• Title/Summary/Keyword: SI7

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Fabrication of $La_2T_2O_7$ Thin Film by Chemical Solution Deposition (CSD 방법을 이용한 $La_2T_2O_7$ 박막제조)

  • 장승우;우동찬;이희영;정우식
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.11a
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    • pp.339-342
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    • 1998
  • Ferroelectric L $a_2$ $Ti_2$ $O_{7}$(LTO) thin films were prepared by chemical solution deposition processes. Acetylacetone was used as chelating agent and nitric acid was added in the stock solution to control hydrolysis and condensation reaction rate. The LTO thin films were spin-coated on Pt/Ti/ $SiO_2$/(100)Si and Pt/Zr $O_2$/ $SiO_2$/(100)Si substrates. After multiple coating, dried thin films were heat-treated for decomposition of residual organics and crystallization. The role of acetylacetone in Ti iso-propoxide stabilization by possibly substituting $O^{i}$Pr ligand was studied by H-NMR. B site-rich impurity phase, i.e. L $a_4$ $Ti_{9}$ $O_{24}$, was found after annealing, where its appearance was dependent on process temperature indicating the possible reaction with substrate. Dielectric and other relevant electrical properties were measured and the results were compared between modified sol-gel and MOD processes.s.s.

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Effect of the Casting Conditions on the Globulization of Primary Al of $AlSi_7Mg$ Alloy (($AlSi_7Mg$알루미늄 합금의 초정 구형화에 대한 주조조건의 영향)

  • Han, Yo-Sub;Lee, Ho-In;Lee, Jae-Chul
    • Journal of Korea Foundry Society
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    • v.23 no.1
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    • pp.40-46
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    • 2003
  • Semisolid forming requires alloys with non-dendritic microstructure of the thixotropy. Recently, low pouring temperture method without stirring, i.e. liquidus casting has been found out new fabrication method of the semisolid metals. Effects of melt superheat and mold conditions on the globulization of primary Al of $AlSi_7Mg$ alloy were investigated in gravity casting process without stirring. The microstructures of primary Al as function of melt superheat and mold temperature show globular, rosette and dendritic shapes. The conditions for globular microstructure of primary Al were low melt superheat < 35 K and low mold temperature < 500 K. The thermal conditions for globular microstructure of primary Al were undercooled melt at early solidification stages and slow cooling < 0.6 K/s. It was found that the initial microstructure was maintained throughout the solidification and the globules of primary Al can be obtained by high nucleation of fine and spherical nuclei due to enhanced undercooling of melt.

First-principles study of the initial-stage oxidation of Si(1110)-(7x7)

  • Lee, Sung-Hoon;Kang, Myung-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.147-147
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    • 2000
  • Chemisorption of oxygen molecules on the Si(111)-(7x7) surface has been studied extensively as a model for the initial-stage oxidation of the surface. The basic step to the surface oxidation is the dissociation of the adsorbed O2 molecules, but the dissociation procedure and the atomic structure of the reaction products still remains as a subject of debates. We present here density-functional theory calculations on the initial-stage oxidation states of the Si adatom site for all possible dissociation configurations that can be generated by multiple O2 reactions. We determine the equilibrium structures and analyze their electronic and vibrational properties in comparison with measured UPS, XPS, and EELS spectra. The O(ad) atom bonded on top of the Si adatom is always less stable than the O(ins) atom inserted into one of the adatom backbonds. Our electronic and vibrational analysis demonstrates further that the O(ad) and O(ins) atoms account well for the metastable and stable features in previous experiments, respectively. Moreover, the calculated decay pathways of the metastable structures and the comparison of the calculated O ls core-level shifts with XPS data provides a convincing argument in unambiguously identifying the experimental metastable and stable structures, thereby making it possible to build a correct atomic-scale picture of the initial-stage oxidation process on this surface.

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ELA Poly-Si과 SLS Poly-Si에서 Boron Activation에 관한 연구

