• Electrical & Electronic Materials
• /
• v.7 no.5
• /
• pp.389-396
• /
• 1994

The bilayer film of Ag/a-S $e_{75.G}$ $e_{25}$ and the monolayer film of a-S $e_{75.G}$ $e_{25}$ act as a negative-type and a positive-type resist in focused ion beam lithography, respectively. Using a model which takes into account the ion stopping power, the ion projected range, the ion concentration implanted into resists and the ion transmission coefficient, etc., the ion resist parameters are calculated for a broad range of ion energies and implanted doses. Ion sources of A $r^{+}$, S $i^{++}$ and G $a^{+}$ are used to expose resists. As the calculated results, the energy loss per unit distance by Ga'$^{+}$ ion is about 10$^{3}$[keV/.mu.M] and nearly constant for all energy range. Especially, the projected range and struggling for 80[keV] G $a^{+}$ ion energy are 0.0425[.mu.m] and 0.020[.mu.m], , respectively and the resist thickness of a-S $e_{75}$ G $e_{25}$ to minimize the ion penetration rate into a substrate is 0.118[.mu.m].u.m]..u.m].

• Journal of the Korean Society of Food Science and Nutrition
• /
• v.31 no.6
• /
• pp.1163-1166
• /
• 2002

Antimicrobial activity of silver ion was tested against 3 kinds of food-borne microorganisms-Salmonella typhimurium, Staphylococcus aureus and Vibrio parahaemolyticus-using paper disk and broth medium methods. In paper disk method, silver ion showed antimicrobial activity against S. typhimurium and V. parahaemolyticus at the concentration above 2 ppm and 10 ppm, respectively, where as it was not detected in S. aureus with 20 ppm of silver ion concentration. In broth medium, the growth of S. typhimurium and V. Porahaemolyticus could be retarded at 0.3 ppm and 0.5 ppm of silver ion concentration respectively. In the presence of 1.0 ppm of silver ion, the growth of S. typhimurium was inhibited completely. In S. aureus, the growth was retarded at 5 ppm and was inhibited at l5 ppm completely.

• Journal of Radiation Protection and Research
• /
• v.48 no.4
• /
• pp.204-212
• /
• 2023

Background: Isotopes of the projectile may be produced along the beam path during the irradiation of a target by a heavy ion due to inelastic interactions with the media. This study analyzed the production cross-section of carbon (C) and Helium (He) projectile's isotopes resulting from the interactions of these beams with different materials along the beam path. Materials and Methods: In this study, we transport C and He ion beams through different materials. This transportation was made by the Monte Carlo simulation. Particle and Heavy Ion Transport code System (PHITS) has been used for this calculation. Results and Discussion: It has been found that ¹⁰C, ¹¹C, and ¹³C from the ¹²C ion beam and ³He from the ⁴He ion beam are significant projectile's isotopes that have higher flux than other isotopes of these projectiles. The ⁴He ion beam has a higher projectile's isotope production cross-section along the beam path, which adds more impurities to the beam than the ¹²C ion beam. These projectile's isotopes from both the ¹²C and ⁴He ion beams have higher production cross-sections in hydrogenous materials like water or polyethylene. Conclusion: It is important to distinguish these projectile's isotopes from the primary beam particles to obtain a precise and accurate cross-section result by minimizing the error during measurement with a nuclear track detector. This study will show the trend of the production probability of projectile's isotopes for these ion beams.

• Journal of Astronomy and Space Sciences
• /
• v.11 no.2
• /
• pp.250-272
• /
• 1994

Various plasma instabilities driven by the ion beams have been proposed in order to explain the broadband electrostatic noise (BEN) in the earth's geomagnetic tail. Ion acoustic, ion-ion two stream, and electron acoustic instabilities have been proposed. Here we consider a theoretical investigation of the generation of BEN by cold streaming ion beams in the earth's magnetotail. Linear theory analysis and particle simulation studies for the plasma sheet, which consists of warm electrons and ions as well as cold streaming ion beams, have been done. Both beam-ion acoustic and ion-ion two stream instabilities easily occur when the beam and warm electron temperature ratio, $T_b/T_e$ is small enough. The numerical simulation results confirm the existence of broadband electrostatic noise whose frequency is ranged from $\omega$=0 to $\omega$$\omega_{pe}$.

• Proceedings of the Korean Vacuum Society Conference
• /
• 1998.02a
• /
• pp.20-20
• /
• 1998

I Ion beam technology has recently attracted much interest because it has exciting t technological p아:ential for surface analysis, ion beam mixing, surface cleaning and etching i in thin film growth and semiconductor fabrication processes, etc. Es야~cially, ion beam s sputtering has been widely used for sputter depth profiling with x-photoelectron S spectroscopy (XPS) , Auger electron s$\pi$~troscopy(AES), and secondary-ion mass S야i따oscopy(SIMS). However, The problem of surface compositional ch없1ge due to ion b bombardment remains to be understo여 없ld solved. So far sputtering processes have been s studied by s따face an외ysis tools such as XPS, AES, and SIMS which use the sputtering p process again. It would be improbable to measure the modified surface composition profiles a accurately due to ion beam bombardment with surface analysis techniques based on sputter d depth profiling. However, recently Medium energy ion scattering spectroscopy(MEIS) has b been applied to study the sputtering of solid surface at ion bombardment and has been p proved that it has been extremely valuable in probing the surface composition 뻐d s structure nondestructively and quantita디vely with less than 1.0 nm depth resolution. To u understand the sputtering processes of solid surface at ion bombardment, The Molecular D Dynamics(MD) and Monte Carlo(MC) simulation has been used and give an intimate i insight into the sputtering processes of solid surfaces. In this presentation, the sputtering processes of alloys and compound samples at ion b bombardment will be reviewed and the MEIS results for the Ar+ sputter induced altered l layer of the TazOs thin film 뻐dd없nage profiling of Ar+ ion sputt얹"ed Si(100) surface will b be discussed with the results of MD and MC simulation.tion.

