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http://dx.doi.org/10.5370/KIEE.2015.64.4.560

A study on Ar/CF4 Magnetized Inductively Coupled Plasma Using Fluid Simulation  

Kim, Yun-Gi (Dept. of Electrical and Computer Engineering, Pusan National University)
Son, Eui-Jeong (Dept. of Electrical and Computer Engineering, Pusan National University)
Wi, Sung-Suk (Dept. of Electrical and Computer Engineering, Pusan National University)
Kim, Dong-Hyun (Dept. of Electrical and Computer Engineering, Pusan National University)
Lee, Ho-Jun (Dept. of Electrical and Computer Engineering, Pusan National University)
Publication Information
The Transactions of The Korean Institute of Electrical Engineers / v.64, no.4, 2015 , pp. 560-566 More about this Journal
Abstract
The self-consistent simulation based on the drift-diffusion approximation with anisotropic transport coefficients was performed. The RHCP-wave propagation was observed in MICP and this wave was refracted toward the high-density region. The calculated impedance seen from the antenna terminal shows that resistance component of MICP is a higher than that of ordinary ICP. Because of a higher resistance, the power transfer efficiency was improved to 95%. This property is practically important for large-size, low-pressure plasma sources because high resistance corresponds to high power-transfer efficiency and stable impedance matching characteristics.
Keywords
Inductively Coupled Plasma; $Ar/CF_4$ Plasma; Fluid Simulation;
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