• 대한금속재료학회지
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• 제47권6호
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• pp.349-355
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• 2009

In the solvent extraction of Ru(IV) with Alamine336, it was found that Ru took part in the reaction as $RuCl_{6}_^{2-}$ in the HCl concentration range of 1 to 5 M. Interaction parameter between hydrogen ion and $RuCl_{6}_^{2-}$ was estimated by applying Bromley equation to the extraction data. From the mixed solutions of Pd(II) and Ru(IV), the distribution coefficients of Pd were found to be higher than those of Ru in the experimental ranges. Separation factor between Pd and Ru rapidly increased with the decrease of Alamine336 concentration. About 60% of the Ru from the mixed solutions was extracted by TBP at 8.3 M HCl, while Pd was not extracted in the HCl concentration range of 1.6 to 8.3 M.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.209.1-209.1
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• 2014

수산화인회석(Hydroxyapatite)는 뼈와 이빨의 무기물의 주성분으로서 칼슘과 인산염으로 구성된다. 본 실험에서는 다양한 농도의 염기조건(NaOH 0,2,4,5,10 M)하에서 서로 다른 형태의 수산화인회석을 수열합성법(hydrothermal method)을 이용해 합성하였다. 합성된 각각의 수산화인회석을 XRD로 확인하였고 일정 농도 이하에서는 octacalcium phosphate이 함께 존재한다는 것을 확인하였다. 수산화인회석 표면에 Ru를 Ion-exchange 반응을 통하여 도입하였으며, 도입된 표면을 TEM을 확인하였다. Ru를 도입한 수산화인회석을 benzyl alcohol과 benzyl amine을 산화반응에 응용하였다.

• 대한화학회지
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• 제36권2호
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• pp.248-254
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• 1992

에탄올 용매 중에서, 착물 $[({\eta}^5-C_5Me_5)RuCl_2]_2$ (1)에 대하여 과량의 포스핀을 반응시켜 비스(포스핀)루테늄 유도체$({\eta}^5-C_5Me_5)Ru(PR_3)_2Cl(PR_3=PMe_3,\; PMe_2Ph,\;PEt_3,\;PMePh_2$, 1/2DPPE, 1/2DPPB) (2a${\sim}$2f)를 합성하였다. 이 유도체들은 에탄올 용매 중에서 $NaBH_4$와 반응하여 상응하는 황색의 착수소화물 $({\eta}^5-C_5Me_5)Ru(PR_3)_2Hl(PR_3=PMe_3,\;PEt_3,\;PMePh_2$, 1/2 DPPE, 1/2DPPB) (3a${\sim}$3e)을 생성한다. 착염화물 (2a${\sim}$2f)와 착수소화물 (3a∼3e)는 모두 결정으로 얻어졌으며, IR, $^1H-NMR$ 그리고 원소분석으로 동정되었다.

• E2M - 전기 전자와 첨단 소재
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• 제28권2호
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• pp.25-33
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• 2015

Ruthenium (Ru) thin films were grown on thermally-grown $SiO_2$ substrates by atomic layer deposition (ALD) using a sequential supply of four kinds of novel zero-valent Ru precursors, isopropyl-methylbenzene-cyclohexadiene Ru(0) (IMBCHDRu, $C_{16}H_{22}Ru$), ethylbenzen-cyclohexadiene Ru(0) (EBCHDRu, $C_{14}H_{18}Ru$), ethylbenzen-ethyl-cyclohexadiene Ru(0) (EBECHDRu, $C_{16}H_{22}Ru$), and (ethylbenzene)(1,3-butadiene)Ru(0) (EBBDRu, $C_{12}H_{16}Ru$) and molecular oxygen (O2) as a reactant at substrate temperatures ranging from 140 to $350^{\circ}C$. It was shown that little incubation cycles were observed for ALD-Ru processes using these new novel zero-valent Ru precursors, indicating of the improved nucleation as compared to the use of typical higher-valent Ru precursors such as cyclopentadienyl-based Ru (II) or ${\beta}$-diketonate Ru (III) metallorganic precursors. It was also shown that Ru nuclei were formed after very short cycles (only 3 ALD cycles) and the maximum nuclei densities were almost 2 order of magnitude higher than that obtained using higher-valent Ru precursors. The step coverage of ALD-Ru was excellent, around 100% at on a hole-type contact with an ultra-high aspect ratio (~32) and ultra-small trench with an aspect ratio of ~ 4.5 (top-opening diameter: ~ 25 nm). The developed ALD-Ru film was successfully used as a seed layer for Cu electroplating.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.1296-1299
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• 2004

