• 제목/요약/키워드: Processing plasma

검색결과 644건 처리시간 0.023초

원자층증착 기술: 개요 및 응용분야 (Atomic Layer Deposition: Overview and Applications)

  • 신석윤;함기열;전희영;박진규;장우출;전형탁
    • 한국재료학회지
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    • 제23권8호
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    • pp.405-422
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    • 2013
  • Atomic layer deposition(ALD) is a promising deposition method and has been studied and used in many different areas, such as displays, semiconductors, batteries, and solar cells. This method, which is based on a self-limiting growth mechanism, facilitates precise control of film thickness at an atomic level and enables deposition on large and three dimensionally complex surfaces. For instance, ALD technology is very useful for 3D and high aspect ratio structures such as dynamic random access memory(DRAM) and other non-volatile memories(NVMs). In addition, a variety of materials can be deposited using ALD, oxides, nitrides, sulfides, metals, and so on. In conventional ALD, the source and reactant are pulsed into the reaction chamber alternately, one at a time, separated by purging or evacuation periods. Thermal ALD and metal organic ALD are also used, but these have their own advantages and disadvantages. Furthermore, plasma-enhanced ALD has come into the spotlight because it has more freedom in processing conditions; it uses highly reactive radicals and ions and for a wider range of material properties than the conventional thermal ALD, which uses $H_2O$ and $O_3$ as an oxygen reactant. However, the throughput is still a challenge for a current time divided ALD system. Therefore, a new concept of ALD, fast ALD or spatial ALD, which separate half-reactions spatially, has been extensively under development. In this paper, we reviewed these various kinds of ALD equipment, possible materials using ALD, and recent ALD research applications mainly focused on materials required in microelectronics.

The Routing Algorithm for Wireless Sensor Networks with Random Mobile Nodes

  • Yun, Dai Yeol;Jung, Kye-Dong;Lee, Jong-Yong
    • International Journal of Internet, Broadcasting and Communication
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    • 제9권4호
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    • pp.38-43
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    • 2017
  • Sensor Networks (WSNs) can be defined as a self-configured and infrastructure-less wireless networks to monitor physical or environmental conditions, such as temperature, sound, vibration, pressure, motion or pollutants and to cooperatively pass their data through the network to a main location or base-station where the data can be observed and analyzed. Typically a wireless sensor network contains hundreds of thousands of sensor nodes. The sensor nodes can communicate among themselves using radio signals. A wireless sensor node is equipped with sensing and computing devices, radio transceivers and power components. The individual nodes in a wireless sensor network (WSN) are inherently resource constrained: they have limited processing speed, storage capacity, communication bandwidth and limited-battery power. At present time, most of the research on WSNs has concentrated on the design of energy- and computationally efficient algorithms and protocols In order to extend the network life-time, in this paper we are looking into a routing protocol, especially LEACH and LEACH-related protocol. LEACH protocol is a representative routing protocol and improves overall network energy efficiency by allowing all nodes to be selected to the cluster head evenly once in a periodic manner. In LEACH, in case of movement of sensor nodes, there is a problem that the data transmission success rate decreases. In order to overcome LEACH's nodes movements, LEACH-Mobile protocol had proposed. But energy consumption increased because it consumes more energy to recognize which nodes moves and re-transfer data. In this paper we propose the new routing protocol considering nodes' mobility. In order to simulate the proposed protocol, we make a scenario, nodes' movements randomly and compared with the LEACH-Mobile protocol.

Multicrystalline Silicon Texturing for Large Area CommercialSolar Cell of Low Cost and High Efficiency

  • Dhungel, S.K.;Karunagaran, B.;Kim, Kyung-Hae;Yoo, Jin-Su;SunWoo, H.;Manna, U.;Gangopadhyay, U.;Basu, P.K.;Mangalaraj, D;Yi, J.
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.280-284
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    • 2004
  • Multicrystalline silicon wafers were textured in an alkaline bath, basically using sodium hydroxide and in acidic bath, using mainly hydrofluoric acid (HF), nitric acid $(HNO_3)$ and de-ionized water (DIW). Some wafers were also acid polished for the comparative study. Comparison of average reflectance of the samples treated with the new recipe of acidic solution showed average diffuse reflectance less than even 5 percent in the optimized condition. Solar cells were thus fabricated with the samples following the main steps such as phosphorus doping for emitter layer formation, silicon nitride deposition for anti-reflection coating by plasma enhanced chemical vapor deposition (PECVD) and front surface passivation, screen printing metallization, co-firing in rapid thermal processing (RTP) Furnace and laser edge isolation and confirmed >14 % conversion efficiency from the best textured samples. This isotropic texturing approach can be instrumental to achieve high efficiency in mass production using relatively low cost silicon wafers as starting material.

