• Title/Summary/Keyword: SiO vapor

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Characteristics of Plasma Polymer Thin Films for Low-dielectric Application

  • Cho, S.J.;Boo, J.H.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.124-124
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    • 2011
  • This study investigated the interaction of varied plasma power with ultralow-k toluene-tetraethoxysilane (TEOS) hybrid plasma polymer thin films, as well as changing electrical and mechanical properties. The hybrid thin films were deposited on silicon(100) substrates by plasma enhanced chemical vapor deposition (PECVD) system. Toluene and tetraethoxysilane were utilized as organic and inorganic precursors. In order to compare the electrical and the mechanical properties, we grew the hybrid thin films under various conditions such as rf power of plasma, bubbling ratio of TEOS to toluene, and post annealing temperature. The hybrid plasma polymer thin films were characterized by Fourier transform infrared (FT-IR) spectroscopy, atomic force microscopy (AFM), nanoindenter, I-V curves, and capacitance. Also, the hybrid thin films were analyzed by using ellipsometry. The refractive indices varied with the RF power, the bubbling ratio of TEOS to toluene, and the annealing temperature. To analyze their trends of electrical and mechanical properties, the thin films were grown under conditions of various rf powers. The IR spectra showed them to have completely different chemical functionalities from the liquid toluene and TEOS precursors. Also, The SiO peak intensity increased with increasing TEOS bubbling ratio, and the -OH and the CO peak intensities decreased with increasing annealing temperature. The AFM images showed changing of surface roughness that depended on different deposition rf powers. An nanoindenter was used to measure the hardness and Young' modulus and showed that both these values increased as the deposition RF power increased; these values also changed with the bubbling ratio of TEOS to toluene and with the annealing temperature. From the field emission scanning electron microscopy (FE-SEM) results, the thickness of the thin films was determined before and after the annealing, with the thickness shrinkage (%) being measured by using SEM cross-sectional images.

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Development of Nano Ceramic Structures for HEPA Type Breathing Wall (HEPA Filter형 숨쉬는 벽체용 나노세라믹 여재개발)

  • Kim, Jong-Won;Ahn, Young-Chull;Kim, Gil-Tae
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.20 no.4
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    • pp.274-279
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    • 2008
  • In the perspective of saving energy in buildings, high performance of insulation and air tightness for improving the heating and the cooling efficiency has brought the positive effect in an economical view. However, these building energy saving technologies cause the lack of ventilation, which is the direct cause of increasing the indoor contaminants, and it is also very harmful to residents because they spend over 90% of their time in the indoor area. Therefore, the ventilation is important to keep indoor environment clean and it can also save energy consumption. In this study, a HEPA type breathing wall is designed as a passive ventilation system to collect airborne particles and to supply fresh outdoor air. To make fine porous structures, polymer nano fibers which were made by electro spinning method are used as a precursor. The nano fibers are coated with SiO2 nano particles and finally the HEPA type breathing wall is made by sintering in the electric furnace at $300\sim500^{\circ}C$. The pressure drops of nano ceramic structure are 8.2, 25.5 and 44.9 mmAq at the face velocity of 2.0, 5.9 and 8.8 cm/s, respectively. Also the water vapor permeability is $3.6g/m^2{\cdot}h{\cdot}mmHg$. In this research, the porous nano ceramic structures are obtained and the possibility for the usage of a material for HEPA type breathing wall can be obtained.

Fabrication of a robust, transparent, and superhydrophobic soda-lime glass

  • Rahmawan, Yudi;Kwak, Moon-Kyu;Moon, Myoung-Woon;Lee, Kwang-Ryeol;Suh, Kahp-Yang
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.86-86
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    • 2010
  • Micro- and nanoscale texturing and control of surface energy have been considered for superhydrophobicity on polymer and silicon. However these surfaces have been reported to be difficult to meet the robustness and transparency requirements for further applications, from self cleaning windows to biochip technology. Here we provided a novel method to fabricate a nearly superhydrophobic soda-lime glass using two-step method. The first step involved wet etching process to fabricate micro-sale patterns on soda-lime glass. The second step involved application of $SiO_x$-incorporated DLC to generate high intrinsic contact angle on the surface using chemical vapor deposition (CVD) process. To investigate the effect of surface roughness, we used both positive and negative micro-scale patterns on soda-limeglass, which is relatively hard for surface texturing in comparison to quartz or Pyrex glasses due to the presence of impurities, but cheaper. For all samples we tested the static wetting angle and transparency before and after 100 cycles of wear test using woolen steel. The surface morphology is observed using optical and scanning electron microscope (SEM). The results shows that negative patterns had a greater wear resistance while the hydrophobicity was best achieved using positive patterns having static contact angle up to 140 deg. with about 80% transparency. The overall experiment shows that positive patterns at etching time of 1 min shows the optimum transparency and hydrophobicity. The optimization of micro-scale pattern to achieve a robust, transparent, superhydrophobic soda-lime glass will be further investigated in the future works.

