• Title/Summary/Keyword: Single-crystalline region

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Two-dimensional model simulation for reflectance of single crystalline silicon solar cell (단결정 실리콘 태양전지 2차원 모델의 반사율 시뮬레이션)

  • Lee, Sang-Hun;Kang, Gi-Hwan;Yu, Gwon-Jong;Ahn, Hyung-Keun;Han, Deuk-Young
    • 한국태양에너지학회:학술대회논문집
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    • 2012.03a
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    • pp.237-242
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    • 2012
  • At present, crystalline solar cells take up a significant percentage of the solar industry. The ways of increasing the efficiency of crystalline solar cell are texturing and AR(Anti-Reflection) coating, and the purpose of these technologies is to increase the amount of available light on the solar cell by reducing the reflectivity. The reflectance of crystalline silicon solar cell combined with such technologies will be able to predict using the proposed simulation in this paper. The simulation algorithm was made using MATLAB, and it is a combination of the theories of reflection in textured wafer and in anti-reflection coated wafer. The simulation results were divided into three wavelength band and were compared with actual reflectance measured by a spectrometer. The wavelength band from 300 to 380 was named ultraviolet region and the wavelength band from 380 to 780 is named visible region. Finally, the wavelength band from 780 to 1200 named infrared region. When compared with measured reflection data, the simulation results had a small error from 0.4 to 0.5[%] in visible region. The error occurred in the rest two regions is larger than visible region. The extreme error occurred the infrared region is due to internal reflection effect, but in the ultraviolet region, the rationale on reduction phenomenon of reflectance occurred in small range did not proved. If these problem will be solve, this simulation will have high reliability more than now and be able to predict the reflectance of solar cells.

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The Diameter Expansion of 6H-SiC Single Crystals by the Modification of Inner Guide Tube (새로운 가이드 튜브를 통한 6H-SiC 단결정의 직경 확장에 관한 연구)

  • Son, Chang-Hyun;Choi, Jung-Woo;Lee, Gi-Sub;Hwang, Hyun-Hee;Choi, Jong-Mun;Ku, Kap-Ryeol;Lee, Won-Jae;Shin, Byoung-Chul
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.9
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    • pp.795-800
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    • 2008
  • A sublimation method using the SiC seed crystal and SiC powder as the source material is commonly adopted to grow SiC bulk single crystal. However, it has proved to be difficult to achieve the high quality crystal and the process reliability because SiC single crystal should be grown at very high temperature in closed system. The present research was focused to improve SiC crystal quality grown by PVT method through using the new inner guide tube. The new inner guide tube was designed to prevent the enlargement of polycrystalline region into single crystalline region and to enlarge the diameter of SiC single crystal. The 6H-SiC crystals were grown by conventional PVT process. The seed adhered on seed holder and the high purity SiC source materials are placed on opposite side in sealed graphite crucible surrounded by graphite insulation. The SiC bulk growth was conducted around 2300 $^{\circ}C$ of growth temperature and 50 mbar in an argon atmosphere of growth pressure. The axial thermal gradient across the SiC crystal during the growth was estimated in the range of 15${\sim}$20 $^{\circ}C$/cm.

The Single-Side Textured Crystalline Silicon Solar Cell Using Dielectric Coating Layer (절연막을 이용한 단면 표면조직화 결정질 실리콘 태양전지)

  • Do, Kyeom-Seon;Park, Seok-Gi;Myoung, Jae-Min;Yu, Gwon-Jong;Song, Hee-Eun
    • 한국태양에너지학회:학술대회논문집
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    • 2011.11a
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    • pp.245-248
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    • 2011
  • Many researches have been carried out to improve light absorption in the crystalline silicon solar cell fabrication. The rear reflection is applied to increase the path length of light, resulting in the light absorption enhancement and thus the efficiency improvement mainly due to increase in short circuit current. In this paper, we manufactured the silicon solar cell using the mono crystalline silicon wafers with $156{\times}156mm^2$, 0.5~3.0 ${\Omega}{\cdot}cm$ of resistivity and p-type. After saw damage removal, the dielectric film ($SiN_x$)on the back surface was deposited, followed by surface texturing in the KOH solution. It resulted in single-side texturing wafer. Then the dielectric film was removed in the HF solution. The silicon wafers were doped with phosphorus by $POCl_3$ with the sheet resistance 50 ${\Omega}/{\Box}$ and then the silicon nitride was deposited on the front surface by the PECVD with 80nm thickness. The electrodes were formed by screen-printing with Ag and Al paste for front and back surface, respectively. The reflectance and transmittance for the single-sided and double-sided textured wafers were compared. The double-sided textured wafer showed higher reflectance and lower transmittance at the long wavelength region, compared to single-sided. The completed crystalline silicon solar cells with different back surface texture showed the conversion efficiency of 17.4% for the single sided and 17.3% for the double sided. The efficiency improvement with single-sided textured solar cell resulted from reflectance increase on back surface and light absorption enhancement.

