• Title/Summary/Keyword: Sn doping

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Synthesis and Properties of ITO Nano Powders by Spray Drying Process (분무건조법에 의한 ITO 나노분말의 합성과 특성)

  • 허민선;최철진;권대환
    • Journal of Powder Materials
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    • v.11 no.1
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    • pp.22-27
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    • 2004
  • The Indium Tin Oxide(ITO) nano powders were prepared by spray drying and heat treatment process. The liquid solution dissolved Indium and Tin salts was first spray dried to prepare chemically homogeneous recursor powders at the optimum spray drying conditions. Subsequently, the precursor powders were subjected to eat treatment process. The nano size ITO powders was synthesized from the previous precursor powders and the npuities also were decreased with increasing heat treatment temperature. Furthermore, the lattice parameter of TO nano powders was increased by doping Tin into Indium with increasing heat treatment temperature. The par icle size of the resultant ITO powders was about 20∼50nm and chemical composition was composed of In:Sn =86:10 wt.% at 80$0^{\circ}C$.

Synthesis and pressure effects on the La doped CaFe2As2

  • Shin, Soohyeon;Shang, T.;Yuan, H.Q.;Park, Tuson
    • Progress in Superconductivity and Cryogenics
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    • v.16 no.3
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    • pp.1-3
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    • 2014
  • We have synthesized La doped $CaFe_2As_2$ single crystals with Sn flux in an evacuated quartz ampule. Doping and pressure effects on the magnetic and superconducting properties of the under-doped $Ca_{1-x}La_xFe_2As_2$ (x=0.08, 0.1) were studied by measuring electrical resistivity under quasi-hydrostatic pressure up to 21 kbar. Magnetic transition temperatures for all studied concentrations were sharply suppressed with slight amplitude of pressure, less than 3 kbar, while superconducting transition temperatures were robust against pressure. In this communication, we report temperature-pressure phase diagram for the La-doped $CaFe_2As_2$ single crystals.

Preparation of thin films with light transmission conductive by electrospinning (Electrospinning을 통한 광투과 전도성 박막의 제조)

  • Lee, Kui-Young;Kim, Han-Seong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.383-384
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    • 2008
  • $SnO_2$ oxides are considerable interest for the development of transparent electrode, thin film resistor and gas sensors. Electrospinning is a class of nanofiber forming processes by which electrostatic forces are employed to control the production of nanofibers. In this study, antimony doped tin oxide thin films were prepared by electrospinning process. Effects of ATO doping concentration and applied voltage on electrical and light transmission properties were investigated.

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Characteristics of ATO Thin Films Prepared by Sol-Gel Process (졸겔법으로 제조된 ATO 박막의 특성 연구)

  • 구창영;이동근;이희영
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.11a
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    • pp.192-195
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    • 2000
  • Antimony doped tin oxyde thin films have been deposited by sol-gel method using non-alkoxide precursor SnCl$_2$$.$2H$_2$O as host and SbC1$_3$ as dopant material. Using spin coating method, thin films of thickness up to 200nm have been uniformly deposited on Corning 1737F non-alkali glass substrates. Effect of Sb doping concentration and heat treatment on electrical and optical properties was investigated. Heat treatment was performed at the temperature from 350$^{\circ}C$ to 650$^{\circ}C$ in flowing O$_2$. The resulting ATO films showed widely changing electrical resistivity and optical transmittance values in the visible spectrum depending on the composition and firing condition.

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ATO Thin Films Prepared by Reactive lout Beam Sputtering (반응성 이온빔 스퍼터링법에 의해 제조된 ATO박막)

  • 구창영;김경중;김광호;이희영
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.361-364
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    • 2000
  • Antimony doped tin oxide (ATO) thin films were deposited at room temperature by reactive ion-beam sputter deposition (IBSD) technique in oxidizing atmosphere utilizing Sb and Sn metal targets. Effect of Sb doping concentration, film thickness and heat treatment on electrical and optical properties was investigated. The thickness of as-deposited films was controlled approximately to 1500 $\AA$ or 2000$\AA$, and Sb concentration to 10.8 and 14.9 wt%, as determined by SEM and XPS analyses. Heat treatment was performed at the temperature from 40$0^{\circ}C$ to 80$0^{\circ}C$ in flowing $O_2$or forming gas. The resulting ATO films showed widely changing electrical resistivity and optical transmittance values in the visible spectrum depending on the composition, thickness and firing condition.

