• Title/Summary/Keyword: Plasma Display

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Activation of melanogenesis by non-thermal atmospheric pressure plasma

  • Ali, Anser;Kumar, Naresh;Kumar, Ajeet;Rhee, Prof. Myungchull;Lee, SeungHyun;Attri, Pankaj;Choi, Eun Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.211.1-211.1
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    • 2016
  • Several reports have demonstrated the wide range of nonthermal plasma applications in biomedical field including cancers, diabetics, wound healing and cosmetics. Recently, it has been shown that plasma is able to modulate the p38 MAPK and JUN level in cells which has a crucial role in melanin synthesis and skin pigmentation. Therefore we investigated the effect of plasma on melanogenesis in-vitro using melanoma (B16F10) cells and in-vivo using mouse and zebra fish. To investigate the mechanism of plasma action, plasma device characteristics were measured, reactive species inside and outside the cells were detected, and western blot was performed to find the signaling pathway involved in melanin activation in-vitro and in-vivo. This is the first report presenting the role of nonthermal plasma for melanogenesis which provides a new perspective of plasma in the field of dermatology.

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23' LCD TV by using ALT plasma beam alignment technology

  • Lee, C.Y.;Tang, H.C.;Chen, C.W.;Shih, Y.J.;Liu, C.H.;Lin, C.H.;Yang, K.H.;Lin, S.H.;Chang, H.C.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.776-779
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    • 2006
  • The alignment of liquid crystal (LC) is one of the key issues of liquid crystal display (LCD) technologies. In this study, we aligned polyimide (as the LC alignment layer) by ALT plasma beam and to realize the stability and characteristics of this technology. The characteristics such as anchoring energy, pre-tilt angle, voltage holding ratio(VHR) and residual direct current(Rdc) were discussed. Besides, we applied it to the in plane switch (IPS) mode 23" WXGA real panel, the performance parameters and electrical properties were measured and compared with those of rubbing alignment. From the result, we demonstrated a successful LC alignment treatment process in real panel by ALT plasma beam.

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A study of characteristics for Image sticking in AC - Plasma Display Panel

  • Han, Yong-gyu;Lee, S.B.;Jeong, S.H.;Son, C.G.;Yoo, N.L.;Lee, H.J.;Lim, J.E.;Lee, J.H.;Jeoung, J.M.;Ko, B.D.;Oh, P.Y.;Moon, M.W.;Choi, Eun-Ha
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.263-265
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    • 2005
  • In the alternative current plasma display panel(AC-PDP) technology, it is very important to remove the image sticking for improving an image quality. In this paper, we have investigated the driving method of alternative current plasma display panel(AC-PDP) for preventing image sticking. We have investigated the driving method of alternative current plasma display panel(AC-PDP) for preventing image sticking. The preventing method of image sticking was proposed by adopting the Sticking Remove Pulse(SRP). The variation of brightness is most affected by the MgO to be formed at the surface of the phosphor layer. As a result, the image sticking is reduced when the driving method adopted an SRP.

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New Cu Process and Short Channel TFT

  • Yang, J.Y.;Hong, G.S.;Kim, K.;Bang, J.H.;Ryu, W.S.;Kim, J.O.;Kang, Y.K.;Yang, M.S.;Kang, I.B.;Chung, I.J.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1189-1192
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    • 2009
  • Short channel a-Si:H TFT devices with Cu electrodes have been investigated. Short channel TFTs are defined by new plasma etch process. When the channel length becomes shorter, the TFT characteristics (threshold voltage, off current, sub threshold voltage, etc.,) are degraded. These degraded characteristics can be improved through the hydrogen plasma treatment and new gate insulator structure. Using these processes, 15.0 inch XGA LCD panel was fabricated successfully where the channel length of the TFT devices was about 2.5 micrometers.

