• Journal of the korean academy of Pediatric Dentistry
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• v.45 no.1
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• pp.82-89
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• 2018

In a photodynamic therapy, the difference of antibacterial capacity was compared according to the type of source of light when the same quantity of energy is irradiated. After S. mutans is formed in planktonic state and biofilm state, erythrosine diluted to $40{\mu}M$ was treated for 3 minutes, and as the type of light source, Halogen, LED, and Plasma arc were used, which were irradiated for 30 seconds, 15 seconds and 9.5 seconds, respectively. After the completion of the experiment, CFU of each experiment arm was measured to compare the photodynamic therapeutic effects according to each condition. The CFU of each experiment arm had no statistically significant difference. Under the same quantity of energy, the photodynamic therapeutic effect can be said to be the same regardless of types of light source, which is a useful result in the clinical field with various light irradiators.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.108-108
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• 2010

We have generated Ne-Xe plasma in dense plasma focus device with hypocycloidal pinch for extreme ultraviolet (EUV) lithography and investigated an electron temperature. We have applied an input voltage 4.5 kV to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ne-Xe(30%) gas in accordance with pressure. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium (LTE) conditions, the electron temperature of the hypocycloidal pinch plasma focus could be obtained by the optical emission spectroscopy (OES). The electron temperature has been measured by Boltzmann plot. The light intensity is proportion to the Bolzman factor. We have been measured the electron temperature by observation of relative Ne-Xe intensity. The EUV emission signal whose wavelength is about 6~16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD) and the line intensity has been detected by using a HR4000CG Composite-grating Spectrometer.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.306-306
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• 2010

A high density (> $10^{11}\;cm^{-3}$) and low electron temperature (< 2 eV) plasma is produced by using a conventional HF (13.56 MHz) plasma enhanced chemical vapor deposition (PECVD) with an additional ultra high frequency (UHF, 314 MHz) plasma source utilizing two parallel antenna assembly. It is applied for the high rate synthesis of high quality nanocrystalline silicon (nc-Si) films. A high deposition rate of 1.8 nm/s is achieved with a high crystallinity (< 70%), a low spin density (< $3{\times}10^{16}\;cm^{-3}$) and a high light soaking stability (< 1.5). Optical emission spectroscopy measurements reveal emission intensity of $Si^*$ and $SiH^*$, intensity ratio of $H{\alpha}/Si^*$ and $H{\alpha}/SiH^*$ which are closely related to film deposition rate and film crystallinity, respectively. A high flux of precursor and atomic hydrogen which are produced by an additional high excitation frequency is effective for the fast deposition of highly crystallized nc-Si films without additional defects.

• Medical Lasers
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• v.8 no.1
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• pp.28-31
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• 2019

Superficial fungal infections with dermatophytes, nondermatophyte molds, or yeasts are treated primarily with topical and/or systemic antifungal agents. Additional or alternative treatment modalities, particularly energy-delivering modalities, however, are used widely to induce fungicidal effects via selective photothermal reactions. In addition to light- or laser-based devices, plasma therapy also has antifungal properties. This report describes a Korean male patient with mycologically confirmed tinea pedis that was treated effectively with two sessions of nitrogen plasma treatment at one-week intervals using a plasma delivering system. Nitrogen plasma was prepared by loading a 0.28-ml inert nitrogen gas/pulse that was activated by a microwave generator. The other treatment settings were a nozzle diameter of 5 mm, pulse energy of 0.75 J, pulse duration of 7 msec, and two passes. One week after the first session of nitrogen plasma treatment, the patient exhibited marked reductions in scale and inflammation. One month after the final treatment, no clinical features of recurrence were found, and successive potassium hydroxide testing revealed negative results.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.893-896
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• 2003

Plasma polymerized para-xylene (PPpX) thin films deposited by plasma enhanced chemical vapor deposition (PECVD) were used to passivate the organic light emitting diodes (OLEDs). For OLEDs, indium tin oxide (ITO), N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1,1'-diphenyl-4,4'-diamine (TPD), tris(8-hydroxyquinoline) aluminum $(Alq_{3})$ and aluminum (Al) were used as the anode, the hole transport layer (HTL), the emitting layer (EML) and the cathode, respectively. The OLED device with the PPpX passivation film (passivated device) showed similar electrical and optical characteristics to those of the OLED device without the PPpX passivation film (control device), indicating that the PECVD process did not degrade the performance of the OLEDs notably. The lifetime of the passivated device was two times longer than that of the control device. Passivation of OLEDs with PPpX films also suppressed the growth of dark spots. The density and size of dark spots of the passivated device were much smaller than those of the control device.

