Characteristics of MOSFET Devices with Polycrystalline-Gallium-Oxide Thin Films Grown by Mist-CVD (Mist-CVD법으로 증착된 다결정 산화갈륨 박막의 MOSFET 소자 특성 연구)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.33 no.5
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- pp.427-431
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- 2020