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Crystal Structure of a Benzene Sorption Complex of Dehydrated Fully $Cd^{2+}$-Exchanged Zeolite X

  • 김양;염영훈;최은영;김안나;한영욱
    • Bulletin of the Korean Chemical Society
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    • v.19 no.11
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    • pp.1222-1227
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    • 1998
  • The crystal structure of a benzene sorption complex of fully dehydrated Cd2+-exchanged zeolite X, Cd46Si100Al92O384·43C6H6 (a=24.880(6) Å), has been determined by single-crystal X-ray diffraction techniques in the cubic space group Fd3 at 21 ℃. The crystal was prepared by ion exchange in a flowing stream of 0.05 M aqueous Cd(NO3)2 for 3 d, followed by dehydration at 400 ℃ and 2 x 10-6 Torr for 2 d, followed by exposure to about 92 Torr of benzene vapor at 22 ℃. The structure was determined in this atmosphere and refined to the final error indices R1=0.054 and Rw=0.066 with 561 reflections for which I > 3σ(I). In this structure, Cd2+ ions are found at four crystallographic sites: eleven Cd2+ ions are at site 1, at the centers of the double six-oxygen rings; six Cd2+ ions lie at site I', in the sodalite cavity opposite to the double six-oxygen rings; and the remaining 29 Cd2+ ions are found at two nonequivalent threefold axes of unit cell, sites Ⅱ' (in the sodalite cavity ) and site Ⅱ (in the supercage) with occupancies of 2 and 27 ions, respectively. Each of these Cd2+ ions coordinates to three framework oxylkens, either at 2.173(13) or 2.224(10) Å, respectively, and extends 0.37 Å into the sodalite unit or 0.60 Å into the supercage from the plane of the three oxygens to which it is bound. The benzene molecules are found at two distinct sites within the supercages. Twenty-seven benzenes lie on threefold axes in the large cavities where they interact facially with the latter 27 site-Ⅱ Cd2+ ions (Cd2+-benzene center=2.72 Å; occupancy=27 molecules/32 sites). The remaining sixteen benzene molecules are found in 12ring planes; occupancy=16 molecules/16 sites. Each hydrogen of these sixteen benzenes is ca. 2.8/3.0 Å from three 12-ring oxygens where each is stabilized by multiple weak electrostatic and van der Waals interactions with framework oxygens.

An Algorithm Study to Detect Mass Flow Controller Error in Plasma Deposition Equipment Using Artificial Immune System (인공면역체계를 이용한 플라즈마 증착 장비의 유량조절기 오류 검출 실험 연구)

  • You, Young Min;Jeong, Ji Yoon;Ch, Na Hyeon;Park, So Eun;Hong, Sang Jeen
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.4
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    • pp.161-166
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    • 2021
  • Errors in the semiconductor process are generated by a change in the state of the equipment, and errors usually arise when the state of the equipment changes or when parts that make up the equipment have flaws. In this investigation, we anticipated that aging of the mass flow controller in the plasma enhanced chemical vapor deposition SiO2 thin film deposition method caused a minute flow rate shift. In seven cases, fourier transformation infrared film quality analysis of the deposited thin film was used to characterize normal and pathological processes. The plasma condition was monitored using optical emission spectrometry data as the flow rate changed during the procedure. Preprocessing was used to apply the collected OES data to the artificial immune system algorithm, which was then used to process diagnosis. Through comparisons between datasets, the learning algorithm compared classification accuracy and improved the method. It has been confirmed that data characterized as a normal process and abnormal processes with differing flow rates may be discriminated by themselves using the artificial immune system data mining method.

