• 제목/요약/키워드: Polish

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폴리쉬 사용으로 인한 네일 변색에 관한 연구 (A Study on the Nail Discoloration of the Polish)

  • 이영숙;박영선
    • 복식문화연구
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    • 제19권2호
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    • pp.309-315
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    • 2011
  • Due to rapid growth of nail art industry, various materials and expression tools are have been developed. Increasing number of consumers favor diverse nail art techniques including painting and artificial tips in addition to basic care such as cuticle trimming or coloring. Accordingly, the diversity of polish colors has been settled as a concept of total fashion in addition to the clothes and accessories. As the result, nails may be damaged or discolored. A study the nail discoloration by using polish was purposed that contribute to the development of nail protective products. The tests were conducted with 20 college students for six months from March 3 to Aug. 28, 2009, using digital camera as the measurement apparatus. The students were classified into two groups which applied bright polish (white, beige, pink series) and dark polish (purple, blue, black series), and then divided into the groups applied and not applied the base coat which is known to be effective in preventing nail discoloration, and the groups applied and not applied tonic. The students applied polish for one week, and removed the polish with remover and photographed to examine the degree of nail discoloration. Dark colored polished resulted in earlier coloration and discoloration than the bright colored ones. Base coat could prevent coloration and the color changes of hyponychium and eponychium were lighter than the cases not applied with base coat. Tonic could delay coloration and reduced the color changes of hyponychium showing that tonic was effective for preventing coloration and discoloration of nail in addition to nutrition.

NOVA System을 이용한 CMP Automation에 관한 연구 (The Study for the CMP Automation with Nova Measurement System)

  • 김상용;정헌상;박민우;김창일;장의구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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    • pp.176-180
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    • 2001
  • There are several factors causing re-work in CMP process such as improper polish time calculation by operator. removal rate decline of the polisher, unstable in-suit pad conditioning, slurry supply module problem and wafer carrier rotation inconsistancy. And conclusively those fundimental reason for the re-work rate increasement is mainly from the cycle time delay between wafer polish and post measurement. Therefore, Wafer thickness measurement in wet condition could be able to remove those improper process conditions which may happen during the process in comparison with the conventional dried wafer measurement system and it can be able to reduce the CMP process cycle time. CMP scrap reduction by overpolish, re-work rate reduction, thickness control efficiency also can be easily achieved. CMP Equipment manufacturer also trying to develop integrated system which has multi-head & platen, cleaner, pre & post thickness measure and even control the polish time from the calculated removal rate of each polishing head by software. CMP re-work problem such as over & under polish by target thickness may result in the cycle time delay. By reducing those inefficient factors during the process and establish of the automatic process control, CLC system need to be adopted to maximize the process performance. Wafer to Wafer Polish Time Feed Back Control by measuring the wafer right after the polish shorten the polish time calculation for the next wafer and it lead to the perfact Post CMP target thickness control capability. By Monitoring all of the processed the wafer, CMP process will also be stabilize itself.

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NOVA System을 이용한 CMP Automation에 관한 연구 (The Study for the CMP Automation wish Nova Measurement system)

  • 김상용;정헌상;박민우;김창일;장의구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.176-180
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    • 2001
  • There are several factors causing re-work in CMP process such as improper polish time calculation by operator, removal rate decline of the polisher, unstable in-suit pad conditioning, slurry supply module problem and wafer carrier rotation inconsistency. And conclusively those fundimental reason for the re-work rate increasement is mainly from the cycle time delay between wafer polish and post measurement. Therefore, Wafer thickness measurement in wet condition could be able to remove those improper process conditions which may happen during the process in comparison with the conventional dried wafer measurement system and it can be able to reduce the CMP process cycle time. CMP scrap reduction by overpolish, re-work rate reduction, thickness control efficiency also can be easily achieved. CMP Equipment manufacturer also trying to develop integrated system which has multi-head & platen, cleaner, pre & post thickness measure and even control the polish time from the calculated removal rate of each polishing head by software. CMP re-work problem such as over & under polish by target thickness may result in the cycle time delay. By reducing those inefficient factors during the process and establish of the automatic process control, CLC system need to be adopted to maximize the process performance. Wafer to Wafer Polish Time Feed Back Control by measuring the wafer right after the polish shorten the polish time calculation for the next wafer and it lead to the perfect Post CMP target thickness control capability. By Monitoring all of the processed the wafer, CMP process will also be stabilize itself.

