Electrical Characteristics of Thin Nitroxide Films Prepared by $NH_3$ Rapid Themal Annealing of $SiO_2$
($SiO_2$ 의 $NH_3$ 급속열처리에 의한 nitroxide 박막의 전기적 특성)
-
- Electrical & Electronic Materials
- /
- v.3 no.2
- /
- pp.105-114
- /
- 1990