• Title/Summary/Keyword: SiO

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Syntheses and Mechanical Properties of Quaternary Cr-Si-O-N Coatings by Hybrid Coating System (하이브리드 코팅시스템에 의한 Cr-Si-O-N 코팅막 합성 및 기계적 성질)

  • Lee, Jeong-Doo;Wang, Qi Min;Kim, Kwang-Ho
    • Journal of the Korean institute of surface engineering
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    • v.43 no.5
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    • pp.238-242
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    • 2010
  • In the present work, the influence of oxide on the Cr-Si-N coatings was investigated for the Cr-Si-O-N coatings on AISI 304 and Si wafer deposited by hybrid system, which combines the DC magnetron sputtering technique and arc ion plating (AIP) using Cr and Si target in an $Ar/N_2/O_2$ gaseous mixture. As the O content in the Cr-Si-N coatings increased, the diffraction patterns of the Cr-Si-O-N coatings showed CrN and $Cr_2O_3$ phases. However, as the O content increased to 28.8 at.%, diffraction peak of $Cr_2O_3$ was disappeared in the Cr-Si-O-N coating. The $d_{200}$ value was decreased with increasing of O content. The average grain size increased from about 40 nm to 65 nm as the O content increased. The maximum micro-hardness of the Cr-Si-O-N coating was obtained 4507 Hk at the O content of 24.8 at.%. The average friction coefficient of the Cr-Si-O-N coatings was gradually decreased by increasing the O content and the average friction coefficient decreased from 0.37 to 0.25 by increasing the O content. These results indicated that amorphous phase was increased in the Cr-Si-O-N coatings by increasing of O content.

Bending Strength of Crack Healed $Si_3N_4/SiC$ Composite Ceramics by $SiO_2$ Colloidal

  • Park, Sung-Won;Kim, Mi-Kyung;Ahn, Seok-Hwan;Nam, Ki-Woo
    • Proceedings of the Korea Committee for Ocean Resources and Engineering Conference
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    • 2006.11a
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    • pp.166-168
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    • 2006
  • $Si_3N_4/SiC$ composite ceramics was sintered in order to investigate their bending strength behavior after crack healing. $Y_2O_$ and $TiO_2$ power was added as sintering additives to enhance it's sintering property. A three-point bending specimen was cut out from sintered plates. About $100\;{\mu}m$ semi-circular surface cracks were made on the center of the tension surface of the three-point bending specimen using Vickers indenter. After the crack-healing processing from $500^{\circ}C$ to $1300^{\circ}C$, for 1 h, in air, the bending strength behavior of these crack-healed specimen coated with $SiO_2$ colloidal were determined systematically at room temperature. $Si_3N_4/SiC$ ceramics using additive powder ($Y_2O_3+TiO_2$) was superior to that of additive powder $Y_2O_3$. The additive powder $TiO_2$ exerted influence at growth of $Si_3N_4$. The optimum crack healing conditions coated $SiO_2$ colloidal were $1000^{\circ}C$ at $Si_3N_4/SiC$ using additive powder ($Y_2O_3+TiO_2$), and $1300^{\circ}C$ at $Si_3N_4/SiC$ using additive powder $Y_2O_3$.

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Effect of Silicon Source and Application Method on Growth of Kalanchoe 'Peperu' (규산염 종류와 적용방법이 칼랑코에 '페페루'의 생육에 미치는 영향)

