• Title/Summary/Keyword: Repetition pulse

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Starting Current Application for Magnetic Stimulation

  • Choi, Sun-Seob;Bo, Gak-Hwang;Kim, Whi-Young
    • Journal of Magnetics
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    • v.16 no.1
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    • pp.51-57
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    • 2011
  • A power supply for magnetic-stimulation devices was designed via a control algorithm that involved a start current application based on a resonant converter. In this study, a new power supply for magnetic-stimulation devices was designed by controlling the pulse repetition frequency and pulse width. The power density could be controlled using the start-current-compensation and ZCS (zero-current switching) resonant converter. The results revealed a high-repetition-frequency, high-power magnetic-stimulation device. It was found that the stimulation coil current pulse width and that pulse repetition frequency could be controlled within the range of 200-450 ${\mu}S$ and 200-900 pps, respectively. The magnetic-stimulation device in this study consisted of a stimulation coil device and a power supply system. The maximum power of the stimulation coil from one discharge was 130 W, which was increased to 260 W using an additional reciprocating discharge. The output voltage was kept stable in a sinusoidal waveform regardless of the load fluctuations by forming voltage and current control using a deadbeat controller without increasing the current rating at the starting time. This paper describes this magnetic-stimulation device to which the start current was applied.

Passively Q-switched Erbium Doped All-fiber Laser with High Pulse Energy Based on Evanescent Field Interaction with Single-walled Carbon Nanotube Saturable Absorber

  • Jeong, Hwanseong;Yeom, Dong-Il
    • Current Optics and Photonics
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    • v.1 no.3
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    • pp.203-206
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    • 2017
  • We report a passive Q-switching of an all-fiber erbium-doped fiber laser delivering high pulse energy by using a high quality single-walled carbon nanotube saturable absorber (SWCNT-SA). A side-polished fiber coated with the SWCNT is employed as an in-line SA for evanescent wave interaction between the incident light and the SWCNT. This lateral interaction scheme enables a stable Q-switched fiber laser that generates high pulse energy. The central wavelength of the Q-switched pulse laser was measured as 1560 nm. A repetition rate frequency of the Q-switched laser is controlled from 78 kHz to 190 kHz by adjusting the applied pump power from 124 mW to 790 mW. The variation of pulse energy from 51 nJ to 270 nJ is also observed as increasing the pump power. The pulse energy of 270 nJ achieved at maximum pump power is 3 times larger than those reported in Q-switched all-fiber lasers using a SWCNT-SA. The tunable behaviors in pulse duration, pulse repetition rate, and pulse energy as a function of pump power are reported, and are well matched with theoretical expectation.

Study on low-k wafer engraving processes by using UV pico-second laser (Low-k 웨이퍼 레이저 인그레이빙 특성에 관한 연구)

  • Nam, Gi-Jung;Moon, Seong-Wook;Hong, Yoon-Seok;Bae, Han-Seong;Kwak, No-Heung
    • Proceedings of the Korean Society of Laser Processing Conference
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    • 2006.11a
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    • pp.128-132
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    • 2006
  • Low-k wafer engraving process has been investigated by using UV pico-second laser with high repetition rate. Wavelength and repetition rate of laser used in this study are 355nm and 80MHz, respectively. Main parameters of low-k wafer engraving processes are laser power, work speed, assist gas flow rate, and protective coating to eliminate debris. Results show that engraving qualities of low-k layer by using UV pico-second pulse width and high repetition rate had better kerf edge and higher work speed, compared to one by conventional laser with nano-second pulse width and low repetition rate in the range of kHz. Assist gas and protective coating to eliminate debris gave effects on the quality of engraving edge. Total engraving width and depth are obtained less than $20{\mu}m$ and $10{\mu}m$ at more than 500mm/sec work speed, respectively. We believe that engraving method by using UV pico-second laser with high repetition rate is useful one to give high work speed of laser material process.

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Independent PRF Generation and Control for Frequency Phase Calibration on Mono-pulse Radar at a Remote Location (원격지에서 모노펄스 레이더의 주파수 위상 교정을 위한 독립된 펄스반복주파수 생성 및 제어)

  • Yang, Jaewon;Yoo, Seungoh;Yoon, Jaehyuk;Lee, Dongju
    • Journal of the Korea Institute of Military Science and Technology
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    • v.24 no.4
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    • pp.368-373
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    • 2021
  • This paper presents a method of independent pulse repetition frequency(PRF) generation and control for frequency phase calibration on mono-pulse radar at a remote location. In order to generate an independent PRF signal of 320[Hz], pulse width modulation(PWM) of 16-bit timer/counter was applied. For a precision control of PRF signal, 16-bit timer/counter interrupt was changed for each period. Therefore, average frequency of PRF could be controlled by 0.0001[Hz]. To calibrate a frequency phase of mono-pulse radar at a remote location, the proposed PRF generator with a precision control of frequency was used regardless of receiving PRF signal from a radar. For the verification of the proposed PRF generator, theoretical analysis and experimental results are included.

