• Title/Summary/Keyword: Plasma cell

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High Resolution Melting Analysis for Epidermal Growth Factor Receptor Mutations in Formalin-fixed Paraffin-embedded Tissue and Plasma Free DNA from Non-small Cell Lung Cancer Patients

  • Jing, Chang-Wen;Wang, Zhuo;Cao, Hai-Xia;Ma, Rong;Wu, Jian-Zhong
    • Asian Pacific Journal of Cancer Prevention
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    • 제14권11호
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    • pp.6619-6623
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    • 2013
  • Background:The aim of the research was to explore a cost effective, fast, easy to perform, and sensitive method for epidermal growth factor receptor (EGFR) mutation testing. Methods: High resolution melting analysis (HRM) was introduced to evaluate the efficacy of the analysis for dectecting EGFR mutations in exons 18 to 21 using formalin-fixed paraffin-embedded (FFPE) tissues and plasma free DNA from 120 patients. Results: The total EGFR mutation rate was 37.5% (45/120) detected by direct sequencing. There were 48 mutations in 120 FFPE tissues assessed by HRM. For plasma free DNA, the EGFR mutation rate was 25.8% (31/120). The sensitivity of HRM assays in FFPE samples was 100% by HRM. There was a low false-positive mutation rate but a high false-negative rate in plasma free DNA detected by HRM. Conclusions: Our results show that HRM analysis has the advantage of small tumor sample need. HRM applied with plasma free DNA showed a high false-negative rate but a low false-positive rate. Further research into appropriate methods and analysis needs to be performed before HRM for plasma free DNA could be accepted as an option in diagnostic or screening settings.

Dual-frequency Capacitively Coupled Plasma-enhanced Chemical Vapor Deposition System for Solar Cell Manufacturing

  • 권형철;원임희;신현국;;이재구
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.310-311
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    • 2011
  • Dual-frequency (DF) capacitively coupled plasmas (CCP) are used to separately control the mean ion energy and flux at the electrodes [1]. This separate control in capacitively coupled radio frequency discharges is one of the most important issues for various applications of plasma processing. For instance, in the Plasma Enhanced Chemical Vapor Deposition processes such as used for solar cell manufacturing, this separate control is most relevant. It principally allows to increase the ion flux for high deposition rates, while the mean ion energy is kept constant at low values to prevent highly energetic ion bombardment of the substrate to avoid unwanted damage of the surface structure. DF CCP can be analyzed in a fashion similar to single-frequency (SF) driven with effective parameters [2]. It means that DF CCP can be converted into SF CCP with effective parameters such as effective frequency and effective current density. In this study, comparison of DF CCP and its converted effective SF CCP is carried out through particle-in-cell/Monte Carlo (PIC-MCC) simulations. The PIC-MCC simulation shows that DF CCP and its converted effective SF CCP have almost the same plasma characteristics. In DF CCP, the negative resistance arises from the competition of the effective current and the effective frequency [2]. As the high-frequency current increases, the square of the effective frequency increases more than the effective current does. As a result, the effective voltage decreases with the effective current and it leads to an increase of the ion flux and a decrease of the mean ion energy. Because of that, the negative resistance regime can be called the preferable regime for solar cell manufacturing. In this preferable regime, comparison of DF (13.56+100 or 200 MHz) CCP and SF (60 MHz) CCP with the same effective current density is carried out. At the lower effective current density (or at the lower plasma density), the mean ion energy of SF CCP is lower than that of DF CCP. At the higher effective current density (or at the higher plasma density), however, the mean ion energy is lower than that of SF CCP. In this case, using DF CCP is better than SF CCP for solar cell manufacturing processes.

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비글개에서 발정 주기 및 교배 적기 동안 질세포상과 번식 호르몬의 관계 (Relationship between Vaginal Cytology and Reproductive Hormone during the Estrous Cycle and Optimal Mating Time in Beagle Dogs)