  • Son, Moon-Sook;Oh, Hye-Jin;Song, Ju-Yeon;Lim, Mi-Young;Sivanesan, Iyyakkannu;Jeong, Byoung-Ryong
    • Horticultural Science & Technology
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    • v.30 no.3
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    • pp.250-255
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    • 2012
  • The effect of different source silicon ($CaSiO_3$, $K_2SiO_3$, and $NaSiO_3$) and their application methods (foliar application and subirrigation) on the growth of potted kalanchoe was investigated. Rooted terminal cuttings of Kalanchoe blossfeldiana 'Peperu' were transplanted into 10.5 cm plastic pots containing a commercial growing medium. Then, a nutrient solution, containing 0 or $50mg{\cdot}L^{-1}$ Si as $K_2SiO_3$, $Na_2SiO_3$, or $CaSiO_3$ and adjusted to EC 1.4-$1.6mS{\cdot}cm^{-1}$ and pH 6.0, was supplied through subirrigation along with the nutrient solution or by a foliar application. Plants were grown in a glasshouse under a mean temperature of $23^{\circ}C$ and RH of 70-80%. After 12 weeks of cultivation, plant growth characteristics and leaf tissue contents of P, K, Ca, Mg, Na, S, and Si were measured. Both subirrigational supply and foliar application of Si decreased the plant height and flower stem length. However, the plant condition in the foliar application resulted in disease-like soft rot on the leaf. Among three silicon sources tested, $CaSiO_3$ supplied through a subirrigation system increased shoot tissue contents of Si and chlorophyll as compared to the $Na_2SiO_3$ or $K_2SiO_3$ treatment. Shoot tissue contents of Ca, K, and Na increased when the plant was supplied with $CaSiO_3$, $K_2SiO_3$, and $Na_2SiO_3$, respectively. Subirrigational supply of $K_2SiO_3$ and $NaSiO_3$ decreased the shoot tissue contents of Ca and Mg, and K and Ca, respectively. Therefore, $CaSiO_3$ supplied through a subirrigation system could improve plant quality of kalanchoe 'Peperu' making compact potted plants.

High Temperature Properties of $Si_3N_4-Re$Silicon Oxynitride (Re=Y, Yb, Er, La) Ceramics

  • Park, Heon-Jin;Lee, June-Gunn;Kim, Young-Wook;Cho, Kyeong-Sik
    • The Korean Journal of Ceramics
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    • v.5 no.3
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    • pp.211-216
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    • 1999
  • Four different $\beta-Si_3N_4$ ceramics with silicon oxynitrides $[Y_10(SiO_4)_6N_2, Yb_4Si_2N_2O_7, Er_2Si_3N_4O_3, \;and La_{10}(SiO_4)_6N_2$, respectivley] as secondary phases have been fabricated by hot-pressing the $Si_3N_4-Re_4Si_2N_2O_7$ (Re=Y, Yb, Er, and La) compositions at $1820^{\circ}C$ for 2h under a pressure of 25 MPa. The high temperature strength and oxidation behavior of the hot-pressed ceramics were characterized and compared with those of the ceramics fabricated from $Si_3N_4-Si_2O_7$ compositions. The $Si_3N_4-Re_4Si_2N_2O_7$composition investigated herein showed comparable high temperature strength to those from $Si_3N_4-Re_2Si_2O_7$ compositions. Si3N4 ceramics from a $Si_3N_4-Y_4Si_2N_2O_7$ composition showed the highest strength of 877 MPa at $1200^{\circ}C$ among the compositions. All $Si_3N_4$ ceramics investigated herein showed a parabolic weight gain with oxidation time at $1400^{\circ}C$ and the oxidation products of the ceramics were $SiO_2$ and $Re_2Si_2O_7$. The $Si_3N_4-Re_4Si_2N_2O_7$ compositions showed inferior oxidation resistance to those from $Si_3n_4-Re_2Si_2O_7$ compositions, owing to the incompatibility of the secondary crystalline phases of those ceramics with $SiO_2$, the oxidation product of Si3N4.Si3N4 ceramics from a $Si_3N_4-Er_4Si_2N_2O_7$ composition showed the best oxidation resistance of 0.375mg/$\textrm{cm}^2$ after oxidation at $1400^{\circ}C$ for 102 h in air among the compositions.

