• 제목/요약/키워드: Sapphire substrate

검색결과 327건 처리시간 0.032초

질화물계 발광다이오드에서 광 추출 효율의 패턴 기판 의존성 (Dependency of Light Extraction Efficiency on Sapphire Substrate Pattern Shapes in Light Emitting Diodes)

  • 장동현;심종인
    • 한국광학회:학술대회논문집
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    • 한국광학회 2008년도 동계학술발표회 논문집
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    • pp.355-356
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    • 2008
  • The light extraction efficiencies of GaN-based light-emitting diodes (LEDs) grown on differently patterned sapphire substrates were investigated by using the ray tracing method. It was found that angle of the pattern surface against the sapphire surface, the number of pattern per unit area were important structural factors for high extraction efficiency.

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HVPE GaN film의 성장과 결함 (The growth and defects of GaN film by hydride vapor phase epitaxy)

  • 이성국;박성수;한재용
    • 한국결정성장학회지
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    • 제9권2호
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    • pp.168-172
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    • 1999
  • HVPE 법으로 sapphire 기판 위에 두께 9$\mu\textrm{m}$의 GaN film을 성장하였다. Sapphire위에 직접 성장된 GaN film은 crack free로 mirror surface를 나타내었고 dislocation density는 $2{\times}10^9/cm^2$이었다.$SiO_2$ mask pattern을 사용하여 성장된 ELO GaN film도 대부분이 mirror surface를 나타내었으나 표면 일부에서 coalescence가 덜 이루어져 stripe 방향으로 hole이 존재하였다. ELO GaN film의 mask 윗부분은 window 부분에 비해 낮은 dislocation density를 나타냈다. 특히 mask center와 window사이 영역에서는 거의 dislocation이 없었다. ELO GaN film의 dislocation density는 평균 $8{\times}10^7/cm^2$.이었다.

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고주파 마그네트론 스펏터링법으로 제조한 ZnO박막의 기판에 따른 효과 (Substrate effects of ZnO films deposited by rf magnetron sputtering)

  • 김영진;권오준;유상대;김기완
    • 센서학회지
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    • 제5권6호
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    • pp.68-73
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    • 1996
  • 고주파 마그네트론 스펏터링법을 이용하여 유리 및 (012)면인 사파이어 기판위에 ZnO박막을 제조하였다. 유리기판위에는 (002)면을 갖는 ZnO 다결정박막이 제조되었으며, (012)면인 사파이어 기판위에는 (110)면인 ZnO에 피택셜 박막이 제조되었다. 유리 및 사파이어 기판위에 제조된 ZnO박막의 표면탄성파 특성을 조사하였다. 유리 및 사파이어 기판에 대한 중심주파수에서의 전파속도는 각각 2680 m/sec 및 5980 m/sec였으며, 기본모드에서 구한 결합계수는 각각 0.98 % 및 1.44 %였다.

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Strain relaxed Co nanocrystals formation from thin films on sapphire substrate induced by nano-second laser irradiation

  • 서옥균;강덕호;손준곤;최정원;하성수;김선민;강현철;노도영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.145.2-145.2
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    • 2016
  • We report the phase transformation of Co thin films on a sapphire substrate induced by laser irradiation. As grown Co films were initially strained and tetragonally distorted. With low power laser irradiation, the surface was ruptured and irregular holes were formed. As the laser power was increased, the films changed into round shape Co nanocrystals with well-defined 6-fold structure. By measuring the XRD of Co nanostructure as a function of laser energy densities, we found that the change of morphological shapes from films to nanocrystals was accompanied with decrease of the tetragonal distortion as well as strain relaxation. By measuring the size distribution of nanocrystals as a function of film thickness, the average diameter is proportional to 1.7 power of the film thickness which was consistent with the prediction of thin film hydrodynamic (TFT) dwetting theory. Finally, we fabricated the formation of size controlling nanocrystals on the sapphire substrate without strain.

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사파이어 기판 위에 펄스-증착법으로 성장한 YBCO/CeO2박막의 초전도성과 표면 모폴러지 (Superconductivity and Surface Morphology of YBCO/CeO$_2$ Thin Films on Sapphire Substrate by Pulsed Laser Deposition)

  • Kang, Kwang-Yong;J. D. Suh
    • 한국초전도저온공학회:학술대회논문집
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    • 한국초전도저온공학회 2003년도 학술대회 논문집
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    • pp.88-91
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    • 2003
  • The crystal structure and properties of YBa$_2$Cu$_3$$O_{7-x}$(YBCO) and CeO$_2$ thin films deposited on r-plane (1(equation omitted)02) sapphire substrate by pulsed- laser deposition(PLD) have been investigated. C-axis oriented epitaxial YBCO thin films with critical temperature (Tc) of 88 K were routinely grown on (200) oriented CeO$_2$ buffer layers with thickness in the range between 20 to 80 nm. When the thickness of the (200)oriented CeO$_2$ buffer layer increases over than 80 nm, the superconducting properties of YBCO thin films on that were deteriorated. The decrease in Tc of YBCO thin films was explained by the microcrack formation in CeO$_2$ buffer layer. These results indicate that the thickness of the (200) oriented CeO$_2$ buffer layer is critical to the epitaxial YBCO thin nim growth on r-plane (1(equation omitted)02) sapphire substrate.e.

