• Journal of Welding and Joining
• /
• v.20 no.3
• /
• pp.109-115
• /
• 2002

In this study high power Nd:YAG laser welding of structural steel was investigated. For the test steel blocks of $50{\times}50{\times}200mm$ were cut and machined, and bead-on-plate weld was made on the machined surface. Argon, nitrogen, helium, dry air or mixed gases were used to find the effect of shielding conditions on the bead formation. Results demonstrated that there were Fe I rich region and Fe II rich region in the laser induced plasma column based on the spectral analysis with S-2000 field spectrometer The Fe I region was located at the root of the column near keyhole opening. On the other hand, Fe II region was found at the middle of the plasma column. In the Nd:YAG laser welding, Fe I region emitted continuum which had peak value at wave length of around 710nm, and Fe II region had the peak at 580nm. In the welding of steel by $CO_2$ laser, however, no continuum was observed. There showed two groups of strong spikes in the $CO_2$ laser welding; the first group was displayed at the wave band of 450-560nm. This spike group emitted stronger intensity of light and sharper peaks than those group at 680-800nm.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1999.05a
• /
• pp.406-409
• /
• 1999

Experimental Investigations were carried out to remove NOx, SOx simultaneously from simulated flue gas[NO(0.02%)-SO$_2$(0.08%)-$CO_2$-Air-$N_2$] by using a plasma chemical reaction. Ammonia gas(14.81%) balanced by argon was diluted by all and was Introduced to mall simulated flue gas duct through NH$_3$ Injection system which is in downstream of reactor. The NH$_3$ molecular ratio(MR) was determined based on (NH3) to [NO+S0$_2$]. MR is 1, 1.5, 2.5. The NOx removal rate significantly increased with increasing NaOH bubble quantity. The SO$_2$ removal rate was not significantly effected by applied voltage, however it fairly Increased with increasing NH$_3$ molecule ratio. By-product aerosol particle was observed by XRD(X-ray diffraction) after sampling, The NOx, SOx removal rates, when H2O vapour bubbled by dry all was injected to plasma reactor, were better than those of other cases. When aqueous NaOH solution(20%) bubbled by 2.5( ι /min) of $N_2$ and 0.5 ( ι /min) NH$_3$(MR=1.5) were injected to simulated flue gas, The NOx. SOx removal rate was 95 ~ 100[%]

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2006.12a
• /
• pp.91-95
• /
• 2006

In whole world consciousness of environment maintenance have increased very quickly for the end of the 20th century. To use and disuse toxic substances have been controled at the field of industry. Also the field of lighting source belong to environmental control. And in the future the control will be strong. In radiational mechanism of fluorescence lamp mercury is the worst environmental problem. In radiational mechanism of fluorescence lamp mercury is the worst environmental problem root. In the mercury free lighting source system the Xe gas lamp is one type. And the Ne:Xe mixing gas lamp improvements firing voltage of Xe gas lamp. Purpose and subject of this study are understand, efficiency, ideal of Ne:Xe plasma which mercury free lamp. Before ICP was designed, basic parameters of plasma, which are electron temperature and electron density, were measured and calculated by langmuir probe data. Property of electron temperature and electron density were confirmed by changing ratio of Ne:Xe.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.11a
• /
• pp.214-215
• /
• 2007

Etch rates and surface chemistry of phenol formaldehyde-based photoresist after short time $O_2\;and\;N_2O$ radio frequency (RF) plasma treatment depending on exposure time were investigated. It was found that the etch rate of photoresist sharply increased after discharge turn on and reached a limit with increase in plasma exposure time in both gases. X-ray photoelectron spectroscopy (XPS) analysis showed that the surface chemical structure become nearly constant after the treatment of 15 sec. Concentration of surface oxygen-containing groups after processing both in oxygen and in $N_2O$ plasmas is similar.

• Journal of the Korean Vacuum Society
• /
• v.15 no.6
• /
• pp.556-562
• /
• 2006

The plasma display panel is made of many small discharge cells, which consist of a discharge space between the cathode and anode. An electrical discharge occurs in the discharge space filled by neon and xenon gases. The electron temperature is determined from the sparking criterion, which theoretically estimates the electrical breakdown voltage in terms of the xenon mole fraction. The plasma in the cell emits vacuum ultraviolet lights of 147 nm and 173 nm, exciting fluorescent material and converting VUV lights to visible lights. The physical mechanisms of all these processes have been theoretically modeled and experimentally measured. The theory and experimental data agree reasonably well. However, new materials and better configuration of cells are needed to enhance discharge and light emission efficiency and to improve the PDP performance.

• Proceedings of the Membrane Society of Korea Conference
• /
• 1998.10a
• /
• pp.63-65
• /
• 1998

1. Introduction : Atmospheric discharge of VOC-contaminated streams in chemical plants and air streams from chemical processes poses a serious environmental problem and entails large financial losses. Such emissions may be reduced by i) adsorption process, ii) absorption process and iii) incineration process. These processes only forbids the air pollutions. Throughout the recent decade, another technique-membrane process has emerged. The separation and recovery of organic vapors by membrane process may have great economic potential. Most of the published research works on the separation of organic vapors from air were performed using silicon rubber membranes. However, it is very difficult to fabricate very thin membranes with less than 1 $u m thickness. Plasma polymerization could be a good technique to generate a thin polymer film. The objective of this work is to find out the optimum condition of plasma polymerization for producing VOC separation membrane. For the objective, composite membranes are prepared through plasma polymerization of hexamethyldisiloxane onto porous substrates under different conditions. The membrane is then subjected to the permeation of permanent gases and VOCs to find the correlations between the physical properties of the penetrant and permeability and selectivity.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.02a
• /
• pp.213-213
• /
• 2010

