• Elastomers and Composites
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• 제24권3호
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• pp.185-192
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• 1989

The thermal degradation of the homopolymer poly(methyl methacrylate)(PMMA)/tetra cyano quino dimethane(TCNQ) blend and Eccogel/TCNQ blend were carried out using the thermogravimetric method in the stream of nitrogen gas with 60ml/min at various heating rate from 1 to $20^{\circ}C/min$. Friedman and Ozawa mathermatical methods were used to obtain the value of activation energy. Produced electrical properties and activation energy by electric conductivity method that used LCR meter.

• Journal of Magnetics
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• 제13권2호
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• pp.53-56
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• 2008

This study proposes a simple nano-patterning process for the fabrication of magnetic nanodot arrays on a large area substrate. Ni nanodots were fabricated on a large area (4 inches in diameter) Si substrate using the soft lithographic technique using self-assembled surface micelles of Polystyrene-block-Poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer formed at the air/water interface as a mask. The hexagonal array of micelles was successfully transferred to a Ni thin film on a Si substrate using the Langmuir-Blodgett technique. After ion-mill dry etching, a magnetic Ni nanodot array with a regular hexagon array structure was obtained. The Ni nanodot array showed in-plane easy axis magnetization and typical soft magnetic properties.

• Carbon letters
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• 제11권2호
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• pp.83-89
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• 2010

We prepared polycarbonate (PC)/poly(methyl methacrylate) (PMMA)/multiwall carbon nanotube (MWCNT) nanocomposites by co-rotating twin screw extruder at 533 K. Thermal analysis results indicate that the miscibility of PC and PMMA is enhanced by MWCNTs. Bead necklace-like morphology of PMMA-rich phase is observed in PC/PMMA/MWCNT nanocomposites with increasing PMMA weight fraction due to the bead necklace-like morphology. The tensile strength of PC/PMMA (75/25)/MWCNT (1 wt.%) nanocomposite is 3% higher than those of PC/PMMA (75/25) alloy. Suppression of die swell by MWCNT filler is observed in the melt flow of PC/PMMA/MWCNT nanocomposites during extrusion.

• Composites Research
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• 제17권4호
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• pp.47-52
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• 2004

본 논문에서는 사출성형법과 용매를 이용한 필름 캐스팅 방법을 혼용하여 MWNT/PMMA 나노복합재료의 제작방법을 확립하였다. 본 제작법을 이용하여, PMMA 모재 내에서 MWNTs의 분산도를 향상시킬 수 있었고 또한 분산상을 유지하면서 복합재료를 제작할 수 있었다. 제작된 복합재료의 기계적 물성을 측정하였고, 주사현미경 사진을 이용하여 파단면에서의 분산도를 확인해 보았다. 아울러 계면활성제가 MWNTs의 분산도 향상 및 기계적 물성 향상에 미치는 영향을 알아보았다

• Korea-Australia Rheology Journal
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• 제18권1호
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• pp.1-8
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• 2006

Blend of bisphenol-A polycarbonate (PC) and (acrylonitrile-styrene-acrylic rubber) terpolymer (ASA) having excellent balance in the interfacial properties and mechanical strength was developed for the automobile applications. Since interfacial adhesion between PC and styrne-acrylonitrile copolymer (SAN) matrix of ASA is not strong enough, two different types of compatibilizers, i.e, diblock copolymer composed of tetramethyl polycarbonate (TMPC) and SAN (TMPC-b-SAN) and poly(methyl methacrylate) (PMMA) were examined to improve interfacial adhesion between PC and SAN. TMPC-b-SAN was more effective than PMMA in increasing interfacial adhesion between PC and SAN matrix of ASA (or weld-line strength of PC/ASA blend). When blend composition was fixed, PC/ASA blends exhibited similar mechanical properties except impact strength and weld-line strength. Impact strength of PCI ASA blend at low temperature was influenced by rubber particle size and its morphology. PC/ASA blends containing commercially available PMMA as compatibilizer also exhibited excellent balance in mechanical properties and interfacial adhesion.

