• 대한화학회지
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• 제50권5호
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• pp.355-361
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• 2006

순수 물 및 n-부탄올 수용액(0.1M, 0.2M, 0.3M)에서 음이온 계면활성제인 sodium dodecyl benzenesulfonate(DBS)와 비이온 계면활성제인 dodecyl polyoxyethylene(23) lauryl ether(Brij 35)의 혼합계면활성제의 임계미셀농도(CMC)와 반대이온의 결합상수값(B)을 DBS의 겉보기 몰분율(1)의 함수로서 전도도법과 표면장력계법으로 측정하였다. 이와 같이 측정한 CMC값에 비이상적 혼합미셀화모델을 적용함으로써 여러 가지 열역학적 함수값(Xi, i, Ci, aiM, 및 Hmix)들을 계산하고 분석하였다. 그리고 DBS/Brij 35 혼합계면활성제의 미셀화에 미치는 n-부탄올의 농도에 따른 열역학 함수값들의 변화를 측정하고 분석하였다.

• 대한화학회지
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• 제41권1호
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• pp.12-17
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• 1997

순수 물 및 n-부탄올 수용액에서 Sodium dodecylsulfate(SDS)와 Sodium dodecylbenzenesulfonate(DBS)의 혼합계면활성제가 나타나는 임계미셀농도(CMC*) 및 반대이온들의 결합상수값(B)을 25℃에서 전도도법으로 측정하였다. 이들 CMC* 및 B값들의 α1(SDS의 전체 몰분율조성)에 따른 변화로부터 비이상적 혼합 미셀모델을 적용함으로써 여러가지 열역학적 함수값들(Xi, γi, Ci, aiM, β, ΔHmix 및 ΔGm0)을 계산하였으며, 또한 SDS/DBS혼합계면활성제의 미셀화에 미치는 n-부탄올의 효과를 조사하기 위하여 n-부탄올의 농도(0.1 M, 0.2 M 및 0.3 M)에 따른 이들 열역학함수값들의 변화를 측정하여 순수 물에서의 값들과 서로 비교함으로써 분석하였다.

• 대한화학회지
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• 제53권5호
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• pp.491-498
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• 2009

25 ${^{\circ}C}$의 순수 물 및 n-부탄올 수용액에서 음이온성 계면활성제인 DBS (sodium dodecylbenzenesulfonate)와 비이온성 계면활성제인 Brij 30 (polyoxyethylene(4) lauryl ether)과 Brij 35 (polyoxyethylene(23)lauryl ether)의 혼합미셀화에 대한 임계미셀농도(CMC)와 반대이온의 결합상수값(B)을 DBS의 겉보기몰분율($\alpha$1)의 함수로서 전도도법으로 측정하였다. 이와 같이 측정한 CMC값에 비이상적 혼합미셀화모델을 적용함으로써 여러 가지 열역학적 함수값(Xi, $\gamma$i, Ci, aiM, $\beta$ 및 ${\Delta}H_{mix}$)들을 계산하여 상호 비교분석하였다. 그 결과, DBS는 Brij 30보다는 Brij 35와 더욱 강한 결합을 이루었으며 이상적 혼합미셀화로부터 더욱 큰 음의 벗어남을 보였다.

• 한국압력기기공학회 논문집
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• 제11권1호
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• pp.20-24
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• 2015

Steam generator(S/G) tubes in pressurized water reactor (PWR's) are subject to several types of degradation. This degradation includes denting, pitting, intergranular attack(IGA), intergranular stress corrosion cracking(IGSCC), fatigue, fretting and wear. Degradation can be derived from either the primary side(inside) or the secondary side(outside) of the tube. Recent issue for tube degradation in domestic steam generator is the tube end cracking on seal weld region. The seal weld region at the tube end and tube itself is regarded as a pressure boundary between the primary side and the secondary side. One of the Westinghouse Model-F S/G has experienced tube end cracking and its number of plugging approximately becomes to the operating limit up to 5% due to tube end cracking which was reported as SAI/MAI(single/multiple axial indication) or SCI/MCI(Single/multiple circumferential indication) from the results of eddy current testing. Eddy current mock-up test was carried out to determine the origin of cracking whether it is from weld zone area or parent tube. This result was helpful to analyze crack location on ECT data. Correct action on this problem was the installation of tube-end sleeve. Last year, after removing 340 installed plugs from tubes, selected 269 tubes took tube-end sleeve installation. Tube-end sleeve brought pressure boundary from parent tube to installed sleeve tube. Tube-end sleeve has the benefit of reducing outage period and increasing more revenue than replacing S/G. This paper is provided to assist interest parties in effectively understanding this issue.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2000년도 Proceedings of 5th International Joint Symposium on Microeletronics and Packaging
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• pp.118-118
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• 2000

