• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.159-159
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• 2015

A new approach for antimicrobial is based on the overproduction of reactive nitrogen species (RNS), especially; nitric oxide (NO) and peroxinitrite (ONOO-) are important factors to deactivate the bacteria. Recently, non-thermal atmospheric pressure plasma jet (APPJ) has been frequently used in the field of microbial sterilization through the generation of different kinds of RNS/ROS species. However, in previous study we showed APPJ has combine effects ROS/RNS on bacterial sterilization. It is not still clear whether this bacterial killing effect has been done through ROS or RNS. We need to further investigate separate effect of ROS and RNS on bacterial sterilization. Hence, in this work, we have enhanced NO production, especially; by applying a 1% of HNO3 vapour to the N2 based APPJ. In comparison with nitrogen plasma with inclusion of water vapour plasma, it has been shown that nitrogen plasma with inclusion of 1% of HNO3 vapour has higher efficiency in killing the E. coli through the high production of NO. We also investigate the enhancement of NO species both in atmosphere by emission spectrum and inside the solution by ultraviolet absorption spectroscopy. Moreover, qPCR analysis of oxidative stress mRNA shows higher gene expression. It is noted that 1% of HNO3 vapour plasma generates high amount of NO for killing bacteria.

• Journal of Industrial Technology
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• v.15
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• pp.15-22
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• 1995

We have studied the generation and behavior of negative ions in silane plasmas. The negative ions were formed by homogeneous reaction in silane plasma and the behavior of negative ions were predicted by solving the model equations. The concentration profiles of negative ions were shown as a function of reactor length and time. The effects of process variables such as reactor pressure, flow rate and electrical field strengths on the behavior of negative ions were analyzed.

• Proceedings of the KIEE Conference
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• 1994.07b
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• pp.1568-1570
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• 1994

Laser-triggered-lightning is protection methed for power apparatus against lightning. It is necessary to understand the generation mechanism of laser produced plasma. So production of long distance laser-plasma-channel was numerically analyzed with electron growth equation and laser transport equation.

• Bulletin of the Korean Chemical Society
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• v.15 no.8
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• pp.622-627
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• 1994

Conducting solid samples are successfully analyzed with the spark ablation combined to the moderate power (500W) Helium Microwave Induced Plasma (He MIP). The relative standard deviations are in the range of 3-10% and the detection limits are around 50 ${\mu}$g $g^-1$. These values are higher than those of Ar MIP or Ar Inductively Coupled Plasma. Spark ablated particles are examined to investigate the analytical characteristics of the system.

• Journal of the Korean Society of Propulsion Engineers
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• v.19 no.6
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• pp.1-9
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• 2015

This paper introduces a zero-dimensional modeling on the plasma generation in electrothermal gun operation. The plasma generator consists of alumina bore and aluminum electrodes which is electrically powered by outer pulse forming network and, traditionally, its numerical simulations have employed time-dependent one-dimensional governing equations. However, by assuming isothermal approximation along the bore and choked bore exit condition, present analysis simplifies the mass and energy equations into zero-dimensional approximation of plasma conditions coupled with mass ablation model and plasma property evaluation. The numerical results show good agreement with the corresponding one-dimensional computations and thus verify the present modeling approach.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1869-1873
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• 2008

In this work, to make it possible to generate glow discharge in atmospheric pressure condition with relatively high and wide electric field, micro channel reactor is proposed. Si DRIE and Cr deposition by Ebeam evaporation is used to make channel and bottom electrode layer. Upper electrode is made from ITO glass to visualize discharge within micro channel. Fabricated reactor is verified by generating uniform glow plasma with N2 / He gases each as working fluid. The range of gas electric field to generate glow plasma is from about 200 V/cm and upper limit is not observed in tested condition of up to 150 kV/cm. This data shows that micro channel plasma reactor is more versatile. Indirect estimation of electron temperature in this reactor can be inferred that the electron temperature within glow discharge in micro reactor lies $0{\sim}2eV$. This research demonstrates that the reactor is appropriate in application that needs to maintain low temperature condition during chemical process.

