• 제목/요약/키워드: Single-crystalline region

검색결과 24건 처리시간 0.022초

단결정 실리콘 태양전지 2차원 모델의 반사율 시뮬레이션 (Two-dimensional model simulation for reflectance of single crystalline silicon solar cell)

  • 이상훈;강기환;유권종;안형근;한득영
    • 한국태양에너지학회:학술대회논문집
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    • 한국태양에너지학회 2012년도 춘계학술발표대회 논문집
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    • pp.237-242
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    • 2012
  • At present, crystalline solar cells take up a significant percentage of the solar industry. The ways of increasing the efficiency of crystalline solar cell are texturing and AR(Anti-Reflection) coating, and the purpose of these technologies is to increase the amount of available light on the solar cell by reducing the reflectivity. The reflectance of crystalline silicon solar cell combined with such technologies will be able to predict using the proposed simulation in this paper. The simulation algorithm was made using MATLAB, and it is a combination of the theories of reflection in textured wafer and in anti-reflection coated wafer. The simulation results were divided into three wavelength band and were compared with actual reflectance measured by a spectrometer. The wavelength band from 300 to 380 was named ultraviolet region and the wavelength band from 380 to 780 is named visible region. Finally, the wavelength band from 780 to 1200 named infrared region. When compared with measured reflection data, the simulation results had a small error from 0.4 to 0.5[%] in visible region. The error occurred in the rest two regions is larger than visible region. The extreme error occurred the infrared region is due to internal reflection effect, but in the ultraviolet region, the rationale on reduction phenomenon of reflectance occurred in small range did not proved. If these problem will be solve, this simulation will have high reliability more than now and be able to predict the reflectance of solar cells.

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새로운 가이드 튜브를 통한 6H-SiC 단결정의 직경 확장에 관한 연구 (The Diameter Expansion of 6H-SiC Single Crystals by the Modification of Inner Guide Tube)

  • 손창현;최정우;이기섭;황현희;최종문;구갑렬;이원재;신병철
    • 한국전기전자재료학회논문지
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    • 제21권9호
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    • pp.795-800
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    • 2008
  • A sublimation method using the SiC seed crystal and SiC powder as the source material is commonly adopted to grow SiC bulk single crystal. However, it has proved to be difficult to achieve the high quality crystal and the process reliability because SiC single crystal should be grown at very high temperature in closed system. The present research was focused to improve SiC crystal quality grown by PVT method through using the new inner guide tube. The new inner guide tube was designed to prevent the enlargement of polycrystalline region into single crystalline region and to enlarge the diameter of SiC single crystal. The 6H-SiC crystals were grown by conventional PVT process. The seed adhered on seed holder and the high purity SiC source materials are placed on opposite side in sealed graphite crucible surrounded by graphite insulation. The SiC bulk growth was conducted around 2300 $^{\circ}C$ of growth temperature and 50 mbar in an argon atmosphere of growth pressure. The axial thermal gradient across the SiC crystal during the growth was estimated in the range of 15${\sim}$20 $^{\circ}C$/cm.

절연막을 이용한 단면 표면조직화 결정질 실리콘 태양전지 (The Single-Side Textured Crystalline Silicon Solar Cell Using Dielectric Coating Layer)

  • 도겸선;박석기;명재민;유권종;송희은
    • 한국태양에너지학회:학술대회논문집
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    • 한국태양에너지학회 2011년도 추계학술발표대회 논문집
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    • pp.245-248
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    • 2011
  • Many researches have been carried out to improve light absorption in the crystalline silicon solar cell fabrication. The rear reflection is applied to increase the path length of light, resulting in the light absorption enhancement and thus the efficiency improvement mainly due to increase in short circuit current. In this paper, we manufactured the silicon solar cell using the mono crystalline silicon wafers with $156{\times}156mm^2$, 0.5~3.0 ${\Omega}{\cdot}cm$ of resistivity and p-type. After saw damage removal, the dielectric film ($SiN_x$)on the back surface was deposited, followed by surface texturing in the KOH solution. It resulted in single-side texturing wafer. Then the dielectric film was removed in the HF solution. The silicon wafers were doped with phosphorus by $POCl_3$ with the sheet resistance 50 ${\Omega}/{\Box}$ and then the silicon nitride was deposited on the front surface by the PECVD with 80nm thickness. The electrodes were formed by screen-printing with Ag and Al paste for front and back surface, respectively. The reflectance and transmittance for the single-sided and double-sided textured wafers were compared. The double-sided textured wafer showed higher reflectance and lower transmittance at the long wavelength region, compared to single-sided. The completed crystalline silicon solar cells with different back surface texture showed the conversion efficiency of 17.4% for the single sided and 17.3% for the double sided. The efficiency improvement with single-sided textured solar cell resulted from reflectance increase on back surface and light absorption enhancement.