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The Behavior of $BF_2$ Implanted Single Crystalline Si Substrates During the Formation of $TaSi_2$ ($TaSi_2$ 형성시 단결정 실리콘 기판에 이온주입된 $BF_2$의 거동)

  • 조현춘;양희준;최진석;백수현
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.28A no.10
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    • pp.814-820
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    • 1991
  • TaSi$_2$ was formed by rapid thermal annealing(RTA) on BF$_2$ doped single crystalline silicon substrates. The formation and various properties of TaSi$_2$ have been investigated by using 4-point probe, HP414, XRD, and SEM. And the redistribution of boron with RTA has been observed by SIMS. Implanted boron was diffused out into the TaSi$_2$ for RTA temperature but did not significantly affect the formation temperature of TaSi$_2$. Also, the contact resistance for TaSi$_2$/p$^{+}$ region had a low value 22$\Omega$, at contact size of 0.9$\mu$m, and the native oxide formed on Si-substrates by BF$_2$ implantation retarded the formation of TaSi$_2$.

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IR Absorption Property in Nano-thick Ir-inserted Nickel Silicides (이리듐이 첨가된 니켈실리사이드의 적외선 흡수 특성)

  • Yoon, Kijeong;Song, Ohsung;Han, Jeungjo
    • Korean Journal of Metals and Materials
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    • v.46 no.11
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    • pp.755-761
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    • 2008
  • We fabricated thermally evaporated 10 nm-Ni/1 nm-Ir/(poly)Si films to investigate the energy saving property of silicides formed by rapid thermal annealing (RTA) at the temperature range of $300{\sim}1200^{\circ}C$ for 40 seconds. Moreover, we fabricated 100 nm-thick ITO/(poly)Si films with an rf-sputter as references. A transmission electron microscope (TEM) and an X-ray diffractometer were used to determine cross-sectional microstructure and phase changes. A UV-VIS-NIR and FT-IR (Fourier transform infrared spectroscopy) were employed for near-IR and middle-IR absorbance. Through TEM analysis, we confirmed 20~65 nm-thick silicide layers formed on the single and polycrystalline silicon substrates. Ir-inserted nickel silicide on single crystalline substrate showed almost the same absorbance in near IR region as well as ITO, but Ir-inserted nickel silicide on polycrystalline substrate, which had the uniform absorbance in specific region, showed better absorbance in near IR region than ITO. The Ir-inserted nickel silicide on polycrystalline substrate particularly showed better absorbance in middle IR region than ITO. The results imply that nano-thick Ir-inserted nickel silicides may have excellent absorbing capacity in near-IR and middle-IR region.

Advanced P-Channel Poly-Si TFTs for SOG

  • Park, Seong-Jin;Kang, Sang-Hoon;Ku, Yu-Mi;Choi, Jong-Hyun;Jang, Jin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.1019-1022
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    • 2004
  • High performance p-ch poly-Si TFTs with excellent stability were developed. By using a frequency doubled DPSS CW laser, the a-Si on glass could be crystallized into one dimensional single crystalline silicon named as a sequential lateral crystallization (SLC) region. We fabricated p-ch TFTs on SLC region and the typical characteristic values of the TFTs were $u_{fe}$ = 180 $cm^2$/Vs, $V_{th}$ = -3 V, S.S. = 0.5 V/dec, and $I_{off}$ = 1 pA/um@ $V_d$ = -10V. It is found that the TFTs are very stable after bias stresses such as negative and positive gate biases, hot carrier bias and high current bias. These results indicate that the poly-Si in SLC region is suitable for system on glass (SOG) application.

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CMnAl TRIP Steel Surface Modification During CGL Processing

