• 제목/요약/키워드: Si(III)-H

검색결과 65건 처리시간 0.029초

황토의 물리적 특성 및 수용액중의 중금속 이온의 흡착 특성에 관한 연구 (A Study on Physical Properties and Adsorption Characteristics of Heavy Metal Ions of Loess)

  • 정의덕;김호성;박경원;백우현
    • 한국환경과학회지
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    • 제8권4호
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    • pp.491-496
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    • 1999
  • Removal of Cu(II), Cr(III) and Pb(II) ions from aqueous solutions using the adsorption process on the loesses has been investigated. Variations of contact time, pH, adsorption isotherms and selectivity of coexisting ions were experimental parameters. pH of KJ and YIK samples diluted to 1% solution, was rearly the same with each value of pH 5.58 and 5.49, and both samples showed weak acidic properties. From chemical analysis, both samples contain remarkably different amounts of ${SiO}_{2}$, ${Al}_{2}O_{3}$ and ${Fe}_{2}O_{3}$. From XRD measurement, quartz was mainly observed in both samples. Kaolinite was also observed, also in both samples, but Feldspar was only observed in KJ sample. Adsorption of metal ions on the loesses were reached at equilibrium by shaking for about 30min. The adsorption of Cr(III) ion was higher than that of Cu(II) oand Pb(II) ions. The order of amount adsorbed among the investigated ions was Cr(III)>Pb(II)>Cu(II). In acidic solution, the adsorptivity of loesses was increased as pH increased. The adsorption of Cr(III) ion on the loesses were fitted to the Freundlich isotherms. Freundlich constants(1/n) of KJ and YIK loesses were 0.54 and 0.55, respectively.

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Preparation of Atomically Flat Si(111)-H Surfaces in Aqueous Ammonium Fluoride Solutions Investigated by Using Electrochemical, In Situ EC-STM and ATR-FTIR Spectroscopic Methods

  • Bae, Sang-Eun;Oh, Mi-Kyung;Min, Nam-Ki;Paek, Se-Hwan;Hong, Suk-In;Lee, Chi-Woo J.
    • Bulletin of the Korean Chemical Society
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    • 제25권12호
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    • pp.1822-1828
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    • 2004
  • Electrochemical, in situ electrochemical scanning tunneling microscope (EC-STM), and attenuated total reflectance-FTIR (ATR-FTIR) spectroscopic methods were employed to investigate the preparation of atomically flat Si(111)-H surface in ammonium fluoride solutions. Electrochemical properties of atomically flat Si(111)-H surface were characterized by anodic oxidation and cathodic hydrogen evolution with the open circuit potential (OCP) of ca. -0.4 V in concentrated ammonium fluoride solutions. As soon as the natural oxide-covered Si(111) electrode was immersed in fluoride solutions, OCP quickly shifted to near -1 V, which was more negative than the flat band potential of silicon surface, indicating that the surface silicon oxide had to be dissolved into the solution. OCP changed to become less negative as the oxide layer was being removed from the silicon surface. In situ EC-STM data showed that the surface was changed from the initial oxidecovered silicon to atomically rough hydrogen-terminated surface and then to atomically flat hydrogenterminated surface as the OCP moved toward less negative potentials. The atomically flat Si(111)-H structure was confirmed by in situ EC-STM and ATR-FTIR data. The dependence of atomically flat Si(111)-H terrace on mis-cut angle was investigated by STM, and the results agreed with those anticipated by calculation. Further, the stability of Si(111)-H was checked by STM in ambient laboratory conditions.

Laser CVD법에 의한 III-V화합물 반도체 표면의 불활성화 (The passivation of III-V compound semiconductor surface by laser CVD)

  • 이한신;이계신;조태훈;허윤종;김성진;성영권
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1993년도 하계학술대회 논문집 B
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    • pp.1274-1276
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    • 1993
  • The silicon-nitride films formed by laser CVD method are used for passivating GaAs surfaces. The electrical Properties of metal-insulator-GaAs structure are studied to determined the interfacial characteristics by C-V curves and deep level transient spectroscopy(DLTS). The SiN films are photolysisly deposited from $SiH_4\;and\;NH_3$ in the range of $100^{\circ}C-300^{\circ}C$ on P type, (100) GaAs. The hysteresis is reduced and interface trap density is lowered to $10^{12}-10^{13}$ at $100^{\circ}C-200^{\circ}C$. The surface leakage current is studied too. The passivated GaAs have a little leakage current compared to non passivated GaAs.