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Pulse Electrodeposition of Polycrystalline Si Film in Molten CaCl2 Containing SiO2 Nanoparticles

  • Taeho Lim;Yeosol Yoon
    • Journal of Electrochemical Science and Technology
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    • v.14 no.4
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    • pp.326-332
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    • 2023
  • The high cost of Si-based solar cells remains a substantial challenge to their widespread adoption. To address this issue, it is essential to reduce the production cost of solar-grade Si, which is used as raw material. One approach to achieve this is Si electrodeposition in molten salts containing Si sources, such as SiO2. In this study, we present the pulse electrodeposition of Si in molten CaCl2 containing SiO2 nanoparticles. Theoretically, SiO2 nanoparticles with a diameter of less than 20 nm in molten CaCl2 at 850℃ have a comparable diffusion coefficient with that of ions in aqueous solutions at room temperature. However, we observed a slower-than-expected diffusion of the SiO2 nanoparticles, probably because of their tendency to aggregate in the molten CaCl2. This led to the formation of a non-uniform Si film with low current efficiency during direct current electrodeposition. We overcome this issue using pulse electrodeposition, which enabled the facile supplementation of SiO2 nanoparticles to the substrate. This approach produced a uniform and thick electrodeposited Si film. Our results demonstrate an efficient method for Si electrodeposition in molten CaCl2 containing SiO2 nanoparticles, which can contribute to a reduction in production cost of solar-grade Si.

Mechanical Properties of Hot-Pressed SiC with Rare-Earth Oxide (희토류 산화물을 첨가한 일축가압소결 탄화규소의 기계적 특성)

  • 최철호;이충선;박광자;조덕호;김영욱
    • Journal of the Korean Ceramic Society
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    • v.37 no.2
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    • pp.158-163
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    • 2000
  • Six different SiC ceramics with SiO2-Re2O3 (Re=Yb, Er, Y, Dy, Gd, Sm) as sintering additives have been fabricated by hot-pressing the SiC-Re2Si2O7 compositions at 1850$^{\circ}C$ for 2 hr under a pressure of 25 MPa. The room temperature strneth and the fracture toughness of the hot-pressed ceramics were characterized and compared with those of the ceramics sintered with YAG (Y3Al5O12). Five SiC ceramics (Re=Yb, Er, Y, Dy, Gd) investigated herein showed sintered densities higher than 94% of theoretical. Tthe SiC-Re2Si2O7 compositions showed lower strength and comparable toughness to those from SiC-YAG composition, owing to the chemical reaction between SiO2 and SiC during sintering. SiC ceramics fabricated from a SiC-Y2Si2O7 composition showed the best mechanical properties of 490 MPa and 4.8 MPa$.$m1/2 among the compositions investigated herein.

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Electrical characterizations of$Al/TiO_2-SiO_2/Mo$ antifuse ($Al/TiO_2-SiO_2/Mo$ 구조를 가진 Antifuse의 전기적 특성 분석)

  • 홍성훈;노용한;배근학;정동근
    • Journal of the Korean Vacuum Society
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    • v.9 no.3
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    • pp.263-266
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    • 2000
  • This paper is focused on the fabrication of reliable Al/$TiO_2-SiO_2$/Mo antifuse, which could operate at low voltage along with the improvement in on/off state properties. Mo metal as the bottom electrode had smooth surface and high melting point, and was being kept as-deposited $SiO_2$film stable. The breakdown voltage of TiO_2-SiO_2$ stacked antifuse was better than that of same-thickness (100 $\AA$) $SiO_2$antifuse because of Ti diffusion in $SiO_2$. The improving breakdown-voltage and on-resistance can be obtained as well as the influence of hillock in the bottom metal is reduced by using double insulator. Low on-resistance (65 $\Omega$) and low programming voltage (9.0 V) can be obtained in these antifuses with 250 $\AA$ double insulator.

