• 제목/요약/키워드: Self-assembled Monolayer (SAM)

검색결과 131건 처리시간 0.028초

알칸싸이올 이징 모형의 자기 조립 단분자층 시뮬레이션 응용 (Ising Model of Alkanethiol and Its Application to Simulation of a Self-Assembled Monolayer)

  • 변기상;송승민;장준경
    • 대한화학회지
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    • 제64권6호
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    • pp.345-349
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    • 2020
  • 금 표면 위에서 알칸싸이올 분자가 자기조립을 통해 단분자층을 만들 때 싸이올기가 화학 흡착을 못하고 알킬기가 물리 흡착을 하는 결함이 생길 수 있다. 이러한 결함은 열적 어닐링 과정으로 제거할 수 있음이 알려져 있다. 우리는 알칸싸이올 분자에 대한 이징 모형을 제시하고 단분자층 어닐링 과정의 몬테카를로 시뮬레이션에 적용하였다. 새로운 이징 모형은 선행 분자동역학 시뮬레이션에서 나타난 어닐링을 통한 단분자층의 결함 제거를 성공적으로 재현할 수 있었다.

Thin Film Micromachining Using Femtosecond Laser Photo Patterning of Organic Self-assembled Monolayers

  • Chang Won-Seok;Choi Moo-Jin;Kim Jae-Gu;Cho Sung-Hak;Whang Kyung-Hyun
    • International Journal of Precision Engineering and Manufacturing
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    • 제7권1호
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    • pp.13-17
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    • 2006
  • Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

Micromolding 기술의 성능 향상을 위한 소수성 SAM coating (Hydrophobic Self-assembled monolayers(SAMs) coating for enhanced micromolding)

  • 박상하;박정호;문성욱;박종오
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2001년도 하계학술대회 논문집 C
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    • pp.1887-1889
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    • 2001
  • 금속 재질의 MEMS 구조물의 모양을 폴리머에 전사하는 micromolding 과정에서 금속 구조물과 폴리머 사이를 분리 (demolding)시킬 때 금속 구조물과 폴리머 기판 사이에 분리를 방해하는 응착 (Adhesion) 문제가 발생한다. 이러한 응착 문제를 줄이고자 표면 에너지가 낮은 Self-Assembled Monolayer(SAM) coating을 금속(Ni) 표면에 시도하였다. SAM coating 막의 형성 여부와 응착력 (Adhesion force) 값을 구하기 위해 각각 XPS(X-ray photoelectron spectroscopy)와 AFM(Atomic force microscopy)을 이용하여 측정하였고 측정 결과 Ni 표면에 SAM이 형성되었음을 XPS로부터 알 수 있었고 SAM coating된 Ni 시편에서 더 낮은 응착력값을 보여 주었다.

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유기 단분자막을 이용한 마그네슘 합금 판재 (AZ31)의 내식성 표면처리 기술 연구 (Anti-corrosive surface treatment of Mg alloy steel using organic self assembly monolayer technique)

  • 박종원;이경황;박영희
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2009년도 춘계학술대회 논문집
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    • pp.113-114
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    • 2009
  • 기존의 습식 및 건식 표면처리 공정의 단점을 극복하고, 마그네슘 합금의 가장 큰 문제점인 내식성개선을 위해 열화학기상증착(thermal Chemical Vapor Deposition)법을 이용하여 자기조직화 유기 단분자막(Self-Assembled organic Monolayer, SAM)을 제작하여 마그네슘 합금(AZ31)의 내식성을 검토하였다.

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대류성 자기조립법을 통한 폴리스티렌 비드 대면적 단일층 형성에 미치는 공정 변수 효과 (Effect of Processing Parameters on the Formation of Large Area Self-Assembled Monolayer of Polystyrene Beads by a Convective Self-Assembly Method)

  • 서안나;최지환;변재철;김원목;김인호;이경석
    • 한국재료학회지
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    • 제25권12호
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    • pp.647-654
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    • 2015
  • Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a high-throughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.

STM Study of 2-Mercaptoethanol Self-Assembled Monolayer on Au(111)

