• Journal of the Korean Society for Precision Engineering
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• v.25 no.5
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• pp.96-102
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• 2008

Manufacturing of printed electronics using printing technology has begun to get into the hot issue in many ways due to the low cost effectiveness to existing semi-conductor process. This technology, with low cost and high productivity, can make it possible to produce printed electronics such as TFT, solar cell, RFID Tag, printed battery, and so on. In this study, apparatus of gravure-offset printing are developed for fine line-width/gap printing and the results obtained from the apparatus shows that it is possible to make around 20 micro-meter line-width/gap printing patterns. The roll-to-roll printing system for fine line-width printing based on primary experiment is presented. The printing results obtained from the system shows around 30 micro-meter line-width/gap printing patterns.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.583-584
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• 2006

Printing technology has begun to get into the spotlight in many ways due to the low cost effectiveness to existent semi-conductor process. It also has very useful application areas, not only paper printing but also patterning for LCD color tilter, Photovoltaic patterning, RFID antenna, OLED, and so on. In this study, an apparatus of gravure offset printing was developed for fine line width printing. The pattern was composed of $20{\mu}m$ size of continuous lines of which pitch size was $40{\mu}m$. The printed pattern shows that it is possible to make around $20{\mu}m$ line-width printing pattern. The roll-to-roll printing system for fine line-width printing based on primary experiment is presented. For testing of multi-layer printing, the system was designed to be capable of printing two different materials from each printing unit using gravure-offset printing method and have a function of alignment of two printed materials.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.26 no.4
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• pp.351-356
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• 2017

The resistance of printed patterns for electrodes fabricated using printing technology should be minimized. This parameter depends on the pattern width and thickness; however, from the viewpoint of printability, the printed patterns should be printed at the designed width. The resistance of the printed patterns as well as printability is affected by various printing conditions. In this paper, the printing condition is optimized to minimize the resistance of electrodes printed by the roll-to-roll gravure method. This is done by considering the spread ratio of pattern width as a parameter of printability using design experiments. The drying temperature, dryer fan speed, and printing speed are selected as effective factors for the experiment objective. The optimized conditions are obtained and reproducibility test using these demonstrates that the optimized conditions can produce low-resistance electrodes for printability of the pattern width.

• Journal of the Semiconductor & Display Technology
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• v.9 no.2
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• pp.55-60
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• 2010

Ink transfer process from the printing roll to the moving web was investigated using a CFD technique for the application in R2R printed electronics. In line with the requirement that the web handling speed needs to be increased further for the cost competitiveness, the effects of web moving velocity with relatively complex roll patterns were analyzed. To make the present analysis more realistic, the numerical geometry and the ink properties were selected to match those of the real printing production system. Our numerical results showed that both web handling speed and complex printing-roll patterns influenced the shape of the transferred ink. As the web moving speed approaches towards 30mpm, a significant distortion of the shape of the transferred ink occurred. In the range of pattern width smaller than 100 microns, a phase distortion was also found to occur in all the printing-roll patterns considered in the present work but the ratio of the phase distortion to the line width gets smaller as the width becomes smaller. Thus, the web handling speed and the shape of printing-roll pattern will be important elements for the better printing quality under 100 micron line width range.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.461-466
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• 2007

There has been a great interest in printing technology as a low cost and mass production method for the application of printed electronics such as printed TFT, solar cell, RFID Tag, printed battery, and so on. In this study, apparatuses of gravure-offset printing are developed for fine line-width/gap printing and examining pattern distortion occurred in gravure-offset printing process. The fine line-width/gap pattern shows that it is possible to make around 20 micro-meter line-width/gap printing patterns. Pattern distortion is modeled, and the amount and shape of the distortion are calculated by using commercial FEM code. The roll-to-roll printing system under development consists of unwinder/rewinder, two printing units, one coating unit, drying units, guiding unit, vision system, and other auxiliary devices. For multi-layer printing, the system is designed to be capable of printing two different materials.

• Laser Solutions
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• v.16 no.4
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• pp.12-16
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• 2013

For mass production of electronic devices, the processing of the printing roll is one of the most important key technologies for printed electronics technology. A roll of printing process, the gravure printing that is used to print the electronic device is most often used. The indirect laser processing has been used in order to produce printing roll for gravure printing. It consists of the following processing that is coating of photo polymer or black lacquer on the surface of printing roll, pattering using a laser beam and etching process. In this study, we have carried out study on the coating and etching for $25{\mu}m$ line width on the printing roll. To do this goals, a $4{\mu}m$ coating thickness and 20% average coating thickness of the coating homogeneity of variance is performed. The factors to determine the thickness and homogeneity are a viscosity of coating solution, the liquid injection, the number of injection, feed rate, rotational speed, and the like. After the laser patterning, a line width of $25{\mu}m$ or less was confirmed to be processed through etching and the chromium plating process.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.10
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• pp.1123-1130
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• 2011

The pattern shape engraved on the gravure printing roll is one of the most important factors influencing ink transfer. This study focuses on the relations between dot geometry engraved on gravure printing roll and the ink transfer during the gravure printing process. The influence of dot width on printed patterns will be demonstrated. Results reveal that as the width of a dot on the printing roll increases, the ink transfer rate also increases. But over a certain size of width, surface uniformity began to recede. Therefore, proper dot geometry on the printing roll should be decided to guarantee good printing quality according to printing conditions and expected performance of the electronic devices.

• 한국태양에너지학회:학술대회논문집
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• 2011.04a
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• pp.293-298
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• 2011

The most widely used method to form an electrode in industrial solar cells are screen printing. Screen printing is characterized by a relatively simple and well-known production sequence with high throughput rates. However the method is difficult to implement a fine line width of high-efficiency solar cells can not be made. The open circuit voltage(Voc) and the short circuit current density(Jsc) and fill factor(FF) need to be further improved to increase the efficiency of silicon solar cells. In this study, gravure offset printing method using the multicrystalline-silicon solar cells were fabricated. Gravure off-set printing method which can print the fine line width of finger electrode can have the ability reduce the shaded area and increase the Jsc. Moreover it can make a high aspect ratio thereby series resistance is reduced and FF is increased. Approximately $50{\mu}m$ line width with $35{\mu}m$ height was achieved. The efficiency of gravure off set was 0.7% higher compare to that of scree printing method.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.391-391
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• 2011

Crystalline silicon solar cell을 양산에 적용하기 위해 전면 전극의 패턴을 형성하는 방법으로 Ag paste를 이용한 screen printing이 가장 일반적으로 사용된다. 전면 전극의 패턴 형성 시, Finger의 width와 spacing은 Fill factor, JSC, VOC 등 태양전지의 중요 parameter들과 관련되어, 효율에 영향을 미치기 때문에, printing 시 Finger width와 spacing을 최적화하여 최대한의 효율을 내는 조건을 찾는 것이 바람직하다. 본 연구에서는 Finger width를 $30{\mu}m{\sim}100{\mu}m$, spacing을 $1.8{\mu}m{\sim}2.8{\mu}m$ 까지 가변하여 c-Si solar cell을 제작하였으며, 제작된 cell의 LIV를 측정을 통하여, 최적의 효율을 내는 조건을 찾고자 하였다. 그 결과 Finger width $30{\mu}m$, Finger spacing $1.8{\mu}m$의 조건에서 17.12%로 최고의 효율을 나타내었다.

• Proceedings of the KSME Conference
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• 2005.11a
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• pp.210.1-210.1
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• 2005