• 제목/요약/키워드: Pulsed Laser deposition

검색결과 639건 처리시간 0.026초

Nd:YAG 레이저에 의한 폴리테트라플루오르에틸렌 박막 증착 (Deposition of Polytetrafluoroethylene Thin Films by IR-pulsed Laser Ablation)

  • 박훈;서유석;홍진수;채희백
    • 한국산학기술학회논문지
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    • 제6권1호
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    • pp.58-63
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    • 2005
  • 레이저 용발법을 이용하여 폴리테트라플루오르에틸렌(PTFE: polytetrafluoroethylene) 박막을 증착하였다 사용한 레이저는 1064 nm Nd:YAG 레이저이고, 타겟은 그라파이트 분말이 도핑된 PTFE 펠릿(pellet) 이었다. 그라파이트는 포톤에너지를 효과적으로 흡수하여 열에너지로 전환시키고, 이 에너지를 인접한 PTFE에 전달한다. PTFE는 전달받은 열에너지에 의해서 열분해 된다. 타겟 표면에서 열분해에 의해 형성된 PTFE 단량체(monomer)들은 기판위에서 재중합반응(repolymerization)하여 필름을 형성하게 된다. 증착된 필름은 투명하고 결정화된 필름이었다. 주사전자현미경(SEM: scanning electron microscopy)과 원자현미경(AFM: atomic force microscopy)으로 분석한 결과, 필름의 표면은 박막의 두께가 증가할수록 섬유구조(fibrous structure)를 보였다. X선 광전자 분광기(XPS: X-ray photoelectron spectroscopy), 퓨리에 변화 적외선 분광기(FTIR: fouirer transform infrared spectroscopy)와 X선 회절분광기(XRD: X-ray diffraction)로 분석한 결과, 필름의 F/C 비는 1.7이고 분자축(molecular axis)은 기판과 나란했다.

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PLAD법에 의한 탄소 플라즈마의 모델링 (The Modelling of Carbon Plume by Pulsed-laser ablation Method)

  • 소순열;정해덕;이진;박계춘;김창선;문채주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 영호남 합동 학술대회 및 춘계학술대회 논문집 센서 박막 기술교육
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    • pp.41-45
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    • 2006
  • The study on laser-ablation plasmas has been strongly interested in fundamental aspects of laser-solid interaction and consequent plasma generation. In particular, this plasma has been widely used for the deposition of thin solid films and applied to the semiconductors and insulators. In this paper, we developed and discussed the generation of carbon ablation plasmas emitted by laser radiation on a solid target, graphite. The progress of carbon plasmas by laser-ablation was simulated using Monte-Carlo particle model under the pressures of vacuum, 1 Pa, 10 Pa and 66 Pa. At the results, carbon particles with low energy were deposited on the substrate as the pressure becomes higher. However, there was no difference of deposition distributions of carbon particles on the substrate regardless of the pressure.

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The Study on Cu2ZnSnSe4 Thin Films without Annealed Grown by Pulsed Laser Deposition for Solar Cells

  • 배종성;변미랑;홍태은;김종필;정의덕;김양도;오원태
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.398.1-398.1
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    • 2014
  • The $Cu_2ZnSnSe_4$ (CZTSe) thin films solar cell is one of the next generation candidates for photovoltaic materials as the absorber of thin film solar cells because it has optimal bandgap (Eg=1.0eV) and high absorption coefficient of $10^4cm^{-1}$ in the visible length region. More importantly, CZTSe consists of abundant and non-toxic elements, so researches on CZTSe thin film solar cells have been increasing significantly in recent years. CZTSe thin film has very similar structure and properties with the CIGS thin film by substituting In with Zn and Ga with Sn. In this study, As-deposited CZTSe thin films have been deposited onto soda lime glass (SLG) substrates at different deposition condition using Pulsed Laser Deposition (PLD) technique without post-annealing process. The effects of deposition conditions (deposition time, deposition temperature) onto the structural, compositional and optical properties of CZTSe thin films have been investigated, without experiencing selenization process. The XRD pattern shows that quaternary CZTSe films with a stannite single phase. The existence of (112), (204), (312), (008), (316) peaks indicates all films grew and crystallized as a stannite-type structure, which is in a good agreement with the diffraction pattern of CZTSe single crystal. All the films were observed to be polycrystalline in nature with a high (112) predominant orientation at $2{\theta}{\sim}26.8^{\circ}$. The carrier concentration, mobility, resistivity and optical band gap of CZTSe thin films depending on the deposition conditions. Average energy band gap of the CZTSe thin films is about 1.3 eV.

