• 제목/요약/키워드: Porous thin film

검색결과 200건 처리시간 0.029초

RF 마그네트론 스퍼터링법으로 제조된 차폐용 NbTi박막의 우선방향에 미치는 스퍼터링 압력의 영향 (Effects of Sputtering pressure on preferred Orientation of Shielding NbTi Thin Film by RF Magnetron Sputtering)

  • 김봉서;우병철;변우봉;이희웅
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 하계학술대회 논문집 C
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    • pp.1098-1101
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    • 1995
  • NbTi thin films were prepared on Si wafer and Cu substrate by rf magnetron sputtering in the range of sputtering pressure $3{\times}10^{-2}$torr to $3{\times}10^{-4}$torr at room temperature. The influence of sputtering pressure and substrate type on crystallographic orientation and morphology of NbTi thin films was investigated by using X-ray diffraction(XRD) and scanning electron microscopy(SEM), respectively. And the effect of crystallographic orientation and morphology of NbTi film on electromagnetic behaviors was estimated by measuring critical current in various applied magnetic field. The film morphology changed from porous structure consisting of tapered crystallites to densely deposited film decreasing with sputtering pressure. The change of crystallographic orientation with the sputtering pressure and rf power was calculated from the texture coefficient of(002) plane based on XRD patterns. It was found that a change of texture coefficient of(002) plane increased with decreasing sputtering pressure. From observation of critical current in various applied magnetic field, we have identified that the change of critical current abruptly decrease applying with magnetic field and NbTi film produced at high sputtering pressure does not exhibit superconductivity but at low sputtering pressure shows superconductivity.

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박막공정의 융합화를 통한 초소형 고체산화물 연료전지의 제작: I. Spray Pyrolysis법으로 증착된 Ni 기반 음극과 스퍼터링으로 증착된 YSZ 전해질의 다층구조 (Fabrication of Micro Solid Oxide Fuel Cell by Thin Film Processing Hybridization: I. Multilayer Structure of Sputtered YSZ Thin Film Electrolyte and Ni-Based Anodes deposited by Spray Pyrolysis)

  • 손지원;김형철;김혜령;이종호;이해원
    • 한국세라믹학회지
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    • 제44권10호
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    • pp.589-595
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    • 2007
  • Physical properties of sputtered YSZ thin film electrolytes on anode thin film by spray pyrolisis has been investigated to realize the porous electrode and dense electrolyte multilayer structure for micro solid oxide fuel cells. It is shown that for better crystallinity and density, YSZ need to be deposited at an elevated temperature. However, if pure NiO anode was used for high temperature deposition, massive defects such as spalling and delamination were induced due to high thermal expansion mismatch. By changing anode to NiOCGO composite, defects were significantly reduced even at high deposition temperature. Further research on realization of full cells by processing hybridization and cell performance characterization will be performed in near future.

전착법과 담금법에 의한 음극지지형 SOFC 지르코니아 전해질막 제조 (Preparation of Electrolyte Thin Film for Anode Support Type Solid Oxide Fuel Cells by Electrophoretic Deposition and Dip-Coating)

  • 김상우;이병호;손용배;송휴섭
    • 한국세라믹학회지
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    • 제36권8호
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    • pp.791-798
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    • 1999
  • 다공성 NiO-YSZ 기판위에 전착법(EPD; Electrophoretic Deposition)법과 담금(Dip-coating)법에 의해 음극지지형 고체연료전지용 이트리아 안정화 지르코니아 박막 제조법을 연구하였다. 이를 위해 슬러리 농도 및 시간에 따른 박막의 무게, 박막의 결함 및 미세구조변화에 영향을 주는 제조조건들을 살펴 봄으로써 전착법과 담금법의 차이를 보았다. 담금법에서는 막생성 초기인 30초까지 막의 무게가 증가하지만 그 후에는 탈락이 일어나 시간을 증가하여도 막의 무게가 오히려 감소하였다. 전착법에서는 임계 인가전류 이상에서 시간에 따라 막의 무게가 증가하고 균일하고 치밀한 막이 형성하였다 전장이 매우 낮은 0.035 mA/$cm^2$ 의 정전류를 120초 이상 장시간 인가하면 막의 흘러내림(sagging)으로 인한 결함이 발생하였다. 전착법에 의해 균일하고도 치밀하게 가스 누출성이 없는 음극지지형 고체산화물 연료전지에 적합한 전해질 박막을 제조할 수 있었다.

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진공 슬러리 담금 코팅 공정에 의한 고체 산화물 연료전지용 박막 전해질막 제조에 관한 연구 (Fabrication Of Thin Electrolyte Layer For Solid Oxide Fuel Cell by Vacuum Slurry Dip-coating Process)

  • 손희정;임탁형;이승복;신동열;송락현;김성현
    • 한국수소및신에너지학회논문집
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    • 제17권2호
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    • pp.204-211
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    • 2006
  • The electrolyte in the solid oxide fuel cell must be dense enough to avoid gas leakage and thin enough to reduce the ohmic resistance. In order to manufacture the thin and dense electrolyte layer, 8 mol% $Y_2O_3$ stabilized-$ZrO_2$ (8YSZ) electrolyte layers were coated on the porous tubular substrate by the novel vacuum slurry dip-coating process. The effects of the slurry concentration, presintering temperature, and vacuum pressure on the thickness and the gas permeability of the coated electrolyte layers have been examined in the vacuum slurry coating process. The vacuum-coated electrolyte layers showed very low gas permeabilities and had thin thicknesses. The single cell with the vacuum-coated electrolyte layer indicated a good performance of $495\;mW/cm^2$, 0.7 V at $700^{\circ}C$. The experimental results show that the vacuum dip-coating process is an effective method to fabricate dense thin film on the porous tubular substrate.

