• Journal of Mechanical Science and Technology
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• 제15권12호
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• pp.1808-1815
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• 2001

The characteristics of a pulsed plasma jet originating from an electrothermal capillary discharge have been investigate using laser-induced fluorescence (LIF) measurement. Previous emission measurements of a 3.1 kJ plasma jet show trial upstream of the Mach disk the temperature and electron number density are about 14,000 K and and 10$\^$17/ cm$\^$-3/, while downstream of the Mach dick tole values are about 25,000 K and 10$\^$18/ cm$\^$-3/, respectively. However, these values are barred on line-of-sight integrated measurements that may be misleading. Hence, LIF is being used to provide both spatially and temporally resolved measurements. Our recent work has been directed at using planar laser-induced fluorescence (PLIF) imaging of atomic copper in the plasma jet flow field. Copper is a good candidate for PLIF studies because it is present throughout the plasma and has electronic transitions that provide an excellent pump-detect strategy. Our PLIF results to date show that emission measurements may give a misleading picture of the flow field, as there appeals to be a large amount of relatively low temperature copper outside the barrel shock. which may lead to errors in temperature inferred from emission spectroscopy. In this paper, the copper LIF image is presented and at the moment, relative density of atomic copper, which is distributed in the upstream of the pulsed plasma jet, is discussed qualitatively.

• 한국표면공학회지
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• 제34권5호
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• pp.475-480
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• 2001

Diffusion of Cu into the low-k para-xylene based plasma polymer (pXPP) thin films deposited by plasma-enhanced chemical vapor deposition using the para-xylene precursor was comparatively measured using various methods. Cu layer was deposited on the surfaces of pXPPs treated by $N_2$ plasma generated in a magnetically enhanced inductively coupled plasma reactor. Diffusion characteristics of Cu into pXPPs were measured using Rutherford backscattering spectroscopy (RBS), secondary ion mass spectroscopy (SIMS), cross-sectional transmission electron microscopy (XTEM), and current-voltage (I-V) measurements for the vacuum-annealed Cu/pXPPs for 1 hour at $450^{\circ}C$ and were compared. The results showed a correlation between the I-V measurement and SIMS data are correlated and have a sensitivity enough to evaluate the dielectric properties but the RBS or XTEM measurements are not sufficient to conclude the electrical properties of low-k dielectrics with Cu in the film bulk. The additional results indicate that the pXPP layers are quite resistant to Cu diffusion at the annealing temperature of $450^{\circ}C$ compared to the other previously reported organic low-k materials.

• KIEE International Transactions on Electrophysics and Applications
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• 제11C권4호
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• pp.107-112
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• 2001

Laser Thomson scattering measurements of electrom temperature and density in a neutral loop discharge (NLD) plasma were performed in order to reveal the electron behavior around the neutral loop (NL). The experimental results were examined by using a simulation model that included effects of a three dimensional electromagnetic field with spatial decay of the RF electric field, and the limitation of the spatial extent of the electron motion and collision effect. From the experiments and modeling of the electron behavior, it was found that NLD plasma posses the electron temeprature $T_{e}$ and density ne peaks around the NL is essential for the formation of plasma. Also, the optimum condition of plasma production could be simply estimated by the calculation of $U_{av}$ and $F_{0}$././.

• 접착 및 계면
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• 제7권1호
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• pp.23-29
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• 2006

Polymer thin films of pentafluorostyrene (PFS) were prepared by RF plasma (13.56 MHz) polymerization in continuous wave (CW) mode, as a function of plasma power and monomer pressure. Conditions for film preparation were optimized by measuring the solvent resistance of plasma polymer thin films in DMAc, NMP, THF, acetone and chloroform, as well as by evaluating the optical clarity via UV-VIS measurements. Pulsed mode plasma polymerization was also utilized to enhance the optical properties of the films by varying the period of on-time and duty cycle. Finally, the films were subjected to refractive index measurements and analyzed by ${\alpha}$-step, TGA and FT-IR.

• 멤브레인
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• 제23권4호
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• pp.297-303
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• 2013

혈액 속의 글루코우즈의 농도를 측정하기 위해 포스파젠 고분자로 만들어진 진단막을 제조하였다. 혈액 속에 존재할 가능성이 있는 장애성분들이 글루코우즈의 농도측정에 미치는 영향을 조사하였다. 그러한 물질들 중, ascorbic acid (AA)는 기준 플라즈마 용액보다 3~9% 정도 높은 K/S 결과치를 나타내었고, tolbutamide (TA)는 기준용액보다 11~13% 정도 낮은 K/S 결과치를 나타내었고, triglycerides와 bovine serum albumin (BSA)은 기준용액 보다 20~25% 정도 낮은 K/S 결과치를 나타내었다. 그러나 위의 물질들을 제외하고는 대부분의 장애성분들이 포스파젠 고분자 진단막을 이용한 혈당측정에 큰 영향을 미치지 않는다는 것을 보여 주었다.