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Laser Ablation법에 의해 형성된 ZnO 박막의 특성평가 (Characterization of ZnO thin films prepared by pulsed laser ablation method)

  • 조중연;장호정;서광종
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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    • pp.103-103
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    • 2003
  • ZnO$_{1-x}$(또는 Zn$_{1+x}$O) 산화아연은 과잉의 아연(또는 oxygen vacancy)이 도우너(donor) 역할을 하는 비화학양론적 n형 산화물 반도체이다. ZnO는 높은 투과율을 가지고 온도나 주변환경에 대해 매우 안정하며, 또한 이미 상용화된 ITO (Indium tin oxide)에 비해 식각 특성이 우수하고, 수소 플라즈마에 대한 저항성이 크다는 장점 때문에 가스센서와 디스플레이용 소자 등 다양한 분야에 응용이 가능하다. ZnO 박막은 CVD, Reactive Magnetron Sputtering, Electron-beam Evaporation 등 여러 가지방법으로 제작할 수 있다. 본 연구에서는 형성된 박막의 구성성분이 타겟의 성분과 유사하고 낯은 기판온도에서도 박막이 형성되어지는 장점을 가지는 Pulsed Laser Deposition 방법을 사용하여 유리 기판위에 ZnO 박막을 형성하였다.다.

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펄스 레이저 애블레이션이 결합된 고전압 방전 플라즈마 장치를 이용한 유전성 질화탄소 박막의 합성 (Formation of dielectric carbon nitride thin films using a pulsed laser ablation combined with high voltage discharge plasma)

  • 김종일
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.208-211
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    • 2003
  • The dielectric carbon nitride thin films were deposited onto Si(100) using a pulsed laser ablation of pure graphite target combined with a high voltage discharge plasma in nitrogen gas atmosphere. We can be calculated dielectric constant, ${\varepsilon}_s$, with a capacitance Sobering bridge method. We reported to investigate the influence of the laser ablation of graphite target and DC high voltage source for the plasma. The properties of the deposited carbon nitride thin films were influenced by the high voltage source during the film growth. Deposition rate of carbon nitride films were found to increase drastically with the increase of high voltage source. Infrared absorption clearly shows the existence of C=N bonds and $C{\equiv}N$ bonds. The carbon nitride thin films were observed crystalline phase, as confirmed by x-ray diffraction data.

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펄스 레이저 애블레이션이 결합된 고전압 방전 플라즈마 장치를 이용한 유전성 질화탄소 박막의 합성 (Formation of Dielectric Carbon Nitride Thin Films using a Pulsed Laser Ablation Combined with High Voltage Discharge Plasma)

  • 김종일
    • 한국전기전자재료학회논문지
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    • 제16권7호
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    • pp.641-646
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    • 2003
  • The dielectric carbon nitride thin films were deposited onto Si(100) substrate using a pulsed laser ablation of pure graphite target combined with a high voltage discharge plasma in the presence of a N$_2$ reactive gas. We calculated dielectric constant, $\varepsilon$$\_$s/, with a capacitance Schering bridge method. We investigated the influence of the laser ablation of graphite target and DC high voltage source for the plasma. The properties of the deposited carbon nitride thin films were influenced by the high voltage source during the film growth. Deposition rate of carbon nitride films were increased drastically with the increase of high voltage source. Infrared absorption clearly shows the existence of C=N bonds and C=N bonds. The carbon nitride thin films were observed crystalline phase confirmed by x-ray diffraction data.

PZT/LSMO/Pt에 대한 펄스레이저 및 졸겔법에 의한 증착연구 (PZT/LSMO/Pt Thin-Film by Pulse Laser and Sol-Gel Deposition)

  • 최강룡;심인보;김철성
    • 한국자기학회지
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    • 제15권1호
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    • pp.21-24
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    • 2005
  • 강자성, 초거대자기저항체인 $La_{0.67}Sr_{0.33}MnO_{3}$ 타겟을 이용하여 248nm의 파장을 갖는 KrF 엑시머 레이저를 사용한 PLD법으로 박막으 제작하고, 강유전체 물질인 $PbZr_{0.52}Ti_{0.48}O_{3}$ 물질을 spin coating 방법으로 제조하였다. Pt 기관(111)위에 125 mtorr의 산소분압으로 증착한 rhombohedral 구조를 갖는 LSMO 박막을 증착하고 그 위에 PZT 물질을 증착한 결과 LSMO, PZT en 물질 모두 단일상으로 [111]방향으로서의 성장하였음을 알 수 있었다. AFM(atomic force micrscope) data 및 SEM(scanning electron microscope) data를 바탕으로 매우 균질한 박막을 얻었음을 알 수 있었으며, 이때의 자기적 성질 및 전기적 성질은 각각 강자성적인 성질 및 강유전체적인 성향을 나타내었다. 이러한 결과를 가지고 박막증착에 있어서 서로간의 결정구조가 미치는 영향과 다른 경향에 대한 조절이 가능함을 알 수 있었다.