  • Hong, Won-Ui;No, Jae-Sang
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.376-376
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    • 2012
  • 본 연구는 Poly-Si에 이온 주입된 Boron의 Activation 거동을 연구하고자 SLS (Sequential Lateral Solidification) Poly-Si과 ELA (Excimer Laser Annealing) Poly-Si의 활성화 거동을 비교 분석하였다. SLS 및 ELA 결정화 방법으로 제조된 Poly-Si을 모재로 비 질량 분리 방식의 ISD (Ion Shower Doping) System을 사용하여 2.5~7.0 kV까지 이온주입 하였다. 이온주입 후 두 가지의 열처리 방법, 즉, FA 열처리(Furnace Annealing)와 RTA 열처리(Rapid Thermal Annealing)를 사용하여 도펀트 활성화 열처리를 수행하고 이온주입 조건 및 활성화 열처리 방법에 따른 결함 회복 및 도펀트 활성화 거동의 변화를 관찰하였다. TRIM-code Simulation 결과 가속 이온 에너지와 조사량이 증가 할수록 이온주입 시 발생하는 결함의 양이 증가하는 것을 정량적으로 계산하였다. 실험 결과 결함의 양이 증가 할수록 Activation이 잘되는 것을 관찰할 수 있었다. SLS Poly-Si에 비하여 ELA Poly-Si의 경우 도펀트 활성화 열처리 후 활성화 효율이 높게 나타났다. 본 결과는 Grain Boundary의 역할과 밀접한 관계가 있으며 간단한 정성적인 Model을 제시하였다. 활성화 효율의 경우 RTA 열처리 시편이 FA 시편에 비하여 높은 것이 관찰되었다. 본 결과는 열처리 온도 및 시간에 따라 변화하는 Boron의 특이한 활성화 거동인 Reverse Annealing 효과에 기인하는 것으로 규명되었다.

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Low temperature electron mobility property in Si/$Si_{1-x}Ge_{x}$ modulation doped quantum well structure with thermally grown oxide

  • Kim, Jin-Young
    • Journal of Korean Vacuum Science & Technology
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    • v.4 no.1
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    • pp.11-17
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    • 2000
  • The low temperature electron mobilities were investigated in Si/$Si_{1-x}Ge_{x}$ modulation Doped (MOD) quantum well structure with thermally grown oxide. N-type Si/$Si_{1-x}Ge_{x}$ structures were fabricated by a gas source MBE. Thermal oxidation was carried out in a dry $O_2$ atmosphere at $700^{\circ}C$ for 7 hours. Electron mobilities were measured by a Hall effect and a magnetoresistant effect at low temperatures down to 0.4 K. Pronounced Shubnikov-de Haas (SdH) oscillations were observed at a low temperature showing two dimensional electron gases (2 DEG) in a tensile strained Si quantum well. The electron sheet density ($n_{s}$) of 1.5${\times}$$10^{12}$[$cm^{-2}$] and corresponding electron mobility of 14200 [$cm^2$$V^{-1}$$s^{-1}$] were obtained at low temperature of 0.4 K from Si/$Si_{1-x}Ge_{x}$ MOD quantum well structure with thermally grown oxide.

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Electrical characteristics of low-k SiOCH thin film deposited by BTMSM/$O_2$ high flow rates (BTMSM/$O_2$ 고유량으로 증착된 low-k SiOCH 박막의 전기적인 특성)

  • Kim, Min-Seok;Hwang, Chang-Su;Kim, Hong-Bae
    • Journal of the Semiconductor & Display Technology
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    • v.7 no.1
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    • pp.41-45
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    • 2008
  • We studied the electrical characteristics of low-k SiOCR interlayer dielectric(ILD) films fabricated by plasma enhanced chemical vapor deposition (PECVD). The precursor bis-trimethylsilylmethane (BTMSM) was introduced into the reaction chamber with the various flow rates. The absorption intensities of Si-O-$CH_x$, bonding group and Si-$CH_x$, bonding group changed synchronously for the variation of precursor flow rate, but the intensity of Si-O-Si(C) responded asynchronously with the $CH_x$, combined bonds. The SiOCH films revealed ultra low dielectric constant around 2.1(1) and reduced further below 2.0 by heat treatments.

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Inhomogeneous Growth of PtSi Studied by Spatially Resolved Photoelectron Spectroscopy

  • Kumar, Yogesh;Lee, Kyoung-Jae;Yang, Mihyun;Ihm, Kyuwook;Hwang, C.C.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.149.1-149.1
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    • 2013
  • Noble metal silicides are widely used in silicon based microelectronic and optoelectronic devices. Among them, as compared to other silicides, structural and electronic properties of platinum silicide (PtSi) are found to be less sensitive to change in its dimensions. PtSi is known to overcome the junction spiking problems of Al-Si contacts. Present study is regarding the spatial evolution of platinum silicide in Pt/SiOx/Si. Scanning photoelectron emission microscopy (SPEM) was used for this purpose. SPEM images were obtained for pristine samples and after an annealing at $500^{\circ}C$ for 1 hr. Core-level spectra were recorded at different points in SPEM images contrasted by the intensity of Pt 4f7/2. Both Pt 4f and Si 2p spectra reveal the formation of PtSi after annealing. However, in contrast to earlier reports, PtSi formation is found to be non-uniform confirmed by the SPEM images and from the core level spectra taken at different intensity points.

