• 제목/요약/키워드: Polymeric substrate

검색결과 123건 처리시간 0.075초

Flexible Ultra-high Gas Barrier Substrate for Organic Electronics

  • Yan, Min;Erlat, Ahmet Gun;Zhao, Ri-An;Scherer, Brian;Jones, Cheryl;Smith, David J.;McConnelee, Paul A.;Feist, Thomas;Duggal, Anil
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.445-446
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    • 2007
  • The use of plastic substrates enables new applications, such as flexible display devices, and other flexible electronic devices, using low cost, rollto-roll (R2R) fabrication technologies. One of the limitations of polymeric substrate in these applications is that oxygen and moisture rapidly diffuse through the material and subsequently degrade the electro-optical devices. GE Global Research (GEGR) has developed a plastic substrate technology comprised of a superior high-heat polycarbonate (LEXAN(R)) substrate film and a unique transparent coating package that provides the ultrahigh barrier (UHB) to moisture and oxygen, chemical resistance to solvents used in device fabrications, and a high performance transparent conductor. This article describes the coating solutions for polycarbonate (LEXAN(R)) films and its compatibility with OLED device fabrication processes.

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알루미나 기재에 부착된 습도센서용 자기 가교형 감습성 전해질 고분자의 내수성 (Self-Curable Humidity-Sensitive Polyelectrolytes Attached to the Alumina Substrate for the Humidity Sensor and their Stability in Water)

  • 한대상;공명선
    • 폴리머
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    • 제34권4호
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    • pp.313-320
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    • 2010
  • 신나메이트기를 갖는 새로운 자기 경화형 감습성 고분자 및 고분자형 앵커제로 사용하기 위하여 [2-[(methacryloyloxy) ethyl]dimethyl]propyl ammonium bromide(MEPAB), methyl methacrylate(MMA), 3-(trimethoxysilyl) propyl methacrylate(TMSPM) 및 2-(cinnamoyloxy)ethyl methacrylate(CEMA)의 공중합체들 을 합성하였다. 광가교성 공중합체들로서 MEPAB/MMA/TMSPM/CEMA=70/20/0/10의 조성을 갖는 공중합체는 감습성 전해질 고분자로서, 그리고 50/0/20/30과 0/0/50/50 조성은 고분자형 부착제로 사용하였다. 이들 광가교형 고분자 실란커플링 처리제의 전극 표면과 부착 특성을 비교하기 위하여 3-(triethoxysilyl)propyl cinnamate(TESPC)도 표면 부착을 위한 표면처리제로서 사용하였다. 표면처리제는 전극의 기재 표면 위에 공유결합을 통하여 광가교성 신나 메이트 박막을 형성시킬 수 있었으며 센서에 UV가 조사되었을 때 전해질 고분자가 [2$\pi$+2$\pi$] 환화반응을 이용한 가교반응으로 기재에 부착되었다. 이렇게 고분자 표면처리제 및 TESPC로 처리된 센서들은 24시간 물에 침적시켰을 때 60~85%의 저항 증가가 생겼으며 이것은 상대습도 변화로서 2.25~3.15%RH에 해당하였다. 또한, -0.2%RH 이하의 양호한 히스테리시스, 90초의 응답 및 회복속도, 그리고 80 $^{\circ}C$ 및 90%RH의 고온 고습에서 매우 좋은 신뢰성을 보여주었다.

정수압을 이용한 미세 패턴 전사 신공정 개발 (Development of New Micro Pattern Fabrication Process by U sing Isostatic Pressing)

  • 설재완;주병윤;임성한
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2009년도 추계학술대회 논문집
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    • pp.267-270
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    • 2009
  • In the present investigation, we are newly developing a new forming process which can fabricate micro patterns on large-area polymeric substrates for high speed mass production. The key idea of the new process is to pressurize multiple vacuum-packed substrate-mold stacks above the glass transition temperature ($T_g$) of the polymeric substrates. The new process is thought to be promising micro-pattern fabrication technique in three aspects; firstly, isostatic pressing ensures the uniform micro-pattern replicating condition regardless of the substrate area. Secondly, the control of forming condition such as temperature and pressure can realize well-defined process condition exploited in the conventional hot embossing research field. Thirdly, multiple substrates can be patterned at the same time. A prototype forming machine for the new process was developed with the design consideration realizing the present idea. With a developed machine, micro prismatic array patterns with 50 um in size were successfully made on the $380{\times}300{\times}6\;mm$ PMMA plate.

