• 제목/요약/키워드: Semiconductor Process Data

검색결과 324건 처리시간 0.027초

반도체 리드 프레임의 금형설계 자동화 시스템 개발에 관한 연구 (A Study on the Development of Computer Aided Die Design System for Lead Frame, Semiconductor)

  • 최재찬;김병민;김철;김재훈;김창봉
    • 한국정밀공학회지
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    • 제16권6호
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    • pp.123-132
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    • 1999
  • This paper describes a research work of developing computer-aided design of lead frame, semiconductor, with blanking operation which is very precise for progressive working. Approach to the system is based on the knowledge-based rules. Knowledge for the system is formulated from pasticity theories, experimental results and the empirical knowledge of field experts. This system has been written in AutoLISP on the AutoCAD using a personal computer and in I-DEAS Drafting Programming Language on the I-DEAS Master Series Drafting with Workstation, HP9000/715(64). Transference of data between AutoCAD and I-DEAS Master Series Drafting is accomplished by DXF(drawing exchange format) and IGES(initial graphics exchange specification) methods. This system is composed of five modules, which are input and shape treatment, production feasibility check, strip-layout, data-conversion and die-layout modules. The process planning and Die design system is designed by considering several factors, such as complexities of blank geometry, punch profiles, and the availability of a press equipment and standard parts. This system provides its efficiecy for strip-layout, and die design for lead frame, semiconductor.

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다결정 실리콘의 확산 공정 시뮬레이션 (Simulation Methodology for Diffusion Process in Poly-silicon)

  • 이흥주;이준하
    • 반도체디스플레이기술학회지
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    • 제4권1호
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    • pp.23-27
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    • 2005
  • This paper presents a simulation methodology for the poly-silicon oriented TCAD(technology-CAD) system. A computer simulation environment for the poly-silicon processing has been set up with the proper adoption of the two-stream model for ion-doping, diffusion, and defects inside of grain and on the grain boundary. After the simulator calibration, simulation results for the poly-silicon diffusion hat shown a good agreement with the SIMS data.

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색상 정보를 이용한 영상 검색 기법 (Image Retrieval Method Using Color Descriptor)

  • 조재훈;이상호;김영섭
    • 반도체디스플레이기술학회지
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    • 제7권2호
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    • pp.69-76
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    • 2008
  • Recently, as the multimedia processing application increases rapidly by going on increasing multimedia data, the efficient retrieval method of image information is required in many fields of application and becoming the matter of major concern. Furthermore, in the last few years rapid improvements in hardware technology have made it possible to process, store and retrieve huge amounts of data in a multimedia format. As a result, Content-Based Image Retrieval (CBIR) has been receiving widespread interest during the last decade. This paper propose the content-based retrieval system as a method for performing image retrieval through the effective feature analysis of the object of significant meaning by using YCbCr channel merging on the basis of the characteristics of man's visual system.

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단일 엣지를 이용한 깊이 정보에 관한 연구 (A Study on the Depth Map using Single Edge)

  • 김영섭;송응열
    • 반도체디스플레이기술학회지
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    • 제9권2호
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    • pp.123-126
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    • 2010
  • An implementation of modified stereo matching using efficient belief propagation (BP) algorithm is presented in this paper. We do recommend the use of the simple sobel, prewitt edge operator. The application of B band sobel edge operator over image demonstrates result with somewhat noisy (distinct border). When we adopt the only MRF + BP algorithm, however, borders cannot be distinguished due to that the message functions in the BP algorithm is just the mechanism which passes energy data to the only large gap of each Message functions In order to address the abovementioned disadvantageous phenomenon, we use the sobel edge operator + MRF + BP algorithm to distinguish the border that is located between the similar message data. Using edge information, the result shows that our proposed process diminishes the propagation of wrong probabilistic information. The enhanced result is due to that our proposed method effectively reduced errors incurred by ambiguous scene properties.