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온천수가 반죽의 발효와 품질에 미치는 영향 (Effect of Hot Spring Water on Dough Fermentation and Quality of Bread)

  • 이예경;김순동
    • 동아시아식생활학회지
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    • 제13권1호
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    • pp.56-63
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    • 2003
  • 증류수, 수도수, 온천수 희석액(55배 희석, 4배 희석, 2배희석)을 사용한 반죽의 발효특성과 빵의 품질에 미치는 영향을 조사하였다. 사용한 온천수의 총고형물 함량은 8,765 ppm 이였으며 주요 무기질로는 Na가 2296 ppm, Ca가 287 ppm, Mg와 K가 각각 65 및 8 ppm을 함유하였다. Fe, Cu, Co, F. Zn, Al, S, Mo, Se 및 Si 등이 0.002~5.2 ppm을 함유하였다. 온천수를 사용한 반죽의 pH는 6.95~7.68로 증류수의 6.40보다 높았다. 반죽부피는 온천수의 농도가 높아짐에 따라 감소하였다. pH를 5.5로 조정한 온천수를 사용한 반죽의 부피는 대조구 보다 오히려 높았다. 온천수를 사용한 빵의 경도와 신장성은 대조구보다 높았으나 pH를 조정한 온천수기 경우는 낮았다. 점착성은 경도 및 신장성과는 역으로 희석 온천수에서 낮았다. pH조정 또는 조정 없이 구운 빵의 부드러운 정도는 2배로 희석한 온천수가 증류수 및 55배, 2배 희석 온천수보다 높았다. 쫄깃한 정도는 전반적으로 온천수가 대조구에 비하여 높았으며 종합적인 맛은 4배로 희석한 온천수가 가장 좋았다.

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First-principles Study of the Structure and Growth Mechanism of Allyl Alcohol Lines on the H-terminated Si(001)

  • Choi, Yun-Ki;Choi, Jin-Ho;Cho, Jun-Hyung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.184-184
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    • 2011
  • Using first-principles density-functional calculations, we investigate the chain reaction mechanism of allyl alcohol (ALA) molecules on the H-terminated Si(001)-2${\times}$1 surface. Recently, it was reported [1] that allyl mercaptan (ALM) molecules show a self-directed line growth across the dimer rows through a chain reaction involving several reaction processes: (i) The created radical at the C atom is transferred to the S atom, (ii) the resulting S-centered radical easily abstracts an H atom from the neighboring dimer row, and (iii) the generated S-H group further reacts with the neighboring dimer row to produce the Si-S bond on the neighboring dimer row, accompanying the associative desorption of H2. This H2-desorption process creates a new DB on the neighboring dimer row, setting off the chain reaction across the dimer rows. In the present study, we find that although the structure of ALA with -OH functional is analogous to that of ALM with -SH functional, ALA and ALM lines show a difference in their growth direction. We predict that ALA undergoes the chain reaction to show a line growth along the dimer row, contrasting with the ALM line growth across the Si dimer rows. Our analysis shows that the different growth direction of ALA is due to the strong instability of oxygen radical intermediate, which prevents from growing across the dimer rows. Thus, we demonstrate that the stability of the radical intermediate plays a crucial role in determining the direction of molecular line growth.

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고정화 산성 이온성 액체 촉매와 금속염화물 촉매를 이용한 셀룰로우스의 5-HMF로의 직접 전환 연구 (Direct Conversion for the Production of 5-HMF from Cellulose over Immobilized Acidic Ionic Liquid Catalyst with Metal Chloride)