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Preparation of Intrinsic ZnO Films at Low Temperature Using Oxidation of ZnS Precursor and Characterizion of the Films

  • Park, Do Hyung;Cho, Yang Hwi;Shin, Dong Hyeop;Ahn, Byung Tae
    • Current Photovoltaic Research
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    • v.1 no.2
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    • pp.115-121
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    • 2013
  • ZnO film has been used for CIGS solar cells as a buffer layer as itself or by doping Mg and Sn; ZnO film also has been used as a transparent conducting layer by doping Al or B for solar cells. Since ZnO itself is a host material for many applications it is necessary to understand the electrical and optical properties of ZnO film itself with various preparation conditions. We prepared ZnO films by converting ZnS precursor into ZnO film by thermal annealing. ZnO film was formed at low temperature as low as $500^{\circ}C$ by annealing a ZnS precursor layer in air. In the air annealing, the electrical resistivity decreased monotonically with increasing annealing temperature; the intensity of the green photoluminescence at 505 nm increased up to $750^{\circ}C$ annealing. The electrical resistivity further decreased and the intensity of green emission also increased in reducing atmospheres. The results suggest that deep-level defects originated by oxygen vacancy enhanced green emission, which reduce light transmittance and enhance the recombination of electrons in conduction band and holes in valence. More oxidizing environment is necessary to obtain defect-free ZnO film for higher transparency.

DC magnetron sputtering을 이용한 Hf 첨가된 zinc oxide기반의 Thin film transistor의 전기적 특성

  • Sin, Sae-Yeong;Mun, Yeon-Geon;Kim, Ung-Seon;Kim, Gyeong-Taek;Park, Jong-Wan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.110-110
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    • 2010
  • 현재 박막 트랜지스터는 비정질 실리콘 기반의 개발이 주를 이루고 있으며, 이 비정질 실리콘은 성막공정이 간단하고 대면적에 용이하지만 전기적인 특성이 우수하지 않기 때문에 디스플레이의 적용에 어려움을 겪고 있다. 이에 따라 poly-Si을 이용한 박막 트랜지스터의 연구가 진행되고 있는데, 이는 공정온도가 높고, 대면적에의 응용이 어렵다. 따라서 앞으로 저온 공정이 가능하며 대면적 응용이 용이한 박막 트랜지스터의 연구가 필수적이다. 한편 최근 박막 트랜지스터의 채널층으로 사용되는 물질에는 oxide 기반의 ZnO, SnO2, In2O3 등이 주로 사용되고 있고, 보다 적합한 채널층을 찾기 위한 연구가 많이 진행되어 왔다. 최근 Hosono 연구팀에서 IGZO를 채널층으로 사용하여 high mobility, 우수한 on/off ratio의 특성을 가진 소자 제작에 성공함으로써 이를 시작으로 IGZO의 연구 또한 세계적으로 활발한 연구가 이루어지고 있다. 특히, ZnO는 wide band gap (3.37eV)을 가지고 있어 적외선 및 가시광선의 투과율이 좋고, 전기 전도성과 플라즈마에 대한 내구성이 우수하며, 낮은 온도에서도 성막이 가능하다는 특징을 가지고 있다. 그러나 intrinsic ZnO 박막은 bias stress 같은 외부 환경이 변했을 경우 전기적인 성질의 변화를 가져올 뿐만 아니라 고온에서의 공정이 불안정하다는 요인을 가지고 있다. ZnO의 전기적인 특성을 개선하기 위해 본 연구에서는 hafnium을 doping한 ZnO을 channel layer로 소자를 제작하고 전기적 특성을 평가하였다. 이를 위해 DC magnetron sputtering을 이용하여 ZnO 기반의 박막 트랜지스터를 제작하였다. Staggered bottom gate 구조로 ITO 물질을 전극으로 사용하였으며, 제작된 소자는 semiconductor analyzer를 이용하여 출력특성과 전이 특성을 평가하였으며, ZnO channel layer 증착시 hafnium이 도핑 되는 양을 조절하여 소자를 제작한 후 intrinsic ZnO의 소자 특성과 비교 분석하였다. 그 결과 hafnium을 doping 시킨 소자의 field effect mobility가 $6.42cm^2/Vs$에서 $3.59cm^2/Vs$로 낮아졌지만, subthreshold swing 측면에서는 1.464V/decade에서 0.581V/decade로 intrinsic ZnO 보다 좋은 특성을 나타냄을 알 수 있었다. 그리고 intrinsic ZnO의 경우 외부환경에 대한 안정성 문제가 대두되고 있는데, hafnium을 도핑한 ZnO의 경우 temperature, bias temperature stability, 경시변화 등의 다양한 조건에서의 안정성이 확보된다면 intrinsic ZnO 박막트랜지스터의 문제점을 해결할 수 있는 물질로 될 것이라고 기대된다.

