• 제목/요약/키워드: Si/O-doped

검색결과 481건 처리시간 0.044초

Effect of Annealing Time on Electrical Performance of SiZnSnO Thin Film Transistor Fabricated by RF Magnetron Sputtering

  • Ko, Kyung Min;Lee, Sang Yeol
    • Transactions on Electrical and Electronic Materials
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    • 제16권2호
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    • pp.99-102
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    • 2015
  • Thin film transistors (TFTs) with amorphous 2 wt% silicon-doped zinc tin oxide (a-2SZTO) channel layer were fabricated using an RF magnetron sputtering system, and the effect of post-annealing treatment time on the structural and electrical properties of a-2SZTO systems was investigated. It is well known that Si can effectively reduce the generation of oxygen vacancies. However, it is interesting to note that prolonged annealing could have a bad effect on the roughness of a-2SZTO systems, since the roughness of a-2SZTO thin films increases in proportion to the thermal annealing treatment time. Thermal annealing can control the electrical characteristics of amorphous oxide semiconductor (AOS) TFTs. It was observed herein that prolonged annealing treatment can cause bumpy roughness, which led to increase of the contact resistance between the electrode and channel. Thus, it was confirmed that deterioration of the electrical characteristics could occur due to prolonged annealing. The longer annealing time also decreased the field effect mobility. The a-2SZTO TFTs annealed at 500℃ for 2 hours displayed the mobility of 2.17 cm2/Vs. As the electrical characteristics of a-2SZTO annealed at a fixed temperature for long periods were deteriorated, careful optimization of the annealing conditions for a-2SZTO, in terms of time, should be carried out to achieve better performance.

비정질 실리콘 태양전지 후면 반사막 적용을 위한 저온 증착된 AZO 박막 특성에 관한 연구

  • Kang, Junyoung;Park, Hyeongsik;Yi, Junsin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.315-315
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    • 2016
  • The hydrogenated amorphous silicon (a-Si:H) thin film solar cells using n/Al or n/Ag/Al back reflector have low short circuit current (Jsc) due to high absorption coefficients of Al or work function difference between n-layer and the metal. In this article, we utilized aluminum doped zinc oxide (AZO) to raise the internal reflectance for the improvement of short current density (Jsc) in a-Si:H thin film solar cells. It was found that there was a slight increase in the reflectance in the long wavelength range at the process temperature of 125oC due to improved crystalline quality of the AZO back reflector. The optical band gap (Eg) and work function were affected by the temperature and so did the internal reflectance. The increased internal reflectance within the solar cell resulted in Jsc of 14.94 mA/cm2 and the efficiency of 8.84%. Jsc for the cell without back reflector was 12.29 mA/cm2.

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Characterization of Electrical Properties and Gating Effect of Single Wall Carbon Nanotube Field Effect Transistor

  • Heo, Jin-Hee;Kim, Kyo-Hyeok;Chung, Il-Sub
    • Transactions on Electrical and Electronic Materials
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    • 제9권4호
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    • pp.169-172
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    • 2008
  • We attempted to fabricate carbon nanotube field effect transistor (CNT-FET) using single walled carbon nanotube(SWNT) on the heavily doped Si substrate used as a bottom gate, source and drain electrode were fabricated bye-beam lithography on the 500 nm thick $SiO_2$ gate dielectric layer. We investigated electrical and physical properties of this CNT-FET using Scanning Probe Microscope(SPM) and conventional method based on tungsten probe tip technique. The gate length of CNT-FET was 600 nm and the diameter of identified SWNT was about 4 nm. We could observed gating effect and typical p-MOS property from the obtained $V_G-I_{DS}$ curve. The threshold voltage of CNT-FET is about -4.6V and transconductance is 47 nS. In the physical aspect, we could identified SWNT with phase mode of SPM which detecting phase shift by force gradient between cantilever tip and sample surface.

Characteristics of a-IGZO TFTs with Oxygen Ratio

  • 이초;박지용;문제용;김보석
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.341.1-341.1
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    • 2014
  • In the advanced material for the next generation display device, transparent amorphous oxide semiconductors (TAOS) are promising materials as a channel layer in thin film transistor (TFT). The TAOS have many advantages for large-area application compared with hydrogenated amorphous silicon TFT (a-Si:H) and organic semiconductor TFT. For the reasonable characteristics of TAOS, The a-IGZO has the excellent performances such as low temperature fabrication (R.T~), high mobility, visible region transparent, and reasonable on-off ratio. In this study, we investigated how the electric characteristics and physical properties are changed as various oxygen ratio when magnetron sputtering. we analysis a-IGZO film by AFM, EDS and I-V measurement. decreasing the oxygen ratio, the threshold voltage is shifted negatively and mobility is increasing. Through this correlation, we confirm the effect of oxygen ratio. We fabricated the bottom-gate a-IGZO TFTs. The gate insulator, SiO2 film was grown on heavily doped silicon wafer by thermal oxidation method. a-IGZO channel layer was deposited by RF magnetron sputtering. and the annealing condition is $350^{\circ}C$. Electrode were patterned Al deposition through a shadow mask(160/1000 um).

