• Title/Summary/Keyword: Silicon texturing

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Korean Institute of Electrical and Electronic Materials (산.알칼리 용액에 의한 결정질 실리콘 태양전지의 표면 텍스쳐링 변화)

  • Lee, You-Kook;Lee, Yang-Kyu;Heo, Sung-Taek;Lee, Dong-Gu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.449-449
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    • 2009
  • 텍스쳐링에 의한 실리콘 태양전지의 표면 반사율 감소는 태양전지의 효율에 있어서 개선해야 할 문제 중 하나이다. 결정질 실리콘 태양전지의 경우 텍스쳐링에 사용되는 용액에 따라 표면 피라미드 분포 형태와 크기의 차이가 나고 그에 따라 각각 다른 반사율을 얻을 수 있다. 이 논문에서는 결정질 실리콘 태양전지에 산 알칼리 용액에 의한 표면 텍스쳐링을 이용하여 균일한 표면 피라미드 형성과 반사율을 감소시킬 수 있는 방안에 대하여 연구하였다.

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태양전지 적용을 위한 Silicon 기판의 표면처리 효과에 관한 연구

  • Yeon, Chang-Bong;Lee, Yu-Jeong;Im, Jeong-Uk;Yun, Seon-Jin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.592-592
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    • 2012
  • 태양전지에서 고효율 달성을 위해 태양광을 더 많이 활용하기 위해서는 태양전지 표면에서의 광 반사를 줄여야 하는데 가장 효과적인 방법은 실리콘 기판의 wet etching 공정을 통한 텍스쳐링이다. 태양전지에서 가장 많이 사용되는 파장대역은 가시광선 영역인데 555 nm 파장에서 실리콘 표면의 total reflectance는 30.1%로 매우 높고 diffuse reflectance는 0.1%로서 무시할만큼 적다. 하지만 wet etching을 한 후 total reflectance는 18%까지 감소하였고, diffuse reflectance는 16%까지 증가하였다. 결정면에 따른 식각선택성을 이용하는 이방성 etching으로 V groove 모양의 표면형상을 얻을 수 있었고, 후속 등방성 etching을 하여 U groove 표면형상을 얻을 수 있었다. 또한 wet etching의 문제점중의 하나는 반응중에 생성되는 수소기체가 실리콘 표면에 부착되어 etching이 불균일하게 진행되는 것인데 초음파를 사용하여 이 문제를 해결하였다. 그리고 Etchant의 성분용액중 하나인 IPA의 농도조절을 통해 표면에 형성되는 피라미드의 크기를 조절할 수 있었다. 본 연구에서는 실리콘 표면형상의 각각 서로 다른 크기와 모양에 따라 태양전지를 만들었을 때 빛의 활용 측면에서 어떤 변화가 있고 얼마만큼의 효율변화가 있는지에 대해서도 알아보았다.

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Investigation of low cost contact formation for crystalline Si solar cells (저가형 금속 전극이 적용된 양산형 결정질 실리콘 태양전지 특성 평가)

  • Choi, Jun-Young;Kim, Bum-Ho;Lee, Eun-Joo;Lee, Soo-Hong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.142-143
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    • 2007
  • 현재 양산용 태앙전지 제조에 가장 널리 쓰이는 전극형성 기술인 Screen printing 기법은 진공 증착법과 무전해 도금에 의한 방법과, 비교할 때 공정장비가 간단하고 자동화에 적합하여 70 년대 이후로 널리 사용되어 왔다. 본 실험에서는 Screen printing기법과 Porous Si을 이용한 양산형 실리콘 태양전지를 제작하여 그 특성을 평가하였으며 13.2%의 변환효율을 나타내었다.

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PC1D Simulation for Optimization of Single Crystalline Silicon Solar Cell (PC1D를 이용한 단결정 실리콘 태양전지 효율의 최적화)

  • Lim, Won-Sub;Moon, In-Yong;Yi, Jun-Sin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.57-58
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    • 2007
  • 결정질 실리콘 웨이퍼의 텍스쳐링과 도핑은 태양전지의 효율을 결정하는 매우 중요한 요인이다. 높은 효율을 갖는 태양전지 설계를 위해 PC1D를 이용하여 텍스쳐링 사면체의 폭 및 각도, 베이스 면저항 및 농도를 조절하였다. 최적화 결과, 텍스쳐 피라미드의 폭은 $2{\sim}4{\mu}m$, 각도는 $79^{\circ}$ 베이스 면저항 $100{\Omega}/{\Box}$, 도핑 농도 $1{\times}10^{19}cm^{-3}$에서 15.06%의 변환효율을 얻을 수 있다.