  • 현문섭;이충균
    • Bulletin of the Korean Chemical Society
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    • 제22권2호
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    • pp.213-218
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    • 2001
  • Presented are the STM images of self-assembled monolayer of 2-mercaptoethanol on Au(111). Striped structures of ($6{\times}3_{\frac{1}{2}}$), ($5{\times}3_{\frac{1}{2}}$), ($4{\times}3_{\frac{1}{2}}$) and compact-($5{\times}3_{\frac{1}{2}}$) were observed after annealing at $80^{\circ}C.$ Analysis of the ordered structures revealed that the basic fundamental units of the ordered structures were three crystallographically non-equivalent ($3_{\frac{1}{2}}{\times}3_{\frac{1}{2}}$) $R30^{\circ}$ assemblies, and that the way of combination of the assemblies produced the four different structures. The($6{\times}3_{\frac{1}{2}}$) structure ( $\theta$ = 0.33) was composed of one ($3_{\frac{1}{2}}{\times}3_{\frac{1}{2}}$)$R30^{\circ}$ assembly, while the ($5{\times}3_{\frac{1}{2}}$) ( $\theta$ = 0.30) and ($4{\times}3_{\frac{1}{2}}$) ( $\theta$ = 0.38) structures were consisted of two ($3_{\frac{1}{2}}{\times}3_{\frac{1}{2}}$) $R30^{\circ}$ assemblies, separated by 5a and 4a, respectively. Furthermore, the compact-(5X 3½) structure ( $\theta$ = 0.50) was obtained by overlapping three ($3_{\frac{1}{2}}{\times}3_{\frac{1}{2}}$) $R30^{\circ}$ assemblies. In spite of the diversity in the adsorption structures, all the adsorption sites of 2-mercaptoethanol were fundamentally identical. On the other hand, the unannealed primitive SAM of 2-mercaptoethanol was characterized by two observations: a short-range order keeping the adsorbed molecules at approximately $3_{\frac{1}{2}}$ a and the small domains of the striped structures supporting that the observed surface structures on the annealed surface were the extension of the primitive layer of 2-mercaptoethanol. Comparing these observations with the already published structures of ethanthiol, it was concluded that the interaction between the hydroxyl groups of 2-mercaptoethanol might play a significant role in the adsorption step of 2-mercaptoethanol on Au(111) to organize the adsorption structures different from those of ethanthiol.

Effect of dipole electric field on low-voltage pentacene thin film transistors

  • Kim, Kang-Dae;Song, Chung-Kun
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1636-1638
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    • 2007
  • We report on low-voltage pentacene TFTs with a Al2O3/OTS as a gate dielectric. Improving device characteristics, we performed chemical modification of self-grown Al2O3 surface with an octadecyltrichlorosilane(OTS) self-assembled monolayer(SAM). As the result of this combination, the mobility was improved from 0.3 to $0.45\;cm^2/Vs$. In addition, we examined that the SAM dipole electric field have an influence on gate leakage current, transfer and output characteristics.

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공액구조 전도성 올리고머 자기조립단분자막의 제작 및 전기화학적 특성 (Electrochemical Properties and Fabrication of Conjugated System Conducting Oligomer Self-assembled Monolayer)

  • 민현식;이태연;오세용
    • 공업화학
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    • 제22권5호
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    • pp.545-550
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    • 2011
  • 바이오 분자의 고정 링커로 전기전도도가 높은 방향족 공액구조의 4-(2-(4-(acetylthio)phenyl)ethynyl)benzoic acid (APBA) 분자를 합성한 후, APBA 자기조립 단분자막을 제작하였다. 제작한 APBA 자기조립 단분자막의 구조를 분석하였고, 페로센으로 고정화시킨 APBA의 자기조립 단분자막의 전기화학적 특성을 조사하였다. 부탄티올 단분자막에 APBA를 삽입시켜 혼합 단분자막을 제조하여 XPS로 금 기판에 대한 혼합 단분자막의 수직 배향성을 조사하였다. 또한, APBA 혼합 시간에 따른 APBA와 부탄티올(BT) 혼합 단분자막에 페로센을 고정화하여 전기화학적 산화 환원 특성을 조사하였다. 혼합 단분자막의 전기화학적 활성은 혼합 시간의 증가에 따라 증가하였고, 부탄티올 단분자막 기판을 APBA 용액에 36 h 침지시켰을 때 가장 높은 페로센 분자의 산화 환원 전류값을 얻었다.

Surface modification for block copolymer nanolithographyon gold surface

  • 황인찬;방성환;이병주;이한보람;김형준
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 추계학술발표대회
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    • pp.33.2-33.2
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    • 2009
  • Block copolymer lithography has attracted great attention for emerging nanolithography since nanoscaleperiodic patterns can be easily obtained through self-assembly process without conventional top-down patterning process. Since the morphologies of self-assembled block copolymer patterns are strongly dependent on surface energy of a substrate, suitable surface modification is required. Until now, the surface modification has been studied by using random copolymer or self-assembled mono layers (SAMs). However, the research on surface modifications has been limited within several substrates such as Si-based materials. In present study, we investigated the formation of block copolymer on Au substrate by $O_2$ plasma treatment with the SAM of 3-(p-methoxy-phenyl)propyltrichloro-silane [MPTS, $CH_3OPh(CH_2)_3SiCl_3$]. After $O_2$ plasma treatment, the chemical bonding states of the surface were analyzed by X-ray photoelectron spectroscopy (XPS). The static contact angle measurement was performed to study the effects of $O_2$ plasma treatment on the formation of MPTS monolayer. The block copolymer nanotemplates formed on Au surface were analyzed by scanning electron microscopy. The results showed that the ordering of self-assembled block copolymer pattern and the formation of cylindrical nano hole arrays were enhanced dramatically by oxygen plasma treatment. Thus, the oxidation of gold surface by $O_2$ plasma treatment enables the MPTS to form the monolayer assembly leading to surface neutralization of gold substrates.

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