• 한국우주과학회:학술대회논문집(한국우주과학회보)
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• 한국우주과학회 2003년도 한국우주과학회보 제12권2호
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• pp.81-81
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• 2003

We report the plasma blob events that were observed from KOMPSAT-1 (2250 LT, 685-km altitude) and from DMSP F15 (2130 LT,840-km altitude) in the low-latitude ionosphere. The global distribution of blobs showed a season-longitudinal dependence similar to the distribution of the equatorial plasma bubbles, although they were observed along the ${\pm}$15 dip latitudes. The blobs drifted upward relative to the ambient plasmas, and the electron temperatures and H+ proportions were lower within the blobs compared to those in the background. These characteristics of the plasma blobs are very similar to the characteristics of the equatorial plasma bubbles. Then, we suggest that the blobs were originated from the lower altitudes by the mechanism that drives an upward drift of the plasma bubbles. The blob events did not occur in a correlated way with the magnetic activity or daily variation of the solar activity.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.73-73
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• 2008

In this work, the study on the $SiO_2$ film non-uniformity by PECVD (Plasma Enhanced Chemical Vapor Deposition) was performed. Plasma diagnostics was analyzed by a DLP(Double Langmuir Probe) and a probe-type QMS(Quadrupole Mass Spectrometer) in order to investigate the spatial distribution of the plasma species in the chamber. The relationship between the plasma species and the depositing rate of the films was examined. On the basis of this work, it was confirmed that O radical density mainly contributed to the increase in the depositing rate of the $SiO_2$ films and the electron temperature in the plasma had a main effect on the formation of the oxygen radicals.

• Biomolecules & Therapeutics
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• 제1권2호
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• pp.204-210
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• 1993

The distribution and excretion of DWC-751, a new cephalosporin, were examined in rats and mice following a single intravenous administration. DWC-751 in plasma and urine was determined by both HPLC and microbiological assay. The plasma concentration of the drug declined biexponentially. The initial and terminal half lives of the drug were 3.0 and 28.3 min, respectively. Binding of the drug to plasma proteins was 42.3%. The distribution volume at steacly-state ($Vd_{ss}$) was only 0.341 ι/kg, which is well correlated with the low n-octanol/water partition coefficient of the drug ($K_{o/w{\cong}0$) Actually, the drug was distributed to liver, kidney and lung with very low organ/plasma concentration ratio. The drug, was excreted mainly via renal excretion, i.e., the total($CL_T$) and apparent renal($CL_{R}$) clearances of the drug were 10.8 and 7.5 ml/min/kg, respectively.

• 전자공학회논문지D
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• 제35D권5호
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• pp.54-62
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• 1998

In a plasma etching system, ions become an important parameter in determining the wafer topography which depends on both the physical sputtering mechanism and the chemically enhanced reaction. this paper reports the energy and angular distributions of ions across the plasma sheath using a monte carlo method. The ion distribution is mainly affected by the magnitude of the sheath voltage and by the collision in the sheath. Furthemore, the local potential distribution in a plamsa sheath has been determined by solving the poisson's equation. In th is work, ionic collisions were cosidered in terms of both charge exchange and momentum transfer. The three-dimensional distributions of ions were calculated with varying the input process conditions in the plasma reactor.

• 한국분말재료학회지
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• 제11권5호
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• pp.363-368
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• 2004

In the present study, the focus is on the analysis of the effect of the mold dimensions on the temperature distribution of a die during plasma activated sintering. The temperature distribution of a cylindrical mold with various dimensions was measured using K-type thermocouples. The temperature homogeneity of the die was studied based on the direction and dimensions of the die. A temperature gradient existed in the radial direction of the die during the plasma activated sintering. Also, the magnitude of the temperature gradient was increased with increasing sintering temperature. In the longitudinal direction, however, there was no temperature gradient. The temperature gradient of the die in the radial direction strongly depended on a ratio of die volume to punch area.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.91-91
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• 2005

Electron energy distribution functions and plasma parameters such as electron temperature ($T_e$) and electron density ($n_e$) in low-pressure Cl-based plasmas have been measured. As the $Cl_2/A4$ gas mixing ratio, the $BCl_3$ gas addition and the process pressure increases, the electron energy probability and the electron temperature decreases. In case of source power increases, electron energy probability increases, whereas the electron temperature was not related.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 하계학술대회 논문집 E
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• pp.1803-1805
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• 1998

Electron temperature, electron density and electron energy distribution function were measured in Radio-Frequency Inductively Coupled Plasma(RFICP) using a probe method. Measurements were conducted in argon discharge for pressure from 10 mTorr to 40 mTorr and input rf power from 100W to 600W and flow rate from 3 sccm to 12 sccm. Spatial distribution electron temperature and electron density and electron energy distribution function were measured for discharge with same aspect ratio(R/L=2). Electron temperature was found to depend on pressure, but only weakly on power. Electron density and electron energy distribution function strongly depended on both pressure and power. Electron density and electron energy distribution function increased with increasing flow rate. Radial distribution of the electron density and electron energy distribution function were peaked in the plasma center. Normal distribution of the electron density electron energy distribution function were peaked in the center between quartz plate and substrate. These results were compared to a simple model of ICP, then we found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2003년도 학술회의 논문집 정보 및 제어부문 B
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• pp.844-847
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• 2003

Display devices are becoming increasingly important as an interface between humans and machines in the growing information society. In display devices, PDP (Plasma Display Panel) has many advantages in that it has wide screen, wide viewing angle and is light weight, thin. In PDP driving method, if the brightness of input image is high, applying the fixed sustain pulse to the PDP panel will raise the PDP power consumption and may damages the PDP panel. To overcome these problems, the Plasma AI driving method was introduced by the Matshushita co. in Japan. The Plasma AI driving module calculates the peak value and average value of 1 frame image and adjusts the gradation and sustain pulses for 1 frame sustain. In this paper, the proposed PDP driving module is based on the Plasma AI driving module. The proposed driving module calculates peak value and average value, and the brightness distribution of 1 frame image. Using brightness distribution, the proposed driving module divides 1 frame input image into 15 image patterns. For each image pattern, minimum sustain pulses and sub-frames are used for the brightness of 1 frame image and the sustain weight for 64, 128, 192 gradation is proposed. Therefore, the sustain power consumption can be reduced.

• 한국표면공학회지
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• 제39권1호
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• pp.1-8
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• 2006

In this study, effect of sputtering after plasma nitriding and before PVD coating on the microstucture, microhardness, surface roughness and the adhesion strength of CrN thin films were investigated. Experimental results showed that this sputtering process not only removed surface compound layer which formed during a plasma nitriding process but also induced an alteration of the surface of plasma nitrided substrate in terms of microhardness distribution and surface roughness, which in turn affected the adhesion strength of PVD coatings. After sputtering, microhardness distribution showed general decrease and the surface roughness became increased slightly. The critical shear stress measured from the scratch test on the CrN coatings showed an approximately twice increase in the binding strength through the sputtering prior to the coating and this could be attributed to a complete removal of compound layer from the plasma nitrided surface and to an increase in the surface roughness after sputtering.

• 한국결정성장학회지
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• 제10권2호
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• pp.128-133
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• 2000

Numerical analysis of the transport phenomena in an inductively coupled plasma reactor was conducted with two-dimensional axisymmetric model including the electromagnetic field model, electron and species density models. The spatial distribution of the charged species in the ion flux to the wafer have been calculated to examine the influence of the process conditions including antenna and reactor geometry. The antenna radius had a significant influence on the plasma state and axial ion flux distribution.