• Title/Summary/Keyword: Plasma electron beam

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High Temperature Tribology Behavior of 4YSZ Coatings Fabricated by Air Plasma Spray (APS) and Electron Beam Physical Vapor Deposition (EB-PVD) (플라즈마 용사 및 전자빔 물리기상 증착법으로 제조된 4YSZ 코팅의 고온마찰마모 거동)

  • Yang, Young-Hwan;Park, Chan-Young;Lee, Won-Jun;Kim, Sun-Joo;Lee, Sung-Min;Kim, Seongwon;Kim, Hyung-Tae;Oh, Yoon-Suk
    • Journal of the Korean institute of surface engineering
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    • v.46 no.6
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    • pp.258-263
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    • 2013
  • 4 mol% Yttria-stabilized zirconia (4YSZ) coatings are fabricated by Air Plasma Spray (APS) and Electron Beam Physical Vapor Deposition (EB-PVD) with top coating of thermal barrier coating (TBC). NiCrAlY based bond coat is prepared as 150 ${\mu}m$ thickness by conventional APS (Air Plasma Spray) method on the NiCrCoAl alloy substrate before deposition of top coating. Each 4YSZ top coating shows different tribological behaviors based on the inherent layer structures. 4YSZ by APS which has splat-stacked structure shows lower friction coefficient but higher wear rate than 4YSZ by EB-PVD which has columnar structure. For 4YSZ by APS, such results are expected due to the sliding wear accompanied with local delamination of splats.

Room Temperature Luminescence from ion Beam or Atmospheric Pressure Plasma Treated SrTiO3

  • Song, Jin-Ho;Seok, Jae-Gwon;Yeo, Chang-Su;Lee, Gwan-Ho;Song, Jong-Han;Sin, Sang-Won;Choe, Jin-Mun;Jo, Man-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.530-531
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    • 2013
  • 3 MeV protonirradiated SrTiO3 (STO) single crystal exhibits a blue and green mixed luminescence. However, the same proton irradiated STO deposited with very thin Pt layer does not show any luminescence. This Pt layer involved in preventing the damage caused by arcingthat comes from tens of kV surface voltage build-up due to secondary electron induced charge up at the surface of insulator during ion beam irradiation. It implies that luminescence of ion irradiated STO originated from the modified STO surface layer caused by arcing rather than direct ion beam irradiation effect. Atmospheric pressure plasma, a simple and cost-effective method, treated STO also exhibits the same kind of blue and green mixed luminescence as the ion beam treated STO, because this plasma also creates a surface damage layer by arcing.

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Ceramic Coating by Electron Beam PVD for Nanos-Tructure Control (나노구조 제어를 위한 EB-PVD법에 의반 세라믹스 코팅)

  • Matsbara, Hideaki
    • Ceramist
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    • v.9 no.6
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    • pp.24-29
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    • 2006
  • Electron beam physical vapor deposition (EB-PVD) process has currently been applied to thermal barrier coatings (TBCs) for aircraft engines. Due to unique columnar structure, EB-PVD TBCs have advantages in resistances to thermal shock and thermal cycle for their applications, compared to films prepared by plasma spray By the EB-PVD equipment, we successfully obtained yttria-stabilized zirconia (YSZ) layer which has columnar and feather like structure including a large amount of nano size pores and gaps. The EB-PVD technique has been developed for coating functional perovskite type oxides such as (La, Sr)MnO3. Electrode properties have been improved by interface and structural control.

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Plasma Sources for Production of High Flux Particle Beams in Hyperthermal Energy Range (하이퍼써멀 에너지 영역에서 높은 플럭스 입자빔 생성을 위한 플라즈마 발생원)

  • Yoo, S.J.;Kim, S.B.
    • Journal of the Korean Vacuum Society
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    • v.18 no.3
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    • pp.186-196
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    • 2009
  • Since it is difficult to extract a high flux ion beam directly at an energy of hyperthermal range ($1{\sim}100\;eV$), especially, lower than 50 eV, the ions should be neutralized into neutral particles and extracted as a neutral beam. A plasma source required to generate and efficiently transport high flux hyperthermal neutral beams should be easily scaled up and produce a high ion density (${\ge}10^{11}\;cm^{-3}$) even at a low working pressure (${\le}$ 0.3 mTorr). It is suggested that the required plasma source can be realized by Electron Cyclotron Resonance (ECR) plasmas with diverse magnetic field configurations of permanent magnets such as a planar ECR plasma source with magnetron field configuration and cylindrical one with axial magnetic fields produced by permanent magnet arrays around chamber wall. In both case of the ECR sources, the electron confinement is based on the simple mirror field structure and efficiently enhanced by electron drifts for producing the high density plasma even at the low pressure.