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Structural and Electrical Properties of Fluorine-doped Zinc Tin Oxide Thin Films Prepared by Radio-Frequency Magnetron Sputtering

  • Pandey, Rina;Cho, Se Hee;Hwang, Do Kyung;Choi, Won Kook
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.335-335
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    • 2014
  • Over the past several years, transparent conducting oxides have been extensively studied in order to replace indium tin oxide (ITO). Here we report on fluorine doped zinc tin oxide (FZTO) films deposited on glass substrates by radio-frequency (RF) magnetron sputtering using a 30 wt% ZnO with 70 wt% SnO2 ceramic targets. The F-doping was carried out by introducing a mixed gas of pure Ar, CF4, and O2 forming gas into the sputtering chamber while sputtering ZTO target. Annealing temperature affects the structural, electrical and optical properties of FZTO thin films. All the as-deposited FZTO films grown at room temperature are found to be amorphous because of the immiscibility of SnO2 and ZnO. Even after the as-deposited FZTO films were annealed from $300{\sim}500^{\circ}C$, there were no significant changes. However, when the sample is annealed temperature up to $600^{\circ}C$, two distinct diffraction peaks appear in XRD spectra at $2{\Theta}=34.0^{\circ}$ and $52.02^{\circ}$, respectively, which correspond to the (101) and (211) planes of rutile phase SnO2. FZTO thin film annealed at $600^{\circ}C$ resulted in decrease of resistivity $5.47{\times}10^{-3}{\Omega}cm$, carrier concentration ~1019 cm-3, mobility~20 cm2 V-1s-1 and increase of optical band gap from 3.41 to 3.60 eV with increasing the annealing temperatures and well explained by Burstein-Moss effect. Change of work function with the annealing temperature was obtained by ultraviolet photoemission spectroscopy. The increase of annealing temperature leads to increase of work function from ${\phi}=3.80eV$ (as-deposited FZTO) to ${\phi}=4.10eV$ ($600^{\circ}C$ annealed FZTO) which are quite smaller than 4.62 eV for Al-ZnO and 4.74 eV for SnO2. Through X-ray photoelectron spectroscopy, incorporation of F atoms was found at around the binding energy of 684.28 eV in the as-deposited and annealed FZTO up to 400oC, but can't be observed in the annealed FZTO at 500oC. This result indicates that F atoms in FZTO films are loosely bound or probably located in the interstitial sites instead of substitutional sites and thus easily diffused into the vacuum from the films by thermal annealing. The optical transmittance of FZTO films was higher than 80% in all specimens and 2-3% higher than ZTO films. FZTO is a possible potential transparent conducting oxide (TCO) alternative for application in optoelectronics.