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Growth and Analyses of 3C-SiC(111)Thin Films on Si(111)Substrate Using Rapid Thermal Chemical Vapor Deposition (RTCVD법을 이용한 Si(111)기판 위에 3C-SiC(111) 박막의 성장 및 분석)

  • Seo, Yeong-Hun;Nam, Gi-Seok;Hwang, Yong-Gyu;Seo, Eun-Gyeong;Lee, Hyeong-Jae
    • Korean Journal of Materials Research
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    • v.7 no.6
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    • pp.472-478
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    • 1997
  • TMS(tetramethysilane, Si(CH$_{3}$)$_{4}$)를 이용하여 RTCVD(rapid thermal chemical vapor deposition)장치에서 Si(111) 기판 위에 $\beta$-SiC(111)를 성장시켰다. 실험변수로는 반응온도, TMS유량, 반응시간, H$_{2}$유량을 변화시켰으며, XRD, IR, SEM, RBS, TEM등을 이용하여 성장된 박막을 분석하였다. 성장된 박막은 crystallized Si, C또한 Si-H, C-H결합은 관찰할 수 없었으나 다결정이었다. TMS의 유량이 증가함에 따라, 성장온도가 감소함에 따라서 미려한 박막을 성장시킬 수 있었으며, 반응의 활성화에너지는 20kcal/molㆍK이었다.

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Surface Chemical Properties of Aqueous Kaolinite and Halloysite: Surface Complexation Modeling (수용액 내 캐올리나이트와 할로이사이트의 표면화학 특성: 표면복합반응 모델링)

  • 장세정;김수진
    • Journal of the Mineralogical Society of Korea
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    • v.17 no.2
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    • pp.157-168
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    • 2004
  • The surface chemical properties of aqueous kaolinite and halloysite were studied using a potentiometric titration experiment and a computer program FITEQL3.2. Among the surface complexation models a constant capacitance model was selected for this study. The 2 sites - 3 p $K_{a}$ s model, in which the surfaces were assumed to have tetrahedral and octahedral sites, was reasonable for the description of the experimental data. The surface charges of both minerals were negative above pH of 4. The higher the pH, the lower the proton surface charge densities of both minerals. The ≡ $SiO^{[-10]}$ site played an important role in cation adsorption in acid and neutral pH range; whereas the ≡ Al $O^{[-10]}$ site was in an alkaline pH range. The optimized intrinsic constants of kaolinite, p $K_{a2(Si)}$$^{int}$, p $K_{al(Al)}$$^{int}$ and p $K_{a2(Al)}$$^{int}$ were 4.436, 4.564, and 8.461 respectively, and those of halloysite were 7.852, 3.885, and 7.084, respectively. The total Si and Al surface sites concentrations of kaolinite were 0.215 and 0.148 mM, and those of halloysite were 0.357 and 0.246 mM. The ratio of Si and Al surface site densities ([≡SiOH]:[≡AlOH]) of both minerals was 1 : 0.69. The total surface site density of kaolinite, 3.774 sites/n $m^2$, was 1.6 times larger than that of halloysite, 2.292 sites/n $m^2$./TEX>.

Effect of Si-Wu-Tang and Si-Jun-Zi-Tang on the Survival of Jejunal Crypt Cells and Hematopoietic Cells in Irradiated Mice (방사선조사 마우스에서 소장움세포 및 조혈세포 생존에 미치는 사물탕 및 사군자탕의 영향)

  • Kim, Sung-Ho;Oh, Heon;Lee, Song-Eun;Jo, Sung-Kee;Byun, Myung-Woo
    • Korean Journal of Food Science and Technology
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    • v.30 no.4
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    • pp.888-894
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    • 1998
  • In order to investigate the radioprotective effect of Si-Wu-Tang (Korean name: Sa-Mul-Tang), a kind of traditional Oriental medicine as a blood-building decoction (Oriental medical concept: Bu-Xie), and Si-Jun-Zi-Tang (Korean name: Sa-Gun-Ja-Tang), one of the widely used Oriental herbal medicines as an energy tonic (Chinese medical concept: Bu-Qi). the jejunal crypt survival, endogenous spleen colony formation, and apoptosis in jejunal crypt cells were observed in irradiated mice. Jejunal crypts were protected by Si-Wu-Tang pretreated both per os (2 mg/mL of drinking water for 7 days, p<0.05) and intraperitoneally (1 mg/head, single injection at 24 hours before irradiation). Si-Wu-Tang adminstration before irradiation(1 mg/head, single injection at 24 hours before irradiation) resulted in an increase of the formation of endogenous spleen colony (p<0.005). The frequency of radiation-induced apoptosis in intestinal crypt cells was also reduced by pretreatment of Si-Wu-Tang (p<0.01). However, the radioprotective effect of Si-Jun-Zi-Tang was not as significant as that of Si-Wu-Tang. These results suggest that Si-Wu-Tang may be a useful radioprotective food, especially since it is a relatively nontoxic natural product.

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