• Korean Journal of Optics and Photonics
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• v.32 no.4
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• pp.180-186
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• 2021

Fluorinated polyimide has excellent light transmittance and a high optical refractive index, and is useful for producing optical-waveguide phase modulators with low optical loss and low electric power consumption. In this work, an optical-waveguide phase modulator is designed and fabricated based on a high-refractive-index fluorinated polyimide, and its characteristics are measured. An efficient protocol for characterizing the loss components of the optical waveguide is proposed, and the propagation loss of the fabricated polyimide optical waveguide is confirmed to be 0.9 dB/cm. The phase modulator requires 9.1 mW of power for phase change of π, and the response time is 290 μs, which is improved by tenfold compared to a previous demonstration of polymeric phase modulators.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2002.10a
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• pp.111-114
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• 2002

We propose and fabricate a vertically integrated waveguide thermo-optic switch. It controls the optical path between two vertically stacked waveguide. As a first step, we fabricate polymeric waveguides. The measured propagation loss is ranged from 0.3 db/cm to 0.4 dB/cm at the wavelength of 1.55 $\mu\textrm{m}$. We fabricate the proposed vertically integrated waveguide thermo-optic switch to demonstrate its preliminary feasibility. The measured crosstalk is better than -10 db. The power consumption is about 500 mW. Further effort is necessary to improve its performance.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.11
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• pp.70-75
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• 1997

a wavelength division multiplexer based on a polymeric arrayed-waveguide grating has been designed and fabricated. A 4-channel multiplexer with a spacing of 3.2 nm is designe dby using te 2-dimensional beam propagation method. A UV-curable epoxy, NOA73, is used for the core layer, and a passive polymer, PMMA, for the cladding layer. The polymer waveguides are fabricated by the reactive ion etching method and their optical properties are characterized. The fabricted device has a center wavelength of 1548.3 nm, and the wavelength spacing between the channels is 3.2nm. The measured crosstalk is better than -18dB.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.5
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• pp.267-271
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• 2006

A polymeric waveguide-type wavelength filter based on a Bragg grating has been proposed and fabricated using the simple nanoimpring technique, for the first time to our knowledge. An ultraviolet transparent stamp with the single-mode waveguide pattern incorporating a surface-relief-type Bragg grating was specially designed selective dry-etching process. Using this stamp, the device fabrication was substantially involving just a single-step process of imprint followed by polymer spin-coating. The achieved maximum reflection was higher than 25 dB at the center wavelength of 1569 nm. And the 3-dB bandwidth was 0.8 nm for the device length of 1.5 cm.

• Korean Journal of Optics and Photonics
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• v.13 no.3
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• pp.223-227
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• 2002

Polymeric multi-mode optical waveguides were fabricated for parallel optical interconnection. Waveguide structures were molded by a Ni mold master using a hot embossing technique. The Ni mold master was manufactured by LIGA process. Multimode optical waveguides with a 48$\times$47 ${\mu}{\textrm}{m}$$^2$cross-section were produced by a simple two-step process. The propagation losses of the multimode waveguide measured at 0.85 ${\mu}{\textrm}{m}$ and 1.3 ${\mu}{\textrm}{m}$ wavelengths were 0.38 dB/cm and 0.66 dB/cm, respectively.

• Polymer Science and Technology
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• v.18 no.2
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• pp.167-172
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• 2007

• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.4
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• pp.73-78
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• 1997

A polymeric waveguide TE-pass polarier operating at wavelengths around 1.55.mu.m is realized by utilizing the birefringence induced by photoleaching at room temperature. To implement the polarizer, the photobleached waveguide supporting only TE mode is integrated in the middle of the etched rib waveguide that supports TE and TM modes. It has a simple structure and requires no high temperature process like poling. The measured polarization extinction ratio is about 21dB and the estimted excess loss is about 0.4dB.

• Journal of the Optical Society of Korea
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• v.13 no.2
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• pp.294-298
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• 2009

In this paper we proposed a new Bragg grating waveguide in order to improve reflectivity and to achieve compactness. Bragg gratings with various thicknesses were engraved in the middle of the core layer with a length of 3 mm. For the sake of cost-effectiveness, the $3^{rd}$ order Bragg grating waveguides were fabricated via conventional photolithography. The maximum reflectivities for the fixed width waveguide of $6{\mu}m$ with the 0.1 and $0.3{\mu}m$-thick Bragg gratings were, -13.14 and -6.25 dB, respectively, and the Bragg wavelengths were 1562.28, 1564.10 nm, respectively. A slight increase in the Bragg grating thickness can result in a remarkable reduction in the length of the Bragg grating waveguide with a fixed reflectivity.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.824-827
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• 2000

Fabrication of InP-based photonic devices by dry etch Process is important for clear formation of waveguide mesa structure. We have developed more efficient etch process of the inductively coupled plasma (ICP) with low damages and less polymeric deposits for the InP-based photonic devices than the reactive ion etching (RIE) technique. We report the tendency of etch rate variation by the process parameters of the RF power, pressure, gas flow rate, and the gas mixing ratio. The surface roughness of InP-based waveguide structure was more improved by the light wet etching in the mixed solution of H$_2$SO$_4$:H$_2$O (1:1)

• Korean Journal of Optics and Photonics
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• v.17 no.4
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• pp.317-322
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• 2006

A polymeric arrayed waveguide grating (AWG) has been proposed and demonstrated by exploiting the nanoimprint method. A PDMS(polydimethylsiloxane) stamp with device patterns engraved was developed out of a master mold made of quartz glass. The device was fabricated by transferring the pattern in the PDMS stamp to a spin-coated polymer film without using any etching process. The device had 8 output channels, while the center wavelengths of each output channel were positioned from 1543.7 nm to 1548.3 nm with the spacing of 0.8 nm. The achieved average channel crosstalk and the 3-dB bandwidth were about 10 dB and 0.8 nm respectively.