Sensitivity Analysis for CAS500-4 Atmospheric Correction Using Simulated Images and Suggestion of the Use of Geostationary Satellite-based Atmospheric Parameters (모의영상을 이용한 농림위성 대기보정의 주요 파라미터 민감도 분석 및 타위성 산출물 활용 가능성 제시)

  • Kang, Yoojin;Cho, Dongjin;Han, Daehyeon;Im, Jungho;Lim, Joongbin;Oh, Kum-hui;Kwon, Eonhye
    • Korean Journal of Remote Sensing
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    • v.37 no.5_1
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    • pp.1029-1042
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    • 2021
  • As part of the next-generation Compact Advanced Satellite 500 (CAS500) project, CAS500-4 is scheduled to be launched in 2025 focusing on the remote sensing of agriculture and forestry. To obtain quantitative information on vegetation from satellite images, it is necessary to acquire surface reflectance through atmospheric correction. Thus, it is essential to develop an atmospheric correction method suitable for CAS500-4. Since the absorption and scattering characteristics in the atmosphere vary depending on the wavelength, it is needed to analyze the sensitivity of atmospheric correction parameters such as aerosol optical depth (AOD) and water vapor (WV) considering the wavelengths of CAS500-4. In addition, as CAS500-4 has only five channels (blue, green, red, red edge, and near-infrared), making it difficult to directly calculate key parameters for atmospheric correction, external parameter data should be used. Therefore, thisstudy performed a sensitivity analysis of the key parameters (AOD, WV, and O3) using the simulated images based on Sentinel-2 satellite data, which has similar wavelength specifications to CAS500-4, and examined the possibility of using the products of GEO-KOMPSAT-2A (GK2A) as atmospheric parameters. The sensitivity analysisshowed that AOD wasthe most important parameter with greater sensitivity in visible channels than in the near-infrared region. In particular, since AOD change of 20% causes about a 100% error rate in the blue channel surface reflectance in forests, a highly reliable AOD is needed to obtain accurate surface reflectance. The atmospherically corrected surface reflectance based on the GK2A AOD and WV was compared with the Sentinel-2 L2A reflectance data through the separability index of the known land cover pixels. The result showed that two corrected surface reflectance had similar Seperability index (SI) values, the atmospheric corrected surface reflectance based on the GK2A AOD showed higher SI than the Sentinel-2 L2A reflectance data in short-wavelength channels. Thus, it is judged that the parameters provided by GK2A can be fully utilized for atmospheric correction of the CAS500-4. The research findings will provide a basis for atmospheric correction of the CAS500-4 in the future.

Crystal Structure of a Methanol Sorption Complex of Dehydrated Partially Cobalt(Ⅱ)-Exchanged Zeolite A (부분적으로 Co(Ⅱ) 이온으로 치환한 제올라이트 A를 탈수한 후 메탄올을 흡착한 결정구조)

  • Jang, Se Bok;Han, Yeong Uk;Kim, Yang
    • Journal of the Korean Chemical Society
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    • v.38 no.5
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    • pp.339-344
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    • 1994
  • The crystal structure of a methanol sorption complex of dehydrated partially Co(II)-exchanged zeolite A, $Co_4Na_4-A{\cdot}6.5CH_3OH$ (a = 12.169(1) $\AA)$, has been determined by single-crystal X-ray diffraction techniques in the cubic space group Pm$\bar3$m at $21(1)^{\circ}C. $Co_4Na_4$-A was dehydrated at $360^{\circ}C\;and\;2{\times}10^{-6}$ torr for 2 days, followed by exposure to about 104 torr of methanol vapor at $22(1)^{\circ}C$ for 1 hr. The structure was refined to final error indices, $R_1$ = 0.061 and $R_2$ = 0.060 with 147 reflections, for which I > $3\sigma(I).$ In this structure, four $Co^{2+}$ ions and 1.5 $Na^+$ ions per unit cell lie at 6-ring positions: the $Na^+$ ions are recessed 0.44 $\AA$ into the sodalite unit and the Co(II) ions extend ca. 0.55 $\AA$ into the large cavity. 2.5 $Na^+$ ions lie in an 8-oxygen ring plane. The 6.5 methanol molecules are sorbed per unit cell. The 6.5 methanol oxygens, all in the large cavity, associate with the 4 $Co^{2+}$ ions and 2.5 $Na^+$ ions.