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Pixel-Structured Scintillator with Polymeric Microstructures for X-Ray Image Sensors

  • Jung, Im-Deok;Cho, Min-Kook;Bae, Kong-Myeong;Lee, Sang-Min;Jung, Phill-Gu;Kim, Ho-Kyung;Kim, Sung-Sik;Ko, Jong-Soo
    • ETRI Journal
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    • 제30권5호
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    • pp.747-749
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    • 2008
  • We introduce a pixel-structured scintillator realized on a flexible polymeric substrate and demonstrate its feasibility as an X-ray converter when it is coupled to photosensitive elements. The sample was prepared by filling $Gd_2O_2S:Tb$ scintillation material into a square-pore-shape cavity array fabricated with polyethylene. For comparison, a sample with the conventional continuous geometry was also prepared. Although the pixelated geometry showed X-ray sensitivity of about 58% compared with the conventional geometry, the resolving power was improved by about 70% above a spatial frequency of 3 $mm^{-1}$. The spatial frequency at 10% of the modulation-transfer function was about 6 $mm^{-1}$.

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AN ENGINEERING SCALE STUDY ON RADIATION GRAFTING OF POLYMERIC ADSORBENTS FOR RECOVERY OF HEAVY METAL IONS FROM SEAWATER

  • Prasad, T.L.;Saxena, A.K.;Tewari, P.K.;Sathiyamoorthy, D.
    • Nuclear Engineering and Technology
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    • 제41권8호
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    • pp.1101-1108
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    • 2009
  • The ocean contains around eighty elements of the periodic table and uranium is also one among them, with a uniform concentration of 3.3 ppb and a relative abundance factor of 23. With a large coastline, India has a large stake in exploiting the 4 billion tonnes of uranium locked in seawater. The development of radiation grafting techniques, which are useful in incorporating the required functional groups, has led to more efficient adsorbent preparations in various geometrical configurations. Separation based on a polymeric adsorbent is becoming an increasingly popular technique for the extraction of trace heavy metals from seawater. Radiation grafting has provided definite advantages over chemical grafting. Studies related to thermally bonded non woven porous polypropylene fiber sheet substrate characterization and parameters to incorporate specific groups such as acrylonitrile (AN) into polymer back bones have been investigated. The grafted polyacrylonitrile chains were chemically modified to convert acrylonitrile group into an amidoxime group, a chelating group responsible for heavy metal uptake from seawater/brine. The present work has been undertaken to concentrate heavy metal ions from lean solutions from constant potential sources only. A scheme was designed and developed for investigation of the recovery of heavy metal ions such as uranium and vanadium from seawater.

Simultaneous Transfer and Patterning of CVD-Grown Graphene with No Polymeric Residues by Using a Metal Etch Mask

  • 장미;정진혁;;이내응
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.642-642
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    • 2013
  • Graphene, two dimensional single layer of carbon atoms, has tremendous attention due to its superior property such as high electron mobility, high thermal conductivity and optical transparency. Especially, chemical vapor deposition (CVD) grown graphene has been used as a promising material for high quality and large-scale graphene film. Unfortunately, although CVD-grown graphene has strong advantages, application of the CVD-grown graphene is limited due to ineffective transfer process that delivers the graphene onto a desired substrate by using polymer support layer such as PMMA(polymethyl methacrylate). The transferred CVD-grown graphene has serious drawback due to remaining polymeric residues generated during transfer process, which induces the poor physical and electrical characteristics by a p-doping effect and impurity scattering. To solve such issue incurred during polymer transfer process of CVD-grown graphene, various approaches including thermal annealing, chemical cleaning, mechanical cleaning have been tried but were not successful in getting rid of polymeric residues. On the other hand, lithographical patterning of graphene is an essential step in any form of microelectronic processing and most of conventional lithographic techniques employ photoresist for the definition of graphene patterns on substrates. But, application of photoresist is undesirable because of the presence of residual polymers that contaminate the graphene surface consistent with the effects generated during transfer process. Therefore, in order to fully utilize the excellent properties of CVD-grown graphene, new approach of transfer and patterning techniques which can avoid polymeric residue problem needs to be developed. In this work, we carried out transfer and patterning process simultaneously with no polymeric residue by using a metal etch mask. The patterned thin gold layer was deposited on CVD-grown graphene instead of photoresists in order to make much cleaner and smoother surface and then transferred onto a desired substrate with PMMA, which does not directly contact with graphene surface. We compare the surface properties and patterning morphology of graphene by scanning electron microscopy (SEM), atomic force microscopy(AFM) and Raman spectroscopy. Comparison with the effect of residual polymer and metal on performance of graphene FET will be discussed.