• Korean Journal Plant Pathology
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• v.10 no.2
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• pp.83-91
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• 1994

Stem tissues of tomato plants (cv. Kwanyang) inoculated with Phytophthora capsici were examined by light and electron microscopy to compare early cytological differences between comaptible and incompatible interactions of tomatoes with the fungus. Twenty four hours after inoculation, the compatible isolate S 197 colonized severely the epidermis, cortex, and xylem vessels of stem tissue, whereas only few fungal cells colonized the stem tissues inoculated with the incompatible isolate CBS 178.26. Fragmented plasma membrane, distorted chloroplast, degraded cell wall, remnants of host cytoplasm were early ultrastructural features of the damaged host cell observed both in the compatible and incompatible interaction, a number of vesicles were distributed in the space between fungal cell walls and plasma membrane. The degradation of host cell walls by P. capsici was more pronounced in the compatible than the incompatible interactions. The incompatible interactions of tomato cells with P. capsici were characterized by formation of host cell wall apposition in the cortical parenchyma cells, indicating that the apposition of electron-dense material from the host cell walls may function as a plant defense reaction to the fungus. The fungal cells encased by wall appositions had abnormal cytoplasm and separated plasma membranes. The haustorium which formed from the fungal hyphae did not further penetrate through the host wall apposition and cytoplasmic aggregation, especially in the incompatible reactions. In contrast, the haustorium of the compatible isolate S 197 was not encased by wall appositions.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.52 no.10
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• pp.476-480
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• 2003

In this paper, we have performed 3-dimensional time-resolving measurement of the Ne light emitted from the cell of plasma display panel(PDP) as a function of the pressure using the scanned point detecting system. From the temporal behavior results, we could analyze the discharge behavior of panel with Ne-Xe(4%) mixing gas and 300 torr, 400 torr and 500 torr pressure. At the top view of panel, the discharge of 300 torr panel starts at the 634 ns and ends at the 722 ns. The emission duration time is about 90 ns. The discharge of 400 torr panel starts at the 682 ns and ends at the 786 ns. the emission duration time is about 100 ns. Also, the discharge of 500 torr panel starts at the 770 ns and ends at the 826 ns. the emission duration time is about 56 ns. The discharge moves from inner edge of cathode electrode to outer cathode electrode forming arc type. In the side view of 300 torr, 400 torr and 500 torr an emission shows that the light is detected up to 180${\mu}{\textrm}{m}$, 150${\mu}{\textrm}{m}$ and 70${\mu}{\textrm}{m}$ height of barrier rib and the emission distribution of the 300 torr is wider than 400 torr, 500 torr.

• Proceedings of the KIEE Conference
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• 1999.07e
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• pp.2227-2229
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• 1999

As a direct-view flat panel displays, there are many devices, such as plasma display panels(PDPs), vacuum fluorescent displays (VFDs), and light emitting diode(LED). Among these, a PDP is the first type of panel display to be made commercially available. A 'Plasma display' is the general term for a flat display utilizing the light emission that is produced by gas discharge. However, the brightness and Luminous efficiency are still not adequate for consumer television. So, the new sustain electrode type of ac PDP was proposed. By arranging the transparent electrode of quadrangle by zigzag, the area of electrode are reduced, and the length of electrode gap is increased. It generates a high luminous efficiency(corresponding to a 40% improvement of standard type), the same discharge voltage characteristics, and the low power consumption at same luminance.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.05a
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• pp.86-90
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• 2006

Discharge of the flat lamp lighting source research are requested very much. For improving brightness, life time, efficiency of flat lamp, plasma diagnosis of the f1at lamp lighting source to understand property of lighting source is very important. Distance of discharge electrode is 5.5mm and width is 16.5mm, we have measured electron temperature and electron density measured with single Langmuir probe in flat lamp. We have tested the discharge from 100 Torr to 300 Torr pressure. The pulse is rectangular pulse with frequency 20kHz and duty ratio 20%. In result, electron temperature decreases and electron density increase as increase the gas pressure and electron temperature decreases and electron density increase as increase the voltage.

• Journal of the Semiconductor & Display Technology
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• v.7 no.2
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• pp.59-62
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• 2008

The Lifetime of OLEDs by ITO/glass substrates cleaning method and cathode deposition method were investigated in the fabrication of green light emitting OLEDs with $Alq_3$-C545T fluorescent system. In our experiments, the optimum cleaning method was obtained at last processing of boiling IPA(isopropyl alcohol). And the optimum deposition methode was obtained at 3 steps deposition rate of Al. The deposition rate of 3 steps progressed changing from $0.5\AA$/sec to $3\AA$/ sec. The green light emitting OLED with plasma treatment at 150W for 2 minutes showed the highest luminance and efficiency of 20000 cd/$m^2$ and 16 lm/W. On the contrary, the OLED device without plasma treatment showed much lower performance with the luminance and efficiency of 3500 cd/$m^2$ and 2 lm/W.