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Catalytic Performance of Iron-Based Fischer-Tropsch Catalysts Promoted by $SiO_2$ Using Different Sources ($SiO_2$ 원료물질에 따른 Fischer-Tropsch 합성반응용 Fe계 촉매의 성능변화)

  • Chun, Dong Hyun;Kim, Hak-Joo;Hyun, Sun-Taek;Lee, Ho-Tae;Yang, Jung-Il;Yang, Jung Hoon;Jung, Heon
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.114.1-114.1
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    • 2010
  • Fe계 촉매는 FT(Fischer-Tropsch) 합성반응에 매우 유망한 촉매로 주목받고 있으며, $280^{\circ}C$ 미만의 저온 FT 합성반응의 경우, 침전법이 Fe계 촉매의 가장 전형적인 제조방법으로 알려져 있다. Fe계 촉매에 첨가되는 조촉매로는 Cu, K, $SiO_2$ 등이 가장 대표적이며, 이 중에서 특히 구조 조촉매로 첨가되는 $SiO_2$는 Fe계 촉매의 기계적 강도를 향상시킬 뿐만 아니라, 촉매의 성능에도 크게 영향을 미치는 것으로 보고되고 있다. 본 연구에서는 침전법을 이용하여 저온 FT 합성반응용 Fe계 촉매를 제조하였고, 구조 조촉매로 첨가한 $SiO_2$의 원료물질에 따른 Fe계 촉매의 성능변화를 조사하였다. $SiO_2$의 원료물질로는 콜로이드 $SiO_2$와 분말 $SiO_2$를 이용하였으며, 분말 $SiO_2$를 이용한 촉매가 콜로이드 $SiO_2$를 이용한 촉매보다 다소 높은 CO 전환율 및 중질탄화수소 선택도를 나타내는 것을 확인하였다.

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CO Gas Sensing Characteristic of ZnO Thin Film/Nanowire Based on p-type 4H-SiC Substrate at 300℃ (P형 4H-SiC 기판에 형성된 ZnO 박막/나노선 가스 센서의 300℃에서 CO 가스 감지 특성)

  • Kim, Ik-Ju;Oh, Byung-Hoon;Lee, Jung-Ho;Koo, Sang-Mo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.2
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    • pp.91-95
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    • 2012
  • ZnO thin films were deposited on p-type 4H-SiC substrate by pulsed laser deposition. ZnO nanowires were formed on p-type 4H-SiC substrate by furnace. Ti/Au electrodes were deposited on ZnO thin film/SiC and ZnO nanowire/SiC structures, respectively. Structural and crystallographical properties of the fabricated ZnO thin film/SiC and ZnO nanowire/SiC structures were investigated by field emission scanning electron microscope and X-ray diffraction. In this work, resistance and sensitivity of ZnO thin film/SiC gas sensor and ZnO nanowire/SiC gas sensor were measured at $300^{\circ}C$ with various CO gas concentrations (0%, 90%, 70%, and 50%). Resistance of gas sensor decreases at CO gas atmosphere. Sensitivity of ZnO nanowire/SiC gas sensor is twice as big as sensitivity of ZnO thin film/SiC gas sensor.

Optical Properties of Transparent Electrode ZnO Thin Film Grown on Carbon Doped Silicon Oxide Film (탄소주입 실리콘 산화막 위에 성장한 투명전극 ZnO 박막의 광학적 특성)

  • Oh, Teresa
    • Journal of the Semiconductor & Display Technology
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    • v.11 no.2
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    • pp.13-16
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    • 2012
  • Zinc oxide (ZnO) films were deposited by an RF magnetron sputtering system with the RF power of 200W and 300W and flow rate of oxygen gases of 20 and 30 sccm, in order to research the growth of ZnO on carbon doped silicon oxide (SiOC) thin film. The reflectance of SiOC film on Si film deposited by the sputtering decreased with increasing the oxygen flow rate in the range of long wavelength. In comparison between ZnO/Si and ZnO/SiOC/Si thin film, the reflectance of ZnO/SiOC/Si film was inversed that of ZnO/Si film in the rage of 200~1000 nm. The transmittance of ZnO film increased with increasing the oxygen gas flow rate because of the transition from conduction band to oxygen interstitial band due to the oxygen interstitial (Oi) sites. The low reflectance and the high transmittance of ZnO film was suitable properties to use for the front electrode in the display or solar cell.