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Novel Deposition Technique of ZnO:Al Transparent Conduction Oxide Layer on Chemically Etched Glass Substrates for High-haze Textured Surface

  • Park, Hyeongsik;Pak, Jeong-Hyeok;Shin, Myunghoon;Bong, Sungjae;Yi, Junsin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.426.1-426.1
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    • 2014
  • For high performance thin film solar cells, texturing surface, enhancing the optical absorptionpath, is pretty important. Textured ZnO:Al transparent oxide layer of high haze is commonly used in Si thin film solar cells. In this paper, novel deposition method for aluminum doped zinc oxide (ZnO:Al) on glass substrates is presented to improve the haze property. The broccoli structure of ZnO:Al layer was formed on chemically etched glass substrates, which showed high haze value on a wide wavelength range.The etching condition of the glass substrates can change not only the haze values of the ZnO:Al of in-situ growth but alsothe electrical and optical properties of the deposited ZnO:Al films.The etching mechanism of the glass substrate affecting on the surface morphology of the glass will be discussed, which resulted in variation of texture of ZnO:Al layer. The optical properties of substrate morphology were also analyzed with EDS and FTIR results. As a result, the high haze value of 85.4% was obtained in the wavelength range of 300 nm to 1100 nm. Furthermore, low sheet resistance of about 5~18 ohm/sq was achieved for different surface morphologies of the ZnO:Al films.

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금을 도우핑한 이중 주입 자기 센서 (Gold-Doped Double Injection Magnetic Sensor)

  • 민남기;이성재
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 하계학술대회 논문집 C
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    • pp.1248-1251
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    • 1995
  • This paper reports some results of an experimental investigation of planar double injection magnetic sensors. The threshold voltage proved to be very sensitive to an applied magnetic field. The magnitude and direction of the threshold voltage variation depends on the field strength and its orientation with respect to the conduction chennel. The positively-directed field pushes the carriers into the bulk causing an increase in the threhold voltage. These results seem to agree with a path modulation due to Lorentz force. The application of a negative field causes a negative variation, which is dependent on the surface recombination velocity of the silicon-$SiO_2$ interface.

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Influence of top AZO electrode deposited in hydrogen ambient on the efficiency of Si based solar cell

  • Chen, Hao;Jeong, Yun-Hwan;Chol, Dai-Seub;Park, Choon-Bae
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.321-322
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    • 2009
  • Al doped ZnO films deposited on glass substrate using RF magnetron sputtering in Ar and $Ar+H_2$ gas ambient at $100^{\circ}C$. The films deposited in $Ar+H_2$ were hydrogen-annealed at the temperature of $150\sim300^{\circ}C$ for 1hr. The lowest resistivity of $4.25\times10^{-4}{\Omega}cm$ was obtained for the AZO film deposited in $Ar+H_2$ after hydrogen annealing at $300^{\circ}C$ for 1hr. The average transmittance is above 85% in the range of 400-1000 nm for all films. The absorption efficiency of solar cell was improved by using the optimized AZO films as a top electrode.

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졸겔 공정을 이용하여 Europium을 doping한 유기-무기 복합막의 광학적 및 구조적 특성 (Optical and Structural Characteristics of Europium Doped Organic-Inorganic Hybrid Film by Sol-Gel Process)

  • 김진균;오동조;김유항;황진명
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.106-106
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    • 2003
  • 최근 집적형 광소자, 레이저 재료, 자료 저장 또는 통신 기술부문에서 제어된 광학적 성질을 갖는 유기-무기 나노 복합체를 만드는 연구가 많은 관심과 주목을 받고 있다. 유기물인 PEG는 대다수의 금속염을 고정시키는 용매 역할을 하는 polymer로써 액체와 같은 특징을 나타내며 무기물인 silica의 network는 순수한 PEG 시스템보다 좋은 기계적 물성을 나타내며, 투명한 물질을 얻을 수 있게 해 준다. 이에 본 연구에서는 SiO2-PEG의 matrix에 우수한 광학적 성질을 지닌 europium을 doping하여 유기-무기 나노 복합막을 합성하여 europium의 농도와 PEG 분자량에 따른 구조적 및 광학적 성질을 알아보고자 한다.

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Contrast Improvement of OLED Using Multi-layer of Metal and Metal Oxide

  • Hwang, Soo-Woong;Lee, Soo-Hwan;Choi, Jae-Youn;Yoon, Hyun-Soo;Kim, You-Hyun;Chae, Soo-Joh;Kim, Woo-Young
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.530-532
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    • 2008
  • Inorganic metal multi-layer(IMML) consisting of Al/Al:SiO/Al was developed as a cathode for OLED to reduce the reflectance generated from ambient light. Device structure of green OLED was ITO/2-TNATA/$\alpha$-NPD/$Alq_3$:C545T/Balq/$Alq_3$/LiF/IMML and IMML was composed of three different layers: thin aluminum layer, aluminum layer doped with silicon monoxide and thick aluminum layer. Average reflectance of green OLED was 9.63% while that of conventional OLED with or without polarizer showed the average reflectance of 8.54% and 66% respectively at visible range from 380 nm to 780 nm.

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형광성 Willemite의 수열, 습식 및 고상 합성에 관한 연구 (The Study on the Preparation of Fluorescence Willemite Powders by Hydrothermal, Wet and Solid State Reaction)

  • 이경희;이병하;남경호;이재영
    • 한국세라믹학회지
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    • 제28권1호
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    • pp.74-78
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    • 1991
  • Willemite powders which have been prepared by solid state reaction were easy to intermixed impurities, and particle surfaces were demaged in the progress of crushing. The above defacts were easy to accompany non-crystallization for mechanochemical effects and luminescence efficiency was deteriorated. The goal of this study improve each of defacts, and synthesize high purity and fine Mn doped willemite powders by wet and hydrothermal methods without crushing progress. It has been experimentally verified that the single phase Zn1.98Mn0.02SiO4 willemite powders which prepared by hydrothermal synthes is at 220$^{\circ}C$ for 10 hours in 2N KOH solution. The products are like needle and composition is the same with starting composition.

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