New single-source precursor, [AlCI3:NH2tBu] was synthesized for AlN thin f film processing with AICI3 (Aluminum Chloride) and tBuNH2 (tert-butylamine). AlN thin films for packaging aspplication were deposited on sapphire substrate by a atmosph하ie-pressure MOCVD. In most of other study methyl-based AI precursors w were used for source, But herein Aluminum Chloride was used for as AI source i in order to prevent the carbon contamination in the films and stabilize the p precursor. New precursor showed the very high gas vapor pressure so it allowed to m make the film under atmospheric-pressure and get the high purified film. High q quality AlN thin film was obtained at 700 to $900^{\circ}C$. The new precursor was p purified by a sublimation technique and help to fabricate high purity film. It s showed high vapor pressure, which is able to a critieal factor for the high purity a and atmospheric CVD of AlN. High Quality AIN thin film was obtained at $700-900^{\circ}C$. The AIN film was characterized by RBS

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2001년도 추계학술발표회 초록집
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• pp.67-67
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• 2001

The structure zone model has been used to provide an overview of the relationship between the microstructure of the films deposited by PVD and the most prominent deposition condition.s. B.AMovchan and AV.Demchishin have proposed it firstls such model. They concluded that the general features of the resulting structures could be correlated into three zones depending on $T/T_m$. Here T m is the melting point of the coating material and T is the substrate temperature in kelvines. Zone 1 ($T/Tm_) is dominated by tapered macrograins with domed tops, zone 2 ($O.3) by columnar grains with denser boundaries and zone 3 ($T/T_m>O.5$) by equiaxed grains formed by recrystallization. J.AThomton has extended this model to include the effect of the sputtering gas pressure and found a fourth zone termed zone T(transition zone) consisting of a dense array of poorly defined fibrous grains. R.Messier found that the zone I-T boundary (fourth zone of Thorton) varies in a fashion similar to the film bias potential as a function of gas pressure. However, there has not nearly enough model for explaining the change in morphology with crystal orientation of the films. The structure zone model only provide an information about the morphology of the deposited film. In general, the nucleation and growth mechanism for granular and fine structure of the deposited films are very complex in an PVD technique because the morphology and orientation depend not only on the substrate temperature but also on the energy of deposition of the atoms or ions, the kinetic mechanism between metal atoms and argon or nitrogen gas, and even on the presence of impurities. In order to clarify these relationship, AI and Mg thin films were prepared on SPCC steel substrates by PVD techniques. The influence of gas pressures and bias voltages on their crystal orientation and morphology of the prepared films were investigated by SEM and XRD, respectively. And the effect of crystal orientation and morphology of the prepared films on corrosion resistance was estimated by measuring polarization curves in 3% NaCI solution.

• 한국산림과학회지
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• 제52권1호
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• pp.58-71
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• 1981

충남(忠南) 전북지방(全北地方) 적송림(赤松林)의 천이과정(遷移過程)을 연구(研究)하기 위하여 솔잎혹파리의 피해지속기간(被害持續期間)에 따라 피해극기지(被害極基地) (5년전(年前)에 피해발생(被害発生))인 공주(公州)(A), 피해지속지(被害持續地)(10년전(年前)에 피해발생(被害発生))인 부여(扶餘)(B), 피해회복지(被害回復地)(20년전(年前)에 피해발생(被害発生))로서 고창지역(高敞地域)(C)을 조사지역(調査地域)으로 설정(設定)하고, 각(各) 조사지역별(調査地域別)로 환경요인(環境要因)과 식생상태(植生狀態)를 調査하여, 환경요인(環境要因)과 식생상태(植生狀態), 삼림군집(森林群集)의 비교(比較), 식물상(植物相)의 변화(変化) 등(等)을 분석(分析)한 결과(結果)를 요약(要約)하면 다음과 같다 1. 임분(林分)이 솔잎혹파리피해(被害)로 부터 회복(回復)되어 감에 따라 식생구성(植生構成)에 변화(変化)가 오고 대상수종(代償樹種)으로 발달(発達)된 참나무류(類)의 상대우점치(相対優点値)가 감소(減小)되었다. 그러나 본(本) 조사지역내(調査地域內)에서는 상수리나무의 상대우점치(相対優点値)가 다른 참나무류(類) 보다 높았다. 2. 솔잎혹파리피해(被害)가 지속(持續)됨에 따라 삼림군집(森林群集)의 종구성상태(種構成狀態)가 점차 다양(多樣)하여진다. 그후 피해(被害)가 회복(回復)됨에 따라 임분(林分)의 종구성상태(種構成狀態)는 단순화(单純化)되는 것으로 나타났다. 3. 상대밀도(相対密度) 및 상대우점치(相対優点値)의 상대치(相対値)에 의(依)한 식생천이(植生遷移)를 종합분석(綜合分析)한 결과(結果) 솔잎혹파리피해(被害)의 극심(極甚)에서 우점종(優点種)을 이루던 참나무류(類)가 피해(被害)로부터 회복(回復)되어감에 따라 그 값이 감소(減少)되고, 싸리류(類), 진달래류(類) 등(等)이 하층식생(下層植生)을 형성(形成)하는 삼림군집(森林群集)으로 변화(変化)하여 갔다. 4. 식생(植生)에 미친 토심(土深), 토양함수량(土壤含水量), 유기물함량(有機物含量), 그리고 유기물층(有機物層)의 두께는 본(本) 조사대상지(調査対象地)의 범위내에 있어서는 거의 같은 것으로 사료(思料)되었고 연평균강수량(年平均降水量)과 온도(温度)도 유사(類似)하였다고 본다.