• Proceedings of the KSME Conference
• /
• 2001.06c
• /
• pp.53-58
• /
• 2001

This paper presents a high resolution capacitive microaccelerometer for applications to personal information systems. We reduce the mechanical noise level of the microaccelerometer by increasing the proof-mass based on deep RIE process. We reduce the electrical noise level by increasing the amplitude of an AC sense voltage. The high sense voltage is obtained by DC-to-DC voltage multiplier. In order to solve the nonlinearity problem caused by the high sense voltage, we modify the conventional comb electrode of straight finger type into that of branched finger type, resulting in self force-balancing effects for enhanced detection linearity. The proposed branched finger capacitive microaccelerometer was fabricated by the deep RIE process of an SOI wafer. The fabricated microaccelerometer reduces the electrical noise at the level of $2.4{\mu}g/\sqrt{Hz}$ for the sense voltage of l6.5V, which is 10.1 times smaller than the electrical noise level of $24.3{\mu}g/\sqrt{Hz}$ at 0.9V. For the sense voltage higher than 2V, the electrical noise level of the microaccelerometer became smaller than the constant mechanical noise level of $11{\mu}g/\sqrt{Hz}$. Total noise level, including the electrical noise and the mechanical noise, has been measured as $9{\mu}g/\sqrt{Hz}$ for the sense voltage of 16.5V, which is 3.2 times smaller than the total noise of $28.6{\mu}g/\sqrt{Hz}$ for the sense voltage of 0.9V. The self force-balancing effect results in the increased stiffness of 1.98 N/m at the sense voltage of 17.8V, compared to the stiffness of 1.35 N/m at 0V, thereby generating the additional stiffness at the rate of $0.002N/m/V^{2}$.

• 한국신재생에너지학회:학술대회논문집
• /
• 2005.06a
• /
• pp.397-402
• /
• 2005

Photovoltaic (PV) module can generate electricity using sunlight without causing any environmental degradation. Due to higher fossil fuel prices and environmental awareness, PV applications are becoming more popular as clean source of electricity generation. PV output is sensitive to the operating temperature and can be drastically affected in Building Integrated PV (BIPV) systems. PV Solarwall (SWPV) combination and PV systems have been evaluated in this study for improvement in electrical output and system costs. PV modules under forced ventilation. A 75W polycrystalline silicon PV module was fixed on SW in front of the ventilation fan as it was indicated to be the coolest position on the SW in phoenix simulations. The effectiveness of cooling by means of the forced ventilating air stream has been studied experimentally. The results indicate that there appears to be significant difference in temperature as well as electricity output comparing the SWPV and BIPV options. Electrical output power recovered is about $4\%$ during the typical day of the month of February. RETScreen(R) analysis of a 3kW PV system hypothetically located at Taegu has shown that with typical temperature reduction of $15^{{\circ}C$, it is possible to reduce the simple payback periods by one year. The work described in this paper may be viewed as an appraisal of a SWPV system based on its improved electrical and financial performances due to its ability to operate at relatively lower temperatures.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2011.10a
• /
• pp.20.1-20.1
• /
• 2011

The nano-sized quantum structure has been an attractive candidate for investigations of the fundamental physical properties and potential applications of next-generation electronic devices. Metal nano-particles form deep quantum wells between control and tunnel oxides due to a difference in work functions. The charge storage capacity of nanoparticles has led to their use in the development of nano-floating gate memory (NFGM) devices. When compared with conventional floating gate memory devices, NFGM devices offer a number of advantages that have attracted a great deal of attention: a greater inherent scalability, better endurance, a faster write/erase speed, and more processes that are compatible with conventional silicon processes. To improve the performance of NFGM, metal nanocrystals such as Au, Ag, Ni Pt, and W have been proposed due to superior density, a strong coupling with the conduction channel, a wide range of work function selectivity, and a small energy perturbation. In the present study, bismuth metal nanocrystals were self-assembled within high-k $Bi_2Mg_{2/3}Nb_{4/3}O_7$ (BMN) films grown at room temperature in Ar ambient via radio-frequency magnetron sputtering. The work function of the bismuth metal nanocrystals (4.34 eV) was important for nanocrystal-based nonvolatile memory (NVM) applications. If transparent NFGM devices can be integrated with transparent solar cells, non-volatile memory fields will open a new platform for flexible electron devices.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2011.10a
• /
• pp.16.2-16.2
• /
• 2011

