• Title/Summary/Keyword: Self-assembled Monolayer (SAM)

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Ising Model of Alkanethiol and Its Application to Simulation of a Self-Assembled Monolayer (알칸싸이올 이징 모형의 자기 조립 단분자층 시뮬레이션 응용)

  • Byun, Kisang;Song, Sung Min;Jang, Joonkyung
    • Journal of the Korean Chemical Society
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    • v.64 no.6
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    • pp.345-349
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    • 2020
  • In the self-assembled monolayer (SAM) of alkanethiol formed on a gold surface, some molecules fail to chemisorb with their terminal alkyl groups physisorbed. The previous molecular dynamics (MD) simulation showed that these defects can be cured by thermal annealing. Herein, we present a simple Ising model of alkanethiol. The Monte Carlo simulation based on the present model reproduced the essential features of the annealing of SAM observed in the MD simulation.

Thin Film Micromachining Using Femtosecond Laser Photo Patterning of Organic Self-assembled Monolayers

  • Chang Won-Seok;Choi Moo-Jin;Kim Jae-Gu;Cho Sung-Hak;Whang Kyung-Hyun
    • International Journal of Precision Engineering and Manufacturing
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    • v.7 no.1
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    • pp.13-17
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    • 2006
  • Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

Hydrophobic Self-assembled monolayers(SAMs) coating for enhanced micromolding (Micromolding 기술의 성능 향상을 위한 소수성 SAM coating)

  • Park, Sang-Ha;Pak, Jung-Ho;Moon, Sung;Park, Jong-Oh
    • Proceedings of the KIEE Conference
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    • 2001.07c
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    • pp.1887-1889
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    • 2001
  • 금속 재질의 MEMS 구조물의 모양을 폴리머에 전사하는 micromolding 과정에서 금속 구조물과 폴리머 사이를 분리 (demolding)시킬 때 금속 구조물과 폴리머 기판 사이에 분리를 방해하는 응착 (Adhesion) 문제가 발생한다. 이러한 응착 문제를 줄이고자 표면 에너지가 낮은 Self-Assembled Monolayer(SAM) coating을 금속(Ni) 표면에 시도하였다. SAM coating 막의 형성 여부와 응착력 (Adhesion force) 값을 구하기 위해 각각 XPS(X-ray photoelectron spectroscopy)와 AFM(Atomic force microscopy)을 이용하여 측정하였고 측정 결과 Ni 표면에 SAM이 형성되었음을 XPS로부터 알 수 있었고 SAM coating된 Ni 시편에서 더 낮은 응착력값을 보여 주었다.

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Anti-corrosive surface treatment of Mg alloy steel using organic self assembly monolayer technique (유기 단분자막을 이용한 마그네슘 합금 판재 (AZ31)의 내식성 표면처리 기술 연구)

  • Park, Jong-Won;Lee, Gyeong-Hwang;Park, Yeong-Hui
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.05a
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    • pp.113-114
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    • 2009
  • 기존의 습식 및 건식 표면처리 공정의 단점을 극복하고, 마그네슘 합금의 가장 큰 문제점인 내식성개선을 위해 열화학기상증착(thermal Chemical Vapor Deposition)법을 이용하여 자기조직화 유기 단분자막(Self-Assembled organic Monolayer, SAM)을 제작하여 마그네슘 합금(AZ31)의 내식성을 검토하였다.

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Effect of Processing Parameters on the Formation of Large Area Self-Assembled Monolayer of Polystyrene Beads by a Convective Self-Assembly Method (대류성 자기조립법을 통한 폴리스티렌 비드 대면적 단일층 형성에 미치는 공정 변수 효과)

  • Seo, Ahn-na;Choi, Ji-Hwan;Pyun, Jae-chul;Kim, Won Mok;Kim, Inho;Lee, Kyeong-Seok
    • Korean Journal of Materials Research
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    • v.25 no.12
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    • pp.647-654
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    • 2015
  • Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a high-throughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.

STM Study of 2-Mercaptoethanol Self-Assembled Monolayer on Au(111)

