• 한국자기학회:학술대회 개요집
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• 한국자기학회 2008년도 Asian Magnetics Conference
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• pp.232.1-232.1
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• 2008

• Elastomers and Composites
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• 제51권4호
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• pp.269-274
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• 2016

Two different reactive silicone oligomers, hydroxylpropyl terminated PDMS (PDMS-L) and 1-(2,3-dihydroxy-propoxy)propyl terminated PDMS (PDMS-B), were synthesized through hydrosilylation reaction under Karstedt's catalyst. Using the reactive silicone oligomers, two different silicone-modified gel-coat series were prepared to investigate their thermal and mechanical properties as well as surface characteristics according to reactive silicone oligomer contents. In case of thermal stabilities and mechanical properties, the gel-coat series containing PDMS-B showed higher values than that of the gel-coat series containing the PDMS-L. The contact angle for the gel-coat containing both silicone oligomers/was increased with reactive silicone oligomer contents but there was similar surface tension between PDMS-L and PDMS-B.

• 열처리공학회지
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• 제14권3호
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• pp.151-154
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• 2001

$TiO_2$ thin film has wide application because of its high capacitanca, reflection, and good transmissivity in visible range. $TiO_2$ thin film can be made by thermal deposition method, reactive evaporation method, activated reactive evaporation(ARE) method. In the case of thermal deposition, the oxygen deficiency can occur because the melting point of Ti is very high. While in the case of reactive evaporation, high density $TiO_2$ can not be made, because reactive gas($O_2$) and evaporated material(Ti) are not fully combined, activated reactive evaporation, $TiO_2$ is easily deposited at lower gas pressure compared with reactive evaporation because the ionized reactive gas is made by plasma. Therefore, activated reactive evaporation is very useful to deposit the material having the high melting point. In this work, we formed $TiO_2$ thin film by activated reactive evaporation method. The surface of $TiO_2$ thin film was analyzed by X-ray photoelectron spectroscopy. The surface morphology which was analyzed by atomic force microscopy(AFM) shows that feature of the film surface is uniform. The dielectric capacitance, withstanding voltage were $600{\mu}F/cm^2$, 0.4V respectively. In further work, we can increase the withstanding voltage by improving the deposition parameter of substrates.

• 한국표면공학회지
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• 제51권2호
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• pp.133-137
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• 2018

Plasma devices such as jets, pencils, and torches have been developed as new tools that help penetration of target agents and applied to plasma medicine. However, these devices cannot be used in a large area. Therefore, we introduced a flexible plasma device, which can be treated of large area and designed as bendable plasma. In additional, in vitro model based on agarose gel was prepared that can be show effectiveness in the depth of penetration. Plasma treatment conditions such as power, time and distance can be optimized on the agarose gel wound model. The chemical structure of changed polysaccharides was predicted due to reactive excited atoms and molecules, UV photons, charged particles and reactive oxygen and nitrogen species (RONS).

• 한국염색가공학회지
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• 제23권3호
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• pp.155-162
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• 2011

para-Aramid has limited dyeability because of its highly crystalline structure and compactness. To improve the dyeability of the para-aramid to reactive dyes of bright color in deep shade, the fabrics were photografted under continuous UV irradiation with dimethylaminopropyl methacrylamide and 4-benzoyl benzoic acid as a monomer and a hydrogen -abstractable photoinitiator respectively. A UV energy of 35J/$cm^2$ and a photoinitiator concentration of ten percent or more with respect to the monomer in the formulation was required for optimal photografting. Grafting yield increased with higher monomer application level. Surface analysis indicated significant alterations in the atomic composition of the photografted fabric surface and the fabric surface was covered with the grafted polymers. While the pristine para-aramid fabrics showed no appreciable dyeability to the ${\alpha}$-bromoacrylamide reactive dyes, the grafted para-aramid fabrics enhanced the dyeability to the reactive dyes substantially. In case of C.I. Reactive Blue 50, a K/S value of 8.7 can be obtained with the grafted para-aramid fabrics with a grafting yield of 2.3 %. Also the color fastness properties of the dyed fabrics was excellent in the conditions of washing, rubbing and light irradiation.

• Current Photovoltaic Research
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• 제5권4호
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• pp.105-108
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• 2017

The reactive ion etching (RIE) technology which enables nano-texturatization of surface is applied on monocrystalline silicon solar cell. The additional RIE process on alkalized textured surface further improves the blue response and short circuit current. Such parameter is characterized by surface reflectance and quantum efficiency measurement. By varying the RIE process time and matching the subsequent processes, the absolute efficiency gain of 0.13% is achieved. However, the result indicates potential efficiency gain could be higher due to process integration. The critical etch process time is discussed which minimizes both front surface reflectance and etching damage, considering the challenges of required system throughput in industry.

• 반도체디스플레이기술학회지
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• 제10권2호
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• pp.83-89
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• 2011

In this study, we investigated the effects of shutter control by Reactive Magnetron Sputtering using Inductively-Coupled Plasma(ICP) for obtaining ZnO thin films with high purity. The surface morphologies and structure of deposited ZnO thin films were characterized using Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM) and X-ray Diffractometer (XRD). Also, optical and chemical properties of ZnO thin films were analyzed by Spectroscopic Ellipsometer (SE) and X-ray Photoelectron spectroscopy (XPS). As a result, it observed that ZnO thin films grown at reactive sputtering using shutter control and ICP were higher density, lower surface roughness, better crystallinity than other conventional sputtering deposition methods. For obtaining better quality deposition ZnO thin films, we will investigate the effects of substrate temperature and RF power on shutter control by a reactive magnetron sputtering using inductively-coupled plasma.

• 한국표면공학회지
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• 제33권2호
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• pp.115-125
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• 2000

TiN films were deposited onto Stellite 6B alloy (Co base) by the reactive magnetron sputter ion plating. As the bias increases, TiN film changes from columnar structure to dense structure with great hardness and smooth surface due to densification and resputtering by ion bombardment. The content of oxygen and carbon impurities in the TiN film decreases greatly when the substrate bias is applied. The preferred orientation of the TiN films changes from (200) to (111) with decreasing $N_2$/Ar ratio, and from (200) to (111) and then (220) with increasing the substrate bias. The change of the preferred orientation is discussed in terms of surface energy and strain energy which are related to the impurity contents and the ion bombardment damage. The hardness of the TiN film increases with increasing compressive stress generated in the film by virtue of ion bombardment. It becomes as high as up to 3500kgf/mm$^2$ when an appropriate substrate bias is applied.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.91-94
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• 2009

We propose advanced liquid crystal display (LCD) modes through surface modification using UV curable reactive mesogen (RM) mixed with alignment layers. The LC directors on the modified alignment layer are controlled and memorized by the polymerized RMs under an applied voltage. Using the method proposed here, we can improve the response time and viewing angle characteristics through surface controlled patterned vertical alignment (SC-PVA) mode and 8-domains PVA mode, respectively. Also, we found that the method can be applicable to fabricate multi-domain structures using multiple UV exposure as same as conventional UV alignment method.

• Steel and Composite Structures
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• 제25권2호
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• pp.209-216
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• 2017

In this paper, the analysis of the behavior of surface cracks in finite-thickness plates repaired with a Boron/Epoxy composite patch is investigated using three-dimensional finite element methods. The stress intensity factor at the crack-front was used as the fracture criteria. Using the Ansys Parametric Design Language (APDL), the stress intensities at the internal and external positions of repaired surface crack were compared. The effects of the mechanical and geometrical properties of the adhesive layer and the composite patch on the variation of the stress intensity factor at the crack-front were examined.