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$TaSi_2$ 형성시 단결정 실리콘 기판에 이온주입된 $BF_2$의 거동 (The Behavior of $BF_2$ Implanted Single Crystalline Si Substrates During the Formation of $TaSi_2$)

  • 조현춘;양희준;최진석;백수현
    • 전자공학회논문지A
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    • 제28A권10호
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    • pp.814-820
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    • 1991
  • TaSi$_2$ was formed by rapid thermal annealing(RTA) on BF$_2$ doped single crystalline silicon substrates. The formation and various properties of TaSi$_2$ have been investigated by using 4-point probe, HP414, XRD, and SEM. And the redistribution of boron with RTA has been observed by SIMS. Implanted boron was diffused out into the TaSi$_2$ for RTA temperature but did not significantly affect the formation temperature of TaSi$_2$. Also, the contact resistance for TaSi$_2$/p$^{+}$ region had a low value 22$\Omega$, at contact size of 0.9$\mu$m, and the native oxide formed on Si-substrates by BF$_2$ implantation retarded the formation of TaSi$_2$.

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이리듐이 첨가된 니켈실리사이드의 적외선 흡수 특성 (IR Absorption Property in Nano-thick Ir-inserted Nickel Silicides)

  • 윤기정;송오성;한정조
    • 대한금속재료학회지
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    • 제46권11호
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    • pp.755-761
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    • 2008
  • We fabricated thermally evaporated 10 nm-Ni/1 nm-Ir/(poly)Si films to investigate the energy saving property of silicides formed by rapid thermal annealing (RTA) at the temperature range of $300{\sim}1200^{\circ}C$ for 40 seconds. Moreover, we fabricated 100 nm-thick ITO/(poly)Si films with an rf-sputter as references. A transmission electron microscope (TEM) and an X-ray diffractometer were used to determine cross-sectional microstructure and phase changes. A UV-VIS-NIR and FT-IR (Fourier transform infrared spectroscopy) were employed for near-IR and middle-IR absorbance. Through TEM analysis, we confirmed 20~65 nm-thick silicide layers formed on the single and polycrystalline silicon substrates. Ir-inserted nickel silicide on single crystalline substrate showed almost the same absorbance in near IR region as well as ITO, but Ir-inserted nickel silicide on polycrystalline substrate, which had the uniform absorbance in specific region, showed better absorbance in near IR region than ITO. The Ir-inserted nickel silicide on polycrystalline substrate particularly showed better absorbance in middle IR region than ITO. The results imply that nano-thick Ir-inserted nickel silicides may have excellent absorbing capacity in near-IR and middle-IR region.

Advanced P-Channel Poly-Si TFTs for SOG

  • Park, Seong-Jin;Kang, Sang-Hoon;Ku, Yu-Mi;Choi, Jong-Hyun;Jang, Jin
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.1019-1022
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    • 2004
  • High performance p-ch poly-Si TFTs with excellent stability were developed. By using a frequency doubled DPSS CW laser, the a-Si on glass could be crystallized into one dimensional single crystalline silicon named as a sequential lateral crystallization (SLC) region. We fabricated p-ch TFTs on SLC region and the typical characteristic values of the TFTs were $u_{fe}$ = 180 $cm^2$/Vs, $V_{th}$ = -3 V, S.S. = 0.5 V/dec, and $I_{off}$ = 1 pA/um@ $V_d$ = -10V. It is found that the TFTs are very stable after bias stresses such as negative and positive gate biases, hot carrier bias and high current bias. These results indicate that the poly-Si in SLC region is suitable for system on glass (SOG) application.

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CMnAl TRIP Steel Surface Modification During CGL Processing

  • Gong, Y.F.;Lee, Y.R.;Kim,, Han-S.;Cooman, B.C.De
    • Corrosion Science and Technology
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    • 제9권2호
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    • pp.81-86
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    • 2010
  • The mechanisms of selective oxidation of intercritically annealed CMnAl TRIP steels in a Continuous Galvanizing Line (GCL) were studied by cross-sectional observation of the surface and sub-surface regions by means of High Resolution Transmission Electron Microscopy (HR-TEM). The selective oxidation and nitriding of an intercritically annealed CMnAl TRIP steel in a controlled dew point 10%$H_2+N_2$ atmosphere resulted in the formation of c-xMnO.$MnO_2$ (1${\leq}$x<3) and c-xMnO.$Al_2O_3$ ($x{\geq}1$) particles on the steel surface. Single crystal c-xMnO.$SiO_2$ ($2{\leq}x{\leq}4$) oxide particles were also observed on the surface. A thin film of crystalline c-xMnO.$SiO_2$ (2${\leq}$x<3) and c-xMnO.$Al_2O_3$ ($x{\geq}1$) was present between these particles. In the sub-surface region, internal oxidation, nitriding and intermetallic compound formation were observed. In the first region, large crystalline c-xMnO.$SiO_2$ ($1{\geq}x{\geq}2$) and c-xMnO.$Al_2O_3$ ($x{\geq}1$) oxides particles were present. In the second region, c-AlN particles were observed, and in a third region, small $MnAl_x$ (x>1) intermetallic compound particles were observed.