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대기압 유전체 배리어 방전을 이용한 폴리머 박막의 증착과 특성 분석에 대한 연구

  • Kim, Gi-Taek;Suzaki, Yoshifumi;Kim, Yun-Gi
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.10a
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    • pp.38.2-38.2
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    • 2011
  • 폴리머 박막은 그 고유한 특성으로 인해 여러 산업적으로 널리 사용되고 있는 재료이다 예로 의약품이나 식품 포장지의 배리어, 전자부품의 절연체, 반도체 공정에서의 사용, 혹은 부식방지를 위해 사용 되어지기도 한다. 이 폴리머 박막을 증착 하기 위한 방법으로 이전부터 CVD (Chemical Vapor Deposition) 방법이 많이 사용되었고 지금까지도 가장 많이 사용되는 방법이다. CVD를 사용하여 $SiO_2$-like 필름의 증착은 전구체(precursor)로 Silane ($SiH_4$)을 사용하였으며, 플라즈마 발생 소스(source)로 열 혹은 전기장 등을 사용 하며 공정 시 압력 또한 대부분 저압 하에서 실시 하였다. 이와 같은 이전 CVD 방법의 문제는 사용되는 Silane 자체가 인체에 해로울 정도로 독성이 있으며 폭발성도 같이 가지고 있어 작업환경의 위험성이 높으며 열을 사용한 CVD의 경우 높은 공정 온도로 인해 증착 할 수 있는 대상이 제한 되어 지며 높은 열의 발생을 위해 많은 에너지의 소비가 필요하다. 저압 플라즈마를 사용한 CVD 는 공정상 높은 열의 발생이 일어나지 않아 기판 운용상 문제가 되지 않지만 저압 환경에서 해당 공정이 이루어기 때문에 인해 필수적으로 고가의 진공 챔버가 필수적이며 저압을 유지할 고가의 진공 펌프나 추가 장비들이 필요하게 된다, 또한 챔버 내에서 이루어지는 공정으로 인해 공정의 연속성이 떨어져 시잔비용 또한 많이 잡아 먹는다. 이러한 열 혹은 저압 플라즈마등을 사용한 공정의 단점을 해결하기 위해 여러 연구자들이 다양한 방법을 통해 연구를 하였다. 대기압 유전체 배리어 방전(AP-DBD: Atmospheric Pressure-Dielectric Barrier Discharge)을 사용한 폴리머 박막의 증착은 이전 전통적인 방법에 비해 낮은 장비 가격과 낮은 공정 온도 그리고 연속적인 공정 등의 장점이 있는 폴리머 박막 증착 방법 이다. 대기압 유전체 배리어 방전 공정 변수로 공급 전압 및 주파수 그리고 공급 전압의 영향, 전구체를 유전체 배리어 방전 전극으로 이동 시키기 위해 사용된 캐리어 가스의 종류 및 유량, 화학양론적 계수를 맞추기 위해 같이 포함되는 산소 가스의 유량, DBD 전극의 형태에 따른 증착 박막의 균일성 등 이 존재하며 이런 많은 변수 들에 대한 연구가 진행 되었지만 아직 이 대기압 DBD를 이용한 폴리머 박막의 증착에 대한 명확한 이해는 아직 완전 하다 할 수 없다. 본 연구에서는 이러한 대기압 DBD를 이용하여 폴리머 박막의 증착시 영향을 미치는 많은 공정 변수 등이 박막생성에 미치는 영향과 증착된 박막의 성질에 대한 연구를 진행 하였다.

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PECVD를 이용한 2차원 이황화몰리브데넘 박막의 저온합성법 개발