상압건조 나노다공성 실리카 에어로젤에 대한 개질제 효과 (Effect of surface modifiers on the nano porous silica aerogels prepared by ambient drying process)

  • 김태정;오영제
    • 센서학회지
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    • 제16권1호
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    • pp.77-83
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    • 2007
  • Nanoporous silica aerogels with various surface modifiers were prepared by ambient drying process. Tetraethylorthosilicate (TEOS) were used a raw material. Ambient drying process for various surface modifier was studied in the point of view of a crack-free monolith and thin films and low cost. Various kinds of surface modifiers like as hexamethyldisilazane (HMDSZ), trimethlychlorosilane (TMCS), methlytriethoxylsilane (MTES), and methlytrimethoxysilane (MTMS) were studied in order to enhance hydrophobicity for the silica aerogel. Surface modified aerogels were evaluated by FT-IR, TG, BET, SEM and wetting angle measurement. Homogeneous and crack-free aerogels were obtained by modifying the HMDSZ and the TMCS. However silica xerogel was obtained when modified with MTMS, MTES.

Characteristics of ZnO Films Deposited on Poly 3C-SiC Buffer Layer by Sol-Gel Method

  • Phan, Duy-Thach;Chung, Gwiy-Sang
    • Transactions on Electrical and Electronic Materials
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    • 제12권3호
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    • pp.102-105
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    • 2011
  • This work describes the characteristics of zinc oxide (ZnO) thin films formed on a polycrystalline (poly) 3C-SiC buffer layer using a sol-gel process. The deposited ZnO films were characterized using X-ray diffraction, scanning electron microscopy, and photoluminescence (PL) spectra. ZnO thin films grown on the poly 3C-SiC buffer layer had a nanoparticle structure and porous film. The effects of post-annealing on ZnO film were also studied. The PL spectra at room temperature confirmed the crystal quality and optical properties of ZnO thin films formed on the 3C-SiC buffer layer were improved due to close lattice mismatch in the ZnO/3C-SiC interface.

친환경용매 기반의 술폰화 폴리아릴렌 에테르 술폰 랜덤 공중합체 Thin Film Composite 제조 (Preparation of Disulfonated Poly(arylene ether sulfone) Random Copolymer Thin Film Composite Membranes Using a Benign Solvent)

  • 이창현;제임스 맥그라스;베니프리만
    • 멤브레인
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    • 제24권4호
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    • pp.292-300
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    • 2014
  • 내염소성을 갖는 염제거공정용 술폰화 폴리아릴렌 에테르 술폰 랜덤 공중합체(SPAES) thin film composite (TFC)막이 모노글라임 용매를 이용하여 제조되었다. 모노글라임은 선택층인 SPAES만을 용해시키며, 다공성 폴리술폰(예 : Udel$^{(R)}$)층에 대해 비용해성을 지녀, TFC 제조를 위한 선택적 용매로 사용될 수 있다. 또한 개미산이나 디에틸글리콜과는 달리, 환경적으로 무해하며, 매우 낮은 끊는점을 지녔다는 점이 또 다른 장점이 될 수 있다. 다공성 Udel$^{(R)}$ 지지체 위에 코팅시, 코팅용액이 기공구조에 침투하여 유수량을 감소시키는 기공투과현상이 발생하는데, 이를 최소화하기 위해 지지체를 이소프로필알콜과 글리세린 혼합액에서 전처리 후에, 코팅-건조 공정을 통해 결함이 없는 SPAES TFC로 제조된다. 또한, SPAES 선택층의 술폰화도, 고정이온의 염상태 및 물리-화학적 가교효과를 SPAES TFC막을 통한 투과거동과 관련하여 관찰하였다.

폴리머 기판위에 형성된 나노구조제어 알루미나의 캐패시터 특성 (Capacitance Properties of Nano-Structure Controlled Alumina on Polymer Substrate)

  • 정승원;민형섭;한정환;이전국
    • 한국재료학회지
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    • 제17권2호
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    • pp.81-85
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    • 2007
  • Embedded capacitor technology can improve electrical perfomance and reduce assembly cost compared with traditional discrete capacitor technology. To improve the capacitance density of the $Al_2O_3$ based embedded capacitor on Cu cladded fiber reinforced plastics (FR-4), the specific surface area of the $Al_2O_3$ thin films was enlarged and their surface morphologies were controlled by anodization process parameters. From I-V characteristics, it was found that breakdown voltage and leakage current were 23 V and $1{\times}10^{-6}A/cm^2$ at 3.3 V, respectively. We have also measured C-V characteristics of $Pt/Al_2O_3/Al/Ti$ structure on CU/FR4. The capacitance density was $300nF/cm^2$ and the dielectric loss was 0.04. This nano-porous $Al_2O_3$ is a good material candidate for the embedded capacitor application for electronic products.

Sol-gel법에 의한 단층 반사 방지막 제조 (Fabrication of Single Layer Anti-reflection Thin Film by Sol-gel Method)

  • 박종국;전대우;이미재;임태영;황종희;배동식;김진호
    • 한국전기전자재료학회논문지
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    • 제28권12호
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    • pp.821-825
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    • 2015
  • Anti-reflective (AR) thin film was fabricated on a glass substrate by sol-gel method. The coating solution was synthesized with TEOS (tetraethlyorthosilicate) and poly ethylene glycol (PEG, 4.0 wt%). As the withdrawal speed of coating was changed from 0.1 mm/sec to 0.3 mm/sec, the thickness and refractive index of prepared thin films were changed. The reflectance and transmittance of coating glass fabricated by the withdrawal speed of 0.1 mm/sec were 0.62% and 95.0% in visible light range. The refractive index and thickness of single layer thin film were n= 1.29 and ca. 99.0 nm.