  • 이기창;강현구;천현미;김일화
    • 한국수정란이식학회지
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    • 제21권2호
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    • pp.109-119
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    • 2006
  • 비글개 6두에서 11회(임신견 7두, 비 임신견 4두)의 발정 주기 및 임신 기간 동안 질 상피 세포 검사 및 혈장 progesterone과 estradiol-$17{\beta}$ 농도를 측정하여 질 상피 세포상과 번식 호르몬의 관계를 조사하고 배란 및 교배 적기 판정을 위한 기초 자료를 제공하고자 본 실험을 실시하였다. 임신 예와 비 임신 예에 있어서 발정 전기, 발정기 및 발정 휴지기의 기간은 각각 $8.5{\pm}1.4(Mean{\pm}SD),\;10.0{\pm}1.4$$54.0{\pm}2.8$ 그리고 $7.9{\pm}2.1,\;9.5{\pm}0.7$$62.0{\pm}11.3$일이었다. 임선 예에 비해 비 임신견의 발정 휴지기가 길었으며, 발정 주기 사이의 간격은 임선 예가 $246.2{\pm}24.5$일, 비 임신 예은 $175.3{\pm}34.5$일을 나타내어 임신이 되었던 예가 임신이 되지 않았던 예보다 길었다. 발정 주기별 질 상피 세포상의 변화를 보면 발정 전기와 발정기에는 superficial cell, anuclear cell 및 적혈구가, 발정 휴지기에는 parabasal cell, small intermediate cell, large intermediate cell 및 백혈구가, 그리고 무발정기에는 parabasal cell과 small intermediate cell이 주종을 이루었다. Cornification index(CI)는 발정 주기와 발정기에 유의하게 높았다. 발정 주기 중 혈장 progesterone과 estradiol-$17{\beta}$의 농도 사이의 관계를 혈장 progesterone 농도가 최초로 4.0 ng/ml 이상으로 상승한 날을 기준(Day 0)으로 살펴보면, 혈장 progesterone 농도는 발정 출혈 개시 일에 1.0 ng/ml 이하였으나 Day -2에 2.0 ng/ml 이상으로 상승하였으며, 혈장 progesterone 농도가 최초로 4.0 ng/ml 이상으로 상승한 날은 최초 교배 허용 후 2일이었다. Day 20일 경에 임신 예 및 비임신 예 모두 40 ng/ml 이상으로 최고치를 나타내었으며 Day 35 일까지 임신 예와 비 임신 예 사이에 차이가 인정되지 않았으나 이후 임신 예가 비 임신 예에 비해 높게 유지된 기간이 걸었다. 혈장 estradiol-$17{\beta}$ 농도는 발정 출혈 개시 일에 9 pg/ml 이상을 나타냈으며 이후 급증하여 Day -2 에 26.4 pg/ml로 peak를 나타내었다. CI와 혈장 progesterone 및 estradiol-$17{\beta}$ 농도 사이의 관계를 살펴보면, 혈장 estradiol-$17{\beta}$ 농도는 최초 교배 허용 일(Day 0)에 peak를 나타냈고 혈장 progesterone 농도는 Day 2에 4.0 ng/ml 이상으로 처음 상승하였다. CI 는 혈장 estradiol-$17{\beta}$ peak 이후 l일(Day 1)에 최고치를 나타냈으며 80% 및 90% 이상으로 증가한 날은 각각 Day -1 및 Day 1이었다. CI가 80% 및 90% 이상을 지속한 기간은 각각 Day -1에서 Day 8(10 일간 ) 및 Day 1에서 Day 6(6 일간)이었다. CI가 최고치를 나타낸 후 l일 (Day 2)에 혈장 progesterone 농도가 4.0 ng/ml 이상으로 처음 증가하였다. 결과를 종합하면 본 연구에서 비글개의 배란은 혈장 estradiol-$17{\beta}$ peak 이후 3일 및 혈장 progesterone 농도가 4.0 ng/ml 이상으로 처 음 상승한 날에 일어나며, 교배 적기는 CI가 90% 이상으로 증가한 후 2일 이후와 혈장 progesterone 농도가 $2{\sim}25\;ng/ml$인 시기로 생각된다.