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Two-dimensional model simulation for reflectance of single crystalline silicon solar cell (단결정 실리콘 태양전지 2차원 모델의 반사율 시뮬레이션)

  • Lee, Sang-Hun;Kang, Gi-Hwan;Yu, Gwon-Jong;Ahn, Hyung-Keun;Han, Deuk-Young
    • 한국태양에너지학회:학술대회논문집
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    • 2012.03a
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    • pp.237-242
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    • 2012
  • At present, crystalline solar cells take up a significant percentage of the solar industry. The ways of increasing the efficiency of crystalline solar cell are texturing and AR(Anti-Reflection) coating, and the purpose of these technologies is to increase the amount of available light on the solar cell by reducing the reflectivity. The reflectance of crystalline silicon solar cell combined with such technologies will be able to predict using the proposed simulation in this paper. The simulation algorithm was made using MATLAB, and it is a combination of the theories of reflection in textured wafer and in anti-reflection coated wafer. The simulation results were divided into three wavelength band and were compared with actual reflectance measured by a spectrometer. The wavelength band from 300 to 380 was named ultraviolet region and the wavelength band from 380 to 780 is named visible region. Finally, the wavelength band from 780 to 1200 named infrared region. When compared with measured reflection data, the simulation results had a small error from 0.4 to 0.5[%] in visible region. The error occurred in the rest two regions is larger than visible region. The extreme error occurred the infrared region is due to internal reflection effect, but in the ultraviolet region, the rationale on reduction phenomenon of reflectance occurred in small range did not proved. If these problem will be solve, this simulation will have high reliability more than now and be able to predict the reflectance of solar cells.

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Effect of Surface Microstructure of Silicon Substrate on the Reflectance and Short-Circuit Current (실리콘 기판 표면 형상에 따른 반사특성 및 광 전류 개선 효과)

  • Yeon, Chang Bong;Lee, Yoo Jeong;Lim, Jung Wook;Yun, Sun Jin
    • Korean Journal of Materials Research
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    • v.23 no.2
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    • pp.116-122
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    • 2013
  • For fabricating silicon solar cells with high conversion efficiency, texturing is one of the most effective techniques to increase short circuit current by enhancing light trapping. In this study, four different types of textures, large V-groove, large U-groove, small V-groove, and small U-groove, were prepared by a wet etching process. Silicon substrates with V-grooves were fabricated by an anisotropic etching process using a KOH solution mixed with isopropyl alcohol (IPA), and the size of the V-grooves was controlled by varying the concentration of IPA. The isotropic etching process following anisotropic etching resulted in U-grooves and the isotropic etching time was determined to obtain U-grooves with an opening angle of approximately $60^{\circ}$. The results indicated that U-grooves had a larger diffuse reflectance than V-grooves and the reflectances of small grooves was slightly higher than those of large grooves depending on the size of the grooves. Then amorphous Si:H thin film solar cells were fabricated on textured substrates to investigate the light trapping effect of textures with different shapes and sizes. Among the textures fabricated in this work, the solar cells on the substrate with small U-grooves had the largest short circuit current, 19.20 mA/$cm^2$. External quantum efficiency data also demonstrated that the small, U-shape textures are more effective for light trapping than large, V-shape textures.

Fabrication of a robust, transparent, and superhydrophobic soda-lime glass

  • Rahmawan, Yudi;Kwak, Moon-Kyu;Moon, Myoung-Woon;Lee, Kwang-Ryeol;Suh, Kahp-Yang
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.86-86
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    • 2010
  • Micro- and nanoscale texturing and control of surface energy have been considered for superhydrophobicity on polymer and silicon. However these surfaces have been reported to be difficult to meet the robustness and transparency requirements for further applications, from self cleaning windows to biochip technology. Here we provided a novel method to fabricate a nearly superhydrophobic soda-lime glass using two-step method. The first step involved wet etching process to fabricate micro-sale patterns on soda-lime glass. The second step involved application of $SiO_x$-incorporated DLC to generate high intrinsic contact angle on the surface using chemical vapor deposition (CVD) process. To investigate the effect of surface roughness, we used both positive and negative micro-scale patterns on soda-limeglass, which is relatively hard for surface texturing in comparison to quartz or Pyrex glasses due to the presence of impurities, but cheaper. For all samples we tested the static wetting angle and transparency before and after 100 cycles of wear test using woolen steel. The surface morphology is observed using optical and scanning electron microscope (SEM). The results shows that negative patterns had a greater wear resistance while the hydrophobicity was best achieved using positive patterns having static contact angle up to 140 deg. with about 80% transparency. The overall experiment shows that positive patterns at etching time of 1 min shows the optimum transparency and hydrophobicity. The optimization of micro-scale pattern to achieve a robust, transparent, superhydrophobic soda-lime glass will be further investigated in the future works.