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Endotoxin-induced inflammation disturbs melatonin secretion in ewe

  • Herman, Andrzej Przemyslaw;Wojtulewicz, Karolina;Bochenek, Joanna;Krawczynska, Agata;Antushevich, Hanna;Pawlina, Bartosz;Zielinska-Gorska, Marlena;Herman, Anna;Romanowicz, Katarzyna;Tomaszewska-Zaremba, Dorota
    • Asian-Australasian Journal of Animal Sciences
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    • 제30권12호
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    • pp.1784-1795
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    • 2017
  • Objective: The study examined the effect of intravenous administration of bacterial endotoxin-lipopolysaccharide (LPS) -on the nocturnal secretion of melatonin and on the expression of enzymes of the melatonin biosynthetic pathway in the pineal gland of ewes, taking into account two different photoperiodic conditions: short-night (SN; n = 12) and long-night (LN; n = 12). Methods: In both experiments, animals (n = 12) were randomly divided into two groups: control (n = 6) and LPS-treated (n = 6) one. Two hours after sunset, animals received an injection of LPS or saline. Blood samples were collected starting one hour after sunset and continuing for 3 hours after the treatment. The ewes were euthanized 3 hours after LPS/saline treatment. The concentration of hormones in plasma was assayed by radioimmunoassay. In the pineal gland, the content of serotonin and its metabolite was determined by HPLC; whereas the expression of examined genes and protein was assayed using real-time polymerase chain reaction and Western Blot, respectively. Results: Endotoxin administration lowered (p<0.05) levels of circulating melatonin in animals from LN photoperiod only during the first hour after treatment, while in ewes from SN photoperiod only in the third hour after the injection. Inflammation more substantially suppressed biosynthesis of melatonin in ewes from SN photoperiod, which were also characterised by lower (p<0.05) cortisol concentrations after LPS treatment compared with animals from LN photoperiod. In the pineal gland of ewes subjected to SN photoperiod, LPS reduced (p<0.05) serotonin content and the expression of melatonin biosynthetic pathway enzymes, such as tryptophan hydroxylase and arylalkylamine-N-acetyltransferase. Pineal activity may be disturbed by circulating LPS and proinflammatory cytokines because the expression of mRNAs encoding their corresponding receptors was determined in this gland. Conclusion: The present study showed that peripheral inflammation reduces the secretion of melatonin, but this effect may be influenced by the photoperiod.

Development and Stability Evaluation of Enteric Coated Diclofenac Sodium Tablets Using AquaPolish E.

  • Zaid, A.N.;Fadda, A.M.;Nator, S.;Qaddumi, A.
    • Journal of Pharmaceutical Investigation
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    • 제41권4호
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    • pp.211-215
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    • 2011
  • The aim of this study was to develop a stable enteric coated diclofenac sodium (DFS) tablets using Aqua-Polish E without using a subcoat. DFS uncoated tablets were manufactured through the non direct compression process. AquaPolish E white aqueous coating dispersion was used as enteric coating material. This film forming polymer is a mixture of selected polymethacrylic/ethylacrylate copolymers. The stability of the obtained enteric coated tablets was evaluated according to ICH guidelines. No signs of disintegration or cracking was observed when they placed in 0.1N HCl solution (pH1.2), but they were completely disintegrated within 10 minutes when they placed in buffered solution at pH6.8. Dissolution test was also conducted by placing tablets in 0.1 N HCl for 2 hours and then 1 hour in phosphate buffer at pH 6.8. Less than 0.9 % of drug was released in the acidic phase and up to 97% in the basic medium. These findings suggest that aqueous enteric coating with AquaPolish E system is an easy and economical approach for preparing stable DFS enteric coat without the use of a subcoating layer.

GMR in Multilayers with an Alternating In-plane and Perpendicular Anisotropy

  • Stobiecki, F.;Szymanski, B.;Lucinski, T.;Dubowik, J.;Urbaniak, M.;Roll, K.;Kim, J.B;Kim, K.W;Lee, Y.P
    • Journal of Magnetics
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    • 제9권2호
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    • pp.40-46
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    • 2004
  • The magnetic properties of sputtered ($Ni_{83}Fe_{17}/Au/Co/Au$) multilayers with various thicknesses of Au (0.5 {\leq} t_{Au} {\leq} 3 nm), Ni-Fe ($1{\leq}t_{Ni-Fe}{\leq}4nm$) and Co ($0.2{\leq}t_{co}{\leq}1.5nm$) layers were characterized. An alternating in-plane and out-of-plane anisotropy of the ferromagnetic layers was achieved for the structures ($t_{Au}{\geq}1.5nm$) showing a weak coupling between the Ni-Fe layers with an in-plane anisotropy and the Co layers ($0.3{\leq}t_Co{\leq}1.2nm$) with a perpendicular anisotropy. For such a structure, a detailed discussion on the GMR effect is presented, relating to the magnetization reversal from a mutually perpendicular magnetic configuration at the remanence to a parallel one at the saturation. An influence of the dense labyrinth domain structure on the magnetoresistance effect is also addressed.

CROSS-LANGUAGE SPEECH PERCEPTION BY KOREAN AND POLISH.