Analysis of Single Crystal Silicon Solar Cell Doped by Using Atmospheric Pressure Plasma

  • Cho, I-Hyun;Yun, Myoung-Soo;Son, Chan-Hee;Jo, Tae-Hoon;Kim, Dong-Hae;Seo, Il-Won;Roh, Jun-Hyoung;Lee, Jin-Young;Jeon, Bu-Il;Choi, Eun-Ha;Cho, Guang-Sup;Kwon, Gi-Chung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.357-357
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    • 2012
  • The doping process of the solar cell has been used by furnace or laser. But these equipment are so expensive as well as those need high maintenance costs and production costs. The atmospheric pressure plasma doping process can enable to the cost reduction. Moreover the atmospheric pressure plasma can do the selective doping, this means is that the atmospheric pressure plasma regulates the junction depth and doping concentration. In this study, we analysis the atmospheric pressure plasma doping compared to the conventional furnace doping. the single crystal silicon wafer doped with dopant forms a P-N junction by using the atmospheric pressure plasma. We use a P type wafer and it is doped by controlling the plasma process time and concentration of dopant and plasma intensity. We measure the wafer's doping concentration and depth by using Secondary Ion Mass Spectrometry (SIMS), and we use the Hall measurement because of investigating the carrier concentration and sheet resistance. We also analysis the composed element of the surface structure by using X-ray photoelectron spectroscopy (XPS), and we confirm the structure of the doped section by using Scanning electron microscope (SEM), we also generally grasp the carrier life time through using microwave detected photoconductive decay (u-PCD). As the result of experiment, we confirm that the electrical character of the atmospheric pressure plasma doping is similar with the electrical character of the conventional furnace doping.

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한국 성인 남자의 혈장 Tocopherol 수준과 관련 요인 분석 (Association between Plasma Tocopherol Levels and Related Factors in Middle-Aged Korean Men)

  • 김경자;이혜진;박유경;강명희
    • Journal of Nutrition and Health
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    • 제39권8호
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    • pp.773-785
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    • 2006
  • Vitamin E in the body system plays an important role in preventing chronic diseases by decreasing the oxidative stress by free-radicals. However, there are not enough researches on analyzing the primary factors affecting vitamin E levels in the blood in Korean adults. Therefore, the purpose of this research was to examine blood tocopherol levels and the primary factors affecting the status. A complete lifestyle survey was performed on 314 Korean adult men and surveyed their smoking, drinking and exercising habits. The average plasma level of ${\alpha}-\;and\;{\gamma}-tocopherol$ showed similar mutual relations with plasma total cholesterol (TC), triglyceride (TG), or low density lipoprotein cholesterol (LDL-C) levels (p<0.001). Plasma ${\alpha}-tocopherol$ level of the subjects did not show any difference as smoking, drinking and exercising habits changed. However, ${\gamma}-tocopherol$ per TG showed much lower figure in smokers than non smokers (p < 0.05). Amongst diet factors, plasma ${\alpha}-tocopherol$ level showed negative correlations with Vitamin E intake, while ${\gamma}-tocopherol$ level showed positive correlations with Vitamin E intake. Erythrocyte superoxide dismutase (SOD) activity and plasma tocopherol showed negative correlations, and catalase activity and plasma ${\alpha}-tocopherol$ showed positive correlationship. The level of cell DNA damage of Iymphocyte and plasma ${\alpha}-\;or\;{\gamma}-tocopherol$ showed negative correlations. As a result of this research, the factors that affect Korean adult men's plasma ${\alpha}-tocopherol$ level are plasma TG, LDL-C and cell DNA damage in Iymphocyte, while the factors that affect ${\gamma}-tocopherol$ level are plasma TG, LDL-C and vitamin E intake based on multiple regression analysis. These findings implies that the level of different types of tocopherol depends on slightly different factors. A further research is needed on the factors involved in the differentiation of the types of tocopherol.

새로운 대기압 플라즈마 소스를 이용한 결정질 실리콘 태양전지 인산 도핑 가능성에 관한 연구 (A Study on Feasibility of the Phosphoric Acid Doping for Solar Cell Using Newly Atmospheric Pressure Plasma Source)

  • 조이현;윤명수;조태훈;권기청
    • 조명전기설비학회논문지
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    • 제27권6호
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    • pp.95-99
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    • 2013
  • Furnace is currently the most important doping process using POCl3 in solar cell. However furnace need an expensive equipment cost and it has to purge a poisonous gas. Moreover, furnace typically difficult appling for selective emitters. In this study, we developed a new atmospheric pressure plasma source, in this procedure, we research the atmospheric pressure plasma doping that dopant is phosphoric acid($H_3PO_4$). Metal tube injected Ar gas was inputted 5 kV of a low frequency(scores of kHz) induced inverter, so plasma discharged at metal tube. We used the P type silicon wafer of solar cell. We regulated phosphoric acid($H_3PO_4$) concentration on 10% and plasma treatment time is 90 s, 150 s, we experiment that plasma current is 70 mA. We check the doping depth that 287 nm at 90 s and 621 nm at 150 s. We analysis and measurement the doping profile by using SIMS(Secondary Ion Mass Spectroscopy). We calculate and grasp the sheet resistance using conventional sheet resistance formula, so there are 240 Ohm/sq at 90 s and 212 Ohm/sq at 150 s. We analysis oxygen and nitrogen profile of concentration compared with furnace to check the doped defect of atmosphere.