  • 박용범;최재형;임한권;우희철
    • 청정기술
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    • 제20권2호
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    • pp.108-115
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    • 2014
  • 셀룰로우스(cellulose)를 5-히드록시메틸푸르푸랄(5-hydroxymethylfurfural, 5-HMF)로 직접 전환하기 위해 이온성 액체 용매하에서 다양한 금속염화물과 산 촉매를 비교 연구하였다. 사용한 금속염화물은 Sn(II), Zn(II), Al(III), Fe(III), Cu(II), Cr(III)를 포함한 염화물을 비교하였으며 산 촉매는 산성 이온성 액체를 고정화하여 사용하였다. 비교를 위하여 $H_2SO_4$, HCl, Amberlyst-15와 DOWEX50x8을 사용하였다. 제조한 촉매의 산도와 산 밀도 특성은 Hammett Indicator 지시약을 통하여 분석하였다. 5-HMF의 선택도 및 수율은 반응온도, 반응시간과 촉매 비를 통하여 확인하였다. 사용한 촉매들 중에서 5-HMF의 선택도는 $CrCl_3-6H_2O$$SiO_2-[ASBI]HSO_4$를 사용하였을 때에 가장 높게 나타났으며, 상용화 고체 산인 Amberlyst-15와 DOWEX50x8에 비하여 활성이 높다는 것을 확인할 수 있었다. 5-HMF의 선택도는 산 촉매의 산도와 반응에 사용된 촉매비에 영향이 있음을 확인할 수 있었으며, 반응 중 재수화 반응이 일어나 레불린산(levulinic acid)이 생성된다는 것을 확인하였다.

플라즈마 화학증착법에서 증착변수가 TiN 증착에 미치는 영향(III) -r.f. power 및 전극간 거리를 중심으로- (Effect of Deposition Parameters on TiN by Plasma Assisted Chemical Vapor Deposition(III) -Influence of r.f. power and electrode distance on the Tin deposition-)

  • 김충환;신영식;김문일
    • 열처리공학회지
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    • 제3권1호
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    • pp.1-7
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    • 1990
  • To investigate the influence of r.f. power and electrode distance on the TiN deposition, TiN films were deposited onto STC3, STD11 steel and Si-wafer from gas mixtures of $TiC_4/N_2/H_2$ using the radio frequency plasma assisted chemical vapor deposition. The crystallinity of TiN film could be improved by the increase of r.f. power and the decrease of electrode distance. The TiN coated layer contains chlorine, its content were decreased with increasing r.f. power as well as decreasing electrode distance. And the thickness of deposited TiN was largely affected by r.f. power and electrode distance. The hardness of deposited TiN reached a maximum value of about Hv 2,000.

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Synthesis of Monodispersed and Spherical $SiO_2-coated Fe_2O_3$ Nanoparticle

  • 한양수;윤선미;김동국
    • Bulletin of the Korean Chemical Society
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    • 제21권12호
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    • pp.1193-1198
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    • 2000
  • The preparation of nanocrystalline hematite, ${\alpha}-Fe_2O_3$, paricles and their surface coating with silica layers are described. The hematite particles with the size of 30~60 nm are firstly prepared by thermal decomposition of trinuclear acetate-hydroxo iron (III) nitrate complex, $[Fe_3$(OCOCH_3)_7$OH${\cdot}$2H_2O]NO_3$, at $400^{\circ}C$. Subsequently the hematite surfaces are coated with siliva layers by a controlled hydrolysis and condensation reaction of TEOS with varying the TEOS concentration and pH. Monodispersed and spherical $SiO_2-coatedFe_2O_3$ particles with the average particle diameter of ~90 nm and extremely narrow size distribution can be obtained at the pH of 11 and the TEOS concentration of 0.68M, which are found to be the optimum conditions in the present study in achieving the homogeneous deposition of silica layers on hematite surfaces. Diffuse reflectance UV-Vis spectra reveal that the characteristic optical reflectance of ${\alpha}-Fe_2O_3$ particles is preserved almost constant even after coating the surfaces, suggesting that the $SiO_2$ layers can be regarded as protecting layers without degrading the optical properties of hematite particles.

Determination of Si/Al Ratio of Faujasite-type Zeolite by Single-crystal X-ray Diffraction Technique. Single-crystal Structures of Fully Tl+- and Partially K+-exchanged Zeolites Y (FAU), |Tl71|[Si121Al71O384]-FAU and |K53Na18|[Si121Al71O384]-FAU

