• Title/Summary/Keyword: Si-solar cell

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Nanotexturing and Post-Etching for Diamond Wire Sawn Multicrystalline Silicon Solar Cell (다이아몬드 와이어에 의해 절단된 다결정 실리콘 태양전지의 나노텍스쳐링 및 후속 식각 연구)

  • Kim, Myeong-Hyun;Song, Jae-Won;Nam, Yoon-Ho;Kim, Dong-Hyung;Yu, Si-Young;Moon, Hwan-Gyun;Yoo, Bong-Young;Lee, Jung-Ho
    • Journal of the Korean institute of surface engineering
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    • v.49 no.3
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    • pp.301-306
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    • 2016
  • The effects of nanotexturing and post-etching on the reflection and quantum efficiency properties of diamond wire sawn (DWS) multicrystalline silicon (mc-Si) solar cell have been investigated. The chemical solutions, which are acidic etching solution (HF-$HNO_3$), metal assisted chemical etching (MAC etch) solutions ($AgNO_3$-HF-DI, HF-$H_2O_2$-DI) and post-etching solution (diluted KOH at $80^{\circ}C$), were used for micro- and nano-texturing at the surface of diamond wire sawn (DWS) mc-Si wafer. Experiments were performed with various post-etching time conditions in order to determine the optimized etching condition for solar cell. The reflectance of mc-Si wafer texturing with acidic etching solution showed a very high reflectance value of about 30% (w/o anti-reflection coating), which indicates the insufficient light absorption for solar cell. The formation of nano-texture on the surface of mc-Si contributed to the enhancement of light absorption. Also, post-etching time condition of 240 s was found adequate to the nano-texturing of mc-Si due to its high external quantum efficiency of about 30% at short wavelengths and high short circuit current density ($J_{sc}$) of $35.4mA/cm^2$.

The Influence of the Wafer Resistivity for Dopant-Free Silicon Heterojunction Solar Cell (실리콘 웨이퍼 비저항에 따른 Dopant-Free Silicon Heterojunction 태양전지 특성 연구)

  • Kim, Sung Hae;Lee, Jung-Ho
    • Journal of the Korean institute of surface engineering
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    • v.51 no.3
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    • pp.185-190
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    • 2018
  • Dopant-free silicon heterojunction solar cells using Transition Metal Oxide(TMO) such as Molybdenum Oxide($MoO_X$) and Vanadium Oxide($V_2O_X$) have been focused on to increase the work function of TMO in order to maximize the work function difference between TMO and n-Si for a high-efficiency solar cell. One another way to increase the work function difference is to control the silicon wafer resistivity. In this paper, dopant-free silicon heterojunction solar cells were fabricated using the wafer with the various resistivity and analyzed to understand the effect of n-Si work function. As a result, it is shown that the high passivation and junction quality when $V_2O_X$ deposited on the wafer with low work function compared to the high work function wafer, inducing the increase of higher collection probability, especially at long wavelength region. the solar cell efficiency of 15.28% was measured in low work function wafer, which is 34% higher value than the high work function solar cells.

Incident Angle Dependence of Quantum Efficiency in c-Si Solar Cell or a-Si Thin Film Solar Cell in BIPV System (광 입사각이 BIPV에 적용되는 단결정 또는 비정질 실리콘 태양전지의 양자효율에 미치는 영향)

  • Kang, Jeong-Wook;Son, Chan-Hee;Cho, Guang-Sup;Yoo, Jin-Hyuk;Kim, Joung-Sik;Park, Chang-Kyun;Cha, Sung-Duk;Kwon, Gi-Chung
    • Journal of the Korean Vacuum Society
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    • v.21 no.1
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    • pp.62-68
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    • 2012
  • The conversion efficiency of solar cells depending on incident angle of light is important for building-integrated photovoltaics (BIPV) applications. The quantum efficiency is the ratio of the number of charge carriers collected by the solar cell to the number of photons of a given energy shining on the solar cell. The analysis of angle dependence of quantum efficiencies give more information upon the variation of power output of a solar cell by the incident angle of light. The variations in power output of solar cells with increasing angle of incidence is different for the type of cell structures. In this study we present the results of the quantum efficiency measurement of single-crystalline silicon solar cells and a-Si:H thin-film solar cells with the angle of incidence of light. As a result, as the angle of incidence increases in single-crystalline silicon solar cells, quantum efficiency at all wavelength (300~1,100 nm) of light were reduced. But in case of a-Si:H thin-film solar cells, quantum efficiency was increased or maintained at the angle of incidence from 0 degree to about 40 degrees and dramatically decrease at more than 40 degrees in the range of visible light. This results of quantum efficiency with increasing incident angle were caused by haze and interference effects in thin-film structure. Thus, the structural optimization considering incident angle dependence of solar cells is expected to benefit BIPV.