Graphene has attracted significant attention due to its unique characteristics and promising nanoelectronic device applications. For practical device applications, it is essential to synthesize high-quality and large-area graphene films. Graphene has been synthesized by eloborated mechanical exfoliation of highly oriented pyrolytic graphite, chemical reduction of exfoliated grahene oxide, thermal decomposition of silicon carbide, and chemical vapor deposition (CVD) on metal substrates such as Ni, Cu, Ru etc. The CVD has advantages over some of other methods in terms of mass production on large-areas substrates and it can be easily separated from the metal substrate and transferred to other desired substrates. Especially, plasma-enhanced CVD (PECVD) can be very efficient to synthesize high-quality graphene. Little information is available on the synthesis of graphene by PECVD even though PECVD has been demonstrated to be successful in synthesizing various carbon nanostructures such as carbon nanotubes and nanosheets. In this study, we synthesized graphene on $Ni/SiO_2/Si$ and Cu plate substrates with CH4 diluted in $Ar/H_2$ (10%) by using an inductively-coupled PECVD (ICPCVD). High-quality graphene was synthesized at as low as $700^{\circ}C$ with 600 W of plasma power while graphene layer was not formed without plasma. The growth rate of graphene was so fast that graphene films fully covered on substrate surface just for few seconds $CH_4$ gas supply. The transferred graphene films on glass substrates has a transmittance at 550 nm is higher 94%, indicating 1~3 monolayers of graphene were formed. FETs based on the grapheme films transferred to $Si/SiO_2$ substrates revealed a p-type. We will further discuss the synthesis of graphene and doped graphene by ICPVCD and their characteristics.

• Korean Journal of Materials Research
• /
• v.20 no.4
• /
• pp.217-222
• /
• 2010

Zirconium diboride (ZrB2) and mixed diboride of (Zr0.7Ta0.3)B2 containing 30 vol.% silicon carbide (SiC) composites were prepared by hot-pressing at $1800^{\circ}C$. XRD analysis identified the high crystalline metal diboride-SiC composites at $1800^{\circ}C$. The TaB2 addition to ZrB2-SiC showed a slight peak shift to a higher angle of 2-theta of ZrB2, which confirmed the presence of a homogeneous solid solution. Elastic modulus, hardness and fracture toughness were slightly increased by addition of TaB2. A volatility diagram was calculated to understand the oxidation behavior. Oxidation behavior was investigated at $1500^{\circ}C$ under ambient and low oxygen partial pressure (pO2~10-8 Pa). In an ambient environment, the TaB2 addition to the ZrB2-SiC improved the oxidation resistance over entire range of evaluated temperatures by formation of a less porous oxide layer beneath the surface SiO2. Exposure of metal boride-SiC at low pO2 resulted in active oxidation of SiC due to the high vapor pressure of SiO (g), and, as a result, it produced a porous surface layer. The depth variations of the oxidized layer were measured by SEM. In the ZrB2-SiC composite, the thickness of the reaction layer linearly increased as a function of time and showed active oxidation kinetics. The TaB2 addition to the ZrB2-SiC composite showed improved oxidation resistance with slight deviation from the linearity in depth variation.

• Journal of the Korea Computer Graphics Society
• /
• v.17 no.2
• /
• pp.37-43
• /
• 2011

OpenVG and SVG Tiny are the most widely used 2D vector graphics technologies for outputs in the various embedded environments including smart phones. Especially, to show high refresh rates on the high resolution screens, it is necessary to effectively accelerate them. Until now, OpenVG and SVG Tiny are available as hardware implementations such as the fully-dedicated graphics chips or full software implementations. Currently available vector graphics silicon chips are relatively expensive and require high power consumption. In contrast, previous full software implementations show lower performance even with almost 100% CPU usages, which would disrupt other multi-threaded applications, In this paper, we present a cost-effective way of accelerating both of OpenVG and SVG Tiny, based on the multimedia-processing hardware, which is wide-spread on the media devices and mobile phones. Through the effective use of these multimedia processors, we successfully accelerated OpenVG and SVG Tiny at least 3.5 times to at most 30 times, even with lower power consumption and lower CPU usage.

