• 제목/요약/키워드: Plasma Discharge

검색결과 1,419건 처리시간 0.024초

New electrode structure for reducing power consumption of PDPs

  • Jung, Hae-Yoon;Cheong, Hee-Woon;Lee, Tae-Ho;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.69-72
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    • 2008
  • A new electrode structure is proposed in this paper which can increase the discharge efficiency of plasma display panels and also decrease the panel capacitance by decreasing the electrode area effectively. Even with the decreased electrode area, the proposed structure could suppress the requirement for increasing the voltage and improve efficiency by limiting the discharge current.

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Realization of novel plasma performances based on systematic understanding of plasma behaviour using laser diagnostics

  • Muraoka, K.
    • 한국조명전기설비학회:학술대회논문집
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    • 한국조명전기설비학회 1999년도 학술대회논문집-국제 전기방전 및 플라즈마 심포지엄 Proceedings of 1999 KIIEE Annual Conference-International Symposium of Electrical Discharge and Plasma
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    • pp.46-52
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    • 1999
  • Laser diagnostics have been extensively used to understand plasma behaiviour under different discharge conditions. Measurements were performance for (i) electric field, (ii) electron temperature and density, and (iii) reaction products due to chemical reactions by electron impacts. The knowledge thus gained has been extensively used to realize novel plasma performances, such as epitaxial thin film depositions using plasma sputtering, performance improvements of discharge-pumped excimer laser, and developments of environmental equipment.

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실시간 고속 플라즈마 아킹 검출에 대한 연구 (Case Study of High-speed Real-time Plasma Arc Detection)

  • 홍상진
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2015년도 추계학술대회 논문집
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    • pp.183-183
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    • 2015
  • Arc in plasma processing chamber results in high current discharge marks and particles on wafers, but it is hard to identify or observe it during the proc ess. In this paper, we report the observations of plasma arc s during various plasma proc esses through a non-invasive optic al plasma monitoring system (OPMS) devised for the in-situ detec tion of abnormal discharge.

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Correlation between Coil Configurations and Discharge Characteristics of a Magnetized Inductively Coupled Plasma

  • Cheong, Hee-Woon
    • Journal of Magnetics
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    • 제21권2호
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    • pp.222-228
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    • 2016
  • Correlation between coil configurations and the discharge characteristics such as plasma density and the electron temperature in a newly designed magnetized inductively coupled plasma (M-ICP) etcher were investigated. Radial and axial magnetic flux density distributions as well as the magnetic flux density on the center of the substrate holder were controllable by placing multiple circular coils around the etcher. The plasma density increased up to 60.7% by arranging coils (or optimizing magnetic flux density distributions inside the etcher) properly although the magnetic flux density on the center of the substrate holder was fixed at 7 Gauss.

전극 재료 및 두께가 DBD 플라즈마 액추에이터의 성능에 미치는 영향에 대한 실험적 연구 (Experimental Study on Effect of Electrode Material and Thickness in a Dielectric Barrier Discharge Plasma Actuator Performance)

  • 이승엽;신유환
    • 한국유체기계학회 논문집
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    • 제15권3호
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    • pp.46-50
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    • 2012
  • Plasma actuator makes parallel flow on the wall surface by the interaction between plasma and neutral air particles. Dielectric barrier discharge (DBD) plasma actuator is widely studied as one type of plasma actuators, which consists of one electrode exposed to the environmental gas and the other encapsulated by a dielectric material. This paper is experimentally focused on the performance of DBD plasma actuator mounted on a flat plate, which depends on kinds of the electrode materials, their thicknesses and the supplied voltage including its frequency. We measured the velocity magnitudes of the induced flow by a stagnation probe as a performance parameter of the plasma actuators. The velocity profiles of the flow induced by the plasma actuators are similar in all measurement cases. The magnitude of the induced velocity is strongly influenced by the thickness of the electrodes and the frequency of the input voltage. The performance of DBD plasma actuators is related to the electric properties of the electrode materials such as the ionization energy and the electrical resistivity.

기체플라즈마에 의한 농약분해특성 연구 (Degradation of the Selected Pesticides by Gas Discharge Plasma)

  • ;홍수명;목철균;임건재
    • 농약과학회지
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    • 제16권1호
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    • pp.11-20
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    • 2012
  • 식량증산을 위해 농약사용량이 증가함에 따라, 식품 중 잔류농약의 안전성 문제에 대한 관심은 날로 증가하고 있지만 효율적인 잔류농약 저감화 방법은 보급되지 못하고 있는 것이 현실이다. 최근에 기체 플라즈마에 의한 오염물질 제거는 고효율성과 환경친화성으로 많은 주목을 받고 있다. 특히 플라즈마는 수질 및 고체 표면 중 유기인계살충제, 페놀, 벤조산, 염료, 니트로벤젠과 같은 오염물질의 제거에 큰 효과가 있는 것으로 알려지고 있다. 본 연구는 플라즈마를 이용하여 농식품 중에 잔류되는 농약의 제거 가능성을 알아보고자 대기압 및 감압플라즈마 플라즈마 발생 상태에서 60종의 농약을 대상으로 분해양상을 파악해보고자 시도하였다. 시험용 농약을 유리판에 도포 후 대기압 및 감압 플라즈마 발생기에서 5분간 조사 후 잔류량을 확인 한 결과 대조구의 회수 분석결과가 70% 미만인 18종을 제외한 41종의 농약 분해율이 66.88-100%를 나타내었고, clothianidin은 감압플라즈마하에서 26.9%이 분해율을 보였다.