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Effects of Process Induced Damages on Organic Gate Dielectrics of Organic Thin-Film Transistors

  • Kim, Doo-Hyun;Kim, D.W.;Kim, K.S.;Moon, J.S.;KIM, H.J.;Kim, D.C.;Oh, K.S.;Lee, B.J.;You, S.J.;Choi, S.W.;Park, Y.C.;Kim, B.S.;Shin, J.H.;Kim, Y.M.;Shin, S.S.;Hong, Mun-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1220-1224
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    • 2007
  • The effects of plasma damages to the organic thin film transistor (OTFT) during the fabrication process are investigated; metal deposition process on the organic gate insulator by plasma sputtering mainly generates the process induced damages of bottom contact structured OTFTs. For this study, various deposition methods (thermal evaporation, plasma sputtering, and neutral beam based sputtering) and metals (gold and Indium-Tin Oxide) have been tested for their damage effects onto the Poly 4-vinylphenol(PVP) layer surface as an organic gate insulator. The surface damages are estimated by measuring surface energies and grain shapes of organic semiconductor on the gate insulator. Unlike thermal evaporation and neutral beam based sputtering, conventional plasma sputtering process induces serious damages onto the organic surface as increasing surface energy, decreasing grain sizes, and degrading TFT performance.

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Study of Plasma Process Induced Damages on Metal Oxides as Buffer Layer for Inverted Top Emission Organic Light Emitting Diodes

  • Kim, Joo-Hyung;Lee, You-Jong;Jang, Jin-Nyoung;Song, Byoung-Chul;Hong, Mun-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.543-544
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    • 2008
  • In the fabrication of inverted top emission organic light emitting diodes (ITOLEDs), the organic layers are damaged by high-energy plasma sputtering process for transparent top anode. In this study, the plasma process induced damages on metal oxide hole injection layers (HILs) including $WO_3$, $MoO_3$, and $V_2O_5$ as buffer layer are examined. With the result of IV characteristic of hole-only devices, we propose that $MoO_3$ and $V_2O_5$ are stable materials against plasma sputtering process.

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Transparent Plasma Display using Transparent Glass Barrier Ribs

  • Lee, Sung-Min;Kim, Seung-Hun;Oh, Seung-Hwa;Shin, Bhum-Jae;Choi, Kyung-Cheol
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.339-341
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    • 2009
  • A transparent plasma display was developed using transparent glass barrier ribs. Glass barrier ribs were fabricated via a wet etching process. Glass barrier ribs created using a top and bottom etching process showed better transparency compared to those created through only a top etching process. A see-through phosphor layer was obtained by coating the sidewall of the barrier ribs with a conventional opaque phosphor. A fabricated prototype of a transparent plasma display was clear enough to see the background beyond the panel and was well operated by a conventional driving scheme. The maximum luminance was 1150 cd/$m^2$ and the maximum luminous efficacy was 1.35 lm/W in a Ne+13.5%Xe gas-mixture and green cells.

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Plasma Treatment Effects on Tungsten Oxide Hole Injection Layer for Application to Inverted Top-Emitting Organic Light-Emitting Diodes

  • Kim, Joo-Hyung;Lee, You-Jong;Jang, Yun-Sung;Kim, Doo-Hyun;Hong, Mun-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.354-355
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    • 2009
  • In the fabrication of inverted top-emitting organic light emitting diodes (ITOLEDs), the sputtering process is needed for deposition of transparent conducting oxide (TCO) as top anode. Energetic particle bombardment, however, changes the physical properties of underlying layers. In this study, we examined plasma process effects on tungsten oxide ($WO_3$) hole injection layer (HIL). From our results, we suggest the theoretical mechanism to explain the correlation between the physical property changes caused by plasma process on $WO_3$ HIL and degradation of device performances.

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Thermal characteristics variation of PDP in compliance with dielectric loss

  • Lee, Tae-Ho;Jung, Jae-Chul;Lee, Sang-Kuk;Kim, Joong-Kyun;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.265-268
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    • 2009
  • The discharge condition of Plasma display panel(PDP) changes as the display time increases. Imaginary part of permittivity of dielectric material which is related to dielectric loss has been often neglected because of relatively small value compare to that of the real part. The thermal characteristics of PDPs with two different dielectrics has been studied and compared.

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Numerical analysis of the striation phenomena in an ac Plasma Display Panel using energy fluid model

  • Bae, Hyun-Sook;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.33-36
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    • 2007
  • We performed a discharge analysis on ac plasma display panel through the numerical simulation of the EF (Energy Fluid) model using the electron's energy equation. When it is compared to the results of commonly used LFA (Local Field Approximation) model, there is a clear difference in the spatiotemporal distribution of Xe excited species. In particular, the experimentally observed striation phenomena in the anode region could be observed in EF model and the occurrence of the striation was attributed to the ionization and excitation instability due to the streaming electrons in the anode region plasma.

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