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RTP 와 PECVD을 이용한 저가의 표면 passivation 막들의 특성연구 (Cost-effective surface passication layers by RTP and PECVD)

  • 이지연;이수홍
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 춘계학술대회 논문집 디스플레이 광소자분야
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    • pp.142-145
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    • 2004
  • In this work, we have investigated the application of rapid thermal processing (RTP) and plasma enhanced chemical vapour deposition (PECVD) for surface passivation. Rapid thermal oxidation (RTO) has sufficiently low surface recombination velocities (SRV) $S_{eff}$ in spite of a thin oxides and short process time. The effective lifetime is increasing with an increase of the oxide thickness. In the same oxide thickness, The effective lifetime is independent on the process temperature and time. $S_{eff,max}$ is exponentially decreased with increasing oxide thickness. $S_{eff,max}$ can be reduced to 200 cm/s with only 10 nm oxide thickness. On the other hand, three different types of SiN are reviewed. SiN1 layer has a thickness of about 72 nm and a refractive index of 2.8. Also, The SiN1 has a high passivation quality. The effective lifetime and SRV of 1 $\Omega$ cm Float zone (FZ) silicon deposited with SiN1 is about 800 s and under 10 cm/s, respectively. The SiN2 is optimized for the use as an antireflection layer since a refractive index of 2.3. The SiN3 is almost amorphous silicon caused by less contents of N2 from total process. The effective lifetime on the FZ 1 ${\Omega}cm$ is over 1000 ${\mu}s$.

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Si3N4 박막의 유기발광소자 수분침투 방지막으로의 응용 (Application of Si3N4 Thin Film as a Humidity Protection Layer for Organic Light Emitting Diode)

  • 김창조;신백균
    • 한국전기전자재료학회논문지
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    • 제23권5호
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    • pp.397-402
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    • 2010
  • In this paper, we studied WVTR(water vapor transmission rate) properties of $Si_3N_4$ thin film that was deposited using TCP-CVD (transformer coupled plasma chemical vapor deposition) method for the possibility of OLED(organic light emitting diode) encapsulation. Considering the conventional OLED processing temperature limit of below $80^{\circ}C$, the $Si_3N_4$ thin films were deposited at room temperature. The $Si_3N_4$ thin films were prepared with the process conditions: $SiH_4$ and $N_2$, as reactive gases; working pressure below 15 mTorr; RF power for TCP below 500 W. Through MOCON test for WVTR, we analyzed water vapor permeation per day. We obtained that WVTR property below 6~0.05 gm/$m^2$/day at process conditions. The best preparation condition for $Si_3N_4$ thin film to get the best WVTR property of 0.05 gm/$m^2$/day were $SiH_4:N_2$ gas flow rate of 10:200 sccm, working pressure of 10 mTorr, working distance of 70 mm, TCP power of 500 W and film thickness of 200 nm. respectively. The proposed results indicates that the $Si_3N_4$ thin film could replace metal or glass as encapsulation for flexible OLED.

연화방법에 따른 기능성 식품 소재로써의 생선뼈의 특성 (Characteristics of Fish Bone as the Functional Food Additives Produced with Different Softening Methods)

  • 이윤미;최정욱;이민경;황혜정;정수진;남택정
    • 한국수산과학회지
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    • 제52권6호
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    • pp.631-636
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    • 2019
  • Fish bone-based calcium products are currently receiving much attention among high value-added industries involving calcium. Industrial processing of fish products yields unused fish parts including bones, which could be used as marine health foods to enhance the economic and environmental benefits of fish production. The ultimate goal of this study is to develop the high value-added fisheries products fortified with fish bones supplementing calcium. We here explored the physical and chemical softening methods of the fish bones to enhance texture of the fish products with a high degree of calcium absorption rates. The eluted calcium from the fish bone was quantified with the inductively coupled plasma optical emission spectrometry (ICP-OES). The characteristics of the softened fish bones were determined by the laser diffraction particle size analysis, texture profile analysis, and volatile organic compounds (VOCs) analysis. As the result, the optimized softening method of fish bone was established when Theragra chalcogramma bone was treated twice with the pressurized high temperature (110-120℃ and 1.0-1.5 kg/cm2). The produced softened fish bone turned out to be suitable for the food additives with low particle sizes, low hardness values, and negligible VOCs responsible for the unpleasant flavors.