  • Seo, Sung-Man;Lee, Oh-Seuk;Kim, Hu-Sik;Bae, Dong-Han;Chun, Ik-Jo;Lim, Woo-Taik
    • Bulletin of the Korean Chemical Society
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    • 제28권10호
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    • pp.1675-1682
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    • 2007
  • Large colorless single crystals of faujasite-type zeolite with diameters up to 200 μm have been synthesized from gels with the composition of 3.58SiO2:2.08NaAlO2:7.59NaOH:455H2O:5.06TEA:1.23TCl. Two of these, colorless octahedron about 200 μm in cross-section have been treated with aqueous 0.1 M TlC2H3O2 and KNO3 in order to prepare Tl+- and K+-exchanged faujasite-type zeolites, respectively, and then determined the Si/Al ratio of the zeolite framework. The crystal structures of |Tl71|[Si121Al71O384]-FAU and |K53Na18|[Si121Al71O384]-FAU per unit cell, a = 24.9463(2) and 24.9211(16) A, respectively, dehydrated at 673 K and 1 × 10-6 Torr, have been determined by single-crystal X-ray diffraction techniques in the cubic space group Fd m at 294 K. The two single-crystal structures were refined using all intensities to the final error indices (using only the 905 and 429 reflections for which Fo > 4σ(Fo)) R1/R2 = 0.059/0.153 and 0.066/0.290, respectively. In the structure of fully Tl+-exchanged faujasite-type zeolite, 71 Tl+ ions per unit cell are located at four different crystallographic sites. Twenty-nine Tl+ ions fill site I' in the sodalite cavities on 3-fold axes opposite double 6-rings (Tl-O = 2.631(12) A and O-Tl-O = 93.8(4)o). Another 31 Tl+ ions fill site II opposite single 6-rings in the supercage (Tl-O = 2.782(12) A and O-Tl-O = 87.9(4)o). About 3 Tl+ ions are found at site III in the supercage (Tl-O = 2.91(6) and 3.44(3) A), and the remaining 8 occupy another site III (Tl-O = 2.49(5) and 3.06(3) A). In the structure of partially K+-exchanged faujasite-type zeolite, 53 K+ ions per unit cell are found at five different crystallographic sites and 18 Na+ ions per unit cell are found at two different crystallographic sites. The 4 K+ ions are located at site I, the center of the hexagonal prism (K-O = 2.796(8) A and O-K-O = 89.0(3)o). The 10 K+ ions are found at site I' in the sodalite cavity (K-O = 2.570(19) A and O-KO = 99.4(9)o). Twenty-two K+ ions are found at site II in the supercage (K-O = 2.711(9) A and O-K-O = 94.7(3)o). The 5 K+ ions are found at site III deep in the supercage (K-O = 2.90(5) and 3.36(3) A), and 12 K+ ions are found at another site III' (K-O = 2.55(3) and 2.968(18) A). Twelve Na+ ions also lie at site I' (Na-O = 2.292(10) and O-Na-O = 117.5(5)o). The 6 Na+ ions are found at site II in the supercage (Na-O = 2.390(17) A and O-Na-O = 113.1(11)o). The Si/Al ratio of synthetic faujasite-type zeolite is 1.70 determined by the occupations of cations, 71, in two single-crystal structures.

메탈로센 촉매를 이용한 에틸렌과 시클로올레핀의 공중합 : III. ${\alpha}$-올레핀 첨가의 영향 (Copolymerization of Ethylene and Cycloolefin with Metallocene Catalyst : III. Effect of ${\alpha}$-Olefin Addition)

  • 이동호;이조훈;김현준;김우식;민경은;박이순;서관호;강인규
    • 폴리머
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    • 제25권4호
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    • pp.468-475
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    • 2001
  • $rac-Et(Ind)_2ZrCl_2,\;rac-Me_2Si(Ind)_2ZrCl_2,\;rac-Me_2Si(Cp)_2ZrCl_2,\;(n-BuCp)_2ZrCl_2$ 등의 메탈로센 촉매와 공촉매인 개질 메틸알루민옥산(MMAO)을 이용한 에틸렌과 노르보르넨의 공중합에서 1-헥센(H), 1-옥텐 및 1-데센 등과 같은 ${\alpha}$-올레핀을 제3단량체로 첨가할 때, 중합조건, 촉매의 구조 및 ${\alpha}$-올레핀의 종류와 첨가량이 촉매 활성, 생성 중합체의 열적 성질 및 조성 등에 미치는 영량을 조사하였다. ${\alpha}$-올레핀의 첨가량에 따른 촉매 활성 및 중합체의 열적 성질의 변화는 촉매구조 뿐만 아니라 ${\alpha}$-올레핀의 구조에도 의존하였다. $rac-Et(Ind)_2ZrCl_2/MMAO$계에서 촉매 활성이 높았고 중합체의 $T_g$ 제어가 용이하였으며, 제3단량체로 H를 첨가한 경우에 가장 높은 촉매활성의 증가를 확인하였다.

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