  • Gong, Y.F.;Lee, Y.R.;Kim,, Han-S.;Cooman, B.C.De
    • Corrosion Science and Technology
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    • v.9 no.2
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    • pp.81-86
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    • 2010
  • The mechanisms of selective oxidation of intercritically annealed CMnAl TRIP steels in a Continuous Galvanizing Line (GCL) were studied by cross-sectional observation of the surface and sub-surface regions by means of High Resolution Transmission Electron Microscopy (HR-TEM). The selective oxidation and nitriding of an intercritically annealed CMnAl TRIP steel in a controlled dew point 10%$H_2+N_2$ atmosphere resulted in the formation of c-xMnO.$MnO_2$ (1${\leq}$x<3) and c-xMnO.$Al_2O_3$ ($x{\geq}1$) particles on the steel surface. Single crystal c-xMnO.$SiO_2$ ($2{\leq}x{\leq}4$) oxide particles were also observed on the surface. A thin film of crystalline c-xMnO.$SiO_2$ (2${\leq}$x<3) and c-xMnO.$Al_2O_3$ ($x{\geq}1$) was present between these particles. In the sub-surface region, internal oxidation, nitriding and intermetallic compound formation were observed. In the first region, large crystalline c-xMnO.$SiO_2$ ($1{\geq}x{\geq}2$) and c-xMnO.$Al_2O_3$ ($x{\geq}1$) oxides particles were present. In the second region, c-AlN particles were observed, and in a third region, small $MnAl_x$ (x>1) intermetallic compound particles were observed.

ANALYSIS OF THE ANODIC OXIDATION OF SINGLE CRYSTALLINE SILICON IN ETHYLEN GLYCOL SOLUTION

  • Yuga, Masamitsu;Takeuchi, Manabu
    • Journal of the Korean institute of surface engineering
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    • v.32 no.3
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    • pp.235-238
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    • 1999
  • Silicon dioxide films were prepared by anodizing silicon wafers in an ethylene $glycol+HNO_3(0.04{\;}N)$ at 20 to $70^{\circ}C$. The voltage between silicon anode and platinum cathode was measured during this process. Under the constant current electrolysis, the voltage increased with oxide film growth. The transition time at which the voltage reached the predetermined value depended on the temperature of the electrolyte. After the time of electrolysis reached the transition time, the anodization was changed the constant voltage mode. The depth profile of oxide film/Si substrate was confirmed by XPS analysis to study the influence of the electrolyte temperature on the anodization. Usually, the oxide-silicon peaks disappear in the silicon substrate, however, this peak was not small at $45^{\circ}C$ in this region.

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Characterization of Subunits Dissociated from Cellulosome of Clostridium thermocellum JW20 (Clostridium thermocellum JW20가 생성하는 섬유소분해 효소복합체(cellulosome) 구성단백질의 특성에 관한 연구)

  • 최상기
    • Korean Journal of Microbiology
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    • v.36 no.3
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    • pp.181-186
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    • 2000
  • The cellulosome of Clo.~tr~rlil~m tl\ulcornererfnocellum consistmg of 26 dfferent polypeptides contains calcium. The polypeptides dissociated when calcium was removed. Most of dockerill region in the catalytic polypeptides cleavcd during dmociation. The dissociated polypeptides were well separated by MonoQ column chromatography into CipA containing fraction, a fraction still complexed wit11 91 kDa (CelK-a). 60 IiDa and 57 kDa polypeptides, and fractious contailling mainly single polypeptide of 46 kDa (CelA-a) or 71 1d)a polypeptide (CelS-trj Most or the fractions hydrolyzed c~ystalliue cellulose The purified 71 kDa polypeptide was strictly dependent on calcium for crystalline cellulose hydvolyzing activities a1 $60^{\circ}C$~$70^{\circ}C$ but 46 kDa polypeptide was not. 46 M)a polypeptide digested cellodextri~~ as cellobiose or cellotriose unit, and glucose was produced together with cellobiose and cellotriose froln cellotetraosc. It seems that cellulosome produces final product, cellobiose, through coordinated ~qulation of activities of vannus subunits.

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The growth and characteristics $K_3$$Li_2$$Nb_5$$O_{15}$ of single crystals ($K_3$$Li_2$$Nb_5$$O_{15}$ 단결정의 성장과 특성에 관한 연구)

  • 김진수;김정남;김태훈;노지현;진병문
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.5
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    • pp.463-469
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    • 1999
  • The potassium lithium niobate $K_3$$Li_2$$Nb_5$$O_{15}$ single crystals were growing in $K_x$$Li_{1-x}$$NbO_3$ (x = 0.4~0.6) chemical formular by the Czorchralski method. Crystal growth is studied in two orientations with growth along a-axis and c-axis. We have subjected this crystal to x-ray diffraction studies and found that they are single-crystalline and belong to tetragonal system with the lattice parameters a = b = 12.577 $\AA$ and c = 3.997$\AA$. The temperature dependence of dielectric constant was measured in the region of the phase transition. Curie temperature and diffuseness of phase transition are influenced by composition concentration. The composition and cation distribution of ferroelectric TB-type niobate crystals has a strong influence on the ferroelectric properties. Growth condition, optical transmittance, etching pattern and dielectric properties are presented and discussed.

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