ANALYSIS OF THE ANODIC OXIDATION OF SINGLE CRYSTALLINE SILICON IN ETHYLEN GLYCOL SOLUTION

  • Yuga, Masamitsu;Takeuchi, Manabu
    • 한국표면공학회지
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    • 제32권3호
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    • pp.235-238
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    • 1999
  • Silicon dioxide films were prepared by anodizing silicon wafers in an ethylene $glycol+HNO_3(0.04{\;}N)$ at 20 to $70^{\circ}C$. The voltage between silicon anode and platinum cathode was measured during this process. Under the constant current electrolysis, the voltage increased with oxide film growth. The transition time at which the voltage reached the predetermined value depended on the temperature of the electrolyte. After the time of electrolysis reached the transition time, the anodization was changed the constant voltage mode. The depth profile of oxide film/Si substrate was confirmed by XPS analysis to study the influence of the electrolyte temperature on the anodization. Usually, the oxide-silicon peaks disappear in the silicon substrate, however, this peak was not small at $45^{\circ}C$ in this region.

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Clostridium thermocellum JW20가 생성하는 섬유소분해 효소복합체(cellulosome) 구성단백질의 특성에 관한 연구 (Characterization of Subunits Dissociated from Cellulosome of Clostridium thermocellum JW20)

  • 최상기
    • 미생물학회지
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    • 제36권3호
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    • pp.181-186
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    • 2000
  • Clostridium thermocellum이 생성하는 섬유소분해 효소복합체인 cellulosome은 26개 의 서로 다른 단백질로 구성되어 있으며 그 구성물질로서 calcium을 포함하고 있다. 견고한 구조의 이 복합체에서 구성단백질을 분리하여 그 기능을 연구할 목적으로 이 복합체를 해체 (dissociation)하려 시도하였다. 이 복합체는 calcium을 제거하였을 대 해체되었다. 해체된 구성 단백질들은 MonoQ column chromatogrphy에 의해 구조단백질인 CipA를 포함한 분획, 91 kDa(CelK-tr), 60 kDa 과 57 kDa 단백질로 구성된 분획과 주로 46 kDa(CelA-tr), 또는 71 kDa(CelS-tr) 단백질을 포함하는 분획들로 크게 분리되었다. 대부분의 분획들은 crystalline cellulose 분해 활성을 보였다. 순수 분리된 71 kDa 단백질은 $60^{\circ}C$~$70^{\circ}C$에서 섬 유소 분해시 calcium에 의존적이었으나 46 kDa 단백질은 그렇지 않았다. 46 kDa 단백질은 cellodextrin을 celloviose 및 cellotriose 단위로 절단하며 cellotetraose 로부터 glucose가 생 성되는 것이 관찰되었다. Cellulosome의 섬유소분해 최성 산물이 cellobiose인 것을 고려할 때 개개 구성단백질의 활성이 이 효소 복합체내에서 조절되어 있음을 알 수 있다.

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$K_3$$Li_2$$Nb_5$$O_{15}$ 단결정의 성장과 특성에 관한 연구 (The growth and characteristics $K_3$$Li_2$$Nb_5$$O_{15}$ of single crystals)

  • 김진수;김정남;김태훈;노지현;진병문
    • 한국결정성장학회지
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    • 제9권5호
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    • pp.463-469
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    • 1999
  • $K_3$$Li_2$$Nb_5$$O_{15}$KLN) 단결정을 $K_x$$Li_{1-x}$$NbO_3$의 조성에서 x= 0.04~0.6으로 결정성장방법으로 성장시켰다. 균열이 없는 양질의 결정성장을 위해 c축 및 a축 방향을 택하였고, 단결정 성장을 위한 최적의 조건에 대하여 연구하였다. 성장된 결정은 편광현미경 관찰을 통해 일축성 무늬를 볼수 있었고, X-선 회절실험에서 결정된 격자상수는 a=b=12.500 $\AA$, c=3.996$\AA$이었으며, 1HF : $2HNO_3$ 용액의 부식에서 c축 방향으로 정사각형 및 a축 방향으로 직사각형의 부식상을 볼수 있었다. 광투과율 측정과 온도에 따른 유전상수 측정등을 통해 KLN 결정의 광학적 특성 및 다른 조성을 갖는 시료에서 유전특성을 조사하였다. $420^{\circ}C$에서 상전이 온도를 갖는 결정은 확산상전이(diffuse phase transition) 특성을 갖는 반면 $493^{\circ}C$에서 상전이 온도를 보이는 결정은 날카로운(shap) 유전특성을 나타내었다.

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