• 한국연소학회지
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• 제10권4호
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• pp.24-32
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• 2005

Various types of plasma source applied in $CH_4$ decomposition process are compared. DBD by pulse and AC power, spark by pulse and AC power, rotating arc and hollow cathode plasma are chosen to be compared. The results show that $CH_4$ conversion per given unit power is relatively high in hollow cathode plasma and rotating arc that induces rather high temperature condition and that is why both thermal dehydration and plasma induced decomposition contribute for the overall process. In case of DBD wherein high temperature electron and low temperature gas molecule coexist, the process shows low conversion rate, for in rather low temperature condition the contribution of thermal dehydration is lowered. Selectivity of $C_2H_6$ and $C_2H_2$ is shown to be a good parameter of the relative contribution of plasma chemistry in the overall process. From the results we concluded that required condition of plasma source for a cost effective and high yield $CH_4$ decomposition is to have characteristics of both thermal plasma and non thermal plasma in which temperature is high above a certain threshold state for thermal dehydration and electron induced collision is maximized in the same breath.

• 분석과학
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• 제22권2호
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• pp.152-158
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• 2009

본 연구에서는 유기화합물의 효과적인 소프트 이온화를 위하여 기존의 SPI장치를 개선한 새로운 형태의 방전 장치를 제작하였다. 새로 제작된 소프트 플라스마 이온화 장치는 반 원통 형태의 메쉬 음극과 속빈 원통 형태의 양극으로 구성하였다. 이온화원으로 사용하기에 앞서, 특정압력에서 전극간격에 따른 전압 전류 특성곡선을 조사하여 장치의 구성을 최적화 하였으며, 그 결과 넓은 전압 전류 영역에서 안정한 플라스마를 생성하는 조건을 결정하여 다양한 이온화 패턴을 기대 할 수 있게 하였다. 최적화된 이온화장치를 사중극자 질량분석기와 연결하여 디클로로메탄의 질량 스펙트럼을 관찰하였고, 분석결과 디클로로메탄은 전자충격이온화에 의한 분리 패턴과 비슷하게 나타나는 것을 확인하였다.

• Journal of Astronomy and Space Sciences
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• 제34권4호
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• pp.343-352
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• 2017

A space plasma facility has been operated with a back-diffusion-type plasma source installed in a mid-sized vacuum chamber with a diameter of ~1.5 m located in Satellite Technology Research Center (SaTReC), Korea Advanced Institute of Science and Technology (KAIST). To generate plasma with a temperature and density similar to the ionospheric plasma, nickel wires coated with carbonate solution were used as filaments that emit thermal electrons, and the accelerated thermal electrons emitted from the heated wires collide with the neutral gas to form plasma inside the chamber. By using a disk-type Langmuir probe installed inside the vacuum chamber, the generation of plasma similar to the space environment was validated. The characteristics of the plasma according to the grid and plate anode voltages were investigated. The grid voltage of the plasma source is realized as a suitable parameter for manipulating the electron density, while the plate voltage is suitable for adjusting the electron temperature. A simple physical model based on the collision cross-section of electron impact on nitrogen molecule was established to explain the plasma generation mechanism.

• 한국연소학회:학술대회논문집
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• 한국연소학회 2005년도 제31회 KOSCO SYMPOSIUM 논문집
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• pp.64-68
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• 2005

Methane reforming processes to obtain hydrogen were investigated experimentally by using atmospheric plasma source. Among possible reforming processes, such as a $CO_2$ reforming(dry reforming), a partial oxidation (POx), a steam reforming(SR), and a steam reforming with oxygen(SRO or auto-thermal reforming), partial oxidation and the steam reforming with oxygen were considered. We choose a rotating arc plasma as an atmospheric plasma source, since it shows the best performances in our preliminary tests in terms of a methane conversion, a hydrogen production, and a power consumption. Then, the effects of a feeding flow-rate, an electrical power input to a plasma reaction, an $O_2/C$ ratio and a steam to carbon ratio in the case of SRO on the reforming characteristics were observed systematically. As results, at a certain condition almost 100% of methane conversion was obtained and we could achieve the same hydrogen production rate by consuming a half of electrical power which was used by the best results for other researchers.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 추계학술대회 논문집
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• pp.369-372
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• 1997

Wire Ion Plasma Source (WIPS) is a plasma device which has a thin wire anode, a coaxially-set cylindrical cathode and electrodes located in both ends of the cylinder. The potential between the anode and cathode changes logarithmically by this electrode configuration. This electrode configuration enables high-density plasma to produce even at a low anode voltage. Since the electrode configuration is axially symmetric and long. plasma with axially uniform number density can be produced. Using particle-in-cell(PIC) and Monte Carlo collision(MCC), we investigate the traiectory of electrons and the characteristics of D.C. discharge in Wire ton Plasma Source.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.269-269
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• 2012

