• Title/Summary/Keyword: Remote plasma polymerization

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Polymerization of Tetraethoxysilane by Using Remote Argon/dinitrogen oxide Microwave Plasma

  • Chun, Tae-Il;Rossbach, Volker
    • Textile Coloration and Finishing
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    • v.21 no.3
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    • pp.19-25
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    • 2009
  • Polymerization of tetraethoxysilane on a glass substrate was investigated by remote microwave plasma using argon with portions of nitrous oxide as carrier gas. Transparent layer like a thickness of 0.5 ${\mu}m$ 3 ${\mu}m$ were obtained, differing in chemical composition, depending on plasma power and treatment time as well as on ageing time. In general the milder the treatment and the shorter the ageing was, the higher was the content of organic structural elements in the layer. We have identified that the chemical structure of our samples composed of mainly Si O and Si C groups containing aliphatics, carbonyl groups. These results were obtained by X ray photon spectroscopy, Fourier transformed infrared spectroscopy, and scanning electron microscope combined with Energy dispersive X ray spectroscopy.

Spectroscopic Analysis of the Remote-plasma-polymerized Methyl Methacrylate Film (원격 플라즈마 중합된 메틸메타크릴레이트 필름의 분광학적 분석)

  • Seomoon, Kyu
    • Applied Chemistry for Engineering
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    • v.32 no.1
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    • pp.49-54
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    • 2021
  • Plasma-polymerized methyl methacrylate (MMA) thin films were synthesized by remote plasma, and effects of plasma power, reaction pressure and direct-indirect plasma on the growth rate and chemical bonding were investigated with alpha-step, FT-IR, XPS and Langmüir probe method. As the plasma power and pressure increased, the tendency of growth rate showed maximum value at a certain range. FT-IR and XPS analyses revealed that composition ratio of C/O and hydrocarbon (C-C) % in the deposited films increased with plasma power, but ester (COO) C % decreased with it. Direct plasma method was effective for fast growth rate, but indirect plasma method was favorable for maintaining the chemical structure of MMA.