TCO Workfunction Engineering with Oxygen Reactive Sputtering Method for Silicon Heterojunction Sola Cell Application

  • Bong, Seong-Jae;Kim, Seon-Bo;An, Si-Hyeon;Park, Hyeong-Sik;Lee, Jun-Sin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.492-492
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    • 2014
  • On account of the good conductivity and optical properties, TCO is generally used in silicon heterojunction solar cell since the emitter material, hydrogenated amorphous silicon (a-Si:H), of the solar cell has low conductivity compare to the emitter of crystalline silicon solar cell. However, the work function mismatch between TCO layer and emitter leads to band-offset and interfere the injection of photo-generated carriers. In this study, work function engineering of TCO by oxygen reactive sputtering method was carried out to identify the trend of band-offset change. The open circuit voltage and short circuit current are noticeably changed by work function that effected from variation of oxygen ratio.

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Screen printed c - Si solar cell의 전면 전극 Finger width 및 spacing 최적화에 대한 연구

  • Kim, Sang-Seop;Choe, Jae-U;Lee, Jun-Sin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.391-391
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    • 2011
  • Crystalline silicon solar cell을 양산에 적용하기 위해 전면 전극의 패턴을 형성하는 방법으로 Ag paste를 이용한 screen printing이 가장 일반적으로 사용된다. 전면 전극의 패턴 형성 시, Finger의 width와 spacing은 Fill factor, JSC, VOC 등 태양전지의 중요 parameter들과 관련되어, 효율에 영향을 미치기 때문에, printing 시 Finger width와 spacing을 최적화하여 최대한의 효율을 내는 조건을 찾는 것이 바람직하다. 본 연구에서는 Finger width를 $30{\mu}m{\sim}100{\mu}m$, spacing을 $1.8{\mu}m{\sim}2.8{\mu}m$ 까지 가변하여 c-Si solar cell을 제작하였으며, 제작된 cell의 LIV를 측정을 통하여, 최적의 효율을 내는 조건을 찾고자 하였다. 그 결과 Finger width $30{\mu}m$, Finger spacing $1.8{\mu}m$의 조건에서 17.12%로 최고의 효율을 나타내었다.

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AAO 나노패턴을 응용한 실리콘 태양전지의 특성 연구

  • Choe, Jae-Ho;Lee, Jeong-Taek;Choe, Yeong-Ha;Kim, Geun-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.250-250
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    • 2009
  • The fabricated the nanostructural patterns on the surface of SiN antireflection layer of polycrystalline Si solar cell using anodic aluminum oxide (AAO) masks in an inductively coupled plasma(ICP) etching process. The AAO nanopattern mask has the hole size of about 70~75nm and lattice constant of 100~120nm. The transferred nano-patterns were observed by the scanning electron microscope (SEM). The voltage of patterned Si solar cell enhanced.