• Clean Technology
• /
• v.17 no.1
• /
• pp.25-30
• /
• 2011

This study presents a fabrication method of cell-chip using aqueous solution based surface modification. The applications of cell-chip have potential for fundamental study of genetics, cell biology as well as cancer diagnostics and treatment. Conventional methods for fabrication of cell-chip have been limited in economic loss and environmental pollution because of the use of harsh organic solvent, complex process of silicon technology, and expensive equipment. In order to fabricate cell chip, we have proposed simple and eco-friendly process combined polyelectrolyte multilayer coating with microcontact printing. For the proof of concept, the cell chip can be applied to analyze the different expression of cell surface glycans and derivatives between cancer and normal cells. Our proposed method is useful technique for the application of novel cancer diagnostics and basic medical engineering.

• Journal of Korean Ophthalmic Optics Society
• /
• v.12 no.3
• /
• pp.77-81
• /
• 2007

We sputtered $TiN_x$ (titanium nitride) thin films on silicon substrates using ultra high vacuum RF magnetron sputtering method, and measured spectra of ellipsometry angles ${\Delta}$ and ${\Psi}$ in the photon-energy range of 1.5-5.0 eV using a variable angle spectroscopic ellipsometer. The optical constants, refractive index and extinction coefficient of the $TiN_x$ films were determined via the dispersion parameters extracted from the curve-fitting process based on Drude+Lorentz oscillator dispersion function. The reliability of determined optical constants were verified through the comparison of between simulated reflectance and reflectance spectra measured using a spectrophotometer.

• Journal of the Korean Vacuum Society
• /
• v.16 no.6
• /
• pp.439-445
• /
• 2007

SiGe integrated circuits are being used in the field of high-speed wire/wireless communications and microwave systems due to the RF/high-speed analog characteristics and the easiness in the fabrication. Reducing the resistance variation in SiGe thin film resistors results in enhancing the reliability of integrated circuits. In this paper, we investigate the causes that generate the resistance nonuniformity after the silicon-based thin film resistor was fabricated, and consider the counter plan against that. Because the Ti-B precipitate, which formed during the silicide process of the SiGe thin film resistor, gives rise to the nonuniformity of SiGe resistors, the boron ions should be implanted as many as possible. In addition, the resistance deviation increases as the size of the contact hole that interconnects the SiGe resistor and the metal line decreases. Therefore, the size of the contact hole must be enlarged in order to reduce the resistance deviation.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.02a
• /
• pp.277-277
• /
• 2013

The epitaxial graphene on the 4H- or 6H-SiC(0001) surface has been intensively studied due to the possibility of wafer-scale growt. However the existence of interface layer (zero layer graphene) and its influence on the upper graphene layer have been considered as one of the main obstarcles for the industrial application. Among various methods tried to overcome the strong interaction with the substrate through the interface layer, it has been proved that the hydrogen intercalation successfully passivate the Si dangling bond of the substrate and can produce the quasi-free standing epitaxial graphene (QFEG) layers on the siC(0001) surface. In this study, we report the results of the angle-resolved photoemission spectroscopy (ARPES) and Raman spectroscopy for the QFEG layers produced by ex-situ and in-situ hydrogen intercalation.From the ARPES measurement, we confirmed that the Dirac points of QFEG layers exactly coincide with the Fermi level. The band structure of QFEG layer are sustainable upon thermal heating up to 1100 K and robust against the deposition of several metals andmolecular deposition. We also investigated the strain of the QFEG layers by using Raman spectroscopy measurement. From the change of the 2D peak position of graphene Raman spectrum, we found out that unlike the strong compressive strain in the normal epitaxial graphene on the SiC(0001) surface, the strain of the QFEG layer are significantly released and almost similar to that of the mechanically exfoliated graphene on the silicon oxide substrate. These results indicated that various ideas proposed for the ideal free-standing graphene can be tested based on the QFEG graphene layers grown on the SiC(0001) surface.