• The Korean Journal of Ceramics
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• 제7권1호
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• pp.26-29
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• 2001

Indium tin oxide (ITO) films were deposited on glass substrates at $300^{\circ}C$ in oxygen/argon mixtures by RF-enhanced DC-magnetron sputtering and were compared to those by conventional DC magnetron sputtering. The RF enhancement was performed using a coil above an ITO target. X-ray diffraction measurements revealed that RF-enhanced plasma affected the preferred orientation and the crystallinity of the films. The resistivity of the films prepared by RF-enhanced DC-magnetron sputtering was almost constant at oxygen content lower than 0.3% and then increased sharply with increasing oxygen content. However the resistivity of the films by conventional sputtering has little dependence on the oxygen content. Those results can be explained on the basis of the incorporation of oxygen into the ITO films due to the RF enhancement.

• 대한의용생체공학회:의공학회지
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• 제20권2호
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• pp.165-172
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• 1999

본 연구에서는 MRI 영상에서 위상을 조절하여 영상 대조를 증가 시키는 방법을 제안 하였다 영상하고자 하는 물체 자체가 갖는 위상에 따라 영상의 대조가 변하기 때문에 본 방법은 자화율 영상이나 유속 영상에 유용하게 쓰일 수가 있다. 본 논문에서는 위상 분포에 따른 영상의 대조를 증가 시키기 위하여 RF 펄스를 복셀 내에서 위상을 갖도록 디자인 하였다. 따라서 복셀에서의 신호의 크기는 물체자체의 위상과 RF 펄스에의하여 가해준 위상이 결합에 의하여 결정된다. 외부위상 변화에 따른 신호의 변화를 분석하였고 그때 디자인된 RF 펄스를 이용하여 자화율만의 영상과 유속만의 영상을 얻었다. 컴퓨터 시뮬레이션의 결과는 제안된 알고리즘이 복셀내에 위상을 갖는 물체의 영상에 유용하고 그런 물체만을 영상하는데 유용함을 보였다.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2001년도 추계 기술심포지움
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• pp.171-177
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• 2001

The adhesion enhancement from inserting a RF bias-sputtered Cr layer between Cu and polyimide (PI) has been studied. The RF bias power applied in this study was ranged from 0 to 400 W. Without the RF bias, the peel strength, which measures the adhesion strength, was nearly o g/mm. As the RF power was increased, the peel strength rose up to ~130 g/mm at 200 W, which remained constant with further increase of the RF bias power. Cross-sectional transmission electron microscopy(TEM) was used to investigate the interfacial reaction between the Cr film and PI substrate during the bias sputtering. The Cr/PI interface without the application of RF dais showed a clean, sharp interface while the RF raised Cr/PI interface had about 10~30 nm thick atomistically mixed interlayer between the metal film and PI substrate. This interlayer appeared to have resulted from the implantation of high energy adatoms during the RF bias sputtering of Cr film. This mixed layer serves as an interlocking layer, which enhances adhesion between the metal and PI layers.

• 마이크로전자및패키징학회지
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• 제12권3호
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• pp.207-212
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• 2005

Al, Ti, Ta 및 Cr 박막을 DC 마그네트론 스퍼터링방법으로 0 - 800 W의 RF 바이어스로 폴리이미드 기판에 가하면서 증착한 후 금속박막의 접착성을 연구하였다. 접착력은 $90^{\circ}$ 필 테스트로 평가하였다. 필 테스트 결과 모든 시편에서 기판에 RF 바이어스를 가하면 접착력이 향상되었다. RF바이어스를 가한 시편은 필링 도중 계면근처의 폴리이미드 내에서 파괴가 일어나면서 소성변형이 심하게 발생하였다. 단면 투과전자현미경 관찰에 의하면 금속/폴리이미드 계면은 분명하지 않고 복잡한 형상을 띄고 있었다. 이런 복잡한 계면은 RF 바이어스의 영향으로 생겼으며 접착력 향상의 주요 요인이었다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제1권1호
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• pp.70-83
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• 2001