플라즈마 반응기구조에 따른 코로나방전 및 NO-NO$_2$ 전환특성에 관한 실험적 연구 (Experimental Study on the Effect of Plasma Reactor Type on Corona Discharge and NO-NO2 Conversion Characteristics)

  • 박용성;전광민
    • 한국자동차공학회논문집
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    • 제10권6호
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    • pp.65-71
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    • 2002
  • Characteristics of corona discharge of the different types of the plasma reactors which are cone-hole and cone-plate is investigated experimentally. The discharge starts at lower voltage for the cathode corona than the anode corona and spark occurs at higher voltage for the cathode corona. And the cathode corona makes more stable discharge than the anode corona. The effect of the base gas in corona discharge for different O$_2$/N$_2$ concentrations is related with the gas molecular weight. The discharge for the smaller molecular weight gas occurs easier than for the high molecular weight gas. The discharge current decreases with the increase of oxygen concentration and it increases more sharply for anode corona than for cathode corona as discharge voltage increases after corona onset voltage. NO-NO$_2$ conversion increases with the energy density of corona discharge and the addition of O$_2$ in a base N$_2$ gas.

산화티타늄 광촉매와 펄스 방전 플라즈마 조합에 의한 공기정화장치 (Air Cleaning Unit using Combination of $TiO_2$ Photocatalyst and Pulsed Discharge Plasma)

  • 홍영기;신수연;강정훈;이성화;조정수;박정후
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제48권10호
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    • pp.710-715
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    • 1999
  • The purpose of this work is to develop a high-efficiency air cleaning system for air pollutants such as particulate and gaseous state in indoor environments. In order to enhance a removal efficiency of gaseous state pollutants, we suggested that pulsed discharge plasma be combined with $TiO_2$ photocatalyst (photocatalytic plasma air cleaning unit). We investigated experimentally the basic characteristics of photocatalytic plasma air cleaning unit and measured air pollutants removal efficiency. The wavelength of light radiated from pulsed discharge plasma under the atmospheric condition was 310~380nm. Its energy is enough to excite the $TiO_2$ photocatalyst and it makes a photochemical reaction in the surface of $TiO_2$ photocatalyst. The removal quantity of trimethylamine$((CH_3)_3N)\; was\; 130mg/m^34 which is twice quantity of pulsed discharge plasma without $TiO_2$ phtocatalyst unit. From the result of gas analysis using FT-IR, nitric oxide was not detected and trimethylamine was decomposed to $H_2O\; and \;CO_2$. And trimethylamine removal efficiency was 95%. These experimental results indicate that photocatalytic plasma air cleaning unit is a potential method in removing the pollutants.

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Hydrocarbon Plasma of a Low-Pressure Arc Discharge for Deposition of Highly-Adhesive Hydrogenated DLC Films

  • Chun, Hui-Gon;Oskomov, Konstantin V.;Sochugov, Nikolay S.;Lee, Jing-Hyuk;You, Yong-Zoo;Cho, Tong-Yul
    • 반도체디스플레이기술학회지
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    • 제2권1호
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    • pp.1-5
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    • 2003
  • Plasma generator based on non-self-sustained low-pressure arc discharge has been examined as a tool for deposition of highly-adhesive hydrogenated amorphous diamond-like carbon(DLC) films. Since the discharge is stable in wide range of gas pressures and currents, this plasma source makes possible to realize both plasma-immersion ion implantation(PIII) and plasma-immersion ion deposition(PIID) in a unified vacuum cycle. The plasma parameters were measured as functions of discharge current. Discharge and substrate bias voltage parameters have been determined for the PIII and PIID modes. For PIID it has been demonstrated that hard and well-adherent DLC coating are produced at 200-500 eV energies per deposited carbon atom. The growth rates of DLC films in this case are about 200-300 nm/h. It was also shown that short(∼60$\mu\textrm{s}$) high-voltage(> 1kV) substrate bias pulses are the most favorable for achieving high hardness and good adhesion of DLC, as well as for reducing of residual intrinsic stress are.

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FE Analysis of Plasma Discharge and Sheath Characterization in Dry Etching Reactor

  • Yu, Gwang Jun;Kim, Young Sun;Lee, Dong Yoon;Park, Jae Jun;Lee, Se Hee;Park, Il Han
    • Journal of Electrical Engineering and Technology
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    • 제9권1호
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    • pp.307-312
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    • 2014
  • We present a full finite element analysis for plasma discharge in etching process of semiconductor circuit. The charge transport equations of hydrodynamic diffusion-drift model and the electric field equation were numerically solved in a fully coupled system by using a standard finite element procedure for transient analysis. The proposed method was applied to a real plasma reactor in order to characterize the plasma sheath that is closely related to the yield of the etching process. Throughout the plasma discharge analysis, the base electrode of reactor was tested and modified for improving the uniformity around the wafer edge. The experiment and numerical results were examined along with SEM data of etching quality. The feasibility and usefulness of the proposed method was shown by both numerical and experimental results.