Microstructural ananalysis of AlN thin films on Si substrate grown by plasma assisted molecular beam epitaxy (RAMBE를 사용하여 Si 기판 위에 성장된 AIN 박막의 결정성 분석)

  • 홍성의;한기평;백문철;조경익;윤순길
    • Journal of the Korean Vacuum Society
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    • v.10 no.1
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    • pp.22-26
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    • 2001
  • Microstructures of AlN thin films on Si substrates grown by plasma assisted molecular beam epitaxy were analyzed with various growth temperatures and substrate orientations. Reflection high energy electron diffraction (RHEED) patterns were checked for the in-situ monitoring of the growth condition. X-ray diffraction(XRD), double crystal X-ray diffraction (DCXD), and transmission electron microscopy/diffraction (TEM/TED) techniques were employed to characterize the microstructure of the films after growth. On Si(100) sub-strates, AlN thin films were grown mostly along the hexagonal c-axis orientation at temperature higher than $850^{\circ}C$. On the other hand the AlN films on Si(111) were epitaxially grown with directional coherencies in AlN(0001)/Si(111), AlN(1100)/Si(110), and AlN(1120)/Si(112). The microstructure of AlN thin films on Si(111) substrates, with a full width at half maximum of almost 3000 arcsec at 2$\theta$=$36.2^{\circ}$, showed that the single crystal films were grown, even if they includ a lot of crystal defects such as dislocations and stacking faults.

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E-beam Lithography using Plasma Processes (플라즈마 공정을 이용한 전자빔 리소그래피)

  • Kim, Sung-O;Lee, Jin;Lee, Kyung-Sup;Lee, Duck-Chool
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.575-577
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    • 1999
  • In this study, the PPPI(Plasma Polymerized Phenyl Isothiocyanate) resist thin film was manufactured in accordance with the plasma polymerization method and after exposing it to an electron beam, a pattern was formed by plasma etching. With the FT-IR(Fourier transform-infrared spectrometry) analysis, it was confirmed that the PI(Phenl Isothiocyanate) monomer was successsfully produced into a thin film by the plasma. The polymerization rate of the thin film was 450~ 1012($\AA$/min) to 100-200(W) discharge power and 120-12($\AA$/min) to 0.1 ~0.4[torr] system pressure.

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Production and Properties of Amorphous TiCuNi Powders by Mechanical Alloying and Spark Plasma Sintering

  • Kim, J.C.;Kang, E.H.;Kwon, Y.S.;Kim, J.S.;Chang, Si-Young
    • Journal of Powder Materials
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    • v.17 no.1
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    • pp.36-43
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    • 2010
  • In present work, amorphous TiCuNi powders were fabricated by mechanical alloying process. Amorphization and crystallization behaviors of the TiCuNi powders during high-energy ball milling and subsequent microstructure changes were studied by X-ray diffraction and transmission electron microscope. TEM samples were prepared by the focused ion beam technique. The morphology of powders prepared with different milling times was observed by field-emission scanning electron microscope and optical microscope. The powders developed a fine, layered, homogeneous structure with milling times. The crystallization behavior showed that glass transition, $T_g$, onset crystallization, $T_x$, and super cooled liquid range ${\Delta}T=T_x-T_g$ were 628, 755 and 127K, respectively. The as-prepared amorphous TiCuNi powders were consolidated by spark plasma sintering process. Full densified TiCuNi samples were successfully produced by the spark plasma sintering process. Crystallization of the MA powders happened during sintering at 733K.

FIRST OPERATING TEST OF THE 700 MHz 1 MW PROTOTYPE KLYSTRON FOR A PROTON ACCELERATOR

  • Ko, Seung-Kook;Lee, Bo-Young;Lee, Kang-Ok;Hong, Jin-Seok;Jeon, Jae-Ha;Chung, Bo-Hyun;Noh, Seung-Jeong;Chung, Kie-Hyung
    • Nuclear Engineering and Technology
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    • v.38 no.8
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    • pp.779-784
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    • 2006
  • The design, manufacturing process, and first operating test of a high power RF source for a proton accelerator are described. A klystron amplifier system has been developed for operation at 700 MHz, 1 MW and is composed of a triode type electron gun, six cavities, an RF output window, a beam collector, and an electromagnet. The prototype klystron was constructed and tested at a reduced duty to produce the designed output RF power.

THEORY AND SIMULATION OF BROADBAND ELECTROSTATIC NOISE IN THE MAGNETOTAIL

  • Kim, S.Y.
    • Journal of Astronomy and Space Sciences
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    • v.11 no.2
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    • pp.250-272
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    • 1994
  • Various plasma instabilities driven by the ion beams have been proposed in order to explain the broadband electrostatic noise (BEN) in the earth's geomagnetic tail. Ion acoustic, ion-ion two stream, and electron acoustic instabilities have been proposed. Here we consider a theoretical investigation of the generation of BEN by cold streaming ion beams in the earth's magnetotail. Linear theory analysis and particle simulation studies for the plasma sheet, which consists of warm electrons and ions as well as cold streaming ion beams, have been done. Both beam-ion acoustic and ion-ion two stream instabilities easily occur when the beam and warm electron temperature ratio, $T_b/T_e$ is small enough. The numerical simulation results confirm the existence of broadband electrostatic noise whose frequency is ranged from $\omega$=0 to $\omega$$\omega_{pe}$.

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