A new ion source has been designed, fabricated, and installed at the NBTS (Neutral Beam Test Stand) at the KAERI (Korea Atomic Energy Research Institute) site. The goalis to provide a 100 keV, 2MW deuterium neutral beam injection as an auxiliary heating of KSTAR (Korea Super Tokamak Advanced Research). To cope with power demand, an ion current of 50 A is required considering the beam power loss and neutralization efficiency. The new ion source consists of a magnetic cusp bucket plasma generator and a set of tetrode accelerators with circular copper apertures. The plasma generator for the new ion source has the same design concept as the modified JAEA multi-cusp plasma generator for the KSTAR prototype ion source. The dimensions of the plasma generator are a cross section of $59{\times}25cm^2$ with a 32.5 cm depth. The anode has azimuthal arrays of Nd-Fe permanent magnets (3.4 kG at surface) in the bucket and an electron dump, which makes 9 cusp lines including the electron dump. The discharge properties were investigated preliminarily to enhance the efficiency of the beam extraction. The discharge of the new ion source was mainly controlled by a constant power mode of operation. The discharge of the plasma generator was initiated by the support of primary electrons emitted from the cathode, consisting of 12 tungsten filaments with a hair-pin type (diameter = 2.0 mm). The arc discharge of the new ion source was achieved easily up to an arc power of 80 kW (80 V/1000 A) with hydrogen gas. The 80 kW capacity seems sufficient for the arc power supply to attain the goal of arc efficiency (beam extracted current/discharge input power = 0.8 A/kW). The accelerator of the new ion source consists of four grids: plasma grid (G1), gradient grid (G2), suppressor grid (G3), and ground grid (G4). Each grid has 280 EA circular apertures. The performance tests of the new ion source accelerator were also finished including accelerator conditioning. A hydrogen ion beam was successfully extracted up to 100 keV /60 A. The optimum perveance is defined where the beam divergence is at a minimum was also investigated experimentally. The optimum hydrogen beam perveance is over $2.3{\mu}P$ at 60 keV, and the beam divergence angle is below $1.0^{\circ}$. Thus, the new ion source is expected to be capable of extracting more than a 5 MW deuterium ion beam power at 100 keV. This ion source can deliver ~2 MW of neutral beam power to KSTAR tokamak plasma for the 2012 campaign.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.582-584
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• 2007

In order to improve the accuracy of simulated results, new UV source was designed. Previously the optical simulation was performed with the symmetric planar UV source. To design new UV source, UV distribution from the plasma fluid code was implanted to the 3-dimensional optical code to generate the visible light distribution. The results from planar UV source and new UV source were compared with the ICCD (Intensified CCD) image in real PDP cell and analyzed the variation of geometries and optical properties.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.74-74
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• 2009

The ArF PR mask was. developed to overcome the limit. of sub 40nm patterning technology with KrF PR. But ArF PR difficult to meet the required PR selectivity by thin PR thickness. So need to the multi-stack mask such as amorphous carbon layer (ACL). Generally capacitively coupled plasma (CCP) etcher difficult to make the high density plasma and inductively coupled plasma (ICP) type etcher is more suitable for multi stack mask etching. Hybrid Coupled Plasma source (HCPs) etcher using the 13.56MHz RF power for ICP source and 2MHz and 27.12MHz for bias power was adopted to improve the process capability and controllability of ion density and energy independently. In the study, the oxide trench which has the multi stack layer process was investigated with the HCPs etcher (iGeminus-600 model DMS Corporation). The results were analyzed by scanning electron microscope (SEM) and it was found that etching characteristic of oxide trench profile depend on the multi-stack mask.

• 대한전기학회논문지
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• 제39권11호
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• pp.1219-1226
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• 1990

This paper is to report the results on the design and construction of a thermal plasma generator with high current DC source. Also, this paper presents the methods to stabilize plasma and to find effects of process variables on plasma characteristics. For this purpose, the reaction chamber, vacuum system, plasma generating torch, magnetic field generating coil with power supply, high current DC source and the other parts have been designed. Fundamental properties of the thermal plasma under various conditions have been measured and analyzed. Magnetic Reynolds Number has been introduced to explain the relationship between plasma and external magnetic field. Through this number, the effect of magnetic field on the plasma has been explained under various flow rates and pressure. A sudden increase in the plasma voltage has been observed with the increase of magnetic field. From this, fundamental changes in plasma flow are believed to occur at the nozzle, and an effort to explain the phenomenon has been tried.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 광주전남지부
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• pp.71-74
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• 2006

Discharge of the flat lamp lighting source research arc requested very much. For improving brightness, life time, efficiency of flat lamp, plasma diagnosis of the flat lamp lighting source to understand property of lighting source is very important. distance of discharge electrode is 5.5mm and width is 16.5mm, we measured electron temperature and electron density measured with single langmuir probe in flat lamp. we tested the discharge from 100 Torr to 300 Torr pressure. the Pulse is rectangular pulse with frequency 20kHz and Duty ratio 20%. Resultly, electron temperature decreases and electron density increase as increase the gas pressure and electron temperature decreases and electron density increase as increase the voltage.