웨이브릿과 X-ray 광전자 분광법을 이용한 반도체 플라즈마 공정 감시 기법 (Monitoring of semiconductor plasma process using wavelet and X-ray photoelectron spectroscopy)

  • 박경영;김병환
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2005년도 심포지엄 논문집 정보 및 제어부문
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    • pp.281-283
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    • 2005
  • Processing Plasmas are very sensitive to a variation in process parameters, To maintain process quality and device field, plasma malfunction should be tightly monitored with high sensitivity. A new monitoring method is presented and this was accomplished by applying discrete wavelet transformation to X-ray photoelectron spectroscopy. XPS data were collected during a plasma etching of silicon carbide. Various effects of DWT factor on fault sensitivity were optimized experimentally. Compared to raw data, total percent sensitivity for DWT data demonstrated a significantly improved sensitivity to plasma faults induced by bias power.

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PC 펠렛의 마이크로웨이브 건조를 위한 에너지 효율 분석 (Analysis of Energy Consumption for Microwave Drying in PC Pellet)

  • 이현민;김재경;전의식
    • 반도체디스플레이기술학회지
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    • 제20권4호
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    • pp.44-48
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    • 2021
  • Semiconductor inspection equipment makes components using materials with insulating properties for functional inspection including current and voltage of semiconductor parts. A representative insulating material is plastic, and plastic is made of a component through an injection process using plastic pellet. When plastic pellets contain excessive moisture, problems such as performance degradation and product surface defects occur. To prevent this, pre-drying is essential, and the heat convective type is the most applied. However, the heat convective type has a problem of low consumption efficiency and a long drying time. Recently, many studies have been conducted on a drying method using microwaves due to high energy efficiency. In this paper, drying was performed using a microwave for drying PC pellets. Energy consumption and drying efficiency analyzed by set up an experimental apparatus of heat convective, microwave, and hybrid(heat convective + microwave) types. It was confirmed that energy consumption and drying efficiency were high when drying using microwaves, and it was confirmed that the hybrid method improved drying performance compared to the heat convective method. It is expected that the research results of this paper can be used as basic data for drying plastic pellets using microwave.

Evaluation of Hazardous Chemicals with Material Safety Data Sheet and By-products of a Photoresist Used in the Semiconductor-Manufacturing Industry

  • Jang, Miyeon;Yoon, Chungsik;Park, Jihoon;Kwon, Ohhun
    • Safety and Health at Work
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    • 제10권1호
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    • pp.114-121
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    • 2019
  • Background: The photolithography process in the semiconductor industry uses various chemicals with little information on their constitution. This study aimed to identify the chemical constituents of photoresist (PR) products and their by-products and to compare these constituents with material safety data sheets (MSDSs) and analytical results. Methods: A total of 51 PRs with 48 MSDSs were collected. Analysis consisted of two parts: First, the constituents of the chemical products were identified and analyzed using MSDS data; second, for verification of the by-products of PR, volatile organic compounds were analyzed. The chemical constituents were categorized according to hazards. Results: Forty-five of 48 products contained trade secrets in amounts ranging from 1 to 65%. A total of 238 ingredients with multiple counting (35 ingredients without multiple counting) were identified in the MSDS data, and 48.7% of ingredients were labeled as trade secrets under the Korea Occupational Safety and Health Act. The concordance rate between the MSDS data and the analytical result was 41.7%. The by-product analysis identified 129 chemicals classified according to Chemical Abstracts Service No., with 17 chemicals that are carcinogenic, mutagenic, and reprotoxic substances. Formaldehyde was found to be released from 12 of 21 products that use novolak resin. Conclusion: We confirmed that several PRs contain carcinogens, and some were not specified in the toxicological information in the MSDS. Hazardous chemicals, including benzene and formaldehyde, are released from PRs products as by-products. Therefore, it is necessary to establish a systematic management system for chemical compounds and the working environment.

