• Journal of the Mineralogical Society of Korea
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• v.22 no.2
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• pp.107-114
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• 2009

In present study, an alternative process for manufacturing ultra marine blue by using kaolin, sulfur, sodium carbonate, silica, and rosin was investigated. From the experiments, it was found in the reductive calcination process that the temperature variation with the bed height of input materials is relatively high due to the inadequate thermal conductivity of them. It was also found that the color of the ultramarine blue manufactured is sensitive for the shape of the input materials and the calcinations conditions, and specially the heating rate is very important to form ultramarine. For manufacturing green ultramarine by using sulfur, sodium carbonate, silicon, and pine resin, an optimum condition was investigated to be the heating rate region below $0.6^{\circ}C/min$, the reaction temperature of $850^{\circ}C$ and the reaction time of 4 hr. At the oxidative calcination process to manufacture ultra marine blue from green ultramarine, the optimum flow rate of air is $500{\sim}550\;{\ell}/kg$ (green ultramarine) and the reaction temperature is $500{\sim}550^{\circ}C$.

• Proceedings of the KAIS Fall Conference
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• 2001.05a
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• pp.124-128
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• 2001

A present semiconductor cleaning technology is based upon RCA cleaning technology which consumes vast amounts of chemicals and ultra pure water(UPW) and is the high temperature Process. Therefore, this technology gives rise to the many environmental issues, and some alternatives such as functional water cleaning are being studied. The electrolyzed water was generated by an electrolysis system which consists of anode, cathode, and middle chambers. Oxidative water and reductive water were obtained in anode and cathode chambers, respectively. In case of NH$_4$Cl electrolyte, the oxidation-reduction potential and pH for anode water(AW) and cathode water(CW) were measured to be +1050mV and 4.8, and -750mV and 10.0, respectively. AW and CW were deteriorated after electrolyzed, but maintained their characteristics for more than 40 minutes sufficiently enough for cleaning. Their deterioration was correlated with CO$_2$ concentration changes dissolved from air. It was known that AW was effective for Cu removal, while CW was more effective for Fe removal. The particle distributions after various particle removal processes maintained the same pattern. In this work, RCA consumed about 9$\ell$chemicals, while EW did only 400$m\ell$ HCI electrolyte or 600$m\ell$ NH$_4$Cl electrolyte. It was hence concluded that EW cleaning technology would be very effective for eliminating environment, safety, and health(ESH) issues in the next generation semiconductor manufacturing.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.17 no.3
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• pp.57-65
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• 2016

Academia-industrial cooperation policy is essential to enhance national competitiveness in Korea. Although government and academia have invested in policies and supported industries, academia-industrial cooperation is not operated actively. This is one of the reasons why industrial demand for cooperation has continuously decreased. There are thoughts that universities' outcomes are larger than colleges' outcomes in academia-industrial cooperation, which could be a barrier to academia-industrial cooperation for colleges. It is important to understand industry demands in order to activate this type of cooperation. We propose a way to achieve this based on survey data for 3D printing and college graduates. Interactive cooperation among industries, colleges, and universities is suggested in the process of technical commercialization, such as TRL (Technology Readiness Level).

• Clean Technology
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• v.7 no.3
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• pp.215-223
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• 2001

A present semiconductor cleaning technology is based upon RCA cleaning technology which consumes vast amounts of chemicals and ultra pure water(UPW) and is the high temperature process. Therefore, this technology gives rise to the many environmental issues, and some alternatives such as electrolyzed water(EW) are being studied. In this work, intentionally contaminated Si wafers were cleaned using the electrolyzed water. The electrolyzed water was generated by an electrolysis system which consists of three anode, cathode, and middle chambers. Oxidative water and reductive water were obtained in anode and cathode chambers, respectively. In case of NH4Cl electrolyte, the oxidation-reduction potential and pH for anode water(AW) and cathode water(CW) were measured to be +1050mV and 4.8, and -750mV and 10.0, respectively. AW and CW were deteriorated after electrolyzed, but maintained their characteristics for more than 40 minutes sufficiently enough for cleaning. Their deterioration was correlated with CO2 concentration changes dissolved from air. Contact angles of UPW, AW, and CW on DHF treated Si wafer surfaces were measured to be $65.9^{\circ}$, $66.5^{\circ}$ and $56.8^{\circ}$, respectively, which characterizes clearly the eletrolyzed water. To analyze the amount of metallic impurities on Si wafer surface, ICP-MS was introduced. It was known that AW was effective for Cu removal, while CW was more effective for Fe removal. To analyze the number of particles on Si wafer surfaces, Tencor 6220 were introduced. The particle distributions after various particle removal processes maintained the same pattern. In this work, RCA consumed about $9{\ell}$ chemicals, while EW did only $400m{\ell}$ HCl electrolyte or $600m{\ell}$ NH4Cl electrolyte. It was hence concluded that EW cleaning technology would be very effective for promoting environment, safety, and health(ESH) issues in the next generation semiconductor manufacturing.

• Ceramist
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• v.23 no.2
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• pp.200-210
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• 2020

Supported catalysts are at the heart of manufacturing essential chemical, agricultural and pharmaceutical products. While the longevity of such systems is critically hinged on the durability of metal nanoparticles, the conventional deposition/dispersion techniques are difficult to enhance the stability of the metal nanoparticles due to the lack of control over the interaction between metal-support. Regarding this matter, ex-solution has begun to be recognized as one of the most promising methodologies to develop thermally and chemically robust nanoparticles. By dissolving desired catalysts as a cation form into a parent oxide, fine and uniformly distributed metal nano-catalysts can be subsequently grown in situ under reductive heat treatment, which is referred to ex-solution. Over the several years, ex-solved analog has resulted in tremendous progress in the chemical-electrochemical applications due to the exceptional robustness coupled with ease synthesis. Herein, we describe the ex-solution process in detail which therein introducing the unique characteristics of ex-solved particles that distinguish them from conventionally dispersed nanoparticles. We then go through the history of science regarding the ex-solution phenomena and summarize several major research achievements which embrace the ex-solved nanoparticles to markedly promote the catalytic performances. In conclusion, we address the remaining challenges and the future perspectives of this rapidly growing field.

