• 대한전기학회:학술대회논문집
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• 대한전기학회 2009년도 제40회 하계학술대회
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• pp.1256_1257
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• 2009

We have grown, for the first time to our knowledge, N-doped ZnO thin films on sapphire substrate by employing novel dielectric barrier discharge in pulsed laser deposition (DBD-PLD). DBD guarantees an effective way for massive in-situ generation of N-plasma under the conventional PLD process condition. Low-temperature photoluminescence spectra of the N-doped ZnO film provided near band-edge emission after thermal annealing process. The emission peak was resolved by Gaussian fitting to find a dominant acceptor-bound exciton peak ($A^0X$) that indicates the successful p-type doping of ZnO with N.

• Transactions on Electrical and Electronic Materials
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• 제12권5호
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• pp.200-203
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• 2011

In this research, nitrogen (N)-doped zinc oxide (ZnO) thin films have been grown on a sapphire substrate by dielectric barrier discharge (DBD) in pulsed laser deposition (PLD). DBD has been used as an effective way for massive in-situ generation of N-plasma under conventional PLD process conditions. Low-temperature photoluminescence spectra of N-doped ZnO thin films provided near-band-edge emission after a thermal annealing process. The emission peak was resolved by Gaussian fitting and showed a dominant acceptor-bound excitation peak ($A^{\circ}X$) that indicated acceptor doping of ZnO with N. The acceptor binding energy of the N acceptor was estimated to be approximately 145 MeV based on the results of temperature-dependent photoluminescence (PL) measurements.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 추계학술대회 논문집
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• pp.379-382
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• 2000

The characteristics of Xe discharge lamp(Mercuryless lamp) are described in this paper. In this paper, FFL is operated by sine wave and pulsed source. We apply V-Q Lissajous' figure for the discharge measurements of FFL which has the electrodes covered with dielectric. When FFL is operated by sine wave source, the characteristics are similar to DBD(Dielectric Barrier Discharge) and SD(Silent Discharge). And we compared the characteristics of FFL which is operated with sine wave and pulsed discharge by using V-Q Lissajous' figure method. When FFL is operated with pulsed, the discharge current flows after the applied voltage is risen. As the duty ratio increases the electric field becomes strong and much more xenon ions are produced. And the number of metastable xenon atoms seem to increase, therefore, the phosphor radiation after the cut off of voltage increases compared with the first peak of radiation. Consequently, the 172㎚ radiation becomes strong as the duty ratio increases.

• 전기학회논문지
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• 제63권1호
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• pp.80-84
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• 2014

The discharge characteristics of Surface Dielectric Barrier Discharge (SDBD) reactor are investigated to find optimal driving condition with adjusting various parameter. When the high voltage with sine wave form is applied to SDBD source, successive pulsed current waveforms are observed owing to multiple ignitions through the long discharge channel and wall charge accumulation on the dielectric surface. The discharge voltage, total charge between dielectrics, mean energy and power are calculated from measured current and voltage according to electrode gap and dielectric thickness. Discharge mode transition from filamentary to diffusive glow is observed for narrow gap and high applied voltage case. However, when the diffusive discharge is occurred with high applied voltage, the actual firing voltage is always lower than that with low driving voltage. The $Si_3N_4$, $MgF_2$, $Al_2O_3$ and $TiO_2$ are considered for dielectric protection and high secondary electron emission coefficient. SDBD with $MgF_2$ shows the lowest breakdown voltage. $MgF_2$ thin film is proposed as a protection layer for low voltage atmospheric dielectric barrier discharge devices.

• 조명전기설비학회논문지
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• 제24권5호
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• pp.160-168
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• 2010

본 논문은 대기압 펄스 배리어 방전을 이용하여 NO 가스를 무해한 물질로 환원시키기 위하여 방전공간에서의 NO 분자의 생성 및 제거과정에 대하여 레이져 유기형광법을 이용하여 시 공간적인 밀도변화를 측정 및 분석하였다. 사용된 펄스 배리어 방전리액터는 진전속도가 $2.7{\times}10^6$[m/s] 인 1차 스트리머가 음극표면에 도착한 이후에 2차 스트리머가 양극 부근에 발생되었다. 그리고, 펄스 레이져에 의하여 NO 분자만을 효율적으로 상위준위로 여기시키기 위하여 Nd:Yag 및 염료 레이져를 복합하여 226[nm]의 자외광을 방전공간으로 도입하였으며, NO 분자만을 $A^2{\Sigma}^+{\leftarrow}X^2{\prod}$(0,0)으로 여기시키고, 여기된 분자들이 낮은 준위 $A^2{\Sigma}^+{\rightarrow}X^2{\prod}$(0,2), (0,3)로 복귀됨에 따라 방출되는 주요한 형광신호를 측정하였다. NO 분자의 시 공간적 변화 측정결과로부터 NO 가스를 효율적으로 제거하기 위해서는 산소농도를 가능한 2 [%]이하로 낮추고, 2차 스트리머 진전에 의해서 충분하게 방전공간에서 NO 환원반응을 유발할 수 있도록 제어하는 것이 필요하다고 판단된다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1994년도 하계학술대회 논문집 C
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• pp.1556-1558
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• 1994