Marx Generator Implementation Using IGBT Stack (IGBT 스택을 이용한 Marx Generator 구현)

  • Kim, J.H.;Min, B.D.;Kim, J.S.;Rim, G.H.
    • Proceedings of the KIPE Conference
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    • 2005.07a
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    • pp.507-510
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    • 2005
  • High voltage pulse power supply using Marx generator and solid-state switches is proposed in this study. The Marx generator is composed of 12 stages and each stage is made of IGBT stack, two diode stacks, and capacitor. To charge the capacitors of each stage in parallel, inductive charging method is used and this method results in high efficiency and high repetition rates. It can generate the pulse voltage with the following parameters: Voltage: up to 120kv Rising time: sub ${\mu}S$ Pulse width: up to $10{\mu}S$, Pulse repetition rate: 1000pps The proposed pulsed power generator uses IGBT stack with a simple driver and has modular design. So this system structure gives compactness and easiness to implement total system. Some experimental results are included to verify the system performances in this paper.

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Output Characteristics of a Flashlamp pumped Nd:YAG Lasers at 1.444 nm (플래시 램프로 펌핑한 Nd:YAG 레이저의 $1.444{\mu}m$ 출력 특성)

  • Lee, Hee-Chul;Kim, Gyu-Ug;Kim, Dong-Hyun;Gong, Sung-Hwan;Kim, Yong-Pyung
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.55 no.12
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    • pp.606-610
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    • 2006
  • We investigated the output characteristics of Nd:YAG lasers at wavelength of 1444 nm, which were pumped by 450 Xe-flashlamp, 700 torr Xe-flashlamp and 700 torr Kr-flashlamp. With a Xe-flashlamp of 700 torr of gas pressure, the pulse energy of 0.738 J was obtained with repetition rate of 9.16 Hz and pumping pulse width of 400 ms. In case pumping pulse width of 5 ms and repetition rate of 1 Hz, 700 torr Kr-flashlamp showed the highest pulse energy of 1.44 J.

High Voltage Nano-Pulse Generator for Industrial Waste Water Treatment (폐수 처리용 고전압 나노 펄스 발생기)

  • Jang, Sung-Duck;Son, Yoon-Gyu;Oh, Jong-Seok;Kwon, O-Jung
    • Journal of the Korean Society of Industry Convergence
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    • v.4 no.3
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    • pp.311-318
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    • 2001
  • The application of a pulsed power system is being extended to a environmental and industrial fields. The non-dissolution waste water pollutants from industrial plants can be processed by applying high voltage pulses with a fast rising time (a few nanoseconds) and short duration (nano to microseconds) in a pulsed corona discharge reactor. The nano-pulse generator with a magnetic switch has been developed. Its corona current in load can be adjusted by pulse width and repetition rate. we investigated the performance of the nano-pulse generator using the dummy load which is composed of resistor and capacitor equivalent to the actual reactor. This paper descibes the electrical characteristics of the nano-pulse generator that produces a 300 ns pulse at maximum repetition rate of 400 pps with a voltage of 40 kV across a $640{\Omega}$ load. In this paper we briefly discuss a configuration of system and test results.

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Development of a High Voltage Pulse Power Supply with Battery Source (밧데리 전원을 이용한 고압 펄스 전원 장치 개발)

  • 강유리
    • Proceedings of the KIPE Conference
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    • 2000.07a
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    • pp.95-97
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    • 2000
  • With the increasing demands for clean environment development of air cleaning systems has been received increasing attention. Pulse power systems are widely used for air cleaning in the industrial applications. High voltage pulse power supply affects the performance of the overall environmental system. In this study high voltage micro pulse power supply for removing NOx in diesel engines is developed. The ratings of the pulse voltage is 20kV. The pulse width is 10usec and max. pulse repetition ratio is 1kHz.

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Repetition-Rate Multiplication of a 10-GHz Mode-Locked Laser via Coding the Spectral Intensity and Phase

  • Kim, Ik Hwan;Cho, Il Hwan;Hong, Sang Jeen;Seo, Dong-Sun
    • Journal of the Optical Society of Korea
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    • v.18 no.5
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    • pp.611-615
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    • 2014
  • We report high-speed pulse train generation from a relatively low-speed 10-GHz mode-locked laser by means of line-by-line spectral coding. To increase the pulse repetition rate multiplication (RRM) factor, we combine coding schemes for both spectral intensity and phase by placing a simple mask at the coder focal plane. The resulting RRM factor, determined by multiplying the RRM factors of the individual coding schemes, rises as high as 16. To verify the generated pulses, the optical spectra and autocorrelation traces are examined.

Q-Switched Nd YAG's SHG conversion techniques for a skin diseased treatment (피부질환 치료를 위한 Q-Switched Nd:YAG의 SHG 변환기술)

  • Kim, Whi-Young
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.13 no.6
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    • pp.1141-1149
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    • 2009
  • Pulse style Nd: YAG Laser is suitable in skin remaking treatment, in compliance with the ramp continuous oscillation until of course normal takeoff, the Q-switch and mode motive takeoff the takeoff form which is various is possible and it is coming to be widely used in microsurgery and skin remaking promotion. According to therapeutic objective very it is important to control a energy density. Control of energy density the method which controls the pulse repetition rate of Laser output is mainly used. From the research which it sees pulse style Nd: It will be able to control the pulse repetition rate of YAG, the 2nd harmonic occurrence Laser (second harmonic generation: SHG) with the energy part of the light-wave which is a footnote wave number will hold and nonlinear decision it propagates and is converted by energy of the light-wave which is a footnote wave number the actual condition which and it applies the second harmonic occurrence in compliance with a secondary nonlinearity it leads and until skin deep part therapeutic possibility is the thing it will be able to observe simply.