• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1994년도 춘계학술대회 논문집
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• pp.138-140
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• 1994

Plasma polymerized thin film was prepared using an interelectrod inductively coupled gas-flow-type reactor. Styrene was chosen as the monomer to be used. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage 30kV, and the pattern in the resist was developed with RIE 80 with argon gas mixture ratio, pressure and RF power. The effect of charge of discharge power on growth rate and etching rate of the thin films were studied. The molecular structure of thin films were investigated by FIR and then was discussed in relation to its quality as a resist. In the case of Plasma polymerization, thickness of resist could be controlled by discharge duration and power. Also etch rate is increased as to growing argon gas and RF power with RIE 80.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.441-441
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• 2010

Hyperthermal neutral beam (HNB)은 박막 성장에 필요한 에너지와 반응 입자들을 동시에 공급할 수 있기 때문에 특히, 저온에서 박막을 성장시킬 때 매우 유용하다. 이와 같은 목적으로 race track 형태의 자기장 구조를 갖고 있는 2.45 GHz electron cyclotron resonance (ECR) plasma를 이용한 HNB 소스를 개발하였다. HNB 소스에서 인출되는 입자들은 중성 입자 뿐만 아니라 이온이나 전자와 같은 하전 입자들로 구성되어 있다. 그러나 양질의 HNB를 얻기 위해서는 하전 입자들의 구성 비율을 최소화해야 한다. HNB 소스는 하전 입자의 구성 비율을 1 % ($1{\mu}A/cm^2$) 이하가 되도록 설계되었다. 이것을 위해서 영구 자석의 자기장을 이용한 plasma limiter를 설계하였다. 대부분의 전자는 limiter 앞에 형성된 자기장의 구조와 반응하여 주로 gradient B drift와 curvature drift를 통하여 차단되고, 이온은 로렌츠 힘을 받아 빔 축으로 부터 벗어나도록 하였다. Limiter의 특성을 연구하기 위해서 정전탐침을 limiter에서 빔 축 방향으로 이동시키면서 I-V 곡선과 이온 포화 전류 및 전자 포화 전류를 측정하였다. 측정 결과를 바탕으로 plasma limiter의 성능을 검증하였고 문제점을 논의하였다.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2008년 영문 학술대회
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• pp.877-880
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• 2008

In this article, in order to fabricate polymer based electrospray device with super hydrophobic nozzle we use PTFE(polyfluorotetraethylene) plate and PMMA(polymethylmethacrylate). To obtain the super hydrophobic surface nozzle, PTFE surface is treated by argon and oxygen plasma treatment process. And evaluate the treated surface, perform measuring contact angle, SEM(Scanning Electron Microscope) and AFM(Atomic Force Microscope). We compare the performance of the super hydrophobic PTFE surface nozzle with raw PTFE and PMMA surface nozzle. For the ion beam treated PTFE nozzle, the liquid doesn't overflow and it keeps initial position and meniscus shape. From these results, we expect in cease of superhydrophobic surface nozzle jetting becomes more stable and repeatable.

• Journal of Korean Vacuum Science & Technology
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• 제5권1호
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• pp.19-24
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• 2001

The paper represents the results of the development and the test of "cold cathode" ion source model with 5 cm aperture where the glow discharge is utilized for generation of electrons in the cathode of the ion source. The results of probe measurements of the ion source are represented. The integral parameters such as electron energy distribution function(EEDF), electron density and mean electron energy, discharge voltage-current characteristics, and distribution of ion beam were studied.

• Journal of Radiation Protection and Research
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• 제42권1호
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• pp.63-68
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• 2017

Background: The combined effect of the low energy electron (LEE) irradiation and $Cu^{2+}$ ion on DNA damage was investigated. Materials and Methods: Lyophilized pBR322 plasmid DNA films with various concentrations (1-15 mM) of $Cu^{2+}$ ion were independently irradiated by monochromatic LEEs with 5 eV. The types of DNA damage, single strand break (SSB) and double strand break (DSB), were separated and quantified by gel electrophoresis. Results and Discussion: Without electron irradiation, DNA damage was slightly increased with increasing Cu ion concentration via Fenton reaction. LEE-induced DNA damage, with no Cu ion, was only 6.6% via dissociative electron attachment (DEA) process. However, DNA damage was significantly increased through the combined effect of LEE-irradiation and Cu ion, except around 9 mM Cu ion. The possible pathways of DNA damage for each of these different cases were suggested. Conclusion: The combined effect of LEE-irradiation and Cu ion is likely to cause increasing dissociation after elevated transient negative ion state, resulting in the enhanced DNA damage. For the decrease of DNA damage at around 9-mM Cu ion, it is assumed to be related to the structural stabilization due to DNA inter- and intra-crosslinks via Cu ion.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.287-287
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• 2009

The characteristics of slow wave structure employed for backward wave oscillators expected to be a high power microwave source are studied analytically and experimentary. The slow wave structure is a sinusoidally corrugated wall waveguide The dispersion relationn and transmitted characteristics for microwaves are measured in the air. There exist literatures on high efficiency of enhanced radiation from backward wave oscillators involving plasma studied experimentally.

• Journal of Information Display
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• 제7권2호
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• pp.1-5
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• 2006

The characteristics of MgO layer deposited under hydrogen atmosphere were investigated. Hydrogen gas was introduced during e-beam evaporation coating process of MgO layer and its effects on microstructure, cathode luminescence spectra, discharge voltages and effective yield of secondary electron emission were examined. The results indicated that the hydrogen influences the concentration and energy levels of defects in MgO layer, which in turn affects the luminance efficiency and discharge delays of the panels significantly.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.713-715
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• 2009

Preferred orientation of MgO protection layer is controlled via adjusting diffusion of adatom between (111) plane with highest neighbor atoms and (200) plane with lowest neighbor atoms. The diffusion of adatom could be modulated by the factors such as substrate temperature, deposition rate, and extra energy applied on adatom like ion beam energy.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.220-220
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• 1999

In plasma source ion implantation, the target is immersed in the plasma and repetitively biased by negative high voltage pulses to implant the extracted ions from plasma into the surface of the target material. In this way, the problems of line-of-sight implantation in ion-beam ion implantation technique can be effectively solved. In addition, the high dose rate and simplicity of the equipment enable the ion implantation a commercially affordable process. In this work, plasma source ion implantation technique was used to improve the wear resistance of Co-cemented WC. which has been extensively used for high speed tools. Nitrogen and carbon ions were implanted using the pulse bias of -602kV, 25 sec and at various implantation conditions. The implanted samples were examined using scanning Auger electron spectroscopy and XPS to investigate the depth distributions of implanted ions and to reveal the chemical state change due to the ion implantation. The implanted ions were found to have penetrated to the depth of 3000$\AA$. The wear resistance of the implanted samples was measured using pin-on-disc wear tester and the wear tracks were examined with alpha-step profilometer.

• 한국세라믹학회지
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• 제45권11호
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• pp.707-712
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• 2008

Plasma resistant nanocrystalline $Y_2O_3$ films were deposited on alumina substrates through the electron-beam PVD technique. Increasing substrate temperature to $600^{\circ}C$ resulted in the textured microstructures with significantly enhanced adhesion force of the coating to the substrate. During the exposure to fluorine plasma, erosion rate of the coated specimen was higher than that of a sintered yttria specimen, but significantly lower than that of a single crystalline alumina. Considering the adhesion and erosion behaviors observed in the coated specimen prepared at $600^{\circ}C$, the deposition technique appears effective in reducing contamination particles generated from the ceramic parts in the plasma environment.