An air/quartz dielectric double barrier pulse discharge has been investigated to develop a novel si lent type ozone generator. It is found that there are very active pulsed coronas occurred in the airgap which are very useful for ozone generation. And, the corona onset voltage of the airgap of the air/quartz double barrier was enfluenced greatly by the airgap of the air/quartz dielectric double barrier, and depended greatly upon the airgap ranged of $0.0{\sim}3.0mm$ and by the quartz tube thickness ranged of $1.75{\sim}2.25mm$.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 제36회 하계학술대회 논문집 B
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• pp.1521-1523
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• 2005

High voltage plasma power supply was adopted to control polluted gases and an ozone generation. Bidirectional pulse power supply consisted of power semiconductor switch devices, a high voltage transformer, and a control board adapted switching method. Plasma power supply with sinusoidal bidirectional pulse, which has output voltage range of 0-20kV and output frequency range of 1kHz-20kHz, is realized. Using proposed system, pulsed high voltage/high frequency discharges were tested in a DBD(dielectric barrier discharge) reactor, and the spatial distribution of a glow discharge was observed. The system showed stable operational characteristics, even though the voltage and the frequency increased. Above features were verified by experiments.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 하계학술대회 논문집 D
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• pp.1441-1443
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• 1998

In this work, the effects of space charge was analyzed in removal efficiency of pollutant using dielectric barrier discharges. In order to investigate effects of space charge, two dielectrics(XLPE and TR-XLPE) was chosen which are different in space charge distribution. The simultaneously measurement of space charge and discharge current was carried out in XLPE and TR-XLPE with air gap by Pulsed-Electro-Acoustic Method in ac. Also, the removal efficiency is measured by classical ozone generator(von Siemens 1875). From the experimental results, we knew that the space charge distribution affects the discharge patterns. The more space charge is in surface, the quickly discharge initiates and the magnitude of discharge is increased when polarity changes. And these affect the removal efficiency of pollutant.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.391-391
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• 2010

The stability enhancement of Znic oxide thin film transistor deposited by PLD-DBD has been reported here using the bias temperature stress test. Znic oxide (ZnO) thin films were deposited on $SiO_2$/Si (100) by pulsed laser deposition method with and without dielectric barrier discharge (DBD) method. The DBD is the efficient method to adopt the nitrogen ions into the thin films. The TFT characteristics of ZnO TFTs with and without Nirogen (N) doping show similar results with $I_{on/off}$ of $10^5{\sim}10^6$. However. the bias temperature stress (BTS) test of N-doped ZnO TFT with DBD shows higher stability than that of ZnO TFT.

• 산업식품공학
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• 제15권4호
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• pp.398-403
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• 2011

비열살균기술로서 저온플라즈마 활용 가능성을 탐색하고자 유전체장벽 방전 플라즈마(DBDP)생성장치를 제작하여 최적 플라즈마생성 조건을 도출하고 Staphyloocus aureus를 대상으로 살균성능을 조사하였다. DBDP생성장치는 전력공급장치, 변압기, 전극, 시료처리부 등 네 부분으로 구성하였다. 인가전압은 단상 200 V AC를 사용하고, 변압기를 통하여 10.0-50.0 kV로 변환하고 10.0-50.0 kHz의 주파수의 펄스 구형파를 유전체인 세라믹 블록 내에 장치한 전극에 투입함으로써 상압에서 플라즈마를 생성하였다. 주파수를 올림에 따라 높은 전류가 유입되었고, 이에 비례하여 전력소비량이 증가하였다. 전류세기 1.0-2.0 A, 주파수32.0-35.3 kHz 범위에서 균일하고 안정적인 플라즈마 발생이 이루어졌으며 시료를 투입하지 않은 상태에서의 최적 전극간격은 1.85 mm 이었다. 전극간격을 높임에 따라 소비전력이 증가하였으나 시료 처리에 적합한 전극간격은 2.65 mm였다. DBDP 처리에 의한 온도상승은 최대 20$^{\circ}C$에 불과하여 열에 의한 생물학적 효과는 무시할 수 있었으며 따라서 비열기술임이 확인되었다. Staphyloocus aureus를 대상으로 DBDP 처리할 경우 초기 5분 동안은 살균치가 직선적인 증가를 보이다가 이후 다소 완만해지는 경향을 보였으며 1.25 A에서 10분간 처리 시 살균치는 5.0을 상회하였다.