Park's Vector Approach를 이용한 BLDC모터진단 방법과 새로운 데이터 셋 특징 추출 연구 (A Study on Diagnosis of BLDC motor and New data-set Feature Extraction using Park's Vector Approach)

  • 고영진;김지선;이범;김경민
    • 전기전자학회논문지
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    • 제26권1호
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    • pp.104-110
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    • 2022
  • 본 논문에서는 UAV의 BLDC 모터 진단방법과 AI진단을 위한 새로운 데이터 셋을 제안하였다. BLDC모터 진단에 있어서 PVA(Park's Vector Approach)는 주파수 성분의 많은 리플로 인해 적용이 어려움이 따르나, 리플의 성분이 3조파를 띄고 있음에 따라 3조파에 뛰어난 SG(Savitzky-Golay)필터를 적용하여 Circle fitting으로 PVA를 활용하는 방법을 제안하였다. 한편, 3상에서 2상으로 변환시키는 기법인 PVA는 변환과정 중 항상 원점을 기준으로 두게 된다. 이에 Circle fitting의 적용과정에서 원점과 측정된 중심점의 오차를 측정하여 고장진단이 가능하도록 하였다. 또한, 이때 측정된 오차의 offset 데이터 기반으로 AI기술의 새로운 데이터 셋으로 활용 가능함을 실험을 통해 입증하였다.

비정질 및 단결정 실리콘에서 10~50 keV 에너지로 주입된 안티몬 이온의 분포와 열적인 거동에 따른 연구 (A Study on Implanted and Annealed Antimony Profiles in Amorphous and Single Crystalline Silicon Using 10~50 keV Energy Bombardment)

  • 정원채
    • 한국전기전자재료학회논문지
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    • 제28권11호
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    • pp.683-689
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    • 2015
  • For the formation of $N^+$ doping, the antimony ions are mainly used for the fabrication of a BJT (bipolar junction transistor), CMOS (complementary metal oxide semiconductor), FET (field effect transistor) and BiCMOS (bipolar and complementary metal oxide semiconductor) process integration. Antimony is a heavy element and has relatively a low diffusion coefficient in silicon. Therefore, antimony is preferred as a candidate of ultra shallow junction for n type doping instead of arsenic implantation. Three-dimensional (3D) profiles of antimony are also compared one another from different tilt angles and incident energies under same dimensional conditions. The diffusion effect of antimony showed ORD (oxygen retarded diffusion) after thermal oxidation process. The interfacial effect of a $SiO_2/Si$ is influenced antimony diffusion and showed segregation effects during the oxidation process. The surface sputtering effect of antimony must be considered due to its heavy mass in the case of low energy and high dose conditions. The range of antimony implanted in amorphous and crystalline silicon are compared each other and its data and profiles also showed and explained after thermal annealing under inert $N_2$ gas and dry oxidation.

산화물 반도체 박막 가스센서 어레이의 제조 및 수율 개선 (Fabrication and yield improvement of oxide semiconductor thin film gas sensor array)

  • 이규정;류광렬;허창우
    • 한국정보통신학회논문지
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    • 제6권2호
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    • pp.315-322
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    • 2002
  • 반도체 제조공정과 미세가공 기술을 이용하여 30$0^{\circ}C$의 동작온도에서 약 60㎽의 전력소모를 갖는 산화물 반도체 박막 가스센서 어레이를 제조하였다. 멤브레인의 우수한 열적 절연은 0.1$\mu\textrm{m}$ 두께의 Si$_3$N$_4$와 1$\mu\textrm{m}$ 두께의 PSG의 이중 층에 의한 것으로, 각각 LPCVD(저압화학 기상증착)와 APCVD(대기압 화학 기상증착)에 의해 제조되었다. 센서 어레이의 4가지 산화물 반도체 박막 감지물질로는 1wt.%Pd가 도핑된 SnO$_2$, 6wt.% $Al_2$O$_3$가 도핑된 ZnO, WO$_3$, ZnO를 이용하였으며, 제조된 초소형 산화물 반도체 박막 가스센서 어레이는 여러 가지 가스의 노출시 유용한 저항 변화를 나타내었고 감도는 감지 물질에 강하게 의존함을 알 수 있었다. 센서 소자의 공정 수율을 증진시키기 위하여 히터 부위를 함몰하는 공정 방법을 취하였으며, 그 결과 월등한 수율 개선을 도모할 수 있었다.