mechanism of Equivalent Power Distribution in Parallel Connected ICP for Large Area Processing

  • 이진원;배인식;안상혁;장홍영;유신재
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.510-510
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    • 2012
  • 반도체, 디스플레이, 태양광 등의 공정에서 사용되는 웨이퍼의 크기가 증가하고, 생산률이 플라즈마의 밀도에 비례한다는 연구 결과가 발표되면서 대면적 고밀도 플라즈마 소스 개발에 대한 연구가 활발히 진행되고 있다. 특히, ECR, ICP, Helicon plasma 등 고밀도 플라즈마 소스에 대한 관심이 높아지고 있다. 이에 따라, 여러 개의 ICP를 결합한 multiple ICP를 이용해 대면적 고밀도 플라즈마 소스 개발을 진행했다. Multiple ICP의 경우 각 ICP 소스에 같은 power (current)를 공급해야만 균일한 플라즈마 방전이 발생되어 균일도를 확보 할 수 있다. Current controller 같은 추가적인 장비를 설치하지 않고, power를 분배하는 transmission line을 coaxial 형태로 설계하고 같은 길이로 병렬 연결함으로써 각각의 ICP소스에서 균일한 플라즈마를 방전시킬 수 있었다. Power generator에서 보는 각 ICP의 total impedance는 각 ICP 소스의 impedance와 coaxial 형태의 transmission line의 characteristic impedance, frequency, 길이의 함수로 구할 수 있고, 이 total impedance가 일정하기 때문에 current가 균등하게 분배되어 각 ICP소스에 균등한 power 분배가 가능한 것이다. 실질적으로 ICP 소스의 impedance는 플라즈마 방전 유무에 따라 변화하기 때문에 일정하게 유지하는 것은 어렵다. Transmission line의 characteristic을 사용함으로써 ICP의 impedance의 변화에 상관없이 Total impedance를 일정하게 유지시킴으로써 균등한 power 분배가 가능하다는 것을 연구했다. Frequency는 13,56MHz, characteristic impedance를 $50{\Omega}$ (coaxial cable)으로 고정하고, ICP 소스의 플라즈마 방전 유무/antenna turn/소스 위치에 따른 total impedance를 transmission line의 길이에 따라 측정하고, 이를 이론값, 그래프와 비교하였다. 특정 length에서 플라즈마 방전 유무(ICP의 impedance 변화)와 상관없이 비교적 일정한 total impedance를 유지하는 것을 확인 했다. 이것은 특정 길이를 갖는 coaxial형태의 transmission line를 연결하면, total impedance는 플라즈마 방전 유무로 발생하는 ICP의 impedance 변화와 상관없이 일정하게 유지되어 각 ICP소스에 균등한 파워 분배가 가능하다는 것을 보여준 결과이다. 이것을 토대로 frequency에 따라(또는 characteristic impedance에 따라) 균등한 파워 분배가 가능한 coaxial 형태 transmission line의 특정 길이를 구할 수 있고, 대면적 소스에서 균등한 파워 분배를 위한 병렬연결에 적용할 수 있을 것이다.

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Ni-20 Cr계 분말의 기계적 합금화 과정에 대한 고찰 (Discussion on the Mechanical Alloying Process of Ni-20Cr alloy)

  • 유명기;최주
    • 분석과학
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    • 제6권2호
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    • pp.197-205
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    • 1993
  • 닉켈과 크롬 20% 혼합분말을 실험실용 아트리터에서 시간을 달리하여 밀링하였고 입도분포, 미세조직 및 X-레이 회절 특성을 조사하였다. 합금화 상태를 확인하고자 포화자화값과 보자력값을 측정하였고 플라즈마 용해 잉곳 경우와 비교하였다. 기계적 합금화는 분말의 미세화 단계 후 크롬이 닉켈 속으로 확산이 일어나는 계면적의 증가에 의해서 진행하였다. 그러나 15시간 이상 밀링 후 서브 미크론 크기의 결정립으로 정상상태가 이루어졌음에도 불구하고 용해 잉곳과 같이 조성적으로 균일한 고용합금의 자성특성이 관찰되지 않았다. 밀링 시간이 길어질수록 결정립의 크기는 미세화되었으며 합금층이 증가하였다. 따라서 조성의 균질화는 분말의 소성변형에 의해서 일어나는 성분분말 사이의 계면적 증가와 계면내에서 입계 또는 전위와 같은 격자결함을 통해 크롬의 닉켈 속으로 확산에 의해서 율속되는 것으로 생각된다.