• Journal of Mechanical Science and Technology
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• 제15권12호
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• pp.1691-1698
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• 2001

In recent years, significant progress has been made in modeling turbulence behavior in plasma and its effect on transport. It has also been made in diagnostics for turbulence measurement; however, there is still a large gap between theoretical model and experimental measurements. Visualization of turbulence can improve the connection to theory and validation of the theoretical model. One method to visualize the flow structures in plasma is a laser Schlieren imaging technique. We have recently applied this technique and investigated the characteristics of a highly underexpanded pulsed plasma jet originating from an electrothermal capillary source. Measurements include temporally resolved laser Schlieren imaging of a precursor blast wave. Analysis on the trajectory of the precursor blast wave shows that it does not follow the scaling expected for a strong shock resulting from the instantaneous deposition of energy at a point. However, the shock velocity does scale as the square root of the deposited energy, in accordance with the point deposition approximation.

• Transactions on Electrical and Electronic Materials
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• 제8권5호
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• pp.211-214
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• 2007

Chemical and morphological changes of phenol formaldehyde-based photoresist after $O_2$ radiofrequency(RF) plasma treatment depending on exposure time and source power were investigated. It was found that etch rate of photoresist sharply increased after discharge turn on and reached a limit with increase in plasma exposure time. Contact angle measurements and X-ray photoelectron spectroscopy(XPS) analysis showed that the surface chemical structure become nearly constant after 15 sec of the treatment. Atomic force microprobe(AFM) measurements were shown that surface roughness was increased with plasma exposure time.

• 한국표면공학회지
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• 제23권4호
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• pp.218-224
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• 1990

Silicon nitride thin(SiNx) is deposited onto 3 inch silicon wafor using ECR plasma apparatus. For the two different plasma extraction windows size, the thin films which were deposited by changing the SiH4/N2 gas fole at at 1.5mTorr without substrate heating are analyzed through the XPS and wlliposometer measurements. The very uniform and good quality silicon nitride thin film were obtained with the analyzed results of the deposited films, and particularly, ion temperature perpendicular to the magnetic filed was nearly same as the neutral gas temperature. The large amount of plasma loss in the transport process following magnetic field lines could be seen from the plasma emission intensity measurements.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.171-171
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• 2012

We have studied the effects of plasma treatments on CdS buffer layers in CIGS thin film solar cells. The CdS layers were deposited on CIGS films by chemical bath deposition (CBD) method. The RF plasma treatments of the CdS thin films were performed with Ar, $O_2 and $N_2 gases, respectively. After plasma treatments, the solar cells with Al:ZnO/i-ZnO/CdS/CIGS structures were fabricated. The surface properties of the CdS/CIGS thin films after plasma treatments were investigated with SEM, EDX and AFM measurements. The electrical properties of manufactured solar cell were discussed with the results of current-voltage measurements. The plasma treatments have a strong influence on the open circuit voltage (VOC) and the fill factor of the solar cells. Finally, a correlation between the surface properties of CdS layer and the efficiencies of the CIGS thin film solar cells is discussed.

• Steel and Composite Structures
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• 제6권6호
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• pp.531-555
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• 2006

H-shaped welded steel column members are fabricated by welding together pre-cut flanges and the web. Modern fabricators are increasingly using plasma-cutting technique instead of traditional flame cutting. Different fabrication techniques result in different degrees of geometric imperfections and residual stresses, which can have considerable influence on the strength of steel columns. This paper presents the experimental investigation based temperature profiles, geometric imperfections, and built-in residual stresses in plasma cut-welded H-shaped steel column members and in similar flame cut-welded H-shaped steel columns. Temperature measurements were taken during and immediately after the cutting operations and the welding operations. The geometric imperfections were established at closely spaced grid locations on the original plates, after cutting plates into plate strips, and after welding plate strips into columns. Geometric imperfections associated with plasma cut element and members were found to be less than those of the corresponding elements and members made by flame cutting. The "Method of Section" technique was used to establish the residual stresses in the plate, plate strip, and in the welded columns. Higher residual stress values were observed in flame cut-welded columns. Models for idealized residual stress distributions for plasma cut and flame cut welded sections have been proposed.