Electric field distribution and discharge characteristics in accordance with various ITO electrode structures in AC-PDP

  • Cho, Seok-H.;Oh, P.Y.;Kim, J.H.;Hong, Y.J.;Kwon, G.C.;Cho, G.S.;Choi, E.H.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.396-399
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    • 2008
  • In this study, the electric field distributions have been investigated by simulation in accordance with the various shapes of ITO-electrodes. Also we have measured the density of excited Xe atoms in the 1s5 state in discharge cell, where the gap distance of 60 um, gas pressure of 400 Torr, Xe contents of 7%, and sustaining voltage of 200 V are kept in this experiment. The maximum density of excited Xe atoms in the 1s5 state in a discharge cell for the fish-boned, T shaped and squared ITO electrodes have been measured to be $3.01\;{\times}\;10^{13}\;cm^{-3}$, $2.66\;{\times}\;10^{13}\;cm^{-3}$ and $2.06\;{\times}\;10^{13}\;cm^{-3}$, respectively. It is shown that the electric field distribution with different ITO Electrodes is essential factor for these maximum density of excited Xe atoms in discharge cell.

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Terahertz emission from a plasma dipole oscillation

  • Min Sup Hur;Manoj Kumar;Hyung Seon Song;Teyoun Kang
    • Journal of the Korean Physical Society
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    • 제80권
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    • pp.852-858
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    • 2022
  • We studied an unrevealed characteristic of radiation emission from a localized plasma oscillator (plasma dipole oscillation-PDO). PDO is a novel concept of generating terahertz emission from a laser plasma-based system. The electromagnetic field generated by a PDO embedded in a uniform plasma, instead of being cut off by the ambient plasma as expected by a common but misleading sense, propagates long distances to escape the plasma eventually. The PDO-THz, differently from other laser plasma-based THz sources, utilizes the collective behavior of the plasma (plasma oscillations) and, accordingly, produces a quasi-narrow-band emission, which can potentially be useful in THz-based accelerator or THz-pump and probe experiments. We verified the PDO mechanism by using realistic three-dimensional particle-in-cell simulations.

New PDP cell structure for high luminous efficacy with low voltage driving

  • Jung, Hae-Yoon;Kim, Tae-Jun;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.480-484
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    • 2006
  • We propose a new PDP cell structure named DIDE (Dual Ignition Discharge Electrodes) structure with a long electrode gap to realize a high luminous efficacy. Suggested DIDE structure basically has a long electrode gap $(200{\mu}m{\sim}400{\mu}m)$, nevertheless, because of auxiliary electrodes formed on the front panel, can be driven at relatively low voltage. The discharge characteristic of DIDE structure was much different from that of conventional structure, which was analyzed by IR emission images using IICCD (Image Intensified Charge Coupled Device). The study can explain some particular characteristics of DIDE structure. As a result, the long electrode gap and low voltage effect can be expected in DIDE structure, and a very high luminous efficacy of 7.5 lm/W has been achieved in monochrome green test panel adopting the new cell structure with Ne-Xe (12%) mixture at 400 torr.

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The effect of the cell size on the discharge characteristics of a plasma display panel

  • Moon, Cheol-Hee
    • Journal of Information Display
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    • 제12권1호
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    • pp.29-35
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    • 2011
  • In this study, plasma display panels with three different cell volumes were prepared by changing the spaces between the vertical barrier ribs into two and three times the reference structure. The discharge gap and area of the segmented ITO electrode were the same for the three cases, and Ne.20%Xe gas was used. The luminance and luminance efficiency were measured using applied voltage variations. The time evolution and intensity distribution of the infrared, which are related to the vacuum ultraviolet, were observed via intensified, charged, coupled device, and the visible-light intensity profiles were observed using PR-900 to analyze the discharge phenomena in the discharge cell.