• 소성∙가공
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• 제13권1호
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• pp.59-64
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• 2004

Nano-scratch tests were performed on PMMA thin films spin-coated on a Si substrate using an atomic force microscopy (AFM) with loads ranging form 10nN to 100nN. At low loads, a ridge pattern was formed on the PMMA thin film surface. No wear particles were observed during the pattern-forming mild wear. At high loads, severe wear by plowing occurred, accompanied by wear particles. The film with the highest hardness showed the highest wear resistance. Friction force generated during the scratching was measured, which was closely related with surface deformation of the film. A simple empirical equation to deduce scratch hardness of the film from a linear fixed-distance scratch test was proposed, and scratching-speed dependency of the scratch hardness was displayed.

• Applied Science and Convergence Technology
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• 제26권5호
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• pp.129-132
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• 2017

We report a chemical vapor deposition approach and optimized growth condition to the synthesis of single layer molybdenum disulfide ($MoS_2$). Obtaining large grain size with continuous $MoS_2$ atomically thin films is highly responsible to the growth distance between molybdenum trioxide source and receiving silicon substrate. Experimental results indicate that triangular shape $MoS_2$ grain size could be enlarged up to > 80um with the precisely controlled the source-to-substrate distance under 7.5 mm. Furthermore, we demonstrate fabrication of a memory device by employing poly(methyl methacrylate) (PMMA) as insulating layer. The fabricated devices have a PMMA-$MoS_2$/metal configuration and exhibit a bistable resistance switching behavior with high/low-current ratio around $10^3$.

• 유변학
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• 제9권4호
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• pp.151-162
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• 1997

다층 구조를 갖는 고무/아크릴 충격보강제가 poly(methyl methacrylate) (PMMA)/ 충격보강제 블렌드의 몰폴로지와 유변학적 성질에 미치는 영향을 고찰하였다. TEM으로 측 정한 블렌드 내의 충격보강제 몰폴로지는 그 함량에 관계없이 균일한 크기의 구형을 이루는 것으로 나타났으며 파괴 단면의 SEM 측정으로부터 충격보강제와 매트릭스 수지와의 강한 결합력을 확인할수있었다. 블렌드의 유변물성 측정 실험에서는 충격보강제 함량이 복합 점 도에 크게 영향을 준 반면, capillary rheometer로부터 얻은 정상상태 점도에는 별 영향을 주지않음이 확인되었다. 특히 동적응력 실험의 고진동 주파수 영역에서는 일정 충격보강제 함량이상 일 때 충격보강제 자체의 점도와 근사해졌으며 이와같은 현상을 충격보강제의 shell 분자 상호간 또는 매트릭스 분자와의 엉킴에서 비롯되는 물리적인 상호 작용측면에서 설명해보았다. 또한 실험 결과를 Palierne[16]의 비상용성 블렌드계의 이멀젼 모델과 비교한 결과 상당한 차이를 확인할수 있었으며 이러한 차이는 위에서 언급한 shell 분자 상호간 또 는 매트릭스 분자와의 엉킴에 기인한다고 추정된다.

• 공업화학
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• 제21권3호
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• pp.353-355
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• 2010

양이온성의 2,2'-azobis(2-methylpropionamidine) (AIBA) 개시제를 이용한 methylmethacrylate (MMA)의 무유화제 에멀전 중합을 통해 polymethylmethacrylate (PMMA) 입자를 합성하였다. 스퇴버 방법을 이용하여 양이온성의 PMMA 입자 표면에 실리카를 코팅하였다. 음전하의 실리카 전구체는 양이온성의 PMMA 입자 표면과의 정전기적 인력에 의해 코팅된다. 실리카 코팅 과정 중에 PMMA 입자가 용해되어 후처리 없이 실리카 중공체를 얻을 수 있었다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2015년도 추계학술대회 논문집
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• pp.332-332
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• 2015

Block Copolymer lithography는 deep nano-scale device 제작을 위한 기존의 top-down방식의 photo-lithography를 대체할만한 기술로 많은 연구가 진행되고 있다. polystyrene(PS)/poly-methyl methacrylate (PMMA)로 구성된 BCP의 nano-scale PS mask는 일반적인 플라즈마 공정에 쉽게 damage를 입는다. 중성빔 식각을 이용하여 식각 공정 중 발생하는 BCP의 degradation을 감소시키고, 비등방성 식각 profile을 얻을 수 있으며 sidewall roughness(SWR)와 sidewall angle(SWA)가 향상되는 것을 알 수 있었다.