Magnetic random access memory (MRAM), based on magnetic tunnel junction (MTJ) and CMOS, is one of the best semiconductor memories because it can provide nonvolatility, fast access time, unlimited read/write endurance, low operating voltage and high storage density. For the realization of high density MRAM, the etching of MTJ stack with good properties is one of a key process. Recently, there has been great interest in the MTJ stack using MgO as barrier layer for its huge room temperature MR ratio. The use of MgO barrier layer will undoubtedly accelerate the development of MTJ stack for MRAM. In this study, high-density plasma reactive ion etching of MgO films was investigated in an inductively coupled plasma of $Cl_2$/Ar gas mixes. The etch rate, etch selectivity and etch profile of this magnetic film were examined on vary gas concentration. As the $Cl_2$ gas concentration increased, the etch rate of MgO monotonously decreased and etch slop was slanted. The effective of etch parameters including coil rf power, dc-bais voltage, and gas pressure on the etch profile of MgO thin film was explored, At high coil rf power, high dc-bais voltage, low gas pressure, the etching of MgO displayed better etch profiles. Finally, the clean and vertical etch sidewall of MgO films was achieved using $Cl_2$/Ar plasma at the optimized etch conditions.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2003.10a
• /
• pp.54-54
• /
• 2003

DLC films were deposited on Si(100) substrates by inductively coupled plasma (ICP) assisted chemical vapor deposition (CVD). A mixture of acetylene (C$_2$H$_2$) and argon (Ar) gases was used as the precursor and plasma source, respectively. The structure of the films was characterized by the Raman spectroscopy. Results from the Raman spectroscopy analysis indicated that the property change of the DLC films is due to the sp$^3$ and sp$^2$ ratio in the films under various conditions such as ICP power, working pressure and RF substrate bias. The hydrogen content in the DLC films was determined by an electron recoil detector (ERB). The roughness of the films was measured by atomic force microscope (Am). A microhardness tester was used for the hardness and elastic modulus measurement. The DLC film showed a maximum hardness of 37㎬. In this work, the relationship between deposition parameters and mechanical properties were discussed.

• Textile Coloration and Finishing
• /
• v.1 no.1
• /
• pp.7-18
• /
• 1989

The distinguishing characteristic of the glow discharge is that chemical reaction induced by partially ionized gases are limited only to the substrate surface. Most studies have been done on the plasma etching and polymerization. The graft polymerization in vapour phase by cold plasma has been rarely investigated. In this study the system of tub3ar reaction chamber with capacitively coupled electrode of alternative current of 60 Hz was employed for the graft polymerization. The graft polymerization of Acylic Acid(AA) onto the poly (ethylene terephthalate) (PET) was carried out by treatment of PET film and fabric by cold plasma (glow discharge of argon gas), followed by the supply of AA vapour. The graft yield was about 1 wt%. The surface property was determined by contact angle, the surface tension was evaluated by zisman’s plot and equation of surface tension mesurement. The results were as follows: 1. In order to obtain lower contact angle, it was effective to avoid the vicinity of electrodes for a setting position of substrate. 2. Contact angle affected on the monomer pressure and its duration of exposure to the acid vapour. 3. Polymer radical formation was influenced by the changes of the value of current density and plasma treatment time. 4. Total surface tension of plasma grafted PET film increased. With an increase in the carboxylic acid content, the dispersion force decreased, while, the polar force and hydrogen bonding force increased. 5. The contact angle decreased from $75^\circ$ to around $30^\circ$ by plasma grafting. There was no ageing effect on the contact angle after 4 months.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.30-30
• /
• 2011

The wave-cutoff tool is a new diagnostic method to measure electron density and electron temperature. Most of the plasma diagnostic tools have the disadvantage that their application to processing plasma where toxic and reactive gases are used gives rise to many problems such as contamination, perturbation, precision of measurement, and so on. We can minimize these problems by using the wave-cutoff method. Here, we will present the results obtained through the development of the wave-cutoff diagnostic method. The frequency spectrum characteristics of the wave-cutoff probe will be obtained experimentally and analyzed through the microwave field simulation by using the CST-MW studio simulator. The plasma parameters are measured with the wave-cutoff method in various discharge conditions and its results will be compared with the results of Langmuir probe. Another disadvantage is that other diagnostic methods spend a long time (~ a few seconds) to measure plasma parameters. In this presentation, a fast measurement method will be also introduced. The wave-cutoff probe system consists of two antennas and a network analyzer. The network analyzer provides the transmission spectrum and the reflection spectrum by frequency sweeping. The plasma parameters such as electron density and electron temperature are obtained through these spectra. The frequency sweeping time, the time resolution of the wave-cutoff method, is about 1 second. A short pulse with a broad band spectrum of a few GHz is used with an oscilloscope to acquire the spectra data in a short time. The data acquisition time can be reduced with this method. Here, the plasma parameter measurement methods, Langmuir probe, pulsed wave-cutoff method and frequency sweeping wave-cutoff method, are compared. The measurement results are well matched. The real time resolution is less than 1 ?sec. The pulsed wave-cutoff technique is found to be very useful in the transient plasmas such as pulsed plasma and tokamak edge plasma.