• Journal of the Korean Ceramic Society
• /
• v.34 no.1
• /
• pp.109-113
• /
• 1997

When the intensity of X-rays scattered from amorphous materials (very weakly absorbing materials) is measured using standard diffractometric technique, the intensity caused by multiple scattering is obtained in the measured X-ray intensity. Computer programs have been developed to estimate the intensity of the mul-tiple scattering obtained in vitreous SiO2 and B2O3 with various X-rays. Using the above computer program, the intensity ratios of multiple scattering to single scattering in vitreous SiO2 were 0.10~0.16% at CuK$\alpha$, 0.98~5.87% at MoK$\alpha$, and 1.88~17.86% at AgK$\alpha$ in the range of 2$\theta$=0~180$^{\circ}$. Therefore, pri-or to the structural analysis of vitreous SiO2 and B2O3 performed experimentally using X-ray diffractometric technique, the intensity data measured in MoK$\alpha$ and AgK$\alpha$ radiations must be corrected for multiple scattering effect.