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Minimization of the reflection of GaAs solar cell by surface texturing using natural lithography (Natural lithography를 이용한 surface texturing을 통한 GaAs solar cell의 반사도 감소)

  • Kim, Byung-Jae;Kim, Ji-Hyun
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.06a
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    • pp.156-158
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    • 2009
  • 우리 연구팀은 $SiO_2$ nanospheres를 이용한 natural lithography를 통해 2가지 방법으로 GaAs 기판의 반사율을 감소시켰다. 먼저 GaAs 기판 위에 benzocyclobutene(BCB) 고분자를 코팅한 후, 그 위에 $SiO_2$ nanospheres를 코팅한다. 그리고 고분자의 유리전이 온도이상으로 가열하면 $SiO_2$ nanospheres가 고분자 속으로 가라앉게 되어 렌즈 형태의 표면이 형성된다. 또한, 이 상태에서 BOE 용액을 통해 $SiO_2$ nanospheres를 제거하여 오목한 형태의 표면을 형성할 수 있다. 이러한 2가지 방법의 surface texturing을 통해 우리는 GaAs 표면의 반사도를 각각 400~800nm의 파장에서 평균 13.6%~16.52%의 반사율을 얻을 수 있었다.

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Fabrication and Physical Properties of Heterojunction Solar Cell (II-VI) of $n-Cd_{1-x}Zn_xS/p-Si$ (이종접합 태양전지 (II-VI)의 제작과 물성에 대한 연구($n-Cd_{1-x}Zn_xS/p-Si$ 태양전지를 중심으로))

  • Lee, Soo-Il;Kim, Byung-Chul;Seo, Dong-Joo;Choi, Seong-Hyu;Hong, Kwang-Joon;You, Sang-Ha
    • Solar Energy
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    • v.8 no.1
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    • pp.41-48
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    • 1988
  • Heterojunction solar cells of $n-Cd_{1-x}Zn_xS/p-Si$ were fabricated by solution growth technique. The crystal structure, spectral response, surface morphology, and I-V characteristics of the $n-Cd_{1-x}Zn_xS/p-Si$ heterojunction solar cells were studied. The $Cd_{1-x}Zn_xS$ layer deposited on a silicon substrate (111) were found to be a cubic structure with the crystal orientation (111), (220) of the CdS and to be a hexagonal structure with crystal orientation (100) of the ZnS. The open-circuit voltage, short-circuit current, fill factor, and conversion efficiency of $n-Cd_{1-x}Zn_xS/p-Si$ heterojunction solar cell under $100mW/cm^2$ illumination were found to be 0.43V, 38mA. 0.76, and 12.4%, respectively.

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Influence of Crystalline Si Solar Cell by Rie Surface Texturing (RIE 표면 텍스쳐링 모양에 따른 결정질 실리콘 태양전지의 영향)

  • Park, In-Gyu;Yun, Myoung-Soo;Hyun, Deoc-Hwan;Jin, Beop-Jong;Choi, Jong-Yong;Kim, Joung-Sik;Kang, Hyoung-Dong;Kwon, Gi-Chung
    • Journal of the Korean Vacuum Society
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    • v.19 no.4
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    • pp.314-318
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    • 2010
  • We fabricated a plasma texturing for multi-crystalline silicon cells using reactive ion etching (RIE). Multi-crystalline Si cells have not benefited from the cost-effective wet-chemical texturing processes that reduce front surface reflectance on single-crystal wafers. Elimination of plasma damage has been achieved while keeping front reflectance to extremely low levels. We will discuss reflectance, quantum efficiency and conversion efficiency for multi-crystalline Si solar cell by each RIE process conditions.

Textured Surface Epitaxial Base Silicon Solar Cell (Textured 표면을 갖는 에피텍셜 베이스 실리콘 태양전지)

  • 장지근;임용규;정진철
    • Journal of the Microelectronics and Packaging Society
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    • v.10 no.2
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    • pp.33-37
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    • 2003
  • The new textured surface epitaxial base(TSEB) cell as a high efficiency Si solar cell was fabricated and its eletro-optical characteristics were investigated. The fabricated device showed the open circuit voltage of 0.62 V, the short circuit current of 40 mA, the fill factor of 0.7, and the efficiency of 16% under the incident light of AM-1 100 mW/$cm^2$. The TSEB cell proposed in this paper has the structural superiority in the fabrication of high efficiency solar cell due to the carrier drift transport in the optical absorption region and the formation of back surface field by $P^-/P^+$ epitaxial base, and the low emitter series resistance by insertion of $n^+$ buried contact.

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