  • Kim, Hyeong-U;An, Chi-Seong;Arabale, Girish;Lee, Chang-Gu;Kim, Tae-Seong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.274-274
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    • 2014
  • 금속칼코게나이드 화합물중 하나인 $MoS_2$는 초저 마찰계수의 금속성 윤활제로 널리 사용되고 있으며 흑연과 비슷한 판상 구조를 지니고 있어 기계적 박리법을 통한 그래핀의 발견 이후 2차원 박막 합성법에 대한 활발한 연구가 진행되고 있다. 최근 다양한 응용이 진행 중인 그래핀의 경우 높은 전자이동도, 기계적 강도, 유연성, 열전도도 등 뛰어난 물리적 특성을 지니고 있으나 zero-bandgap으로 인한 낮은 on/off ratio는 thin film transistor (TFT), 논리회로(logic circuit) 등 반도체 소자 응용에 한계가 있다. 하지만 $MoS_2$는 벌크상태에서 약 1.2 eV의 indirect band-gap을 지닌 반면 단일층의 경우 1.8 eV의 direct-bandgap을 나타내고 있다. 또한 단일층 $MoS_2$를 이용하여 $HfO_2/MoS_2/SiO_2$ 구조의 트랜지스터를 제작하였을 때 $200cm^2/v^{-1}s^{-1}$의 높은 mobility와 $10^8$ 이상의 on/off ratio 나타낸다는 연구가 보고되어 있어 박막형 트랜지스터 응용을 위한 신소재로 주목을 받고 있다. 한편 2차원 $MoS_2$ 박막을 합성하기 위한 대표적인 방법인 기계적 박리법의 경우 고품질의 단일층 $MoS_2$ 성장이 가능하지만 대면적 합성에 한계를 지니고 있으며 화학기상증착법(CVD)의 경우 공정 gas의 분해를 위한 높은 온도가 요구되므로 박막형 투명 트랜지스터 응용을 위한 플라스틱 기판으로의 in-situ 성장이 어렵기 때문에 이를 보완할 수 있는 $MoS_2$ 박막 합성 공정 개발이 필요하다. 특히 Plasma enhanced chemical vapor deposition (PECVD) 방법은 공정 gas가 전기적 에너지로 분해되어 chamber 내부에서 cold-plasma 형태로 존 재하기 때문에 박막의 저온성장 및 대면적 합성이 가능하며 고진공을 바탕으로 합성 중 발생하는 오염 요소를 효과적으로 제어할 수 있다. 본 연구에서는PECVD를 이용하여 plasma power, 공정압력, 공정 gas의 유량 등 다양한 공정 변수를 조절함으로써 저온, 저압 조건하에서의 $MoS_2$ 박막 성장 가능성을 확인하였으며 전구체로는 Mo 금속과 $H_2S$ gas를 사용하였다. 또한 향후 flexible 소자 응용을 위한 플라스틱 기판의 녹는점을 고려하여 공정 온도는 $300^{\circ}C$ 이하로 설정하였으며 합성된 $MoS_2$ 박막의 두께 및 화학적 구성은 Raman spectroscopy를 이용하여 확인 하였다. 공정온도 $200^{\circ}C$$150^{\circ}C$에서 성장한 $MoS_2$ 박막의 Raman peak의 경우 상대적으로 낮은 공정온도로 인하여 Mo와 H2S의 화학적 결합이 감소된 것을 관찰할 수 있었고 $300^{\circ}C$의 경우 약 $26{\sim}27cm^{-1}$의 Raman peak 간격을 통해 5~6층의 $MoS_2$ 박막이 형성 된 것을 확인할 수 있었다.

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Fluid Inclusions Trapped in Xenoliths from the Lower Crust/upper Mantle Beneath Jeju Island (I): A Preliminary Study (제주도의 하부지각/상부맨틀 기원의 포획암에 포획된 유체포유물: 예비연구)

  • Yang, Kyounghee
    • The Journal of the Petrological Society of Korea
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    • v.13 no.1
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    • pp.34-45
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    • 2004
  • This paper describes the textural relations of mantle xenoliths and fluid inclusions in mantle-derived rocks found in alkaline basalts from Jeju Island which contain abundant ultramafic, felsic, and cumulate xenoliths. Most of the ultramafic xenoliths are spinel-lherzolites, composed of olivine, orthopyroxene, clinopyroxene and spinel. The felsic xenoliths considered as partially molten buchites consist of quartz and plagioclase with black veinlets, which are the product of ultrahigh-temperature metamorphism of lower crustal materials. The cumulate xenoliths, clinopyroxene-rich or clinopyroxene megacrysts, are also present. Textural examination of these xenoliths reveals that the xenoliths are typically coarse grained with metamorphic characteristics, testifying to a complex history of evolution of the lower crust/upper mantle source region. The ultramafic xenoliths contain protogranular, porphyroclastic and equigranular textures with annealing features, indicating the presence of shear regime in upper mantle of the Island. The preferential associations of spinel and olivine with large orthopyroxenes suggest a previous high temperature equilibrium in the high-Al field and the original rock-type was a Al-rich orthopyroxene-bearing peridotite without garnet. Three types of fluid inclusions trapped in mantle-derived xenoliths include CO$_2$-rich fluid (Type I), multiphase silicate melt (glass ${\pm}$ devitrified crystals ${\pm}$ one or more daughter crystals + one or more vapor bubbles) (Type II), and sulfide (melt) inclusions (Type III). C$_2$-rich inclusions are the most abundant volatile species in mantle xenoliths, supporting the presence of a separate CO$_2$-rich phase. These CO$_2$-rich inclusions are spatially associated with silicate and sulfide melts, suggesting immiscibility between them. Most multiphase silicate melt inclusions contain considerable amount of silicic glass. reflecting the formation of silicic melts in the lower crust/upper mantle. Combining fluid and melt inclusion data with conventional petrological and geochemical information will help to constrain the fluid regime, fluid-melt-mineral interaction processes in the mantle of the Korean Peninsula and pressure-temperature history of the host xenoliths in future studies.