• Journal of Environmental Science International
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• v.21 no.3
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• pp.363-368
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• 2012

The influence of plasma discharge on the nutrient components ($NO_3$-N, $NH_4$-N, $PO_4$-P, K, Ca, and Mg) and water quality [pH, ORP (oxidation-reduction potential) and electric conductivity] of hydroponic water were investigated. It was observed that the $NH_4$-N, $PO_4$-P, K, Ca, and Mg were kept at the constant concentrations for plasma discharging of 90 min. On the other hand, $NO_3$-N concentration was increased with proceeding of the plasma discharge. The increase of $NO_3$-N concentration was considered with the fact that nitric acid was created from nitrogen among supplying air for the insulation of inside of dielectric barrier. ORP and electric conductivity was increased with plasma discharging time. However, pH was decrease with what because of the generation of the nitric acid. When adjusting the hydroponic ingredients, pH and conductivity must to be considered because of the change of pH and conductivitiy with the discharging.

• Journal of the Semiconductor & Display Technology
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• v.21 no.3
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• pp.125-129
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• 2022

The current display technology tends to be highly integrated with high resolution, the element size is gradually downsized, and the structure becomes complicated. Inductively coupled plasma (ICP) dry etcher of various types of etching equipment is a structure that places a large multi-divisional antenna source on the top lid, passes current to the Antenna, and generates plasma using the induced magnetic field generated at this time. However, in the case of a device of a large area size, a support that can withstand a load structurally is necessary, and when these support portions are applied, arrangement of antenna becomes difficult, which causes reduction in uniformity. As described above, the development of antenna source of a large area having a uniform plasma density on the whole surface is difficult to restrict hardware (H/W). As a solution to this problem, we confirmed the change in uniformity of plasma by applying two kinds of specific shape faraday shield(FICP) to the lower part of the large area upper lid antenna of 6 and 8th more than that generation size. In this thesis, we verify the faraday shield effect which can improve plasma uniformity control of ICP dry etcher equipment applied to medium and large displays.

• Journal of the Semiconductor & Display Technology
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• v.23 no.2
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• pp.100-106
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• 2024

To generate the plasma required in dry cleaning processes, the plasma chamber must be supplied with a high-quality AC voltage with a voltage of more than 1 kV and a frequency of 400 kHz. In the existing research, many methods to supply high power have been studied, but how to improve the quality of the power for high-quality plasma has been relatively little studied. In this paper, we propose a study to improve the quality of RF power circuit for high-quality plasma generation in dry cleaning method. Existing methods in the environment of full-bridge-based RF power circuits must perform PWM duty control in the light load region. This causes distortions in the waveform, resulting in poor power quality, which directly leads to poor plasma quality. To solve these problems, a half-bridge switching method is proposed and the improvement in waveform quality is verified. To verify the feasibility of the design and control algorithm proposed in this paper, an RF power circuit prototype is fabricated and the proposed design and control method is verified through simulation and actual experiments under dummy load.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.230.2-230.2
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• 2016

A new approach for antimicrobial is based on the overproduction of reactive nitrogen species (RNS), especially; nitric oxide (NO) and peroxinitrite ($ONOO^-$-) are important factors to deactivate the bacteria. Recently, non-thermal atmospheric pressure plasma jet (APPJ) has been frequently used in the field of microbial sterilization through the generation of different kinds of RNS/ROS species. However, in previous study we showed APPJ has combine effects ROS/RNS on bacterial sterilization. It is not still clear whether this bacterial killing effect has been done through ROS or RNS. We need to further investigate separate effect of ROS and RNS on bacterial sterilization. Hence, in this work, we have enhanced NO production, especially; by applying a 1% of HNO3 vapour to the N2 based APPJ. In comparison with nitrogen plasma with inclusion of water vapour plasma, it has been shown that nitrogen plasma with inclusion of 1% of HNO3 vapour has higher efficiency in killing the E. coli and different type of cancer cell through the high production of NO. We also investigate the enhancement of NO species both in atmosphere by emission spectrum and inside the solution by ultraviolet absorption spectroscopy. Moreover, qPCR analysis of oxidative stress mRNA shows higher gene expression. It is noted that 1% of HNO3 vapour plasma generates high amount of NO for killing bacteria and cancer cell killing.