• Proceedings of the Korean Information Science Society Conference
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• 2005.07b
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• pp.355-357
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• 2005

웹 응용 관련 기술이 널리 이용되면서 적은 비용, 짧은 개발 기간, 고품질 등 새로운 요구사항이 등장하고 있다. 웹 응용 개발 현장에서는 이러한 요구사항을 만족시키기 위하여 개발 초기부터 UI 프로토타입(UI Prototype)물 적극적으로 이용하는 방법을 택하고 있다. UI 프로토타입에에는 클라이언트 측의 항해가 구현되어 있기 때문에, 항해 설계 활동(Navigation Design Activity)이 불필요하다고 생각할 수 있다. 그렇지만 UI 프로토타입의 복잡성과 비정형성 때문에 큰 규모의 웹 응용 개발 과정에서 요구사항을 만족시키지 못할 가능성도 있다. 이 논문에서는 항해 모델을 이용하여 웹 응용 전체를 쉽게 파악할 수 있고, 사용자 관점 및 서버 판정에서 항해의 문제점을 파악할 수 있다는 점을 근거로 UI 프로토타입에 기반한 항해 설계의 필요성을 제시한다. 그리고 웹 응용 개발 프로세스에서 항해와 관련한 활동들의 세부 단계를 밝히고, UML SPEM 프로파일(Profile)을 이용하여 세부 단계를 표현한다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.144.1-144.1
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• 2013

Recently, we have developed the local oxidization and hydrogenization method for graphene layer using atomic force microscope(AFM) tip at room temperature and ambient pressure. With this method we could create locally oxidized or hydrogenized area on the graphene layer with various size from nanometer to micrometer scale, by controlling the amplitude and polarity of the voltage supplied between conducting AFM tip and the graphene layer. We investigated the chemical states of functionalized C atoms in the graphene layer using scanning photoelectron microscopy. By measuring C 1s core level X-ray Photoemission Spectra of the C atoms and suitable fitting process carried on the measured spectra, we could obtain the fraction of oxidization and hydrogenization under various condition, and the evolution of each chemical state during thermal annealing process.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.65-65
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• 2010

Extreme ultraviolet lithography (EUVL) is expected to be applied for making patterns below 32 nm in device industry. An ultrathin EUV photoresist (PR) of a few nm in thickness is required to reduce minimum feature size further. Here, we show that pentacene molecular layers can be employed as a new EUV resist for the first time. Dots and lines in nm scale are successfully realized using the new molecular resist. We clearly provide the mechanism for forming the nanopatterns with scanning photoemission microscope (SPEM), EUV interference lithography (EUV-IL), atomic force microscope (AFM), photoemission spectroscopy (PES), etc. The molecular PR has several advantages over traditional polymer EUV PRs; for example, high thermal/chemical stability, negligible outgassing, ability to control the height and width on the nanometer scale, leaving fewer residuals, no need for a chemical development process and thus reduction of chemical waste to make the nanopatterns. Besides, it could be applied to any substrate to which pentacene bonds chemically, such as $SiO_2$, SiN, and SiON, which is of importance in the device industry.