• 제목/요약/키워드: Semiconductor devices

검색결과 1,723건 처리시간 0.029초

고내압 IGBT의 전기적 특성 향상에 관한 연구 (High Voltage IGBT Improvement of Electrical Characteristics)

  • 안병섭;정헌석;정은식;김성종;강이구
    • 한국전기전자재료학회논문지
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    • 제25권3호
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    • pp.187-192
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    • 2012
  • Development of new efficient, high voltage switching devices with wide safe operating area and low on-state losses has received considerable attention in recent years. One of those structures with a very effective geometrical design is the trench gate Insulated Gate Bipolar Transistor(IGBT).power IGBT devices are optimized for high-voltage low-power design, decided to aim. Class 1,200 V NPT Planer IGBT, 1,200 V NPT Trench IGBT for class has been studied.

반도체 장비의 변형 진단을 위한 shearographic system의 이론적 고찰 및 위상오차해석 (Theoretical analysis and Phase Error Analysis of the Shearographic System for the Deformation Evaluation of Semiconductor Equipment)

  • 김수길;홍선기
    • 반도체디스플레이기술학회지
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    • 제4권1호
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    • pp.17-21
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    • 2005
  • We presented a new method to obtain four speckle interferograms with relative phase shift of $\pi$/2 by passive devices such as waveplate and polarizer, calculate the phase at each point of the speckle interferogram in shearography using Wollaston prism, which can be applied to the deformation evaluation of semiconductor devices, and theoretically demonstrated the feasibility of the proposed method by Jones matrix.

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Electrical Properties of Mg:Ag/tris-(8-hydroxyquinoline) Aluminum Heterointerface in Organic Light-emitting Devices

  • Choo, D.C.;Im, H.C.;Lee, D.U.;Kim, T.W.;Han, J.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1429-1431
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    • 2005
  • Organic molecular-beam deposition of Mg:Ag thin films with a low Mg concentration on tris (8-hydroxyquinolino) aluminum $(Alq_3)$ layers at room temperature was performed to investigate the feasibility of using Mg:Ag thin films as cathode electrodes in organic light-emitting devices (OLEDs). The effective barrier height of the $Mg:Ag/Alq_3$ heterointerface, determined from current-voltage measurements, was as low as 0.23 eV. These results help improve understanding the electrical properties of the $Mg:Ag/Alq_3$ heterointerfaces in OLEDs.

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준 경험기법을 이용한 고집적 반도체공장의 미진동 제어를 위한 구조물의 동적설계에 관한 연구 (A Study on the Structural Dynamic Design for Sub-micro Vibration Control in High Class Semiconductor Factor by Semi-Empirical Method)

  • 이홍기;백재호;원영재;박해동;김두훈
    • 소음진동
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    • 제9권6호
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    • pp.1227-1233
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    • 1999
  • Modern technology depends on the reliability of extremely high technology equipments. In the production of semiconductor wafer, optical and electron microscopes, ion-beam, laser device must maintain their alignments within a nanometer. This equipment requires a vibration free environment to provide its proper function. Especially, lithography and inspection devices, which have sub-nanometer class high accuracy and resolution, have come to necessity for producing more improved giga and tera class semiconductor wafers. This high technology equipments require very strict environmental vibration standard, vibration criteria, in proportion to the accuracy of the manufacturing, inspecting devices. This paper deals with the structural dynamic design in high class semiconductor factory in order to be satisfied more strict vibration criteria for high sensitive equipment.

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GaN, Cool MOS, SiC MOSFET을 이용한 DC-DC 승압 컨버터의 효율 특성 (Efficiency Characteristics of DC-DC Boost Converter Using GaN, Cool MOS, and SiC MOSFET)

  • 김정규;양오
    • 반도체디스플레이기술학회지
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    • 제16권2호
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    • pp.49-54
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    • 2017
  • In this paper, recent researches on new and renewable energy have been conducted due to problems such as energy exhaustion and environmental pollution, and new researches on high efficiency and high speed switching are needed. Therefore, we compared the efficiency by using high speed switching devices instead of IGBT which can't be used in high speed switching. The experiment was performed theoretically by applying the same parameters of the high speed switching devices which are the Cool MOS of Infineon Co., SiC C3M of Cree, and GaN FET device of Transform, by implementing the DC-DC boost converter and measuring the actual efficiency for output power and frequency. As a result, the GaN FET showed good efficiency at all switching frequency and output power.

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나노물질 기반의 광변환층 개발 동향 (Advances in Nanomaterials-Based Color Conversion Layer)

  • 김동룡;최문기
    • 한국전기전자재료학회논문지
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    • 제35권6호
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    • pp.547-555
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    • 2022
  • Color conversion layer refers to a layer that converts the blue light emitted from the backlight into the red and green light. Heavy metal-free quantum dots and perovskite nanocrystals have attracted great attention as base materials for color conversion layers due to their outstanding optical characteristics. Here, we review recent advances in the development of color conversion layers based on quantum dots. First, we overview the representative optical characteristics of quantum dots and perovskite nanocrystals, and then introduce printing techniques for color converting layers including photolithography, inkjet printing, and nanoimprinting. Finally, we conclude this review with a brief perspective.