• Journal of the Korean Vacuum Society
• /
• v.6 no.S1
• /
• pp.110-114
• /
• 1997

Development of metal ion source growth of high quality Cu metal film formation of non-stoichiometric $SnO_2$ films of Si(100), and modification fo polymer surface by low enregy ion beam have been carried out at KIST Ion Beam Lab. A new metal ion source with high ion beam flux has been developed by a hybrid ion beam (HIB) deposition and non-stoichiometric $SnO_2$ films are controlled by supplying energy. The ion assisted reaction (IAR) in which keV ion beam is irradiated in reactive gas environment has been deveolped for modifying the polymers and enhancing adhesion to other materials and advantages of the IAR have been reviewed.

• Journal of Biomedical Engineering Research
• /
• v.17 no.1
• /
• pp.11-18
• /
• 1996

The toxic metal ion release behaviour and the cytotoxicity of a super stainless steel (S.S.S, 22cr-20Ni -6Mo-0.25N) were investigated The measurement of the amount of static and wear- induced trace metal ion released from the steels was conducted in Hank's balanced salt solution using an electrothermal atomic absdrption spectrometry equiped with Uaphite furnace. And the in vitro cytotoxicity of the materials was assesed in cell culture. The static dissolution rates of Fe and Cr ions from the S.S.S were significantly lower than those of 316L SS. However, the Ni ion release from the S.S.S during the first 4 weeks was yester than that from 316L 55 by 15-45%. Also, the wear-in- duces dissolution rates from the steels were not correlated either with their elemental composition rates or with the static metal ion release rates. The S.S.S did not deteriorate the osteoblasts viability. And no toxic response was observed from the macrophages cultured for 7 days in RFMI 1640 medium immersed with the S.S.S specimens.

• Proceedings of the Korean Radioactive Waste Society Conference
• /
• 2004.02a
• /
• pp.1-11
• /
• 2004

PAN-4A composite ion exchanger was more selective for Sr ion than other cations and PAN-KCoFC composite ion exchanger has much higher ion exchange capacity for Cs ion than other cations. The ion exchange capacities obtained from Dubinin-Polanyi equation were 3.93 meq/g for Sr ion and 1.50 meq/g for Cs ion using PAN-4A and PAN-KCoFC ion exchangers, respectively. The modified Dubinin-Polanyi model fit the experimental data accurately in multi-component system. The effective surface diffusivities $(D_{s, cff})$ for Sr and Cs ions of PAN-4A and PAN-KCoFC ion exchangers were slightly increased with the different particle sizes.

• Applied Science and Convergence Technology
• /
• v.25 no.6
• /
• pp.128-132
• /
• 2016

We investigated the effect of Ar ion sputtering on the surface electronic structure of indium tin oxide (ITO) using X-ray and ultraviolet photoelectron spectroscopy (XPS and UPS) measurements with increasing Ar ion sputtering time. XPS measurements revealed that surface contamination on ITO was rapidly removed by Ar ion sputtering for 10 s. UPS measurements showed that the work function of ITO increased by 0.2 eV after Ar ion sputtering for 10 s. This increase in work function was attributed to the removal of surface contamination, which formed a positive interface dipole relative to the ITO substrate. However, further Ar ion sputtering did not change the work function of ITO although the surface stoichiometry of ITO did change. Therefore, removing the surface contamination is critical for increasing the work function of ITO, and Ar ion sputtering for a short time (about 10 s) can efficiently remove surface contamination.

• Applied Science and Convergence Technology
• /
• v.25 no.6
• /
• pp.108-115
• /
• 2016

Even if ion pumps are widely and mostly used in ultra-high vacuum (UHV) conditions, virtually every existing ion pump has its maximum pumping speed around 1E-6 mbar (1E-4 Pa). Discharge intensity in the ion pump Penning cell is defined as the current divided by pressure (I/P). This quantity reflects the rate of cathode bombardment by ions, which underlies all of the various pumping mechanisms that occur in ion pumps (chemisorption on sputtered material, ion burial, etc.), and therefore is an indication of pumping speed. A study has been performed to evaluate the influence of magnetic fields and cell dimensions on the ion pump discharge intensity and consequently on the pumping speed at different pressures. As a result, a combination of parameters has been developed in order to design and build an ion pump with the pumping speed peak shifted towards lower pressures. Experimental results with several different test set-ups are presented and a prototype of a new 200 l/s ion pump with the maximum pumping speed in the 1E-8 mbar (1E-6 Pa) is described. A model of the system has also been developed to provide a framework for understanding the experimental observations.