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광학 시뮬레이션을 이용한 Patterned Sapphire Substrate에 따른 Flip Chip LED의 광 추출 효율 변화에 대한 연구 (A Study on Improvement of the Light Emitting Efficiency on Flip Chip LED with Patterned Sapphire Substrate by the Optical Simulation)

  • 박현정;이동규;곽준섭
    • 한국전기전자재료학회논문지
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    • 제28권10호
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    • pp.676-681
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    • 2015
  • Recently many studies being carried out to increase the light efficiency of LED. The external quantum efficiency of LED, generally the light efficiency, is determined by the internal quantum efficiency and the light extraction efficiency. The internal quantum efficiency of LED was already reached to more than 90%, but the light extraction efficiency is still insufficient compared with the internal quantum efficiency because the total internal reflection is generated in the interface between the LED chip and air. Thus, we studied about flip chip LED with PSS and performed the optical simulation which find more optimized PSS for flip chip LED to increase the light extraction efficiency. Decreasing of the total internal reflection and effect of diffused reflection according to PSS improved the light extraction efficiency. To get more higher the efficiency, we simulated flip chip with PSS that the parameters are arrangement, edge spacing, radius, height and shape of PSS.

RF마그네트론 스퍼터링법으로 제조한 $YBa_2Cu_3O_{7-x}$전도체 박막의 특성에 대한 기판의 영향 (Substrate effects on the characteristics of $YBa_2Cu_3O_{7-x}$ thin films prepared by RF magnetron sputtering)

  • 신현용;박창엽
    • E2M - 전기 전자와 첨단 소재
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    • 제8권1호
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    • pp.6-12
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    • 1995
  • High Tc superconducting YBa$_{2}$Cu$_{3}$$O_{7-x}$ thin films were prepared on various substrates by off-axis rf magnetron sputtering method to examine the substrate effects on the film structure and its R-T characteristics. The SEM analysis showed that the surface morphology of the grown YBa$_{2}$Cu$_{3}$O.sub 7-x/, film has different characteristic structure with different substrate used. The film on (100) SrTiO$_{3}$ substrate has critical current density of 3*10$^{5}$ A/cm$^{2}$ at 77K under zero magnetic field. The X-ray diffraction measurements revealed that the films on (100) SrTiO$_{3}$ substrate have mixed a-axis and c-axis normal to the substrate surface and the films on (100) MgO and ZrO$_{2}$/sapphire substrates have c-axis normal orientation to the substrate surface. However, YBa$_{2}$Cu$_{3}$$O_{7-x}$ films on (100) sapphire substrates showed no preferential orientation.ion.

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미스트 화학기상증착법을 이용한 c면, a면, m면, r면 사파이어 기판 위의 산화갈륨 박막 성장 연구 (Growth of Gallium Oxide Thin Film on c-, a-, m-, r-Plane Sapphire Substrates Using Mist Chemical Vapor Deposition System )

  • 성기려;조성호;김경호;신윤지;정성민;김태규;배시영
    • 한국전기전자재료학회논문지
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    • 제36권1호
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    • pp.74-80
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    • 2023
  • Gallium oxide (Ga2O3) thin films were grown on c-, a-, m-, r-plane sapphire substrates using a mist chemical vapor deposition system. Various growth temperature range of 400~600℃ was applied for Ga2O3 thin film deposition. Then, several structural properties were characterized such as film thickness, crystal phase, lattice orientation, surface roughness, and optical bandgap. Under the certain growth temperature of 500℃, all grown Ga2O3 featured rhombohedral crystal structures and well-aligned preferred orientation to sapphire substrate. The films grown on c-and r-plane sapphire substrates, showed low surface roughness and large optical bandgap compared to those on a-and m-plane substrates. Therefore, various sapphire orientation can be potentially applicable for future Ga2O3-based electronics applications.

활성화 이온빔 처리된 Sapphire기판 위에 성장시킨 MOCVD-GaN 박막의 격자변형량 측정 (Measurements of Lattice Strain in MOCVD-GaN Thin Film Grown on a Sapphire Substrate Treated by Reactive Ion Beam)

  • 김현정;김긍호
    • Applied Microscopy
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    • 제30권4호
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    • pp.337-345
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    • 2000
  • 사파이어 기판을 이용한 GaN 박막성장에서 완충층의 사용과 기판의 질화처리는 GaN 박막 내의 격자결함을 줄이는 가장 보편적인 방법이다. GaN박막의 초기 핵생성과 성장 거동을 향상시키기 위한 새로운 방법으로 사파이어 표면을 질소 활성화 이온빔으로 처리하는 방법이 시도되었다. 활성화 이온빔 처리의 결과 약 10nm두께의 비정질 $AlO_xN_y$ 층이 형성되었으며 GaN의 성장온도에서 부분적으로 결정화되어 계면 부위에 고립된 비정질 영역으로 존재하였다. 계면에 존재하는 비정질 층은 기판과 박막사이에서 발생하는 열응력을 효과적으로 감소시키는 역할이 가능하며 이를 확인하기 위하여 활성화 이온빔 처리에 의한 GaN박막 내의 격자변형량 차이를 비교하였다. GaN박막에서 얻어진 $[\bar{2}201]$ 정대축고차 Laue도형을 전산모사 도형과 비교하여 격자변형량을 측정하였다. 본 연구의 결과 활성화 이온빔 처리를 하지 않은 기판 위에 성장시킨 GaN박막의 격자변형량은 처리한 경우에 비해 6배 이상 높은 값을 가졌으며 따라서 활성화 이온빔 처리에 의해 GaN박막의 열응력은 크게 감소함을 확인하였다.

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