• Korean Journal of Materials Research
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• v.10 no.1
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• pp.97-106
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• 2000

In these respects the purpose of this research is manufacturing Co-W-P alloy thin film on the corning glass 2948 by electroless plating method using $NaH_2PO_2H_2O$ (sodium hypophosphite) as a reductant, and analyzing deposition rate, alloy composition, microstructure, and magnetic characteristics at various pH's and temperatures. For Co-P alloy thin film, the reductive deposition reaction occurred only in basic condition, not in acidic condition. The deposition rate increased as the pH and temperature increased, and the optimum condition was found at the pH of 10 and the temperature of 8$0^{\circ}C$. Also magnetic characteristics was found to be most excellent at the pH of 9 and the temperature of 7$0^{\circ}C$, resulting in the coercive force of 870Oe and the squareness of 0.78. At this condition, the contents of P was 2.54% and the thickness of the film was 0.216$\mu\textrm{m}$. For crystal orientation, we could not observe fcc for $\beta$-Co. On the other hand, (1010), (0002), (1011) orientation of hcp for $\alpha$-Co was observed. We could confirm the formation of longitudinal magnetization from dominant (1010) and (1011) orientation of Co-P alloy. For Co-W-P alloy thin film, coercive force was 500Oe and squareness was 0.6. For crystal orientation, (0002) orientation of $\alpha$-Co was dominatly found. Then we could confirm the formation of perpendicular magnetization. The content of P was constant at 0.8$\pm$0.2% and the content of W increased as the concentration of Na$_2$WO$_4$increased. When the concentration of Na$_2$WO$_4$was 0.1mol/L, the composition of W was 20%. We observed the changes of magnetic characteristics and microstructure of thin film depositions of Co-W-P by the heat treatment. For heat treatment, the temperature was increased step by step to 10$0^{\circ}C$, 20$0^{\circ}C$, 30$0^{\circ}C$, and 40$0^{\circ}C$ and it took 1 hour at each step in the reductive condition of hydrogen gas. By the heat treatment, flatness of surface was improved, but there were no changes on the magnetic characteristics and the microstructures.

• Journal of the Korean Applied Science and Technology
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• v.38 no.5
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• pp.1325-1334
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• 2021

This study reports the development of a manufacturing method of synthesizing colloidal gold using catalysts available for cosmetics and an anti-aging ampoule with skin improvement effects using it. Nano-colloidal gold was synthesized by using ascorbic acid and sodium borohydride as a reducing catalyst in hydrogen tetrachloroaurate tetrahydrate. It was confirmed that the particles became smaller as the mass of the content of ascorbic acid, which is a catalyst, increased. On the other hand, as the mass of sodium borohydride increased, the particle size tended to increase. In order to control the colloidal gold reaction rate, particles having 100 to 500 nm of a particle diameter distribution could be obtained using xanthan gum and hydroxyethylcellulose. The optimal synthesis conditions could be obtained by reacting for 1 to 4 hours at 18℃, a reduced pressure state of 20 to 75 mmHg, a stirring speed of 10~50 rpm. The synthesized colloidal gold had a unique smell of dark pink, pH = 5.5, specific gravity of 1.0032, and viscosity of 80 to 310 cps. As an application of skin care cosmetics, anti-aging ampoule has been developed, and it is expected to be used for various prescriptions and formulations using it.

• Korean Journal of Materials Research
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• v.9 no.3
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• pp.274-281
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• 1999

Usually sputtering and electroless plating methods were used for manufacturing metal-alloy thin film magnetic memory devices. Since electroless plating method has many merits in mass production and product variety com­pared to sputtering method, many researches about electroless plating have been performed in the United State of America and Japan. However, electroless plating method has not been studied frequently in Korea. In these respects the purpose of this research is manufacturing Co-Mn-P alloy thin film on the corning glass 2948 by electroless plating method using sodium hypophosphite as a reductant, and analyzing deposition rate, alloy composition, microstructure, and magnetic characteristics at various pH's and temperatures. For Co-P alloy thin film, the reductive deposition reaction 0$\alpha$urred only in basic condition, not in acidic condition. The deposition rate increased as the pH and temperature increased, and the optimum condition was found at the pH of 10 and the temperature of $80^{\circ}C$. Also magnetic charac­teristics was found to be most excellent at the pH of 9 and the temperature of $70^{\circ}C$, resulting in the coercive force of 8700e and the squareness of 0.78. At this condition, the contents of P was 2.54% and the thickness of the film was $0.216\mu\textrm{m}$. For crystal orientation, we could not observe fcc for $\beta$-Co. On the other hand,(1010), (0002), (1011) orientation of hcp for a-Co was observed. We could confirm the formation of longitudinal magnetization from dominant (1010) and (1011) orientation of Co-P alloy. For Co-Mn-P alloy deposition, coercive force was about 1000e more than that of Co P alloy, but squareness had no difference. For crystal orientation, (l01O) and (lOll) orientation of $\alpha$-Co was dominant as same as that of Co- P alloy. Likewise we could confirm the formation of longitudinal magnetization.