• The Transactions of The Korean Institute of Electrical Engineers
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• v.64 no.4
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• pp.560-566
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• 2015

The self-consistent simulation based on the drift-diffusion approximation with anisotropic transport coefficients was performed. The RHCP-wave propagation was observed in MICP and this wave was refracted toward the high-density region. The calculated impedance seen from the antenna terminal shows that resistance component of MICP is a higher than that of ordinary ICP. Because of a higher resistance, the power transfer efficiency was improved to 95%. This property is practically important for large-size, low-pressure plasma sources because high resistance corresponds to high power-transfer efficiency and stable impedance matching characteristics.

• Corrosion Science and Technology
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• v.20 no.3
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• pp.112-117
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• 2021

Inductively coupled plasma magnetron sputtering (ICPMS) has the advantage of being able to dramatically improve coating properties by increasing the plasma ionization rate and the ion bombardment effect during deposition. Thus, this paper presents the comparative results of CrN films deposited by direct current magnetron sputtering (dcMS) and ICPMS systems. The structure, microstructure, and mechanical and corrosive properties of the CrN coatings were investigated by X-ray diffractometry, scanning electron microscopy, nanoindentation, and corrosion-resistance measurements. The as-deposited CrN films by ICPMS grew preferentially on a 200 plane compared to dcMS on a 111 plane. As a result, the films deposited by ICPMS had a very compact microstructure with high hardness. The nanoindentation hardness reached 19.8 GPa, and 13.5 GPa by dcMS. The corrosion current density of CrN film prepared by ICPMS was about 9.8 × 10^-6 mA/cm², which was 1/470 of 4.6 × 10^-3 mA/cm², the corrosion current density of CrN film prepared by dcMS.

• Journal of the Semiconductor & Display Technology
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• v.22 no.1
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• pp.64-71
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• 2023

In this study, we investigated the effects of BiAlSiO glass composition on its glass forming range, thermal properties, and plasma resistance. The results showed that increasing the Al2O3 content suppressed the tendency for crystallization and hindered glass formation beyond a certain threshold. Bi2O3 was found to increase the content of non-bridging oxygen, resulting in a decrease in glass transition temperature and an increase in thermal expansion coefficient. Furthermore, the etching rate was found to improve with increasing Al2O3 content but decrease with increasing SiO2 content. It was concluded that the boiling point of fluorinated compounds should be considered to 900℃. Therefore, this study is expected to contribute to the understanding of the properties of BiAlSiO glass and its application to low temperature melting PRG compositions.

• Corrosion Science and Technology
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• v.22 no.4
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• pp.257-264
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• 2023

Ti-6Al-4V alloys are mainly used as dental materials due to their excellent biocompatibility, corrosion resistance, and chemical stability. However, they have a low bioactivity with bioinertness in the body. Therefore, they could not directly bond with human bone. To improve their applications, their bone bonding ability and bone formation capacity should be improved. Thus, the objective of this study was to improve the bioinert surface of titanium alloy substrate to show bioactive characteristics by performing surface modification using wollastonite powder. Commercial bioactive wollastonite powder was successfully deposited onto Ti-6Al-4V alloy using a room temperature spray process. It was found that wollastonite-coated layer showed homogeneous microstructure and uniform thickness. Corrosion resistance of Ti-6Al-4V alloy was also improved by plasma electrolytic oxidation treatment. Its wettability and bioactivity were also greatly increased by wollastonite coating. Results of this study indicate that both plasma electrolytic oxidation treatment and wollastonite coating by room temperature spray process could be used to improve surface bioactivity of Ti-6Al-4V alloy substrate.

• Journal of Ocean Engineering and Technology
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• v.25 no.6
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• pp.60-65
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• 2011

A low temperature plasma carburizing process was performed on AISI 316L austenitic stainless steel to achieve an enhancement of the surface hardness without degradation of its corrosion resistance. Attempts were made to investigate the influence of the processing temperatures on the surface hardened layer during low temperature plasma carburizing in order to obtain the optimum processing conditions. The expanded austenite (${\gamma}_c$) phase, which contains a high saturation of carbon (S phase), was formed on all of the treated surfaces. Precipitates of chromium carbides were detected in the hardened layer (C-enriched layer) only for the specimen treated at $550^{\circ}C$. The hardened layer thickness of ${\gamma}_c$ increased up to about $65{\mu}m$ with increasing treatment temperature. The surface hardness reached about 900 $HK_{0.05}$, which is about 4 times higher than that of the untreated sample (250 $HK_{0.05}$). A minor loss in corrosion resistance was observed for the specimens treated at temperatures of $300^{\circ}C{\sim}450^{\circ}C$ compared with untreated austenitic stainless steel. In particular, the precipitation of chromium carbides at $550^{\circ}C$ led to a significant decrease in the corrosion resistance. A diamond-like carbon (DLC) film coating was applied to improve the wear and friction properties of the S phase layer. The DLC film showed a low and stable friction coefficient value of about 0.1 compared with that of the carburized surface (about 0.45). The hardness and corrosion resistance of the S phase layer were further improved by the application of such a DLC film.