MIM capacitor has been investigated for the next generation DRAM. Conventional poly-Si bottom electrode cannot satisfy the requirement of electrical properties and comparability to the high k materials. New bottom electrode material such as ruthenium has been suggested in the fabrication of MIM structure capacitor. However, the ruthenium has to be planarized due to the backend scalability. For the planarization CMP has been widely used in the manufacture of integrated circuit. In this research, ruthenium thin film was Polished by CMP with cerium ammonium nitrate (CAN)base slurry. HNO3 was added on the CAN solution as an additive. In the various concentration of chemical and alumina abrasive, ruthenium surface was etched and polished. After static etching and polishing, etching and removal rate was investigated. Also microroughness of surface was observed by AFM. The etching and removal rate depended on the concentration of CAN, and HNO3 accelerated the etching and polishing of ruthenium. The reasonable removal rate and microroughness of surface was achieved in the 1wt% alumina slurry.

• 공업화학
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• 제21권1호
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• pp.81-86
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• 2010

실리카 지지 루테늄과 철의 합금($Ru/Fe-SiO_2$) 시료에 일산화탄소(CO)를 흡착시켰을 때 Ru/Fe의 몰비 9/1 이상에서 다섯 적외선 흡수띠($2138.7{\sim}2142.5cm^{-1}$, $2067.3{\sim}2073.1cm^{-1}$, $1976.7{\sim}2017.2cm^{-1}$, $1737.9{\sim}1799.3cm^{-1}$, $1625.7cm^{-1}$)를 관찰했고, Ru/Fe의 몰비 8/2 이하에서 두 적외선 흡수띠($1934.0{\sim}1990.2cm^{-1}$, $1625.7cm^{-1}$)를 관찰했다. $2138.7{\sim}2142.5cm^{-1}$ 흡수띠, $2067.3{\sim}2073.1cm^{-1}$ 흡수띠, $1976.7{\sim}2017.2cm^{-1}$흡수띠는 Ru/Fe 뭉치 표면의 Ru 원자에 선형결합한 CO의 신축진동에 의한 것으로, $1774.2{\sim}1799.3cm^{-1}$ 흡수띠는 Ru/Fe 뭉치 표면의 Ru 원자와 다리결합하거나 높은 지수 평면에 있는 Ru 원자에 결합한 CO의 신축진동에 의한 것으로, $1934.0{\sim}1990.2cm^{-1}$ 흡수띠는 Ru/Fe 뭉치 표면의 Fe 원자에 선형결합한 CO의 신축진동에 의한 것으로 제시할 수 있다. $Ru/Fe-SiO_2$에서 CO를 흡착시켰을 때 Ru/Fe 몰비가 8/2 이하에서 증가할 때 CO가 Fe에 선형결합하여 생긴 $1934.0{\sim}1990.2cm^{-1}$ 흡수띠의 흡광도가 증가하였는데, 이 현상은 Ru/Fe 몰비가 8/2 이하에서 증가할 때 Ru/Fe 뭉치 표면에서 시료의 함량과 비교하여 Fe 농도가 증가했고 $Fe-SiO_2$ 시료와 비교하여 표면적이 Ru/Fe 몰비의 증가에 따라 점차 증가했기 때문으로 설명할 수 있다.