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A study on the surface characteristics of diamond wire-sawn silicon wafer for photovoltaic application (다이아몬드 코팅 와이어로 가공된 태양전지용 실리콘 웨이퍼의 표면 특성에 관한 연구)

  • Lee, Kyoung-Hee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.21 no.6
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    • pp.225-229
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    • 2011
  • Most of the silicon cutting methods using the multi-wire with the slurry injection have been used for wafers of the crystalline solar cell. But the productivity of slurry injection cutting type falls due to low cutting speeds. Also, the direct contact with the metal wire and silicon block increases the concentration of metallic impurities in the wafer's surface. In addition, the abrasive silicon carbide (SiC) generates pollutants. And production costs are rising because it does not re-use the worn wire. On the other hand, the productivity of the cutting method using the diamond coated wire is about 2 times faster than the slurry injection cutting type. Also, the continuous cutting using the used wire of low wear is possible. And this is a big advantage for reduced production costs. Therefore, the cutting method of the diamond coated wire is more efficient than the slurry injection cutting technique. In this study, each cutting type is analyzed using the surface characteristics of the solar wafer and will describe the effects of the manufacturing process of the solar cell. Finally, we will suggest improvement methods of the solar cell process for using the diamond cutting type wafer.

A Study on the Application of Ag Nano-Dots Structure to Improve the Light Trapping Effect of Crystalline Silicon Solar Cell (단결정 실리콘 태양전지의 광 포획 효과 개선을 위한 Ag nano-dots 구조 적용 연구)

  • Choi, Jeong-Ho;Roh, Si-Cheol;Seo, Hwa-Il
    • Journal of the Semiconductor & Display Technology
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    • v.18 no.3
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    • pp.19-24
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    • 2019
  • In this study, the Ag nano-dots structure was applied to the textured wafer surface to improve the light trapping effect of crystalline silicon solar cell. The Ag nano-dots structure was formed by the annealing of Ag thin film. Ag thin film deposition was performed using a thermal evaporator. The effect of light trapping was compared and analyzed through light reflectance measurements. The optimization process of the Ag nano-dots structure was made by varying the thickness of Ag thin film, the annealing temperature and time. The thickness of Ag thin films was in the range of 5 ~ 20 nm. The annealing temperature was in the range of 450~650℃ and the annealing time was in the range of 30 ~ 60 minutes. As a result, the light reflectance of 10 nm Ag thin film annealed at 650℃ for 30 minutes showed the lowest value of about 9.67%. This is a value that is about 3.37% lower than the light reflectance of the sample that has undergone only the texturing process. Finally, the change of the light reflectance by the HF treatment of the sample on which the Ag nano-dots structure was formed was investigated. The HF treatment time was in the range of 0 ~ 120 seconds. As a result, the light reflectance decreased by about 0.41% due to the HF treatment for 75 seconds.

레이저 텍스처링을 통한 다결정 실리콘 태양전지 제작

  • Choe, Pyeong-Ho;Kim, Sang-Seop;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.307-307
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    • 2012
  • 현재 태양전지 시장은 결정질 태양전지가 주류를 차지하고 있으며 이중 상대적으로 재료비가 저렴한 다결정 실리콘 기반의 고효율 태양전지 제작에 대한 연구가 활발히 진행되고 있다. 이에 본 실험에서는 표면 텍스처링 방법에 따른 태양전지 소자의 특성 변화에 대한 실험을 진행하였다. 일반적으로 다결정 태양전지의 경우 산성용액을 이용한 표면 텍스처링을 실시하는데 이 경우 표면에 형성된 텍스처 구조는 산성용액의 등방성 식각으로 인해 반구(Hemisphere) 형태의 구조를 띄게 된다. 이는 표면에서의 광흡수율을 떨어뜨려 태양전지 소자의 효율을 저해하는 원인이 된다. 따라서 본 연구에서는 다결정 실리콘 태양전지의 효율 향상을 위해 레이저를 이용한 차세대 텍스처링 방법에 대한 연구를 진행하였다. 우선 355 nm 파장의 Ultra-Violet (UV) 레이저를 소자 표면에 조사함으로써 $10{\mu}m$의 dot diameter와 depth를 갖는 honey comb 배열의 hole을 형성하였다. 이후 산성용액에 담가 레이저 공정 후의 slag를 제거해 최종적으로 피라미드 형태의 구조를 형성하였다. Suns_Voc 효율 측정 결과 산성용액을 이용한 텍스처링의 경우 개방 전압이 611 mV, 곡선인자가 81%, 효율이 17.32%로 각각 측정되었다. 반면, 레이저 텍스처링의 경우에서는 개방전압이 631 mV, 곡선인자가 83%, 효율이 18.33%로 용액 텍스처링 방법보다 우수한 특성을 보였다. 이는 UV 레이저 텍스처링을 통해 형성된 피라미드 형태의 표면 구조에서의 광흡수율이 산성용액을 이용한 방법보다 우수함을 말하며, 따라서 태양전지의 주요 파라미터가 향상된 결과를 보였다. 본 실험에서는 레이저 텍스처링을 통한 태양전지 제작에 대한 방법을 제시하며, 향후 고효율의 다결정 태양전지 제작에 있어 기여 할 것으로 판단된다.

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