In this paper, the recent progress of RF MEMS research for wireless/mobile communications is reviewed. The RF MEMS components reviewed in this paper include RF MEMS switches, tunable capacitors, high Q inductors, and thin film bulk acoustic resonators (TFBARs) to become core components for constructing miniaturized on chip RF transceiver with multi-band and multi-mode operation. Specific applications are also discussed for each of these components with emphasis on for miniaturization, integration, and performance enhancement of existing and future wireless transceiver developments.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.145-145
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• 2011

Recently, multi-hole electrode RF capacitively coupled plasma discharge is being used in the deposition of microcrystalline silicon for thin film solar cell to increase the speed of deposition. To make efficient multi-hole electrode RF capacitively coupled plasma discharge, the hole diameter is to be designed concerning the plasma parameters. In past studies, the relationship between plasma parameters such as pressures and gas species, and hole diameter for efficient plasma density enhancement is experimentally shown. In the presentation, the relationship between plasma deriving frequency and hole diameter for efficient multi-hole electrode RF capacitively coupled plasma discharge is shown. In usual capacitively coupled plasma discharge, plasma parameter, such as plasma density, plasma impedence and plasma temperature, change as frequency increases. Because of the change, the optimum hole diameter of the multi-hole electrode RF capacitively coupled plasma for high density plasma is thought to be modified when the plasma deriving frequency changes. To see the frequency effect on the multi-hole RF capacitively coupled plasma is discharged and one of its electrode is changed from a plane electrode to a variety of multi-hole electrodes with different hole diameters. The discharge is derived by RF power source with various frequency and the plasma parameter is measured with RF compensated single Langmuir probe. The shrinkage of the hole diameter for efficient discharge is observed as the plasma deriving frequency increases.

• 한국환경보건학회지
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• 제32권4호
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• pp.268-274
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• 2006

In this study in order to evaluate the growth of RF propagation exposure rate generated according to the enhancement of its use, it is proposed for the ground to be able to examine and to contemplate the correlation between the human health and RF propagation exposure rate by measuring and analyzing the RF exposure source and exposure rate in an indoor environment. As a result of research, it is analyzed that the main exposure source of critically making effect in indoor environment is the frequency hand if radio broadcasting, mobile communication, wireless LAN, digital broadcasting, home appliance, etc., including the TV broadcasting. Among these, it is shown that the TV broadcasting and mobile communication band are the highest. And it is the concluded that RF exposure rate of the environmental sensitive equipment, like an institution for the aged, has lower possibility to exceed the human RF protection criteria by this evaluation.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2006년도 하계종합학술대회
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• pp.501-502
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• 2006

In this paper low power high gain amplifier is suitable for application in low power systems was designed and fabricated. The amplifier used both subthreshold bias for low power and positive feedback Q-enhancement technique for high gain. The amplifier used TSCM $0.18{\mu}m$ RF CMOS technology measures a power gain of 32.3dB, a quality factor of 366 and a power consumption of 3mW in a supply voltage of 1.8V.

• 마이크로전자및패키징학회지
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• 제14권3호
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• pp.15-20
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• 2007

플라스틱 기판에 적용이 가능한 최대 공정온도 $270^{\circ}C$ 이하에서 ZnO-TFT 소자를 제작하였다. ZnO-TFT 소자는 bottom gate 구조로 제작되었으며, ICP-CVD로 형성된 $SiO_2$ 산화물 게이트 공정을 제외하고는 모든 박막증착 공정은 RF-magnetron sputtering process를 이용하였다. ZnO 박막은 Ar과 $O_2$ gas 유량의 비율에 따라 여러 가지 조건에서 RF-magnetron sputtering 시스템을 이용하여 상온에서 증착하였다. Ar과 $O_2$ gas의 비율에 따라 제작된 TFT 소자는 모두 enhancement 모드의 소자특성을 나타내었고, 또한 가시광선영역에 있어 80% 이상의 높은 투과율을 보였다. ZnO 증착시 순수 Ar을 사용하여 제작된 ZnO-TFT의 경우에, $1.2\;cm^2/Vs$의 field effect mobility, 8.5 V의 threshold voltage, 그리고 $5{\times}10^5$의 높은 on/off ratio, 1.86 V/decade의 swing voltage로 가장 우수한 전기적 특성을 보였다.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2015년도 임시총회 및 하계학술연구발표회
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• pp.92-94
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• 2015