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ALD-assisted Hybrid Processes for improved Corrosion Resistance of Hard coatings

  • Wan, Zhixin;Kwon, Se-Hun
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2016년도 추계학술대회 논문집
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    • pp.105-105
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    • 2016
  • Recently, high power impulse magnetron sputtering (HIPIMS) has attracted considerable attentions due to its high potential for industrial applications. By pulsing the sputtering target with high power density and short duration pulses, a high plasma density and high ionization of the sputtered species can be obtained. HIPIMS has exhibited several merits such as increased coating density, good adhesion, microparticle-free and smooth surface, which make the HIPIMS technique desirable for synthesizing hard coatings. However, hard coatings present intrinsic defects (columnar structures, pinholes, pores, discontinuities) which can affect the corrosion behavior, especially when substrates are active alloys like steel or in a wear-corrosion process. Atomic layer deposition (ALD), a CVD derived method with a broad spectrum of applications, has shown great potential for corrosion protection of high-precision metallic parts or systems. In ALD deposition, the growth proceeds through cyclic repetition of self-limiting surface reactions, which leads to the thin films possess high quality, low defect density, uniformity, low-temperature processing and exquisite thickness control. These merits make ALD an ideal candidate for the fabrication of excellent oxide barrier layer which can block the pinhole and other defects left in the coating structure to improve the corrosion protection of hard coatings. In this work, CrN/Al2O3/CrN multilayered coatings were synthesized by a hybrid process of HIPIMS and ALD techniques, aiming to improve the CrN hard coating properties. The influence of the Al2O3 interlayer addition, the thickness and intercalation position of the Al2O3 layer in the coatings on the microstructure, surface roughness, mechanical properties and corrosion behaviors were investigated. The results indicated that the dense Al2O3 interlayer addition by ALD lead to a significant decrease of the average grain size and surface roughness and greatly improved the mechanical properties and corrosion resistance of the CrN coatings. The thickness increase of the Al2O3 layer and intercalation position change to near the coating surface resulted in improved mechanical properties and corrosion resistance. The mechanism can be explained by that the dense Al2O3 interlayer acted as an excellent barrier for dislocation motion and diffusion of the corrosive substance.

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Evaluation of the Oral Acute Toxicity of Black Ginseng in Rats

  • Lee, Mi-Ra;Oh, Chang-Jin;Li, Zheng;Li, Jing-Jie;Wang, Chun-Yan;Wang, Zhen;Gu, Li-Juan;Lee, Sang-Hwa;Lee, Jae-Il;Lim, Beong-Ou;Sung, Chang-Keun
    • Journal of Ginseng Research
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    • 제35권1호
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    • pp.39-44
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    • 2011
  • We studied the acute oral toxicity of black ginseng (BG) produced by heat process in rats. Single acute BG extract doses of 0, 5, 10, and 15 g/kg dissolved in saline were administered by oral gavage and the animals were kept under observation for 14 days. The single administration of BG extract up to 15 g/kg did not produce mortality, behavioral change or abnormal clinical signs in the rats. These results indicated that the oral $LD_{50}$ of the BG extract in the rats is higher than 15 g/kg. Compared to the control group, no treatment-related biologically significant effects of BG extract were noted in the measurements of the body weight or food intake. At the end of the period, the biochemical parameters and hematological parameters were analyzed in the plasma and blood. A histopathological examination of the liver and kidney was also conducted. Only the blood nitrogen urea and potassium levels in the biochemical indices showed significant differences at 10 and 15 g/kg doses of BG extract compared to the control group. These changes were not considered to be due to the toxicity. None of the other clinical chemistry parameters were affected. Therefore, these results indicate that the BG by heat processing is virtually nontoxic.