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Inkjet patterning of Aqueous Silver Nano Sol on Interface-controlled ITO Glass

  • Ryu, Beyong-Hwan;Choi, Young-Min;Kong, Ki-Jeong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1552-1555
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    • 2005
  • We have studied the inkjet patterning of synthesized aqueous silver nano-sol on interface-controlled ITO glass substrate. Furthermore, we designed the conductive ink for direct inkjet patterning on bare ITO glass substrate. The first, the highly concentrated polymeric dispersant-assisted silver nano sol was prepared by variation of molecular weight and control of initial nucleation and growth of silver nanoparticles. The high concentration of batch-synthesized silver nano sol was possible to 40 wt%. At the same time the particle size of silver nanoparticles was below $10{\sim}20nm$. The second, the synthesized silver nano sol was inkjet - patterned on ITO glass substrate. The connectivity and width of fine line depended largely on the wettability of silver nano sol on ITO glass substrate, which was controlled by surfactant. The relationship was understood by wetting angle. The fine line of silver electrode as fine as $50{\sim}100\;{\mu}m$ was successfully formed on ITO glass substrate. The last, the direct inkjet-patternable silver nano sol on bare ITO glass substrate was designed also.

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Printability of synthesized Silver Nano sol in Micro-patterning of Electrode on ITO Glass

  • Ryu, Beyong-Hwan;Park, Han-Sung;Byun, Jong-Hoon;Choi, Young-Min;Kong, Ki-Jeong;Lee, Jeong-O;Chang, Hyun-Ju
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.981-984
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    • 2004
  • We have studied a printability of synthesized silver nano solon ITO glass substrate. The highly concentrated polymeric dispersant-assisted silver nano sol was prepared by variation of molecular weight and control of initial nucleation and growth of silver nanoparticles, to achive dispersion stability and controlling the size of silver nanoparticles. The synthesized silver nano-sol was tested for printability to explore the possibility of micro-electrodes patterning on ITO glass substrate. The silver micro-electrode with 50${\sim}100{\mu}m$ line width was formed on ITO glass substrate.

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Functions of the C-Terminal Region of Chitinase ChiCW from Bacillus cereus 28-9 in Substrate-Binding and Hydrolysis of Chitin

  • Huang, Chien-Jui;Chen, Chao-Ying
    • Journal of Microbiology and Biotechnology
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    • 제16권12호
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    • pp.1897-1903
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    • 2006
  • In order to investigate the functions of the C-terminal region of chitinase ChiCW of Bacillus cereus 28-9, a C-terminal truncated enzyme, ChiCW$\Delta$FC, was expressed in Escherichia coli and purified to homogeneity for biochemical characterization. Compared with ChiCW, ChiCW$\Delta$FC exhibited higher chitinase activity at high temperature and pH, but expressed lower hydrolytic and binding activities toward insoluble substrates. In addition, kinetic properties indicated that ChiCW$\Delta$MC hydrolyzed oligomeric and polymeric substrates less efficiently than ChiCW. These results suggest that the C-terminal region of ChiCW plays important roles in substrate binding and hydrolysis of chitin. In addition, the biological meaning of C-terminal proteolytic modification of ChiCW is discussed.

($LEXAN^{(R)}$ for Flexible OLED Display Technology

  • Yan, Min;Ezawa, Hiro
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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    • pp.614-615
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    • 2005
  • The use of plastic substrates enables new applications, such as flexible display devices, and other flexible electronic devices, using low cost, roll-to-roll (R2R) fabrication technologies. One of the limitations of polymeric substrate in these applications is that oxygen and moisture rapidly diffuse through the material and subsequently degrade the electro-optical devices. GE Global Research (GEGR) has developed a plastic substrate technology comprised of a superior high-heat polycarbonate ($LEXAN^{(R)}$) substrate film and a unique transparent coating package that provides the ultrahigh barrier (UHB) to moisture and oxygen,chemical resistance to solvents used in device fabrications, and a high performance transparent conductor. This article describes the coating solutions for polycarbonate ($LEXAN^{(R)}$) films and its compatibility with OLED device fabrication processes.

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