• Journal of the Korean institute of surface engineering
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• v.52 no.4
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• pp.194-202
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• 2019

A systematic investigation was made on the influence of processing parameters such as gas composition and treatment temperature on the surface characteristics of hardened layers of low temperature plasma nitrided 316L Austenitic Stainless Steel. Various nitriding processes were conducted by changing temperature ($370^{\circ}C$ to $430^{\circ}C$) and changing $N_2$ percentage (10% to 25%) for 15 hours in the glow discharge environment of a gas mixture of $N_2$ and $H_2$ in a plasma nitriding system. In this process a constant pressure of 4 Torr was maintained. Increasing nitriding temperature from $370^{\circ}C$ to $430^{\circ}C$, increases the thickness of S phase layer and the surface hardness, and also makes an improvement in corrosion resistance, irrespective of nitrogen percent. On the other hand, increasing nitrogen percent from 10% to 25% at $430^{\circ}C$ decreases corrosion resistance although it increases the surface hardness and the thickness of S phase layer. Therefore, optimized condition was selected as nitriding temperature of $430^{\circ}C$ with 10% nitrogen, as at this condition, the treated sample showed better corrosion resistance. Moreover to further increase the thickness of S phase layer and surface hardness without compromising the corrosion behavior, further research was conducted by fixing the $N_2$ content at 10% with introducing various amount of $CH_4$ content from 0% to 5% in the nitriding atmosphere. The best treatment condition was determined as 10% $N_2$ and 5% $CH_4$ content at $430^{\circ}C$, where the thickness of S phase layer of about $17{\mu}m$ and a surface hardness of $980HV_{0.1}$ were obtained (before treatment $250HV_{0.1}$ hardness). This specimen also showed much higher pitting potential, i.e. better corrosion resistance, than specimens treated at different process conditions and the untreated one.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.33A no.10
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• pp.98-106
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• 1996

A thin film of aluminum for ultra large scale integrated circuits metalization has been deposited on TiN and SiO$_{2}$ substrates by plasma assisted chemical vapor deposition using DMEAA (dimenthylethylamine alane) as a precursor. The effects of plasma on surface topology and growth characteristics were investigated. Thermal CVD Al could not be got continuous films on insulating subsrate such as SiO$_{2}$. However, it was found that Al films could be deposited on SiO$_{2}$ substate without any pretreatments by the hydrogen plasma for pyrolysis of DMEAA. Compared to the thermal CVD, PACVD films showed much better reflectance and resistance on TiN and SiO$_{2}$ substrate. We obtained mirror-like PACVD Al film of 90% reflectance and resistance on TiN and SiO$_{2}$ substrates. We obtained mirror-like PACVD Al film of 90% reflectance on TiN substrate. Excellent conformal step coverage was obtained on submicron contact holes ;by the PACVD blanket deposition.

• Journal of the Korean Ceramic Society
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• v.35 no.6
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• pp.610-618
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• 1998

Alumina were added to ceria based ceramic powders upto 9.7 vol% and composite powders were sprayed by plasma spraying process in order to improve the mechanical properties such as hardness fracture tough-ness and thermal shock resistance. The ceria based coating sprayed without alumina has the typical colum-nar and lamellar structure. Alumina addition has lowered the amount of columnar and lamellar sturcture Added alumina was segreagated in the grain boundary and grain of ceria based crystal accompanied with pore. The maximum value of density and the minimum value of porosity were observed at the sprayed coating with 4.8 vol% alumina. The hardness fracture toughness and thermal shock resistance were increased with alumina addition. The improvement of mechanical properties of plasma sparyed ceria based coatings result-ed from the disapperance of the columnar and lamellar sturcture by addition of alumina.

• Journal of the Korean Vacuum Society
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• v.5 no.1
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• pp.85-92
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• 1996

The external electricla characteristics of helicon wave plasmas were measured over a wide range of RF power and magnetic filed. External parameters. such as antenna voltage , current, phase shift, and interanl parameter, electron density were measured at 7MHz, 1mTorr Ar discharge . The equivalent discharge resistance and reactance, and the power transfer efficiency were calculated through these measurements. There are a helicon mode which produces high density plasma by helicon wave and a lowmode which produces low density plasma by capaictive electric field. In case of the helicon mode, the anternna voltage and current were lower than those of the low-mode. The phase difference between voltage and current decreased suddenly at the transition point from the low-mode to the helicon mode. Equivalent resistance and power efficiency increased and reactance decreased suddenly at the transition point. These results mean that the power transperred to plasma and the nutual coupling between the antenna and plasma increase as the mode changes from the low-mode to the helicon mode.

• Journal of Welding and Joining
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• v.17 no.5
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• pp.107-115
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• 1999

The objective of this research was to study the formation of the thick hardened layer with the addition of metal powder(Cu) and ceramics powders(TiC) on the aluminum 5083 alloys by plasma transferred arc process(PTA process) and to characterize the effect of overlaying conditions on the overlaid layer formation. This was followed by investigating the microstructures of the overlaid layers and mechanical properties such as hardness and wear resistance. The overlaid layer containing copper powder was alloyed and intermetallic compound($CuAl_2$) was formed. The overlaid layers with high melting point TiC powders, however, did not react with base metal. Wear resistance of the alloyed layer was remarkably improved by the formation of $CuAl_2$, precipitate phase, which prevented wear of base aluminum alloys and at higher wear speed, accelerated sliding of the counter part. Wear resistance of the composite layer was also remarkably improved because TiC powder act as a load barring element and Fe debris fragments detached from the counter part act as a solid lubricant on the contact surface.