• 한국전기전자재료학회논문지
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• 제17권6호
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• pp.602-607
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• 2004

This paper describes the characteristics of Ru-Zr alloy gate electrodes deposited by co-sputtering. The various atomic composition was made possible by controlling sputtering power of Ru and Zr. Thermal stability was examined through 600 and 700 $^{\circ}C$ RTA annealing. Variation of oxide thickness and X-ray diffraction(XRD) pattern after annealing were employed to determine the reaction at interface. Low and relatively stable sheet resistances were observed for Ru-Zr alloy after annealing. Electrical properties of alloy film were measured from MOS capacitor and specific atomic composition of Zr and Ru was found to yield compatible work function for nMOS. Ru-Zr alloy was stable up to $700^{\circ}C$ while maintaining appropriate work function and oxide thickness.

• Bulletin of the Korean Chemical Society
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• 제16권7호
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• pp.619-624
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• 1995

Oxidation of triphenylphosphine to triphenylphosphine oxide by [(tpy)(bpy)Ru(O)]2+ (tpy is 2,2':6',2"-terpyridine and bpy is 2,2'-bipyridine) in CH3CN has been studied. Experiments with the 18O-labeled oxo complex show that transfer of oxygen from [(tpy)(bpy)RuⅣ=O]2+ to triphenylphosphine is quantitative within experimental error. The reaction is first order in each reactant with k (25.3 ℃)=1.25 × 106 M-1s-1. The inital product, [(tpy)(bpy)RuⅡ-OPPh3]2+, is formed as an observable intermediate and undergoes slow k (25 ℃)=6.7 × 10-5 s-1 solvolysis. Activation parameters for the oxidation step are ΔH≠=3.5 kcal/mol and ΔS≠=-23 eu. The geometry at ruthenium in the complex cation, [(tpy)(bpy)RuⅡ(OH2)]2+, is approximately octahedral with the ligating atoms being the three N atoms of the tpy ligand, the two N atoms of the bpy ligand, and the oxygen atom of the aqua ligand. The Ru-O bond length is 2.136(5) Å.

• Bulletin of the Korean Chemical Society
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• 제34권2호
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• pp.367-373
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• 2013

The ruthenium(II) ferrocenyl heterocyclic thiosemicarbazone complexes of the type $[RuCl(CO)(EPh_3)]_2L$ (where E = P/As; L = binucleating monobasic tridendate thiosemicarbazone ligand) have been investigated. Strutural features were determined by analytical and spectral techniques. Binding of these complexes with CT-DNA by absorption spectral study indicates that the ruthenium(II) complexes form adducts with DNA and has intrinsic binding constant in the range of $3.3{\times}10^4-1.2{\times}10^5M^{-1}$. The complexes exhibit a remarkable DNA cleavage activity with CT-DNA in the presence of hydrogen oxide and the cleavage activity depends on dosage.

• Bulletin of the Korean Chemical Society
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• 제11권6호
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• pp.552-557
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• 1990

Luminescence quenching reactions of photoexcited tris(2,2'-bipyridine)ruthenium (Ⅱ) complex cation, $Ru(bpy)_3\;^{2+}$, by dialkylviologens (dimethyl, dioctyl, dibenzyl, methyloctyl, methyldodecyl, and methylbenzyl) were studied in sodium dodecylsulfate (SDS), poly(styrenesulfonate) (PSS), and poly(vinylsulfonate) (PVS) solutions. The relative quenching rate varies widely with the microheterogeneous media employed: the highest quenching rate is observed for methyldodecylviologen in homogeneous aqueous medium, dibenzylviologen in SDS and PVS solutions, and dimethylviologen in PSS solution; the lowest rate is found for dimethylviologen in homogeneous medium and SDS solution, methyldodecylviologen in PSS and PVS solutions. These results were interpreted in terms of reduction potential of viologens, affinity of $Ru(bpy)_3\;^{2+}$ and viologens to the microparticles, and the structures of the viologen-colloid complexes.