펄스 레이저 증착(PLD)법에 의한 ZnO 박막 성장과 열처리 효과 (Growth and Effect of Thermal Annealing for ZnO Thin Film by Pulsed Laser Deposition)

  • 홍광준
    • 한국전기전자재료학회논문지
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    • 제17권5호
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    • pp.467-475
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    • 2004
  • ZnO epilayer were synthesized by the pulsed laser deposition(PLD) process on $Al_2$ $O_3$substrate after irradiating the surface of the ZnO sintered pellet by the ArF(193 nm) excimer laser. The epilayers of ZnO were achieved on sapphire(A $l_2$ $O_3$) substrate at a temperature of 400 $^{\circ}C$. The crystalline structure of epilayer was investigated by the photoluminescence and double crystal X-ray diffraction(DCXD). The carrier density and mobility of ZnO epilayer measured with Hall effect by van der Pauw method are 8.27${\times}$$10^{16}$$cm^{-3}$ and 299 $\textrm{cm}^2$/Vㆍs at 293 K, respectively. The temperature dependence of the energy band gap of the ZnO obtained from the absorption spectra was well described by the Varshni's relation, $E_{g}$(T)= 3.3973 eV - (2.69 ${\times}$ 10$_{-4}$ eV/K) $T^2$(T+463k). After the as-grown ZnO epilayer was annealed in Zn atmospheres, oxygen and vaccum the origin of point defects of ZnO atmospheres has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{Zn}$ , $V_{o}$ , Z $n_{int}$, and $O_{int}$ obtained by PL measurements were classified as a donors or accepters type. In addition, we concluded that the heat-treatment in the oxygen atmosphere converted ZnO thin films to an optical p-type. Also, we confirmed that vacuum in ZnO/A $l_2$ $O_3$did not form the native defects because vacuum in ZnO thin films existed in the form of stable bonds.s.s.s.

Deposition of Ferroelectric PB(Zr0.52Ti0.48)O3 Films on Platinized Silicon Using Nd:YAG Laser

  • Im, Hoong-Sun;Kim, Sang-Hyeob;Choi, Young-Ku;Lee, Kee-Hag;Jung, Kwang-Woo
    • Bulletin of the Korean Chemical Society
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    • 제18권1호
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    • pp.56-61
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    • 1997
  • Lead zirconate titanate (PZT) thin fills were deposited onto the Pt/Ti/SiO2/Si substrate by the pulsed laser deposition with the second harmonic wavelength (532 nm) of Nd:YAG laser. In order to determine the optimum conditions for the film deposition, the phase of the films were investigated as functions of ambient oxygen pressure, substrate temperature, and laser fluence. Also the chemical composition analysis was conducted for the PZT films deposited under various ambient oxygen pressure. When the distance between substrate and bulk PZT target is set to 20 mm, the optimum conditions have been determined to be 3 torr of oxygen pressure, 1.5 J/cm2 of laser fluence, and 823-848(±10) K range of substrate temperature. At these conditions, perovskite phase PZT films were obtained on platinized silicon. The chemical composition of the films is very similar to that of PZT bulk target. The physical structure of the deposited films analyzed by scanning electron microscopy shows a columnar morphology perpendicular to the substrate surface. Capacitance-Voltage hysteresis loop measurements show also a typical characteristics of ferroelectric thin film. The dielectric constant is found to be 528 for the 0.48 μm thickness of PZT thin film.

PLD 공정으로 제조된 LSM-YSZ 나노복합체층이 포함된 경사구조 박막 공기극을 적용한 SOFC의 성능 분석 (Performance of Solid Oxide Fuel Cell with Gradient-structured Thin-film Cathode Composed of Pulsed-laser-deposited Lanthanum Strontium Manganite-Yttria-stabilized Zirconia Composite)

  • 명두환;홍종일;황재연;이종호;이해원;김병국;조성걸;손지원
    • 한국세라믹학회지
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    • 제48권6호
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    • pp.487-492
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    • 2011
  • The effect of the application of lanthanum strontrium manganite and yttria-stabilized zirconia (LSM-YSZ) nano-composite fabricated by pulsed laser deposition (PLD) as a cathode of solid oxide fuel cell (SOFC) is studied. A gradient-structure thin-film cathode composed of 1 micron-thick LSM-YSZ deposited at an ambient pressure ($P_{amb}$) of 200 mTorr; 2 micron-thick LSM-YSZ deposited at a $P_{amb}$ of 300 mTorr; and 2 micron-thick lanthanum strontium cobaltite (LSC) current collecting layer was fabricated on an anode-supported SOFC with an ~8 micron-thick YSZ electrolyte. In comparison with a 1 micron-thick nano-structure single-phase LSM cathode fabricated by PLD, it was obviously effective to increase triple phase boundaries (TPB) over the whole thickness of the cathode layer by employing the composite and increasing the physical thickness of the cathode. Both polarization and ohmic resistances of the cell were significantly reduced and the power output of the cell was improved by a factor of 1.6.