  • Hyeon, Mun Seop;Lee, Chung Gyun
    • Bulletin of the Korean Chemical Society
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    • v.22 no.2
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    • pp.213-218
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    • 2001
  • Presented are the STM images of self-assembled monolayer of 2-mercaptoethanol on Au(111). Striped structures of ($6{\times}3_{\frac{1}{2}}$), ($5{\times}3_{\frac{1}{2}}$), ($4{\times}3_{\frac{1}{2}}$) and compact-($5{\times}3_{\frac{1}{2}}$) were observed after annealing at $80^{\circ}C.$ Analysis of the ordered structures revealed that the basic fundamental units of the ordered structures were three crystallographically non-equivalent ($3_{\frac{1}{2}}{\times}3_{\frac{1}{2}}$) $R30^{\circ}$ assemblies, and that the way of combination of the assemblies produced the four different structures. The($6{\times}3_{\frac{1}{2}}$) structure ( $\theta$ = 0.33) was composed of one ($3_{\frac{1}{2}}{\times}3_{\frac{1}{2}}$)$R30^{\circ}$ assembly, while the ($5{\times}3_{\frac{1}{2}}$) ( $\theta$ = 0.30) and ($4{\times}3_{\frac{1}{2}}$) ( $\theta$ = 0.38) structures were consisted of two ($3_{\frac{1}{2}}{\times}3_{\frac{1}{2}}$) $R30^{\circ}$ assemblies, separated by 5a and 4a, respectively. Furthermore, the compact-(5X 3½) structure ( $\theta$ = 0.50) was obtained by overlapping three ($3_{\frac{1}{2}}{\times}3_{\frac{1}{2}}$) $R30^{\circ}$ assemblies. In spite of the diversity in the adsorption structures, all the adsorption sites of 2-mercaptoethanol were fundamentally identical. On the other hand, the unannealed primitive SAM of 2-mercaptoethanol was characterized by two observations: a short-range order keeping the adsorbed molecules at approximately $3_{\frac{1}{2}}$ a and the small domains of the striped structures supporting that the observed surface structures on the annealed surface were the extension of the primitive layer of 2-mercaptoethanol. Comparing these observations with the already published structures of ethanthiol, it was concluded that the interaction between the hydroxyl groups of 2-mercaptoethanol might play a significant role in the adsorption step of 2-mercaptoethanol on Au(111) to organize the adsorption structures different from those of ethanthiol.

Effect of dipole electric field on low-voltage pentacene thin film transistors

  • Kim, Kang-Dae;Song, Chung-Kun
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1636-1638
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    • 2007
  • We report on low-voltage pentacene TFTs with a Al2O3/OTS as a gate dielectric. Improving device characteristics, we performed chemical modification of self-grown Al2O3 surface with an octadecyltrichlorosilane(OTS) self-assembled monolayer(SAM). As the result of this combination, the mobility was improved from 0.3 to $0.45\;cm^2/Vs$. In addition, we examined that the SAM dipole electric field have an influence on gate leakage current, transfer and output characteristics.

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Electrochemical Properties and Fabrication of Conjugated System Conducting Oligomer Self-assembled Monolayer (공액구조 전도성 올리고머 자기조립단분자막의 제작 및 전기화학적 특성)

  • Min, Hyun Sik;Lee, Tae Yeon;Oh, Se Young
    • Applied Chemistry for Engineering
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    • v.22 no.5
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    • pp.545-550
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    • 2011
  • We have synthesized a high electrically conductive 4-(2-(4-(acetylthio)phenyl)ethynyl)benzoic acid (APBA) with a conjugated aromatic structure as a bio fix linker, and then fabricated APBA self-assembled monolayer (SAM) with a self-assembly technique. The structure of the prepared APBA SAM was studied and electrochemical properties of APBA SAM immobilized with a ferrocene molecule were investigated. Also, we have examined the molecular orientation and oxidation-reduction redox characteristics of the mixed SAM consisting of APBA and butanethiol (BT) with a X-ray photo electron spectroscopy (XPS) and cyclicvoltammetry, respectively. Electrochemical activity of the mixed SAM was increased with increasing the mixed time. Especially, the maximum redox current was obtained at a mixed time of 36 hrs.

Surface modification for block copolymer nanolithographyon gold surface

  • Hwang, In-Chan;Bang, Seong-Hwan;Lee, Byeong-Ju;LeeHan, Bo-Ram;Kim, Hyeong-Jun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.11a
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    • pp.33.2-33.2
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    • 2009
  • Block copolymer lithography has attracted great attention for emerging nanolithography since nanoscaleperiodic patterns can be easily obtained through self-assembly process without conventional top-down patterning process. Since the morphologies of self-assembled block copolymer patterns are strongly dependent on surface energy of a substrate, suitable surface modification is required. Until now, the surface modification has been studied by using random copolymer or self-assembled mono layers (SAMs). However, the research on surface modifications has been limited within several substrates such as Si-based materials. In present study, we investigated the formation of block copolymer on Au substrate by $O_2$ plasma treatment with the SAM of 3-(p-methoxy-phenyl)propyltrichloro-silane [MPTS, $CH_3OPh(CH_2)_3SiCl_3$]. After $O_2$ plasma treatment, the chemical bonding states of the surface were analyzed by X-ray photoelectron spectroscopy (XPS). The static contact angle measurement was performed to study the effects of $O_2$ plasma treatment on the formation of MPTS monolayer. The block copolymer nanotemplates formed on Au surface were analyzed by scanning electron microscopy. The results showed that the ordering of self-assembled block copolymer pattern and the formation of cylindrical nano hole arrays were enhanced dramatically by oxygen plasma treatment. Thus, the oxidation of gold surface by $O_2$ plasma treatment enables the MPTS to form the monolayer assembly leading to surface neutralization of gold substrates.

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