차세대 전력반도체 소자 및 패키지 접합 기술 (Recent Overview on Power Semiconductor Devices and Package Module Technology)

  • 김경호;좌성훈
    • 마이크로전자및패키징학회지
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    • 제26권3호
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    • pp.15-22
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    • 2019
  • In these days, importance of the power electronic devices and modules keeps increasing due to electric vehicles and energy saving requirements. However, current silicon-based power devices showed several limitations. Therefore, wide band gap (WBG) semiconductors such as SiC, GaN, and $Ga_2O_3$ have been developed to replace the silicon power devices. WBG devices show superior performances in terms of device operation in harsh environments such as higher temperatures, voltages and switching speed than silicon-based technology. In power devices, the reliability of the devices and module package is the critically important to guarantee the normal operation and lifetime of the devices. In this paper, we reviewed the recent trends of the power devices based on WBG semiconductors as well as expected future technology. We also presented an overview of the recent package module and fabrication technologies such as direct bonded copper and active metal brazing technology. In addition, the recent heat management technologies of the power modules, which should be improved due to the increased power density in high temperature environments, are described.

AN INTRODUCTION TO SEMICONDUCTOR INITIATION OF ELECTROEXPLOSIVE DEVICES

  • Willis K. E.;Whang, D. S.;Chang, S. T.
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 1994년도 제3회 학술강연회논문집
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    • pp.21-26
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    • 1994
  • Conventional electroexplosive devices (EED) commonly use a very small metal bridgewire to ignite explosive materials i.e. pyrotechnics, primary and secondary explosives. The use of semiconductor devices to replace “hot-wire” resistance heating elements in automotive safety systems pyrotechnic devices has been under development for several years. In a typical 1 amp/1 watt electroexplosive devices, ignition takes place a few milliseconds after a current pulse of at least 25 mJ is applied to the bridgewire. In contrast, as for a SCB devices, ignition takes place in a few tens of microseconds and only require approximately one-tenth the input energy of a conventional electroexplosive devices. Typically, when SCB device is driven by a short (20 $\mu\textrm{s}$), low energy pulse (less than 5 mJ), the SCB produces a hot plasma that ignites explosive materials. The advantages and disadvantages of this technology are strongly dependent upon the particular technology selected. To date, three distinct technologies have evolved, each of which utilizes a hot, silicon plasma as the pyrotechnic initiation element. These technologies are 1.) Heavily doped silicon as the resistive heating initiation mechanism, 2.) Tungsten enhanced silicon which utilizes a chemically vapor deposited layer of tungsten as the initiation element, and 3.) a junction diode, fabricated with standard CMOS processes, which creates the initial thermal environment by avalanche breakdown of the diode. This paper describes the three technologies, discusses the advantages and disadvantages of each as they apply to electroexplosive devises, and recommends a methodology for selection of the best device for a particular system environment. The important parameters in this analysis are: All-Fire energy, All-Fire voltage, response time, ease of integration with other semiconductor devices, cost (overall system cost), and reliability. The potential for significant cost savings by integrating several safety functions into the initiator makes this technology worthy of attention by the safety system designer.

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플루오라이트 구조 강유전체 박막의 분극 반전 동역학 리뷰 (A Brief Review on Polarization Switching Kinetics in Fluorite-structured Ferroelectrics)

  • 김세현;박근형;이은빈;유근택;이동현;양건;박주용;박민혁
    • 한국표면공학회지
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    • 제53권6호
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    • pp.330-342
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    • 2020
  • Since the original report on ferroelectricity in Si-doped HfO2 in 2011, fluorite-structured ferroelectrics have attracted increasing interest due to their scalability, established deposition techniques including atomic layer deposition, and compatibility with the complementary-metal-oxide-semiconductor technology. Especially, the emerging fluorite-structured ferroelectrics are considered promising for the next-generation semiconductor devices such as storage class memories, memory-logic hybrid devices, and neuromorphic computing devices. For achieving the practical semiconductor devices, understanding polarization switching kinetics in fluorite-structured ferroelectrics is an urgent task. To understand the polarization switching kinetics and domain dynamics in this emerging ferroelectric materials, various classical models such as Kolmogorov-Avrami-Ishibashi model, nucleation limited switching model, inhomogeneous field mechanism model, and Du-Chen model have been applied to the fluorite-structured ferroelectrics. However, the polarization switching kinetics of fluorite-structured ferroelectrics are reported to be strongly affected by various nonideal factors such as nanoscale polymorphism, strong effect of defects such as oxygen vacancies and residual impurities, and polycrystallinity with a weak texture. Moreover, some important parameters for polarization switching kinetics and domain dynamics including activation field, domain wall velocity, and switching time distribution have been reported quantitatively different from conventional ferroelectrics such as perovskite-structured ferroelectrics. In this focused review, therefore, the polarization switching kinetics of fluorite-structured ferroelectrics are comprehensively reviewed based on the available literature.