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The Comparisons of Electrical and Optical Properties on Transprant Conducting Oxide for Silicon Heterojunction Solar Cells (실리콘 이종접합 태양전지용 투명 전도 산화막의 전기적, 광학적 특성비교)

  • Choi, Suyoung;Lee, Seunghun;Tark, Sung Ju;Parkm, Sungeun;Kim, Won Mok;Kim, Donghwan
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.11a
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    • pp.57.2-57.2
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    • 2010
  • 투명전도 산화막(Transparent conducing oxide: TCO)은 태양 전지, 터치패널, 가스 센서 등 여러 분야에 적용할 수 있는 물질로서 전기 전도성과 광 투과성을 동시에 가진다. 높은 전기 전도성과 광 투과성을 가지는 Sb:$In_2O_3$(ITO)는 투명전도 산화막 재료로써 가장 일반적으로 사용되고 있으나 인듐의 매장량 한계로 인해 가격이 높다는 단점이 있다. 본 연구에서는 ITO 대체 TCO 물질인 Al doped ZnO(AZO)를 rf magnetron sputter를 이용하여 최적의 수소 도핑량을 찾아 ITO의 전기적 광학적 성질과 비교하였다. AZO 박막은(ZnO:Al2O3 2wt.%)타겟을 이용하여 heater 온도 250도에서 슬라이드 글래스 및 코닝 글래스에 증착시켰고 비교군인 ITO박막은 (In2O3:$SnO_2$ 10wt.%)타겟을 이용하여 수소 도핑 없이 350도로 증착시켰다. AZO 및 ITO 박막의 전기적 특성은 hall measurement를 이용하여 측정하였고, UV-VIS spectrophotometer로 광학적 특성을 측정하였다. 수소 도핑량이 증가함에 따라 AZO 박막의 캐리어 농도가 증가하여 전기적 특성이 향상되었고, 가시광 영역에서 높은 평균 투과도를 유지 하였다. AZO 박막과 ITO 박막의 전기적 및 광학적 특성을 비교한 결과, 최적 수소 도핑량을 가진 AZO 박막은 ITO 박막에 준하는 특성을 보였다.

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Electrochemical Properties of Fluorine-Doped Tin Oxide Nanoparticles Using Ultrasonic Spray Pyrolysis (초음파 분무 열 분해법을 통해 제조된 불소 도핑 된 주석 산화물 나노 입자의 전기화학적 특성)

  • Lee, Do-Young;Lee, Jung-Wook;An, Geon-Hyoung;Riu, Doh-Hyung;Ahn, Hyo-Jin
    • Korean Journal of Materials Research
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    • v.26 no.5
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    • pp.258-265
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    • 2016
  • Fluorine-doped tin oxide (FTO) nanoparticles have been successfully synthesized using ultrasonic spray pyrolysis. The morphologies, crystal structures, chemical bonding states, and electrochemical properties of the nanoparticles are investigated. The FTO nanoparticles show uniform morphology and size distribution in the range of 6-10 nm. The FTO nanoparticles exhibit excellent electrochemical performance with high discharge specific capacity and good cycling stability ($620mAhg^{-1}$ capacity retention up to 50 cycles), as well as excellent high-rate performance ($250mAhg^{-1}$ at $700mAg^{-1}$) compared to that of commercial $SnO_2$. The improved electrochemical performance can be explained by two main effects. First, the excellent cycling stability with high discharge capacity is attributed to the nano-sized FTO particles, which are related to the increased electrochemical active area between the electrode and electrolyte. Second, the superb high-rate performance and the excellent cycling stability are ascribed to the increased electrical conductivity, which results from the introduction of fluorine doping in $SnO_2$. This noble electrode structure can provide powerful potential anode materials for high-performance lithiumion batteries.