  • Paradowska, Anna
    • 대한음성학회:학술대회논문집
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    • 대한음성학회 2000년도 7월 학술대회지
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    • pp.178-178
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    • 2000
  • This paper IS concerned with adults' foreign language aquisition and intends to research the relationship between the mother tongue's phonetic system (L1) and the perception of the foreign language (L2), in this paper Polish and Korean. The questions that are to help to define the aforementioned relationship are I) how Polish perceive Korean vowels, 2) how Koreans perceive Polish vowels, and 3) how Koreans perceive Korean vowels pronounced by Poles. In order to identify L2's vowels, the listeners try to fit them into the categories of their own language (L1). On the one hand, vowels that are the same in both languages and those that are articulated where no other vowel is articulated, have the best rate of recognition. For example, /i/ in both languages is a front close vowel and in both languages there are no other front close vowels. Therefore, vowels /i/ (and /a/) have the best rate of recognition in all three experiments. On the other hand, vowels that are unfamiliar to the listeners do not seem to have the worst rate of recognition. The vowels that have the worst rate of recognition are those, that are similar, but not quite the same as those of L1. This research proves that "equivalence classification prevents L2 learners from producing similar L2 phones, but not new L2 phones, authentically" (Flege, 1987). Polish speakers can pronounce unfamiliar L2 vowels "more authentically" than those similar to L1 vowels. However, the difference is not significant and this subject requires further research (different data, more informants).

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Optimum actuator placement for damping of vibrations using the Prestress-Accumulation Release control approach

  • Poplawski, Blazej;Mikulowski, Grzegorz;Pisarski, Dominik;Wiszowaty, Rafal;Jankowski, Lukasz
    • Smart Structures and Systems
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    • 제24권1호
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    • pp.27-35
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    • 2019
  • This paper proposes a quantitative criterion for optimization of actuator placement for the Prestress-Accumulation Release (PAR) strategy of mitigation of vibrations. The PAR strategy is a recently developed semi-active control approach that relies on controlled redistribution of vibration energy into high-order modes, which are high-frequency and thus effectively dissipated by means of the natural mechanisms of material damping. The energy transfer is achieved by a controlled temporary removal of selected structural constraints. This paper considers a short-time decoupling of rotational degrees of freedom in a frame node so that the bending moments temporarily cease to be transferred between the involved beams. We propose and test a quantitative criterion for placement of such actuators. The criterion is based on local modal strain energy that can be released into high-order modes. The numerical time complexity is linear with respect to the number of actuators and potential placements, which facilitates quick analysis in case of large structures.

Giant Magnetoimpedance in C067Fe4Mo1.5Si16.5B11 Metallic Glass Ribbon

  • Kuzminski, M.;Nesteruk, K.;Lachowicz, H.K.;Krzyzewski, A.;Yu, Seong-Cho;Lee, Hee-Bok;Kim, Cheol-Gi
    • Journal of Magnetics
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    • 제9권2호
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    • pp.47-51
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    • 2004
  • Giant magneto-impedance (GMI) effect in zero-magnetostrictive Co-based amorphous ribbons samples in their as-quenched and stress-released states as well as with intentionally induced magnetic anisotropy were investigated. Magnetic and impedance properties of the samples exhibiting different anisotropy were compared and the optimum operation conditions for the studied samples from the view-point of their utilization as a sensor element have been determined. A design of a model of magnetic field sensor and characteristics of the constructed prototype are presented.

Identification of Proteomic Components Associated with Resistance to Fusarium Head Blight in Rye

  • Perlikowski, Dawid;Wisniewska, Halina;Goral, Tomasz;Ochodzki, Piotr;Majka, Maciej;Pawlowicz, Izabela;Belter, Jolanta;Kosmala, Arkadiusz
    • The Plant Pathology Journal
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    • 제35권4호
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    • pp.313-320
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    • 2019
  • Rye was used here to dissect molecular mechanisms of resistance to Fusarium head blight (FHB) and to go deeper with our understanding of that process in cereals. F. culmorum-damaged kernels of two lines different in their potential of resistance to FHB were analyzed using two-dimensional gel electrophoresis and mass spectrometry to identify resistance markers. The proteome profiling was accompanied by measurements of ${\alpha}-$ and ${\beta}-amylase$ activities and mycotoxin content. The proteomic studies indicated a total of 18 spots with clear differences in protein abundance between the more resistant and more susceptible rye lines after infection. Eight proteins were involved in carbohydrate metabolism of which six proteins showed a significantly higher abundance in the resistant line. The other proteins recognized here were involved in stress response and redox homeostasis. Three remaining proteins were associated with protease inhibition/resistance and lignin biosynthesis, revealing higher accumulation levels in the susceptible rye line. After inoculation, the activities of ${\alpha}-$ and ${\beta}-amylases$, higher in the susceptible line, were probably responsible for a higher level of starch decomposition after infection and a higher susceptibility to FHB. The presented results could be a good reference for further research to improve crop resistance to FHB.